Inspecting

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CPC
G03F1/84

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/84Inspecting

Industries

Patents Grantslast 30 patents

Information Patent Grant
Storage environment monitoring system and methods of operation
- Patent number 12,174,528
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Wei Lu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process variability aware adaptive inspection and metrology
- Patent number 12,092,965
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Venugopal Vellanki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask inspection method and apparatus thereof
- Patent number 12,072,621
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chih-Wei Wen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 12,013,634
- Issue date Jun 18, 2024
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology targets
- Patent number 11,982,946
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Nikhil Mehta
- G01 - MEASURING TESTING
Information Patent Grant
Debris removal from high aspect structures
- Patent number 11,964,310
- Issue date Apr 23, 2024
- Bruker Nano, Inc.
- Tod Evan Robinson
- B08 - CLEANING
Information Patent Grant
EUV mask defect tool apparatus
- Patent number 11,960,202
- Issue date Apr 16, 2024
- EUV TECH, INC.
- Chami N Perera
- G01 - MEASURING TESTING
Information Patent Grant
Advanced load port for photolithography mask inspection tool
- Patent number 11,921,431
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tung-Jung Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining an effect of one or more pixel...
- Patent number 11,914,289
- Issue date Feb 27, 2024
- Carl Zeiss SMS Ltd.
- Joachim Welte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for extreme ultraviolet lithography mask treatment
- Patent number 11,906,897
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring photomasks
- Patent number 11,899,358
- Issue date Feb 13, 2024
- Carl Zeiss SMT GmbH
- Dmitry Simakov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for detecting an object structure and apparatus for carrying...
- Patent number 11,892,769
- Issue date Feb 6, 2024
- Carl Zeiss SMT GmbH
- Beat Marco Mout
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for removing a single particulate from a subst...
- Patent number 11,886,126
- Issue date Jan 30, 2024
- Carl Zeiss SMT GmbH
- Klaus Edinger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for measuring a substrate for semiconductor lithography
- Patent number 11,880,145
- Issue date Jan 23, 2024
- Carl Zeiss SMT GmbH
- Sven Martin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stochastic optical proximity corrections
- Patent number 11,874,597
- Issue date Jan 16, 2024
- Synopsys, Inc.
- Zachary Levinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection device for masks for semiconductor lithography and method
- Patent number 11,867,642
- Issue date Jan 9, 2024
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Photomask including fiducial mark and method of making a semiconduc...
- Patent number 11,860,532
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing reflective mask blank, reflective mask bla...
- Patent number 11,852,964
- Issue date Dec 26, 2023
- Hoya Corporation
- Tsutomu Shoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for measuring phase of extreme ultraviolet (EU...
- Patent number 11,852,583
- Issue date Dec 26, 2023
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Grant
Image pickup apparatus and focus adjustment method using bending co...
- Patent number 11,822,233
- Issue date Nov 21, 2023
- Lasertec Corporation
- Hiroki Miyai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement tool and methods for EUV lithography masks
- Patent number 11,815,810
- Issue date Nov 14, 2023
- Intel Corporation
- Yoshihiro Tezuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contaminant detection metrology system, lithographic apparatus, and...
- Patent number 11,803,119
- Issue date Oct 31, 2023
- ASML Holding N.V.
- Michal Emanuel Pawlowski
- G01 - MEASURING TESTING
Information Patent Grant
Structure and method of reticle pod having inspection window
- Patent number 11,796,909
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wang Cheng Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system for examining objects with EUV measurement light
- Patent number 11,796,926
- Issue date Oct 24, 2023
- Carl Zeiss SMT GmbH
- Renzo Capelli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System of measuring image of pattern in high NA scanning-type EUV mask
- Patent number 11,747,289
- Issue date Sep 5, 2023
- Samsung Electronics Co., Ltd.
- Donggun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Method of metrology and associated apparatuses
- Patent number 11,733,614
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Thomas Jarik Huisman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Device and method for analyzing a defect of a photolithographic mas...
- Patent number 11,733,186
- Issue date Aug 22, 2023
- Carl Zeiss SMT GmbH
- Gabriel Baralia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect detection for multi-die masks
- Patent number 11,727,556
- Issue date Aug 15, 2023
- KLA Corp.
- Wenfei Gu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of verifying optical proximity effect correction
- Patent number 11,727,552
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Kisung Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of accelerated hazing of mask assembly
- Patent number 11,703,752
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wu-Hung Ko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTODETECTOR
- Publication number 20240402592
- Publication date Dec 5, 2024
- Lasertec Corporation
- Keita SAITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STORAGE ENVIRONMENT MONITORING SYSTEM AND METHODS OF OPERATION
- Publication number 20240377727
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Wei LU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK
- Publication number 20240377728
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIEN-HUNG LAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF
- Publication number 20240361684
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIH-WEI WEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR...
- Publication number 20240353768
- Publication date Oct 24, 2024
- Carl Zeiss SMT GMBH
- Lutz Brekerbohm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EVALUATING REFERENCE MARK FORMED ON EUV MASK BLANK
- Publication number 20240345474
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takahiro KISHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPTIMIZING A PUPIL STOP SHAPE FOR SIMULATING ILLUMINATIO...
- Publication number 20240319613
- Publication date Sep 26, 2024
- Carl Zeiss SMT GMBH
- Alexander Winkler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS PROXIMITY CORRECTION METHOD BASED ON MACHINE LEARNING, OPTI...
- Publication number 20240319580
- Publication date Sep 26, 2024
- Samsung Electronics Co., Ltd.
- Jaeyong Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CALIBRATING AN OPERATION ON A PHOTOMASK
- Publication number 20240310721
- Publication date Sep 19, 2024
- Cart Zeiss SMT GmbH
- Michael Budach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR REMOVING A SINGLE PARTICULATE FROM A SUBST...
- Publication number 20240295833
- Publication date Sep 5, 2024
- Carl Zeiss SMT GMBH
- Klaus Edinger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL INSPECTION DEVICE FOR SURFACE OF RETICLE POD AND OPTICAL IN...
- Publication number 20240295830
- Publication date Sep 5, 2024
- GUDENG EQUIPMENT CO., LTD.
- YIN-FENG CHAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING PHOTOMASKS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20240280912
- Publication date Aug 22, 2024
- Carl Zeiss SMT GMBH
- Steffen Steinert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROXIMITY CORRECTION (OPC) METHOD, AND METHODS OF MANUFACTU...
- Publication number 20240280891
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Heejun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEBRIS REMOVAL FROM HIGH ASPECT STRUCTURES
- Publication number 20240269717
- Publication date Aug 15, 2024
- Bruker Nano, Inc.
- Tod Evan Robinson
- B08 - CLEANING
Information Patent Application
METHOD FOR EXAMINING SAMPLES PERTAINING TO MICROLITHOGRAPHY
- Publication number 20240255843
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Thomas Witkowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING MASK RULE CHECK VIOLATIONS AND MASK DESIGN
- Publication number 20240241436
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...
- Publication number 20240231242
- Publication date Jul 11, 2024
- ASML NETHERLANDS B.V.
- Bram Paul Theodoor VAN GOCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY CORRECTION FOR ADVANCED INTEGRATED-CIRCUIT DEVICES
- Publication number 20240219825
- Publication date Jul 4, 2024
- ONTO INNOVATION INC.
- Keith F. Best
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET SOURCE TEMPERATURE MONITORING USING CONFOCAL SE...
- Publication number 20240201581
- Publication date Jun 20, 2024
- KLA Corporation
- Patrick Tae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRIPPING MECHANISM FOR INSPECTION OF RETICLE INNER POD
- Publication number 20240192587
- Publication date Jun 13, 2024
- GUDENG EQUIPMENT CO., LTD.
- YIN-FENG CHAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADVANCED LOAD PORT FOR PHOTOLITHOGRAPHY MASK INSPECTION TOOL
- Publication number 20240168387
- Publication date May 23, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tung-Jung CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...
- Publication number 20240134289
- Publication date Apr 25, 2024
- ASML NETHERLANDS B.V.
- Bram Paul Theodoor VAN GOCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE INSPECTION AND PURGING METHOD AND TOOL
- Publication number 20240103359
- Publication date Mar 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Xianhui ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ANALYZING DEFECTS OF A STRUCTURED COMPONENT
- Publication number 20240103384
- Publication date Mar 28, 2024
- Carl Zeiss SMT GMBH
- Jan Tusch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR QUALIFYING A MASK OF A LITHOGRAPHY SYSTEM
- Publication number 20240103360
- Publication date Mar 28, 2024
- Carl Zeiss SMT GMBH
- Asad Rasool
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK
- Publication number 20240094625
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EF...
- Publication number 20240085777
- Publication date Mar 14, 2024
- Samsung Electronics Co., Ltd.
- Dae Young PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY
- Publication number 20240085779
- Publication date Mar 14, 2024
- Carl Zeiss SMT GMBH
- Renzo Capelli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REPAIR METHOD FOR PHOTOMASK DEFECTS
- Publication number 20240069433
- Publication date Feb 29, 2024
- Intel Corporation
- Juan Pablo OVIEDO ROBLES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURI...
- Publication number 20240069428
- Publication date Feb 29, 2024
- HOYA CORPORATION
- Yohei IKEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Storage environment monitoring system and methods of operation

