Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Industry

CPC
H01J2237/24507

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/24507Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method of determining an energy width of a charged particle beam
- Patent number 11,948,771
- Issue date Apr 2, 2024
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for detecting or monitoring for a chemical precursor in a...
- Patent number 11,939,673
- Issue date Mar 26, 2024
- ASM IP Holding B.V.
- John Kevin Shugrue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time dosimetry
- Patent number 11,906,675
- Issue date Feb 20, 2024
- Reveam, Inc.
- Chip Starns
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and system for recognizing and addressing plasma discharge d...
- Patent number 11,894,250
- Issue date Feb 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Yu Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma process monitoring device and plasma processing apparatus in...
- Patent number 11,862,442
- Issue date Jan 2, 2024
- Industry-Academic Cooperation Foundation, Yonsei University
- Il Gu Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement method and measurement apparatus
- Patent number 11,735,402
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Takashi Kubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for charged particle detection
- Patent number 11,715,619
- Issue date Aug 1, 2023
- ASML Netherlands B.V.
- Yongxin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for the particle-optical examinatio...
- Patent number 11,657,999
- Issue date May 23, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion collector for use in plasma systems
- Patent number 11,581,169
- Issue date Feb 14, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma ashing apparatus
- Patent number 11,456,183
- Issue date Sep 27, 2022
- HITACHI HIGH-TECH CORPORATION
- Toru Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining a wavefront of a massive parti...
- Patent number 11,355,311
- Issue date Jun 7, 2022
- Carl Zeiss SMT GmbH
- Joachim Welte
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,355,326
- Issue date Jun 7, 2022
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of examining a sample using a charged particle microscope
- Patent number 11,327,032
- Issue date May 10, 2022
- FEI Company
- Jan Klusácek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for charged particle detection
- Patent number 11,295,930
- Issue date Apr 5, 2022
- ASML Netherlands B.V.
- Yongxin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer quality inspection method and apparatus, and semiconductor de...
- Patent number 11,189,533
- Issue date Nov 30, 2021
- Samsung Electronics Co., Ltd.
- Jong-Hyun Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ESC substrate support with chucking force control
- Patent number 11,114,327
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Wendell Glenn Boyd
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method
- Patent number 11,101,138
- Issue date Aug 24, 2021
- Tokyo Electron Limited
- Maju Tomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for the particle-optical examinatio...
- Patent number 11,049,686
- Issue date Jun 29, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for detecting or monitoring for a chemical precursor in a...
- Patent number 10,975,470
- Issue date Apr 13, 2021
- ASM IP Holding B.V.
- John Shugrue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning a substrate processing apparatus and the substra...
- Patent number 10,944,051
- Issue date Mar 9, 2021
- Tokyo Electron Limited
- Takuya Kubo
- G11 - INFORMATION STORAGE
Information Patent Grant
Active control of radial etch uniformity
- Patent number 10,916,409
- Issue date Feb 9, 2021
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing method, data processing apparatus, and multiple cha...
- Patent number 10,886,103
- Issue date Jan 5, 2021
- NuFlare Technology, Inc.
- Kei Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ real-time plasma chamber condition monitoring
- Patent number 10,854,433
- Issue date Dec 1, 2020
- Applied Materials, Inc.
- Tzu-Yen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection device, microwave output device and plasma processing app...
- Patent number 10,796,886
- Issue date Oct 6, 2020
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
OES device, plasma processing apparatus including the same and meth...
- Patent number 10,770,273
- Issue date Sep 8, 2020
- Samsung Electronics Co., Ltd.
- In-Joong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser processing system and laser processing method
- Patent number 10,710,194
- Issue date Jul 14, 2020
- Gigaphoton Inc.
- Kouji Kakizaki
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Charged particle beam device and control method of charged particle...
- Patent number 10,636,620
- Issue date Apr 28, 2020
- Hitachi High-Technologies Corporation
- Hiroshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for chamber matching and monitoring
- Patent number 10,622,219
- Issue date Apr 14, 2020
- Tokyo Electron Limited
- Jun Shinagawa
- G01 - MEASURING TESTING
Information Patent Grant
Charge reduction by digital image correlation
- Patent number 10,614,998
- Issue date Apr 7, 2020
- FEI Company
- Remco Geurts
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Etching method
- Patent number 10,586,710
- Issue date Mar 10, 2020
- Tokyo Electron Limited
- Maju Tomura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
NON-DESTRUCTIVE SEM-BASED DEPTH-PROFILING OF SAMPLES
- Publication number 20240096591
- Publication date Mar 21, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Dror Shemesh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Emission Spectroscopy for Advanced Process Characterization
- Publication number 20240094056
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS
- Publication number 20240055230
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Jong Yun KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM FOR SENSOR PROTECTION IN ELECTRON IMAGING APPLICATIONS
- Publication number 20240055222
- Publication date Feb 15, 2024
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMAGNETIC FIELD SIGNAL ACQUISITION SYSTEM FOR HIGH SIGNAL-TO-...
- Publication number 20230352281
- Publication date Nov 2, 2023
- Dublin City University
- Alessio Di Liberto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR DETECTING THERAPEUTIC RADIATION BASED ON OPTICAL DISK WI...
- Publication number 20230288582
- Publication date Sep 14, 2023
- NATIONAL CANCER CENTER
- Dongho SHIN
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...
- Publication number 20230290608
- Publication date Sep 14, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...
- Publication number 20230268235
- Publication date Aug 24, 2023
- Applied Materials, Inc.
- Lei LIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM IRRADIATION SYSTEM, CONTROL METHOD FOR PARTICLE BEAM...
- Publication number 20230253175
- Publication date Aug 10, 2023
- Hitachi, Ltd
- Kenta TAKAHASHI
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Pulse And Bias Synchronization Methods And Systems
- Publication number 20230223235
- Publication date Jul 13, 2023
- MKS Instruments, Inc.
- Mariusz OLDZIEJ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION COLLECTOR FOR USE IN PLASMA SYSTEMS
- Publication number 20230197424
- Publication date Jun 22, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230118576
- Publication date Apr 20, 2023
- Hitachi High-Tech Corporation
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR ARCING DIAGNOSIS, PLASMA PROCESS EQUIPMENT INCLUDING...
- Publication number 20230109672
- Publication date Apr 13, 2023
- Samsung Electronics Co., Ltd.
- Changsoon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20230102923
- Publication date Mar 30, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS
- Publication number 20230044262
- Publication date Feb 9, 2023
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT METHOD AND MEASUREMENT APPARATUS
- Publication number 20220406579
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Takashi KUBO
- G01 - MEASURING TESTING
Information Patent Application
SMALL GAS FLOW MONITORING OF DRY ETCHER BY OES SIGNAL
- Publication number 20220392785
- Publication date Dec 8, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Lung HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CHARGED PARTICLE DETECTION
- Publication number 20220375716
- Publication date Nov 24, 2022
- ASML NETHERLANDS B.V.
- Yongxin WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR RECOGNIZING AND ADDRESSING PLASMA DISCHARGE D...
- Publication number 20220359244
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Yu WANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF DETERMINING AN ENERGY WIDTH OF A CHARGED PARTICLE BEAM
- Publication number 20220148849
- Publication date May 12, 2022
- FEI Company
- Peter Christiaan TIEMEIJER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM AND METHOD FOR THE PARTICLE-OPTICAL EXAMINATIO...
- Publication number 20210313137
- Publication date Oct 7, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR RECOGNIZING AND ADDRESSING PLASMA DISCHARGE D...
- Publication number 20210305074
- Publication date Sep 30, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Yu WANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS FOR DETECTING OR MONITORING FOR A CHEMICAL PRECURSOR IN A...
- Publication number 20210180189
- Publication date Jun 17, 2021
- ASM IP HOLDING B.V.
- John Kevin Shugrue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20210035788
- Publication date Feb 4, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ELECTRIC FIELD MONITOR, PLASMA PROCESSING APPARATUS AND PLAS...
- Publication number 20200388473
- Publication date Dec 10, 2020
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF EXAMINING A SAMPLE USING A CHARGED PARTICLE MICROSCOPE
- Publication number 20200363349
- Publication date Nov 19, 2020
- FEI Company
- Jan Klusácek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING A WAVEFRONT OF A MASSIVE PARTI...
- Publication number 20200312613
- Publication date Oct 1, 2020
- Carl Zeiss SMT GMBH
- Joachim Welte
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU REAL-TIME PLASMA CHAMBER CONDITION MONITORING
- Publication number 20200176233
- Publication date Jun 4, 2020
- Applied Materials, Inc.
- Tzu-Yen HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM AND METHOD FOR THE PARTICLE-OPTICAL EXAMINATIO...
- Publication number 20200098541
- Publication date Mar 26, 2020
- CARL ZEISS MICROSCOPY GMBH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTION DEVICE, MICROWAVE OUTPUT DEVICE AND PLASMA PROCESSING APP...
- Publication number 20200035462
- Publication date Jan 30, 2020
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS

Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of determining an energy width of a charged particle beam

Apparatus for detecting or monitoring for a chemical precursor in a...

