Hybrid phase shift masks

Industry

CPC
G03F1/0053

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

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G03F1/0053Hybrid phase shift masks

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for fabricating semiconductor device using a hybrid mask pat...
- Patent number 10,607,855
- Issue date Mar 31, 2020
- Samsung Electronics Co., Ltd.
- Jun Ho Yoon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of achieving CD linearity control for full-chip CPL manufact...
- Patent number 7,667,216
- Issue date Feb 23, 2010
- ASML Masktools B.V.
- Doug Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hybrid phase-shift mask and manufacturing method thereof
- Patent number 7,582,396
- Issue date Sep 1, 2009
- Toppan Chunghwa Electronics Co., Ltd.
- Tzu-Chang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for creating phase edge structures in a phase shift mask
- Patent number 7,563,546
- Issue date Jul 21, 2009
- International Business Machiens Corporation
- Jason M. Benz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for contact hole unit cell formation
- Patent number 7,556,891
- Issue date Jul 7, 2009
- Chartered Semiconductor Manufacturing Ltd.
- Soon Yoeng Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask
- Patent number 7,541,118
- Issue date Jun 2, 2009
- Samsung Electronics Co., Ltd.
- Myung-Ah Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shifting mask for equal line/space dense line patterns
- Patent number 7,504,184
- Issue date Mar 17, 2009
- Nanya Technology Corp.
- Yung-Long Hung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, method for producing the same, and method for forming pa...
- Patent number 7,504,186
- Issue date Mar 17, 2009
- Panasonic Corporation
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask
- Patent number 7,361,434
- Issue date Apr 22, 2008
- Infineon Technologies AG
- Christoph Nölscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating a phase shift mask
- Patent number 7,338,736
- Issue date Mar 4, 2008
- Samsung Electronics Co., Ltd.
- Myung-Ah Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, method for producing the same, and method for forming pa...
- Patent number 7,282,309
- Issue date Oct 16, 2007
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern using a photomask
- Patent number 7,250,248
- Issue date Jul 31, 2007
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching method for making a reticle
- Patent number 7,226,866
- Issue date Jun 5, 2007
- Fujitsu Limited
- Hisatsugu Shirai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of achieving CD linearity control for full-chip CPL manufact...
- Patent number 7,211,815
- Issue date May 1, 2007
- ASML Masktools B.V.
- Doug Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern using photomask
- Patent number 7,144,684
- Issue date Dec 5, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask
- Patent number 7,141,337
- Issue date Nov 28, 2006
- United Microelectronics Corp.
- Chin-Lung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic mask
- Patent number 7,070,887
- Issue date Jul 4, 2006
- Infineon Technologies AG
- Christoph Nölscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method for producing the same
- Patent number 7,045,255
- Issue date May 16, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method for producing the same
- Patent number 7,001,694
- Issue date Feb 21, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist mask that combines attenuated and alternating phase shi...
- Patent number 6,593,039
- Issue date Jul 15, 2003
- Advanced Micro Devices, Inc.
- Hung-Eil Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing binary phase shift mask
- Patent number 6,255,023
- Issue date Jul 3, 2001
- United Microelectronics Corp.
- Chien-Chao Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING A HYBRID MASK PAT...
- Publication number 20190027376
- Publication date Jan 24, 2019
- Samsung Electronics Co., Ltd.
- JUN HO YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHASE SHIFT MASK AND METHOD OF FABRICATING THE SAME
- Publication number 20080102383
- Publication date May 1, 2008
- Samsung Electronics Co., Ltd.
- Myung-Ah KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High Definition Mask and Manufacturing Method of the Same
- Publication number 20080032212
- Publication date Feb 7, 2008
- Jae HYUN KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hybrid phase-shift mask and manufacturing method thereof
- Publication number 20070269722
- Publication date Nov 22, 2007
- Toppan Chunghwa Elctronics Co., Ltd.
- Tzu-Chang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, method for producing the same, and method for forming pa...
- Publication number 20070254219
- Publication date Nov 1, 2007
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of achieving CD linearity control for full-chip CPL manufact...
- Publication number 20070148562
- Publication date Jun 28, 2007
- ASML MASKTOOLS B.V.
- Doug Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, method for producing the same, and method for forming pa...
- Publication number 20070054204
- Publication date Mar 8, 2007
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFTING MASK FOR EQUAL LINE/SPACE DENSE LINE PATTERNS
- Publication number 20060240333
- Publication date Oct 26, 2006
- Yung-Long Hung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming pattern using a photomask
- Publication number 20060183035
- Publication date Aug 17, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming pattern using photomask
- Publication number 20060099523
- Publication date May 11, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for contact hole unit cell formation
- Publication number 20060088770
- Publication date Apr 27, 2006
- Chartered Semiconductor Manufacturing LTD.
- Soon Yoeng Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing a semiconductor device
- Publication number 20050277065
- Publication date Dec 15, 2005
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle manufacturing method
- Publication number 20050266318
- Publication date Dec 1, 2005
- FUJITSU LIMITED
- Hisatsugu Shirai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR CREATING PHASE EDGE STRUCTURES
- Publication number 20050164097
- Publication date Jul 28, 2005
- International Business Machines Corporation
- Jason M. Benz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask
- Publication number 20050084771
- Publication date Apr 21, 2005
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask and method of fabricating the same
- Publication number 20040248018
- Publication date Dec 9, 2004
- Myung-Ah Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A phase shift mask
- Publication number 20040197671
- Publication date Oct 7, 2004
- Chin-Lung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of achieving CD linearity control for full-chip CPL manufact...
- Publication number 20040115539
- Publication date Jun 17, 2004
- Doug Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, method for producing the same, and method for forming pa...
- Publication number 20030203290
- Publication date Oct 30, 2003
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, method for producing the same, and method for forming pa...
- Publication number 20030203291
- Publication date Oct 30, 2003
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photolithographic mask
- Publication number 20030022074
- Publication date Jan 30, 2003
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hybrid phase shift masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for fabricating semiconductor device using a hybrid mask pat...

Method of achieving CD linearity control for full-chip CPL manufact...

Hybrid phase-shift mask and manufacturing method thereof

Process for creating phase edge structures in a phase shift mask

Method and apparatus for contact hole unit cell formation

Phase shift mask

Phase-shifting mask for equal line/space dense line patterns

Photomask, method for producing the same, and method for forming pa...

Phase shift mask

Method of fabricating a phase shift mask

Photomask, method for producing the same, and method for forming pa...

Method for forming pattern using a photomask

Etching method for making a reticle

Method of achieving CD linearity control for full-chip CPL manufact...

Method for forming pattern using photomask

Phase shift mask

Photolithographic mask

Photomask and method for producing the same

Photomask and method for producing the same

Photoresist mask that combines attenuated and alternating phase shi...

Method of manufacturing binary phase shift mask

Patents Applicationslast 30 patents

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING A HYBRID MASK PAT...

PHASE SHIFT MASK AND METHOD OF FABRICATING THE SAME

High Definition Mask and Manufacturing Method of the Same

Hybrid phase-shift mask and manufacturing method thereof

Photomask, method for producing the same, and method for forming pa...

Method of achieving CD linearity control for full-chip CPL manufact...

Photomask, method for producing the same, and method for forming pa...

PHASE-SHIFTING MASK FOR EQUAL LINE/SPACE DENSE LINE PATTERNS

Method for forming pattern using a photomask

Method for forming pattern using photomask

Method and apparatus for contact hole unit cell formation

Method of manufacturing a semiconductor device

Reticle manufacturing method

PROCESS FOR CREATING PHASE EDGE STRUCTURES

Phase shift mask

Phase shift mask and method of fabricating the same

A phase shift mask

Method of achieving CD linearity control for full-chip CPL manufact...

Photomask, method for producing the same, and method for forming pa...

Photomask, method for producing the same, and method for forming pa...

Photolithographic mask