Membership
Tour
Register
Log in
Inspecting
Follow
Industry
CPC
G03F1/84
This industry / category may be too specific. Please go to a parent level for more data
Parent Industries
G
PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
G03F1/00
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof
Current Industry
G03F1/84
Inspecting
Industries
Overview
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Metrology targets
Patent number
11,982,946
Issue date
May 14, 2024
ASML Netherlands B.V.
Nikhil Mehta
G01 - MEASURING TESTING
Information
Patent Grant
Debris removal from high aspect structures
Patent number
11,964,310
Issue date
Apr 23, 2024
Bruker Nano, Inc.
Tod Evan Robinson
B08 - CLEANING
Information
Patent Grant
EUV mask defect tool apparatus
Patent number
11,960,202
Issue date
Apr 16, 2024
EUV TECH, INC.
Chami N Perera
G01 - MEASURING TESTING
Information
Patent Grant
Advanced load port for photolithography mask inspection tool
Patent number
11,921,431
Issue date
Mar 5, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Tung-Jung Chang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method and apparatus for determining an effect of one or more pixel...
Patent number
11,914,289
Issue date
Feb 27, 2024
Carl Zeiss SMS Ltd.
Joachim Welte
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for extreme ultraviolet lithography mask treatment
Patent number
11,906,897
Issue date
Feb 20, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Pei-Cheng Hsu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for measuring photomasks
Patent number
11,899,358
Issue date
Feb 13, 2024
Carl Zeiss SMT GmbH
Dmitry Simakov
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for detecting an object structure and apparatus for carrying...
Patent number
11,892,769
Issue date
Feb 6, 2024
Carl Zeiss SMT GmbH
Beat Marco Mout
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Apparatus and method for removing a single particulate from a subst...
Patent number
11,886,126
Issue date
Jan 30, 2024
Carl Zeiss SMT GmbH
Klaus Edinger
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Method for measuring a substrate for semiconductor lithography
Patent number
11,880,145
Issue date
Jan 23, 2024
Carl Zeiss SMT GmbH
Sven Martin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Stochastic optical proximity corrections
Patent number
11,874,597
Issue date
Jan 16, 2024
Synopsys, Inc.
Zachary Levinson
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Inspection device for masks for semiconductor lithography and method
Patent number
11,867,642
Issue date
Jan 9, 2024
Carl Zeiss SMT GmbH
Holger Seitz
G01 - MEASURING TESTING
Information
Patent Grant
Photomask including fiducial mark and method of making a semiconduc...
Patent number
11,860,532
Issue date
Jan 2, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Hsin-Chang Lee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for manufacturing reflective mask blank, reflective mask bla...
Patent number
11,852,964
Issue date
Dec 26, 2023
Hoya Corporation
Tsutomu Shoki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Apparatus and method for measuring phase of extreme ultraviolet (EU...
Patent number
11,852,583
Issue date
Dec 26, 2023
Samsung Electronics Co., Ltd.
Jongju Park
G01 - MEASURING TESTING
Information
Patent Grant
Image pickup apparatus and focus adjustment method using bending co...
Patent number
11,822,233
Issue date
Nov 21, 2023
Lasertec Corporation
Hiroki Miyai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Measurement tool and methods for EUV lithography masks
Patent number
11,815,810
Issue date
Nov 14, 2023
Intel Corporation
Yoshihiro Tezuka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Contaminant detection metrology system, lithographic apparatus, and...
Patent number
11,803,119
Issue date
Oct 31, 2023
ASML Holding N.V.
Michal Emanuel Pawlowski
G01 - MEASURING TESTING
Information
Patent Grant
Structure and method of reticle pod having inspection window
Patent number
11,796,909
Issue date
Oct 24, 2023
Taiwan Semiconductor Manufacturing Company Ltd.