Process variability aware adaptive inspection and metrology

Photomask inspection method and apparatus thereof

Reduction or elimination of pattern placement error in metrology me...

Metrology targets

Debris removal from high aspect structures

EUV mask defect tool apparatus

Advanced load port for photolithography mask inspection tool

Method and apparatus for determining an effect of one or more pixel...

Method for extreme ultraviolet lithography mask treatment

Method for measuring photomasks

Method for detecting an object structure and apparatus for carrying...

Apparatus and method for removing a single particulate from a subst...

Method for measuring a substrate for semiconductor lithography

Stochastic optical proximity corrections

Inspection device for masks for semiconductor lithography and method

Photomask including fiducial mark and method of making a semiconduc...

Method for manufacturing reflective mask blank, reflective mask bla...

Apparatus and method for measuring phase of extreme ultraviolet (EU...

Image pickup apparatus and focus adjustment method using bending co...

Measurement tool and methods for EUV lithography masks

Contaminant detection metrology system, lithographic apparatus, and...

Structure and method of reticle pod having inspection window

Metrology system for examining objects with EUV measurement light

System of measuring image of pattern in high NA scanning-type EUV mask

Method of metrology and associated apparatuses

Device and method for analyzing a defect of a photolithographic mas...

Defect detection for multi-die masks

Method of verifying optical proximity effect correction

Method of accelerated hazing of mask assembly

Patents Applicationslast 30 patents

PHOTODETECTOR

STORAGE ENVIRONMENT MONITORING SYSTEM AND METHODS OF OPERATION

PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK

PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF

MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR...

METHOD FOR EVALUATING REFERENCE MARK FORMED ON EUV MASK BLANK

METHOD FOR OPTIMIZING A PUPIL STOP SHAPE FOR SIMULATING ILLUMINATIO...

PROCESS PROXIMITY CORRECTION METHOD BASED ON MACHINE LEARNING, OPTI...

METHOD AND APPARATUS FOR CALIBRATING AN OPERATION ON A PHOTOMASK

APPARATUS AND METHOD FOR REMOVING A SINGLE PARTICULATE FROM A SUBST...

OPTICAL INSPECTION DEVICE FOR SURFACE OF RETICLE POD AND OPTICAL IN...

METHOD FOR MEASURING PHOTOMASKS FOR SEMICONDUCTOR LITHOGRAPHY

OPTICAL PROXIMITY CORRECTION (OPC) METHOD, AND METHODS OF MANUFACTU...

DEBRIS REMOVAL FROM HIGH ASPECT STRUCTURES

METHOD FOR EXAMINING SAMPLES PERTAINING TO MICROLITHOGRAPHY

DETERMINING MASK RULE CHECK VIOLATIONS AND MASK DESIGN

OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...

OVERLAY CORRECTION FOR ADVANCED INTEGRATED-CIRCUIT DEVICES

EXTREME ULTRAVIOLET SOURCE TEMPERATURE MONITORING USING CONFOCAL SE...

GRIPPING MECHANISM FOR INSPECTION OF RETICLE INNER POD

ADVANCED LOAD PORT FOR PHOTOLITHOGRAPHY MASK INSPECTION TOOL

OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...

RETICLE INSPECTION AND PURGING METHOD AND TOOL

METHOD FOR ANALYZING DEFECTS OF A STRUCTURED COMPONENT

METHOD AND DEVICE FOR QUALIFYING A MASK OF A LITHOGRAPHY SYSTEM

PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK

PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EF...

METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY

REPAIR METHOD FOR PHOTOMASK DEFECTS

REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURI...