Inspecting

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G03F1/84

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

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G03F1/84Inspecting

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank, and reflective mask
- Patent number 12,353,121
- Issue date Jul 8, 2025
- Shin-Etsu Chemical Co., Ltd.
- Taiga Ogose
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for qualifying a mask of a lithography system
- Patent number 12,353,126
- Issue date Jul 8, 2025
- Carl Zeiss SMT GmbH
- Asad Rasool
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask including fiducial mark and method of making a photomask
- Patent number 12,339,582
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for computational metrology and inspection for patterns to b...
- Patent number 12,340,495
- Issue date Jun 24, 2025
- D2S, Inc.
- Linyong Pang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask inspection apparatus and method for inspecting a mask having f...
- Patent number 12,333,706
- Issue date Jun 17, 2025
- Samsung Display Co., Ltd.
- Dae Won Baek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inspection apparatus and inspection method
- Patent number 12,326,407
- Issue date Jun 10, 2025
- ASML Netherlands B.V.
- Nitish Kumar
- G01 - MEASURING TESTING
Information Patent Grant
Advanced load port for photolithography mask inspection tool
- Patent number 12,298,664
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tung-Jung Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method of reticle pod having inspection window
- Patent number 12,248,245
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wang Cheng Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Storage environment monitoring system and methods of operation
- Patent number 12,174,528
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Wei Lu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process variability aware adaptive inspection and metrology
- Patent number 12,092,965
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Venugopal Vellanki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask inspection method and apparatus thereof
- Patent number 12,072,621
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chih-Wei Wen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 12,013,634
- Issue date Jun 18, 2024
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology targets
- Patent number 11,982,946
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Nikhil Mehta
- G01 - MEASURING TESTING
Information Patent Grant
Debris removal from high aspect structures
- Patent number 11,964,310
- Issue date Apr 23, 2024
- Bruker Nano, Inc.
- Tod Evan Robinson
- B08 - CLEANING
Information Patent Grant
EUV mask defect tool apparatus
- Patent number 11,960,202
- Issue date Apr 16, 2024
- EUV TECH, INC.
- Chami N Perera
- G01 - MEASURING TESTING
Information Patent Grant
Advanced load port for photolithography mask inspection tool
- Patent number 11,921,431
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tung-Jung Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining an effect of one or more pixel...
- Patent number 11,914,289
- Issue date Feb 27, 2024
- Carl Zeiss SMS Ltd.
- Joachim Welte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for extreme ultraviolet lithography mask treatment
- Patent number 11,906,897
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring photomasks
- Patent number 11,899,358
- Issue date Feb 13, 2024
- Carl Zeiss SMT GmbH
- Dmitry Simakov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for detecting an object structure and apparatus for carrying...
- Patent number 11,892,769
- Issue date Feb 6, 2024
- Carl Zeiss SMT GmbH
- Beat Marco Mout
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for removing a single particulate from a subst...
- Patent number 11,886,126
- Issue date Jan 30, 2024
- Carl Zeiss SMT GmbH
- Klaus Edinger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for measuring a substrate for semiconductor lithography
- Patent number 11,880,145
- Issue date Jan 23, 2024
- Carl Zeiss SMT GmbH
- Sven Martin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stochastic optical proximity corrections
- Patent number 11,874,597
- Issue date Jan 16, 2024
- Synopsys, Inc.
- Zachary Levinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection device for masks for semiconductor lithography and method
- Patent number 11,867,642
- Issue date Jan 9, 2024
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Photomask including fiducial mark and method of making a semiconduc...
- Patent number 11,860,532
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing reflective mask blank, reflective mask bla...
- Patent number 11,852,964
- Issue date Dec 26, 2023
- Hoya Corporation
- Tsutomu Shoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for measuring phase of extreme ultraviolet (EU...
- Patent number 11,852,583
- Issue date Dec 26, 2023
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Grant
Image pickup apparatus and focus adjustment method using bending co...
- Patent number 11,822,233
- Issue date Nov 21, 2023
- Lasertec Corporation
- Hiroki Miyai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement tool and methods for EUV lithography masks
- Patent number 11,815,810
- Issue date Nov 14, 2023
- Intel Corporation
- Yoshihiro Tezuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contaminant detection metrology system, lithographic apparatus, and...
- Patent number 11,803,119
- Issue date Oct 31, 2023
- ASML Holding N.V.
- Michal Emanuel Pawlowski
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
COMPREHENSIVE INSPECTION EQUIPMENT FOR EUV EXPOSURE PROCESS
- Publication number 20250231494
- Publication date Jul 17, 2025
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
- Jinho AHN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING A SURFACE
- Publication number 20250224325
- Publication date Jul 10, 2025
- NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO
- Antonius Martinus Cornelis Petrus DE JONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND METHOD OF FABRICATING THE SAME
- Publication number 20250216768
- Publication date Jul 3, 2025
- SK enpulse Co., Ltd.
- Gyeongse JEONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Inspecting Mask
- Publication number 20250216773
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Hsun CHEN
- G01 - MEASURING TESTING
Information Patent Application
MANUFACTURING METHOD FOR CONDUCTIVE FILM, MANUFACTURING METHOD FOR...
- Publication number 20250208500
- Publication date Jun 26, 2025
- MITSUBISHI CHEMICAL CORPORATION
- Shunsuke KANAME
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION SYSTEM AND METHOD FOR OPERATING THEREOF
- Publication number 20250199398
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chao-Ting CHEN
- G01 - MEASURING TESTING
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...
- Publication number 20250193992
- Publication date Jun 12, 2025
- Gigaphoton Inc.
- Shinji NAGAI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
STRUCTURE AND METHOD OF RETICLE POD HAVING INSPECTION WINDOW
- Publication number 20250180984
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- WANG CHENG SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS TO IMPROVE DETECTION OF DEFECTS IN PHOTOMASK...
- Publication number 20250164871
- Publication date May 22, 2025
- Intel Corporation
- Yoshihiro Tezuka
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR STRUCTURE INSPECTION METHOD, EXTREME ULTRAVIOLET (EUV...
- Publication number 20250164872
- Publication date May 22, 2025
- Samsung Electronics Co., Ltd.
- Jiho PARK
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL MEMBER AND PRODUCTION METHOD THEREFOR
- Publication number 20250155796
- Publication date May 15, 2025
- NIPPON LIGHT METAL COMPANY, LTD.
- Takeshi OSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EXAMINING A BLANK OF A MICROLITHOGRAPHIC PHOTOMASK
- Publication number 20250147412
- Publication date May 8, 2025
- Carl Zeiss SMT GMBH
- Christof Baur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM TO FOR RAPID INSPECTION OF PHOTOLITHOGRAPHY RETICLE
- Publication number 20250123555
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jia-Lin SYU
- G01 - MEASURING TESTING
Information Patent Application
LEARNING-BASED DIE-TO-DIE MASK INSPECTION APPARATUS AND METHOD
- Publication number 20250117948
- Publication date Apr 10, 2025
- ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Hye Jin KIM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LIGHT SOURCE APPARATUS, INSPECTION APPARATUS, EXPOSURE APPARATUS, L...
- Publication number 20250102445
- Publication date Mar 27, 2025
- Lasertec Corporation
- Ko GONDAIRA
- G01 - MEASURING TESTING
Information Patent Application
CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
- Publication number 20250093768
- Publication date Mar 20, 2025
- SEMES CO., LTD.
- Jin Yeong SUNG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR A MASK INSPECTION SYSTEM
- Publication number 20250093770
- Publication date Mar 20, 2025
- Carl Zeiss SMT GMBH
- Sören Schmidt
- G01 - MEASURING TESTING
Information Patent Application
MASK QUALITY MANAGEMENT SYSTEM
- Publication number 20250093769
- Publication date Mar 20, 2025
- SAMSUNG DISPLAY CO., LTD.
- SUNGMIN HUR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE APPARATUS, METHOD FOR P...
- Publication number 20250085624
- Publication date Mar 13, 2025
- MITSUI CHEMICALS, INC.
- Ryo TANAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HANDLING SYSTEM FOR MICROLITHOGRAPHIC PHOTOMASKS, INSPECTION SYSTEM...
- Publication number 20250076773
- Publication date Mar 6, 2025
- Carl Zeiss SMT GMBH
- Johann Irnstetter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PUPIL FILTER WITH SPATIALLY-VARYING TRANSMISSION
- Publication number 20250044679
- Publication date Feb 6, 2025
- KLA Corporation
- Alexander Pokrovskiy
- G01 - MEASURING TESTING
Information Patent Application
MASK INSPECTION DEVICE FOR PHOTOMASKS OF EUV LITHOGRAPHY AND CARRIE...
- Publication number 20250044680
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AUTO PARAMETER TUNING FOR CHARGED PARTICLE INSPECTION IMAGE ALIGNMENT
- Publication number 20250036030
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Haoyi LIANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BASEPLATE FOR SUPPORTING A RETICLE AND RELATED SYSTEMS AND METHODS
- Publication number 20250028239
- Publication date Jan 23, 2025
- Entegris, Inc.
- Huaping Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTODETECTOR
- Publication number 20240402592
- Publication date Dec 5, 2024
- Lasertec Corporation
- Keita SAITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STORAGE ENVIRONMENT MONITORING SYSTEM AND METHODS OF OPERATION
- Publication number 20240377727
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Wei LU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK
- Publication number 20240377728
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIEN-HUNG LAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF
- Publication number 20240361684
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIH-WEI WEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR...
- Publication number 20240353768
- Publication date Oct 24, 2024
- Carl Zeiss SMT GMBH
- Lutz Brekerbohm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EVALUATING REFERENCE MARK FORMED ON EUV MASK BLANK
- Publication number 20240345474
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takahiro KISHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Reflective mask blank, and reflective mask

Method and device for qualifying a mask of a lithography system

Photomask including fiducial mark and method of making a photomask

Method for computational metrology and inspection for patterns to b...

Mask inspection apparatus and method for inspecting a mask having f...

Inspection apparatus and inspection method

Advanced load port for photolithography mask inspection tool

Structure and method of reticle pod having inspection window

Storage environment monitoring system and methods of operation

Process variability aware adaptive inspection and metrology

Photomask inspection method and apparatus thereof

Reduction or elimination of pattern placement error in metrology me...

Metrology targets

Debris removal from high aspect structures

EUV mask defect tool apparatus

Advanced load port for photolithography mask inspection tool

Method and apparatus for determining an effect of one or more pixel...

Method for extreme ultraviolet lithography mask treatment

Method for measuring photomasks

Method for detecting an object structure and apparatus for carrying...

Apparatus and method for removing a single particulate from a subst...

Method for measuring a substrate for semiconductor lithography

Stochastic optical proximity corrections

Inspection device for masks for semiconductor lithography and method

Photomask including fiducial mark and method of making a semiconduc...

Method for manufacturing reflective mask blank, reflective mask bla...

Apparatus and method for measuring phase of extreme ultraviolet (EU...

Image pickup apparatus and focus adjustment method using bending co...

Measurement tool and methods for EUV lithography masks

Contaminant detection metrology system, lithographic apparatus, and...

Patents Applicationslast 30 patents

COMPREHENSIVE INSPECTION EQUIPMENT FOR EUV EXPOSURE PROCESS

METHOD AND SYSTEM FOR INSPECTING A SURFACE

BLANK MASK AND METHOD OF FABRICATING THE SAME

System and Method for Inspecting Mask

MANUFACTURING METHOD FOR CONDUCTIVE FILM, MANUFACTURING METHOD FOR...

INSPECTION SYSTEM AND METHOD FOR OPERATING THEREOF

EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...

STRUCTURE AND METHOD OF RETICLE POD HAVING INSPECTION WINDOW

METHODS AND APPARATUS TO IMPROVE DETECTION OF DEFECTS IN PHOTOMASK...

SEMICONDUCTOR STRUCTURE INSPECTION METHOD, EXTREME ULTRAVIOLET (EUV...

OPTICAL MEMBER AND PRODUCTION METHOD THEREFOR

METHOD FOR EXAMINING A BLANK OF A MICROLITHOGRAPHIC PHOTOMASK

METHOD AND SYSTEM TO FOR RAPID INSPECTION OF PHOTOLITHOGRAPHY RETICLE

LEARNING-BASED DIE-TO-DIE MASK INSPECTION APPARATUS AND METHOD

LIGHT SOURCE APPARATUS, INSPECTION APPARATUS, EXPOSURE APPARATUS, L...

CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

ILLUMINATION OPTICAL UNIT FOR A MASK INSPECTION SYSTEM

MASK QUALITY MANAGEMENT SYSTEM

PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE APPARATUS, METHOD FOR P...

HANDLING SYSTEM FOR MICROLITHOGRAPHIC PHOTOMASKS, INSPECTION SYSTEM...

PUPIL FILTER WITH SPATIALLY-VARYING TRANSMISSION

MASK INSPECTION DEVICE FOR PHOTOMASKS OF EUV LITHOGRAPHY AND CARRIE...

AUTO PARAMETER TUNING FOR CHARGED PARTICLE INSPECTION IMAGE ALIGNMENT

BASEPLATE FOR SUPPORTING A RETICLE AND RELATED SYSTEMS AND METHODS

PHOTODETECTOR

STORAGE ENVIRONMENT MONITORING SYSTEM AND METHODS OF OPERATION

PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK

PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF

MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR...

METHOD FOR EVALUATING REFERENCE MARK FORMED ON EUV MASK BLANK