Inorganic compounds Onium compounds Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/029Inorganic compounds Onium compounds Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

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Patents Grantslast 30 patents

Information Patent Grant
On-press development type lithographic printing plate precursor, me...
- Patent number 12,157,296
- Issue date Dec 3, 2024
- FUJIFILM Corporation
- Natsumi Yokokawa
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Lithographic printing plate precursor, method for preparing lithogr...
- Patent number 12,122,177
- Issue date Oct 22, 2024
- FUJIFILM Corporation
- Yusuke Namba
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photosensitive resin composition, pattern forming method, cured fil...
- Patent number 12,078,929
- Issue date Sep 3, 2024
- FUJIFILM Corporation
- Toshihide Aoshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compositions, preparation methods thereof, and quant...
- Patent number 12,055,852
- Issue date Aug 6, 2024
- Samsung Electronics Co., Ltd.
- Shang Hyeun Park
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Coloring composition, color filter, pattern forming method, solid-s...
- Patent number 12,019,369
- Issue date Jun 25, 2024
- FUJIFILM Corporation
- Shoichi Nakamura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Negative resist composition and pattern forming process
- Patent number 11,994,799
- Issue date May 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition and method for forming pattern
- Patent number 11,966,160
- Issue date Apr 23, 2024
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing a test body for diffusion tensor imaging
- Patent number 11,931,954
- Issue date Mar 19, 2024
- Technische Universitat Wien
- Aleksandr Ovsianikov
- G01 - MEASURING TESTING
Information Patent Grant
Actinic radiation curable polymeric mixtures, cured polymeric mixtu...
- Patent number 11,926,688
- Issue date Mar 12, 2024
- Bridgestone Americas Tire Operations, LLC
- Joshua P. Abell
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Photosensitive resin composition, dry film using same, printed wiri...
- Patent number 11,921,424
- Issue date Mar 5, 2024
- Hitachi Chemical Company, Ltd. (FIPAS)
- Nobuhito Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, spacer, light conversion layer, a...
- Patent number 11,914,292
- Issue date Feb 27, 2024
- ECHEM SOLUTIONS CORP.
- Ya-Qian Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-patternable organic semiconductor (OSC) polymers for organic...
- Patent number 11,917,897
- Issue date Feb 27, 2024
- Corning Incorporated
- Mingqian He
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Methods for fabricating appliances from polymerizable compositions
- Patent number 11,884,758
- Issue date Jan 30, 2024
- Align Technology, Inc.
- Michael Christopher Cole
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Lithographic printing plate precursor, method for preparing lithogr...
- Patent number 11,874,602
- Issue date Jan 16, 2024
- FUJIFILM Corporation
- Akira Sakaguchi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Continuous digital light processing additive manufacturing of implants
- Patent number 11,865,785
- Issue date Jan 9, 2024
- H. David Dean
- G02 - OPTICS
Information Patent Grant
Photo-curable composition and methods for preparing cured film, opt...
- Patent number 11,835,858
- Issue date Dec 5, 2023
- Canon Kabushiki Kaisha
- Toshiki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working ultra thick film photoresist
- Patent number 11,698,586
- Issue date Jul 11, 2023
- Merck Patent GmbH
- Aritaka Hishida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blue curable resin composition, blue color filter, and display devi...
- Patent number 11,693,310
- Issue date Jul 4, 2023
- Sumitomo Chemical Company, Limited
- Takakiyo Terakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Water-soluble composition, production method for cured product ther...
- Patent number 11,649,334
- Issue date May 16, 2023
- Adeka Corporation
- Masatomi Irisawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,635,685
- Issue date Apr 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoimageable compositions and processes for fabrication of relief...
- Patent number 11,635,688
- Issue date Apr 25, 2023
- KAYAKU ADVANCED MATERIALS, INC.
- Daniel J. Nawrocki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Highly efficient free radical photopolymerizations through enabled...
- Patent number 11,597,735
- Issue date Mar 7, 2023
- The Regents of the University of Colorado, a Body Corporate
- Jeffrey W. Stansbury
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive resin composition, organic EL element barrier rib, a...
- Patent number 11,599,023
- Issue date Mar 7, 2023
- Showa Denko K.K.
- Kentaro Furue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for making an object and formulations for use in said methods
- Patent number 11,597,839
- Issue date Mar 7, 2023
- PhotoCentriC Limited
- Paul Holt
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Lithographic printing plate precursor, method of producing lithogra...
- Patent number 11,574,810
- Issue date Feb 7, 2023
- FUJIFILM Corporation
- Kenjiro Araki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic printing plate precursor, method for making lithograph...
- Patent number 11,567,404
- Issue date Jan 31, 2023
- FUJIFILM Corporation
- Atsuyasu Nozaki
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Lithographic printing plate precursor
- Patent number 11,465,403
- Issue date Oct 11, 2022
- AGFA NV
- Thomas Billiet
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
On-press processing of a UV or violet-sensitized lithographic print...
- Patent number 11,465,404
- Issue date Oct 11, 2022
