Intensity, dose or other characteristics of particle beams or electromagnetic radiation

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CPC
H01J2237/24507

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/24507Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Small gas flow monitoring of dry etcher by OES signal
- Patent number 12,142,494
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Lung Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulse and bias synchronization methods and systems
- Patent number 12,131,884
- Issue date Oct 29, 2024
- MKS Instruments, Inc.
- Mariusz Oldziej
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for recognizing and addressing plasma discharge d...
- Patent number 12,100,604
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Yu Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Microwave resonator array for plasma diagnostics
- Patent number 12,062,529
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing method and plasma processing apparatus
- Patent number 12,051,574
- Issue date Jul 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Endpoint detection in low open area and/or high aspect ratio etch a...
- Patent number 12,046,522
- Issue date Jul 23, 2024
- Applied Materials, Inc.
- Lei Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of cleaning process chamber components
- Patent number 12,014,902
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Jong Yun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion collector for use in plasma systems
- Patent number 11,996,276
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining an energy width of a charged particle beam
- Patent number 11,948,771
- Issue date Apr 2, 2024
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for detecting or monitoring for a chemical precursor in a...
- Patent number 11,939,673
- Issue date Mar 26, 2024
- ASM IP Holding B.V.
- John Kevin Shugrue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time dosimetry
- Patent number 11,906,675
- Issue date Feb 20, 2024
- Reveam, Inc.
- Chip Starns
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and system for recognizing and addressing plasma discharge d...
- Patent number 11,894,250
- Issue date Feb 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Yu Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma process monitoring device and plasma processing apparatus in...
- Patent number 11,862,442
- Issue date Jan 2, 2024
- Industry-Academic Cooperation Foundation, Yonsei University
- Il Gu Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement method and measurement apparatus
- Patent number 11,735,402
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Takashi Kubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for charged particle detection
- Patent number 11,715,619
- Issue date Aug 1, 2023
- ASML Netherlands B.V.
- Yongxin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for the particle-optical examinatio...
- Patent number 11,657,999
- Issue date May 23, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion collector for use in plasma systems
- Patent number 11,581,169
- Issue date Feb 14, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma ashing apparatus
- Patent number 11,456,183
- Issue date Sep 27, 2022
- HITACHI HIGH-TECH CORPORATION
- Toru Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining a wavefront of a massive parti...
- Patent number 11,355,311
- Issue date Jun 7, 2022
- Carl Zeiss SMT GmbH
- Joachim Welte
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,355,326
- Issue date Jun 7, 2022
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of examining a sample using a charged particle microscope
- Patent number 11,327,032
- Issue date May 10, 2022
- FEI Company
- Jan Klusácek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for charged particle detection
- Patent number 11,295,930
- Issue date Apr 5, 2022
- ASML Netherlands B.V.
- Yongxin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer quality inspection method and apparatus, and semiconductor de...
- Patent number 11,189,533
- Issue date Nov 30, 2021
- Samsung Electronics Co., Ltd.
- Jong-Hyun Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ESC substrate support with chucking force control
- Patent number 11,114,327
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Wendell Glenn Boyd
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method
- Patent number 11,101,138
- Issue date Aug 24, 2021
- Tokyo Electron Limited
- Maju Tomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for the particle-optical examinatio...
- Patent number 11,049,686
- Issue date Jun 29, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for detecting or monitoring for a chemical precursor in a...
- Patent number 10,975,470
- Issue date Apr 13, 2021
- ASM IP Holding B.V.
- John Shugrue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning a substrate processing apparatus and the substra...
- Patent number 10,944,051
- Issue date Mar 9, 2021
- Tokyo Electron Limited
- Takuya Kubo
- G11 - INFORMATION STORAGE
Information Patent Grant
Active control of radial etch uniformity
- Patent number 10,916,409
- Issue date Feb 9, 2021
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing method, data processing apparatus, and multiple cha...
- Patent number 10,886,103
- Issue date Jan 5, 2021
- NuFlare Technology, Inc.
- Kei Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PRINTED MICROWAVE RESONATOR FOR MEASURING HIGH ELECTRON DENSITY PLA...
- Publication number 20240412959
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- David PETERSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...
- Publication number 20240379469
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Lei LIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMALL GAS FLOW MONITORING OF DRY ETCHER BY OES SIGNAL
- Publication number 20240379387
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Lung HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS
- Publication number 20240371615
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS
- Publication number 20240321555
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Jongyun KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS MONITORING APPARATUS USING TERAHERTZ WAVES AND MONIT...
- Publication number 20240297014
- Publication date Sep 5, 2024
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
- Hak Sung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION COLLECTOR FOR USE IN PLASMA SYSTEMS
- Publication number 20240290588
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Real-Time Dosimetry
- Publication number 20240272310
- Publication date Aug 15, 2024
- Reveam, Inc.
- Chip Starns
- G01 - MEASURING TESTING
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20240242932
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, MULTIPLE CHARGED...
- Publication number 20240242931
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A HEAD FOR IRRADIATING A TARGET WITH A BEA...
- Publication number 20240221970
- Publication date Jul 4, 2024
- UNIVERSITÉ D'AIX-MARSEILLE
- Wilfried Vervisch
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
DETECTING CHARGED PARTICLE EVENTS AT HIGH DOSE RATES
- Publication number 20240212974
- Publication date Jun 27, 2024
- FEI Company
- Jaap Mulder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER
- Publication number 20240194446
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS INCLUDING COATING FILM AND INSPECTIO...
- Publication number 20240162012
- Publication date May 16, 2024
- SEMES CO., LTD.
- Ki Ryong LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER, SUBSTRATE TREATING APPARATUS INCLUDING THE SAME, A...
- Publication number 20240162014
- Publication date May 16, 2024
- Samsung Electronics Co., Ltd.
- Heewon Min
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Emission Spectroscopy for Advanced Process Characterization
- Publication number 20240094056
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-DESTRUCTIVE SEM-BASED DEPTH-PROFILING OF SAMPLES
- Publication number 20240096591
- Publication date Mar 21, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Dror Shemesh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS
- Publication number 20240055230
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Jong Yun KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM FOR SENSOR PROTECTION IN ELECTRON IMAGING APPLICATIONS
- Publication number 20240055222
- Publication date Feb 15, 2024
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMAGNETIC FIELD SIGNAL ACQUISITION SYSTEM FOR HIGH SIGNAL-TO-...
- Publication number 20230352281
- Publication date Nov 2, 2023
- Dublin City University
- Alessio Di Liberto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR DETECTING THERAPEUTIC RADIATION BASED ON OPTICAL DISK WI...
- Publication number 20230288582
- Publication date Sep 14, 2023
- NATIONAL CANCER CENTER
- Dongho SHIN
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...
- Publication number 20230290608
- Publication date Sep 14, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...
- Publication number 20230268235
- Publication date Aug 24, 2023
- Applied Materials, Inc.
- Lei LIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM IRRADIATION SYSTEM, CONTROL METHOD FOR PARTICLE BEAM...
- Publication number 20230253175
- Publication date Aug 10, 2023
- Hitachi, Ltd
- Kenta TAKAHASHI
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Pulse And Bias Synchronization Methods And Systems
- Publication number 20230223235
- Publication date Jul 13, 2023
- MKS Instruments, Inc.
- Mariusz OLDZIEJ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION COLLECTOR FOR USE IN PLASMA SYSTEMS
- Publication number 20230197424
- Publication date Jun 22, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230118576
- Publication date Apr 20, 2023
- Hitachi High-Tech Corporation
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR ARCING DIAGNOSIS, PLASMA PROCESS EQUIPMENT INCLUDING...
- Publication number 20230109672
- Publication date Apr 13, 2023
- Samsung Electronics Co., Ltd.
- Changsoon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20230102923
- Publication date Mar 30, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS
- Publication number 20230044262
- Publication date Feb 9, 2023
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS

Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Small gas flow monitoring of dry etcher by OES signal

Pulse and bias synchronization methods and systems

Method and system for recognizing and addressing plasma discharge d...

Microwave resonator array for plasma diagnostics

Wafer processing method and plasma processing apparatus

Endpoint detection in low open area and/or high aspect ratio etch a...

System and method of cleaning process chamber components

Ion collector for use in plasma systems

Method of determining an energy width of a charged particle beam

Apparatus for detecting or monitoring for a chemical precursor in a...

Real-time dosimetry

Method and system for recognizing and addressing plasma discharge d...

Plasma process monitoring device and plasma processing apparatus in...

Measurement method and measurement apparatus

Method and apparatus for charged particle detection

Particle beam system and method for the particle-optical examinatio...

Ion collector for use in plasma systems

Plasma processing method and plasma ashing apparatus

Method and apparatus for determining a wavefront of a massive parti...

Plasma processing apparatus and control method

Method of examining a sample using a charged particle microscope

Method and apparatus for charged particle detection

Wafer quality inspection method and apparatus, and semiconductor de...

ESC substrate support with chucking force control

Etching method

Particle beam system and method for the particle-optical examinatio...

Apparatus for detecting or monitoring for a chemical precursor in a...

Method of cleaning a substrate processing apparatus and the substra...

Active control of radial etch uniformity

Data processing method, data processing apparatus, and multiple cha...

Patents Applicationslast 30 patents

PRINTED MICROWAVE RESONATOR FOR MEASURING HIGH ELECTRON DENSITY PLA...

ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...

SMALL GAS FLOW MONITORING OF DRY ETCHER BY OES SIGNAL

MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS

SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS

PLASMA PROCESS MONITORING APPARATUS USING TERAHERTZ WAVES AND MONIT...

ION COLLECTOR FOR USE IN PLASMA SYSTEMS

Real-Time Dosimetry

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, MULTIPLE CHARGED...

METHOD FOR MANUFACTURING A HEAD FOR IRRADIATING A TARGET WITH A BEA...

DETECTING CHARGED PARTICLE EVENTS AT HIGH DOSE RATES

CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER

SUBSTRATE PROCESSING APPARATUS INCLUDING COATING FILM AND INSPECTIO...

PROCESS CHAMBER, SUBSTRATE TREATING APPARATUS INCLUDING THE SAME, A...

Optical Emission Spectroscopy for Advanced Process Characterization

NON-DESTRUCTIVE SEM-BASED DEPTH-PROFILING OF SAMPLES

SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS

SYSTEM FOR SENSOR PROTECTION IN ELECTRON IMAGING APPLICATIONS

ELECTROMAGNETIC FIELD SIGNAL ACQUISITION SYSTEM FOR HIGH SIGNAL-TO-...

DEVICE FOR DETECTING THERAPEUTIC RADIATION BASED ON OPTICAL DISK WI...

CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...

ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...

PARTICLE BEAM IRRADIATION SYSTEM, CONTROL METHOD FOR PARTICLE BEAM...

Pulse And Bias Synchronization Methods And Systems

ION COLLECTOR FOR USE IN PLASMA SYSTEMS

WAFER PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

APPARATUS FOR ARCING DIAGNOSIS, PLASMA PROCESS EQUIPMENT INCLUDING...

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...

MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS