Holding mechanisms

Industry

CPC
H01J2237/2007

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2007Holding mechanisms

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus for improved high pressure plasma processing
- Patent number 12,368,028
- Issue date Jul 22, 2025
- Applied Materials, Inc.
- William R. Johanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,368,027
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Takatoshi Orui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and method
- Patent number 12,362,152
- Issue date Jul 15, 2025
- SPTS Technologies Limited
- Maxime Varvara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,145
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Yuji Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck, substrate processing apparatus, and substrate...
- Patent number 12,354,852
- Issue date Jul 8, 2025
- Semes Co., Ltd.
- Hyun Tak Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,354,851
- Issue date Jul 8, 2025
- NGK Insulators, Ltd.
- Yusuke Akai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic material having high resistivity and high corrosion resista...
- Patent number 12,354,900
- Issue date Jul 8, 2025
- NGK Insulators, Ltd.
- Akiyoshi Hattori
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method and apparatus for treating substrate
- Patent number 12,347,694
- Issue date Jul 1, 2025
- Semes Co., Ltd.
- Dong-Hun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,654
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Hwajun Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,347,658
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Ryota Sakane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly for cryogenic applications
- Patent number 12,347,659
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,340,985
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Tetsuji Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for semiconductor manufacturing apparatus
- Patent number 12,340,990
- Issue date Jun 24, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck including a heater element with mutiple heating...
- Patent number 12,341,049
- Issue date Jun 24, 2025
- Toto Ltd.
- Akihito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate fixing device
- Patent number 12,340,991
- Issue date Jun 24, 2025
- Shinko Electric Industries Co., Ltd.
- Aya Uchiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck
- Patent number 12,341,050
- Issue date Jun 24, 2025
- Toto Ltd.
- Akihito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma ultraviolet enhanced deposition
- Patent number 12,334,317
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hai-Dang Trinh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cryogenic micro-zone electrostatic chuck connector assembly
- Patent number 12,331,984
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,334,313
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Hwajun Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle gun, charged particle beam system, and lock nut
- Patent number 12,334,298
- Issue date Jun 17, 2025
- HITACHI HIGH-TECH CORPORATION
- Teruaki Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage power supply apparatus and plasma etching equipment ha...
- Patent number 12,327,712
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Jihwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and method
- Patent number 12,327,748
- Issue date Jun 10, 2025
- PIOTECH INC.
- Zhuo Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with improved temperature control
- Patent number 12,322,633
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Hanish Kumar Panavalappil Kumarankutty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier device, semiconductor apparatus, and residual charge detect...
- Patent number 12,315,706
- Issue date May 27, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jian Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electron beam inspection apparatus, multipole array control m...
- Patent number 12,308,202
- Issue date May 20, 2025
- NuFlare Technology, Inc.
- Yuichi Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating method and substrate treating apparatus
- Patent number 12,308,219
- Issue date May 20, 2025
- Semes Co., Ltd.
- Seong Gil Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage, plasma processing apparatus, and cleaning method
- Patent number 12,300,471
- Issue date May 13, 2025
- Tokyo Electron Limited
- Takahiro Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,300,476
- Issue date May 13, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Placement stage and substrate processing apparatus
- Patent number 12,300,530
- Issue date May 13, 2025
- Tokyo Electron Limited
- Daisuke Satake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 12,293,903
- Issue date May 6, 2025
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS
- Publication number 20250239476
- Publication date Jul 24, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF
- Publication number 20250233008
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Yohei UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20250233001
- Publication date Jul 17, 2025
- TOTO LTD.
- Yuki SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF FILTER TOPOLOGY FOR SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20250233571
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20250226256
- Publication date Jul 10, 2025
- Tomoegawa Corporation
- Ryouji Shikata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250226190
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Takayuki ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EFFICIENT DECHUCKING AND PARTICLE MANAGEMENT IN PROCESS CHAMBERS
- Publication number 20250226255
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Arvinder Manmohan Singh Chadha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218825
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Jae Woo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE HOLDER
- Publication number 20250218845
- Publication date Jul 3, 2025
- KYOCERA CORPORATION
- Tomoya TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE HOLDER
- Publication number 20250218858
- Publication date Jul 3, 2025
- KYOCERA CORPORATION
- Musashi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SPRAYING APPARATUS AND SUBSTRATE TREATING APPARATUS INCLUDING T...
- Publication number 20250218735
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Si Young JO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF WAFER GROUNDING UTILIZING WAFER EDGE BACKSIDE COATING EXC...
- Publication number 20250218720
- Publication date Jul 3, 2025
- ASML NETHERLANDS B.V.
- Yinglong LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218843
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Iksu BYUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...
- Publication number 20250218739
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING ELECTROSTATIC CHUCK
- Publication number 20250210325
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Atsushi KAWABATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT
- Publication number 20250210393
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Masaki ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY, PLASMA CONTROL METHOD, AND PLASMA PROCE...
- Publication number 20250201521
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Dae Hyun YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT TO BE USED FOR PLASMA PROCESSING DEVICE, METHOD FOR MANUF...
- Publication number 20250201537
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Taisei SEGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND TEMPERATURE MEASUREMENT METHOD
- Publication number 20250201601
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Kazuhito YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250201535
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Sho OIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER CIRCUIT, CONTROLLING METHOD THEREOF, AND SUBSTRATE PROCESSIN...
- Publication number 20250201615
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Byeong Hyeon KONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS
- Publication number 20250201528
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hsing LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK DEVICE AND COOLING PLATE
- Publication number 20250191956
- Publication date Jun 12, 2025
- HORIBA STEC, CO., LTD.
- Esteban GONZALEZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE FOR SEMICONDUCTOR EQUIPMENT, METHOD OF OPERATING A SE...
- Publication number 20250189347
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Gyoseon Choo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ADDITIVELY MANUFACTURING HIGH-PURITY SILICON, METHOD OF A...
- Publication number 20250178234
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Takayuki ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARAMETER ESTIMATION SYSTEM, PARAMETER ESTIMATION METHOD, STORAGE M...
- Publication number 20250183018
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Wataru SUWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20250174441
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Naoya FUKUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250166975
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT
- Publication number 20250166977
- Publication date May 22, 2025
- SEMES CO., LTD.
- HYOUNGKYU SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIFT PIN INTERFACE IN A SUBSTRATE SUPPORT
- Publication number 20250167030
- Publication date May 22, 2025
- Applied Materials, Inc.
- Alexander SULYMAN
- H01 - BASIC ELECTRIC ELEMENTS

Holding mechanisms

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus for improved high pressure plasma processing

Substrate processing method and substrate processing apparatus

Plasma etching apparatus and method

Plasma processing apparatus and plasma processing method

Electrostatic chuck, substrate processing apparatus, and substrate...

Wafer placement table

Ceramic material having high resistivity and high corrosion resista...

Method and apparatus for treating substrate

Plasma processing apparatus

Stage and plasma processing apparatus

Electrostatic chuck assembly for cryogenic applications

Plasma processing apparatus and plasma processing method

Member for semiconductor manufacturing apparatus

Electrostatic chuck including a heater element with mutiple heating...

Substrate fixing device

Electrostatic chuck

Remote plasma ultraviolet enhanced deposition

Cryogenic micro-zone electrostatic chuck connector assembly

Plasma processing apparatus and plasma processing method

Charged particle gun, charged particle beam system, and lock nut

High voltage power supply apparatus and plasma etching equipment ha...

Semiconductor processing apparatus and method

Electrostatic chuck with improved temperature control

Carrier device, semiconductor apparatus, and residual charge detect...

Multi-electron beam inspection apparatus, multipole array control m...

Substrate treating method and substrate treating apparatus

Stage, plasma processing apparatus, and cleaning method

Wafer placement table

Placement stage and substrate processing apparatus

Substrate support and plasma processing apparatus

Patents Applicationslast 30 patents

ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS

PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF

ELECTROSTATIC CHUCK

RF FILTER TOPOLOGY FOR SUBSTRATE SUPPORT ASSEMBLY

ELECTROSTATIC CHUCK

STAGE AND SUBSTRATE PROCESSING APPARATUS

EFFICIENT DECHUCKING AND PARTICLE MANAGEMENT IN PROCESS CHAMBERS

SUBSTRATE PROCESSING APPARATUS

SAMPLE HOLDER

SAMPLE HOLDER

GAS SPRAYING APPARATUS AND SUBSTRATE TREATING APPARATUS INCLUDING T...

METHOD OF WAFER GROUNDING UTILIZING WAFER EDGE BACKSIDE COATING EXC...

SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...

ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING ELECTROSTATIC CHUCK

MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT

SUBSTRATE SUPPORT ASSEMBLY, PLASMA CONTROL METHOD, AND PLASMA PROCE...

COMPONENT TO BE USED FOR PLASMA PROCESSING DEVICE, METHOD FOR MANUF...

PLASMA PROCESSING APPARATUS AND TEMPERATURE MEASUREMENT METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

HEATER CIRCUIT, CONTROLLING METHOD THEREOF, AND SUBSTRATE PROCESSIN...

METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS

ELECTROSTATIC CHUCK DEVICE AND COOLING PLATE

SENSOR DEVICE FOR SEMICONDUCTOR EQUIPMENT, METHOD OF OPERATING A SE...

METHOD OF ADDITIVELY MANUFACTURING HIGH-PURITY SILICON, METHOD OF A...

PARAMETER ESTIMATION SYSTEM, PARAMETER ESTIMATION METHOD, STORAGE M...

Substrate Processing Apparatus

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT

LIFT PIN INTERFACE IN A SUBSTRATE SUPPORT