Wang Cheng Shih
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Metrology system for examining objects with EUV measurement light
Patent number
11,796,926
Issue date
Oct 24, 2023
Carl Zeiss SMT GmbH
Renzo Capelli
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
System of measuring image of pattern in high NA scanning-type EUV mask
Patent number
11,747,289
Issue date
Sep 5, 2023
Samsung Electronics Co., Ltd.
Donggun Lee
G01 - MEASURING TESTING
Information
Patent Grant
Method of metrology and associated apparatuses
Patent number
11,733,614
Issue date
Aug 22, 2023
ASML Netherlands B.V.
Thomas Jarik Huisman
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Device and method for analyzing a defect of a photolithographic mas...
Patent number
11,733,186
Issue date
Aug 22, 2023
Carl Zeiss SMT GmbH
Gabriel Baralia
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Defect detection for multi-die masks
Patent number
11,727,556
Issue date
Aug 15, 2023
KLA Corp.
Wenfei Gu
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Method of verifying optical proximity effect correction
Patent number
11,727,552
Issue date
Aug 15, 2023
Samsung Electronics Co., Ltd.
Kisung Kim
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Method of accelerated hazing of mask assembly
Patent number
11,703,752
Issue date
Jul 18, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Wu-Hung Ko
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Inspection apparatus and inspection method
Patent number
11,692,948
Issue date
Jul 4, 2023
ASML Netherlands B.V.
Nitish Kumar
G01 - MEASURING TESTING
Information
Patent Grant
Method for manufacturing a semiconductor device
Patent number
11,686,998
Issue date
Jun 27, 2023
Samsung Electronics Co., Ltd.
Jeong-Hun Seo
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Inspection tool and inspection method
Patent number
11,668,661
Issue date
Jun 6, 2023
ASML Netherlands B.V.
Thomas Jarik Huisman
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Reticle backside inspection method
Patent number
11,657,492
Issue date
May 23, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Zi-Wen Chen
G06 - COMPUTING CALCULATING COUNTING
Patents Applications
last 30 patents
Information
Patent Application
OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...
Publication number
20240134289
Publication date
Apr 25, 2024
ASML NETHERLANDS B.V.
Bram Paul Theodoor VAN GOCH
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RETICLE INSPECTION AND PURGING METHOD AND TOOL
Publication number
20240103359
Publication date
Mar 28, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Xianhui ZHOU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR ANALYZING DEFECTS OF A STRUCTURED COMPONENT
Publication number
20240103384
Publication date
Mar 28, 2024
Carl Zeiss SMT GMBH
Jan Tusch
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD AND DEVICE FOR QUALIFYING A MASK OF A LITHOGRAPHY SYSTEM
Publication number
20240103360
Publication date
Mar 28, 2024
Carl Zeiss SMT GMBH
Asad Rasool
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK
Publication number
20240094625
Publication date
Mar 21, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Hsin-Chang LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EF...
Publication number
20240085777
Publication date
Mar 14, 2024
Samsung Electronics Co., Ltd.
Dae Young PARK
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY
Publication number
20240085779
Publication date
Mar 14, 2024
Carl Zeiss SMT GMBH
Renzo Capelli
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REPAIR METHOD FOR PHOTOMASK DEFECTS
Publication number
20240069433
Publication date
Feb 29, 2024
Intel Corporation
Juan Pablo OVIEDO ROBLES
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURI...
Publication number
20240069428
Publication date
Feb 29, 2024
HOYA CORPORATION
Yohei IKEBE
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD AND APPARATUS FOR CHARACTERIZATION OF A MICROLITHOGRAPHY MASK
Publication number
20240061328
Publication date
Feb 22, 2024
Carl Zeiss SMT GMBH
Ulrich Matejka
G01 - MEASURING TESTING
Information
Patent Application
MASK INSPECTION APPARATUS WITH A PLATFORM MODULE
Publication number
20240027922
Publication date
Jan 25, 2024
STEK CO., LTD.
Ming-Sheng Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK INSPECTION APPARATUS
Publication number
20240027895
Publication date
Jan 25, 2024
STEK CO., LTD.
Ming-Sheng Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD AND APPARATUS FOR PROCESSING A SAMPLE
Publication number
20230418153
Publication date
Dec 28, 2023
Carl Zeiss SMT GMBH
Christof Baur
G01 - MEASURING TESTING
Information
Patent Application
LIGHT SOURCE SYSTEM AND METHOD
Publication number
20230418081
Publication date
Dec 28, 2023
APPLIED MATERIALS ISRAEL LTD.
Haim Feldman
G02 - OPTICS
Information
Patent Application
METHOD FOR REGISTERING STRUCTURES ON MICROLITHOGRAPHIC MASKS, COMPU...
Publication number
20230393488
Publication date
Dec 7, 2023
Carl Zeiss SMT GMBH
Dirk Seidel
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
STRUCTURE AND METHOD OF RETICLE POD HAVING INSPECTION WINDOW
Publication number
20230367207
Publication date
Nov 16, 2023
WANG CHENG SHIH
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
INSPECTION APPARATUS AND INSPECTION METHOD
Publication number
20230296533
Publication date
Sep 21, 2023
ASML NETHERLANDS B.V.
Nitish KUMAR
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PELLICLE HOLDING MODULE, PELLICLE THERMAL DURABILITY EVALUATION DEV...
Publication number
20230251568
Publication date
Aug 10, 2023
IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
Jin Ho AHN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD AND STRUCTURE FOR OVERLAY MEASUREMENT IN SEMICONDUCTOR DEVIC...
Publication number
20230244139
Publication date
Aug 3, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Yen-Liang CHEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
APPARATUS AND METHOD FOR MEASURING PHASE OF EXTREME ULTRAVIOLET (EU...
Publication number
20230236124
Publication date
Jul 27, 2023
Samsung Electronics Co., Ltd.
Jongju Park
G01 - MEASURING TESTING
Information
Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
Publication number
20230211436
Publication date
Jul 6, 2023
SEMES CO., LTD.
Hyo Won YANG
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Application
METHOD FOR INSPECTING A PHOTOMASK CONTAINED IN A TRANSPARENT POD
Publication number
20230176474
Publication date
Jun 8, 2023
CHI-CHUNG CHEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ADVANCED LOAD PORT FOR PHOTOLITHOGRAPHY MASK INSPECTION TOOL
Publication number
20230176488
Publication date
Jun 8, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Tung-Jung CHANG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SYSTEMS AND METHODS FOR INSPECTING PHOTOMASKS
Publication number
20230175839
Publication date
Jun 8, 2023
THE TEXAS A&M UNIVERSITY SYSTEM
ChaBum Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METROLOGY SYSTEM FOR EXAMINING OBJECTS WITH EUV MEASUREMENT LIGHT
Publication number
20230168593
Publication date
Jun 1, 2023
Carl Zeiss SMT GMBH
Renzo Capelli
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Debris Removal From High Aspect Structures
Publication number
20230158555
Publication date
May 25, 2023
Bruker Nano, Inc.
Tod Evan Robinson
G01 - MEASURING TESTING
Information
Patent Application
REFLECTIVE MASK BLANK, AND REFLECTIVE MASK
Publication number
20230152680
Publication date
May 18, 2023
Shin-Etsu Chemical Co., Ltd.
Taiga OGOSE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A LITHOGRAPHIC MASK
Publication number
20230152685
Publication date
May 18, 2023
Carl Zeiss SMT GMBH
Markus Bauer
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CONTAMINANT IDENTIFICATION METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS...
Publication number
20230142459
Publication date
May 11, 2023
ASML Holding N.V.
Andrew JUDGE
G01 - MEASURING TESTING
Information
Patent Application
METHOD FOR ASCERTAINING AN IMAGE OF AN OBJECT
Publication number
20230131390
Publication date
Apr 27, 2023
Carl Zeiss SMT GMBH
Christoph Husemann
G02 - OPTICS