- AGFA Offset BV
- Peter Hendrikx
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
3D printed composites from a single resin by patterned light exposures
- Patent number 11,434,316
- Issue date Sep 6, 2022
- Align Technology, Inc.
- Michael Christopher Cole
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Composition, patterned film, and electronic device including the same
- Patent number 11,345,851
- Issue date May 31, 2022
- Samsung Electronics Co., Ltd.
- Taekhoon Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST COMPOSITION, SYSTEM COMPRISING A PHOTORESIST COMPOSITIO...
- Publication number 20240408815
- Publication date Dec 12, 2024
- Karlsruher Institut für Technologie
- Vincent HAHN
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD FOR NON-INVASIVE PRODUCTION OF DEFINED STRUCTURES INSIDE COM...
- Publication number 20240402608
- Publication date Dec 5, 2024
- Max-Planck-Gesellschaft zur Forderung der Wissenschaften e.V.
- Kerstin GÖPFRICH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTIL...
- Publication number 20240393686
- Publication date Nov 28, 2024
- Resonac Corporation
- Hideyuki KATAGI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PHOTOSENSITIVE COMPOSITION
- Publication number 20240377736
- Publication date Nov 14, 2024
- Arkema France
- Kangtai REN
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20240345480
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICRO PATTERN MANUFACTURING METHOD USING PHOTOSENSITIVE RESIN COMPOUND
- Publication number 20240345482
- Publication date Oct 17, 2024
- Canon Kabushiki Kaisha
- YOHEI HAMADE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANIC SALT, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF...
- Publication number 20240327338
- Publication date Oct 3, 2024
- Samsung Electronics Co., Ltd.
- Aram JEON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...
- Publication number 20240329527
- Publication date Oct 3, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240310727
- Publication date Sep 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST PROCESS
- Publication number 20240310726
- Publication date Sep 19, 2024
- HELIO DISPLAY MATERIALS LIMITED
- Gerardus Keyzer DE KEYZER
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER
- Publication number 20240295814
- Publication date Sep 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi IBATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AN...
- Publication number 20240287219
- Publication date Aug 29, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Yune KUMAZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AN...
- Publication number 20240279432
- Publication date Aug 22, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Yune KUMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240272550
- Publication date Aug 15, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTI-WETTING, NON-STICK SURFACES FROM A PHOTOPOLYMER-NANOPARTICLE F...
- Publication number 20240272549
- Publication date Aug 15, 2024
- Syracuse University
- Ian D. Hosein
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
- Publication number 20240272548
- Publication date Aug 15, 2024
- Sumitomo Chemical Company, Limited
- Shohei TERAHIGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Actinic Radiation Curable Polymeric Mixtures, Cured Polymeric Mixtu...
- Publication number 20240247091
- Publication date Jul 25, 2024
- BRIDGESTONE AMERICAS TIRE OPERATIONS, LLC
- Joshua P. Abell
- B60 - VEHICLES IN GENERAL
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240210830
- Publication date Jun 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CURABLE COMPOSITION COMPRISING A PHOTOINITIATOR
- Publication number 20240199770
- Publication date Jun 20, 2024
- Arkema France
- Richard Plenderleith
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20240192598
- Publication date Jun 13, 2024
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS FOR FABRICATING APPLIANCES FROM POLYMERIZABLE COMPOSITIONS
- Publication number 20240182616
- Publication date Jun 6, 2024
- Align Technology, Inc.
- Michael Christopher Cole
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RESIN COMPOSITION, RESIN SHEET, MULTILAYERED PRINTED WIRING BOARD,...
- Publication number 20240174809
- Publication date May 30, 2024
- Nippon Kayaku Kabushiki-Kaisha
- Kazuyoshi YAMAMOTO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...
- Publication number 20240176232
- Publication date May 30, 2024
- Samsung SDI Co., Ltd.
- Chang-Hyun KWON
- G02 - OPTICS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...
- Publication number 20240176233
- Publication date May 30, 2024
- Samsung SDI Co., Ltd.
- Chang-Hyun KWON
- G02 - OPTICS
Information Patent Application
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
- Publication number 20240142872
- Publication date May 2, 2024
- Sumitomo Chemical Company, Limited
- Shohei TERAHIGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
- Publication number 20240142876
- Publication date May 2, 2024
- JSR Corporation
- Hiroyuki MIYAUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...
- Publication number 20240126168
- Publication date Apr 18, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patte...
- Publication number 20240103367
- Publication date Mar 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUCING HOLLOW...
- Publication number 20240103368
- Publication date Mar 28, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kenichi Yamagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTINUOUS DIGITAL LIGHT PROCESSING ADDITIVE MANUFACTURING OF IMPLANTS
- Publication number 20240100777
- Publication date Mar 28, 2024
- H. David DEAN
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Inorganic compounds Onium compounds Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

On-press development type lithographic printing plate precursor, me...

Lithographic printing plate precursor, method for preparing lithogr...

Photosensitive resin composition, pattern forming method, cured fil...

Photosensitive compositions, preparation methods thereof, and quant...

Coloring composition, color filter, pattern forming method, solid-s...

Negative resist composition and pattern forming process

Radiation-sensitive resin composition and method for forming pattern

Method of producing a test body for diffusion tensor imaging

Actinic radiation curable polymeric mixtures, cured polymeric mixtu...

Photosensitive resin composition, dry film using same, printed wiri...

Photosensitive resin composition, spacer, light conversion layer, a...

Photo-patternable organic semiconductor (OSC) polymers for organic...

Methods for fabricating appliances from polymerizable compositions

Lithographic printing plate precursor, method for preparing lithogr...

Continuous digital light processing additive manufacturing of implants

Photo-curable composition and methods for preparing cured film, opt...

Negative-working ultra thick film photoresist

Blue curable resin composition, blue color filter, and display devi...

Water-soluble composition, production method for cured product ther...

Resist composition and patterning process

Photoimageable compositions and processes for fabrication of relief...

Highly efficient free radical photopolymerizations through enabled...

Photosensitive resin composition, organic EL element barrier rib, a...

Methods for making an object and formulations for use in said methods

Lithographic printing plate precursor, method of producing lithogra...

Lithographic printing plate precursor, method for making lithograph...

Lithographic printing plate precursor

On-press processing of a UV or violet-sensitized lithographic print...

3D printed composites from a single resin by patterned light exposures

Composition, patterned film, and electronic device including the same

Patents Applicationslast 30 patents

PHOTORESIST COMPOSITION, SYSTEM COMPRISING A PHOTORESIST COMPOSITIO...

METHOD FOR NON-INVASIVE PRODUCTION OF DEFINED STRUCTURES INSIDE COM...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTIL...

PHOTOSENSITIVE COMPOSITION

MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS

MICRO PATTERN MANUFACTURING METHOD USING PHOTOSENSITIVE RESIN COMPOUND

ORGANIC SALT, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF...

ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

PHOTORESIST PROCESS

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER

RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AN...

RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AN...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

ANTI-WETTING, NON-STICK SURFACES FROM A PHOTOPOLYMER-NANOPARTICLE F...

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...

Actinic Radiation Curable Polymeric Mixtures, Cured Polymeric Mixtu...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

CURABLE COMPOSITION COMPRISING A PHOTOINITIATOR

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

SYSTEMS FOR FABRICATING APPLIANCES FROM POLYMERIZABLE COMPOSITIONS

RESIN COMPOSITION, RESIN SHEET, MULTILAYERED PRINTED WIRING BOARD,...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...

SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION

ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...

Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patte...

NEGATIVE PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUCING HOLLOW...

CONTINUOUS DIGITAL LIGHT PROCESSING ADDITIVE MANUFACTURING OF IMPLANTS