Real-time dosimetry

Method and system for recognizing and addressing plasma discharge d...

Plasma process monitoring device and plasma processing apparatus in...

Measurement method and measurement apparatus

Method and apparatus for charged particle detection

Particle beam system and method for the particle-optical examinatio...

Ion collector for use in plasma systems

Plasma processing method and plasma ashing apparatus

Method and apparatus for determining a wavefront of a massive parti...

Plasma processing apparatus and control method

Method of examining a sample using a charged particle microscope

Method and apparatus for charged particle detection

Wafer quality inspection method and apparatus, and semiconductor de...

ESC substrate support with chucking force control

Etching method

Particle beam system and method for the particle-optical examinatio...

Apparatus for detecting or monitoring for a chemical precursor in a...

Method of cleaning a substrate processing apparatus and the substra...

Active control of radial etch uniformity

Data processing method, data processing apparatus, and multiple cha...

In-situ real-time plasma chamber condition monitoring

Detection device, microwave output device and plasma processing app...

OES device, plasma processing apparatus including the same and meth...

Laser processing system and laser processing method

Charged particle beam device and control method of charged particle...

Methods and systems for chamber matching and monitoring

Charge reduction by digital image correlation

Etching method

Patents Applicationslast 30 patents

NON-DESTRUCTIVE SEM-BASED DEPTH-PROFILING OF SAMPLES

Optical Emission Spectroscopy for Advanced Process Characterization

SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS

SYSTEM FOR SENSOR PROTECTION IN ELECTRON IMAGING APPLICATIONS

ELECTROMAGNETIC FIELD SIGNAL ACQUISITION SYSTEM FOR HIGH SIGNAL-TO-...

DEVICE FOR DETECTING THERAPEUTIC RADIATION BASED ON OPTICAL DISK WI...

CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...

ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH A...

PARTICLE BEAM IRRADIATION SYSTEM, CONTROL METHOD FOR PARTICLE BEAM...

Pulse And Bias Synchronization Methods And Systems

ION COLLECTOR FOR USE IN PLASMA SYSTEMS

WAFER PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

APPARATUS FOR ARCING DIAGNOSIS, PLASMA PROCESS EQUIPMENT INCLUDING...

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...

MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS

MEASUREMENT METHOD AND MEASUREMENT APPARATUS

SMALL GAS FLOW MONITORING OF DRY ETCHER BY OES SIGNAL

METHOD AND APPARATUS FOR CHARGED PARTICLE DETECTION

METHOD AND SYSTEM FOR RECOGNIZING AND ADDRESSING PLASMA DISCHARGE D...

METHOD OF DETERMINING AN ENERGY WIDTH OF A CHARGED PARTICLE BEAM

PARTICLE BEAM SYSTEM AND METHOD FOR THE PARTICLE-OPTICAL EXAMINATIO...

METHOD AND SYSTEM FOR RECOGNIZING AND ADDRESSING PLASMA DISCHARGE D...

APPARATUS FOR DETECTING OR MONITORING FOR A CHEMICAL PRECURSOR IN A...

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

PLASMA ELECTRIC FIELD MONITOR, PLASMA PROCESSING APPARATUS AND PLAS...

METHOD OF EXAMINING A SAMPLE USING A CHARGED PARTICLE MICROSCOPE

METHOD AND APPARATUS FOR DETERMINING A WAVEFRONT OF A MASSIVE PARTI...

IN-SITU REAL-TIME PLASMA CHAMBER CONDITION MONITORING

PARTICLE BEAM SYSTEM AND METHOD FOR THE PARTICLE-OPTICAL EXAMINATIO...

DETECTION DEVICE, MICROWAVE OUTPUT DEVICE AND PLASMA PROCESSING APP...