involving an interaction between the metallic and non-metallic component

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/0044involving an interaction between the metallic and non-metallic component

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Sample support
- Patent number 11,947,260
- Issue date Apr 2, 2024
- Hamamatsu Photonics K.K.
- Akira Tashiro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 11,934,101
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic printing plate precursor and method of use
- Patent number 11,714,354
- Issue date Aug 1, 2023
- Eastman Kodak Company
- Philipp Viehmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quantum dot-polymer composite film, method of manufacturing the sam...
- Patent number 11,613,694
- Issue date Mar 28, 2023
- Samsung Electronics Co., Ltd.
- Tae Gon Kim
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 11,573,489
- Issue date Feb 7, 2023
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Secondary electron generating composition
- Patent number 11,487,199
- Issue date Nov 1, 2022
- The University of Manchester
- Scott Lewis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, method fo...
- Patent number 11,460,769
- Issue date Oct 4, 2022
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 11,287,740
- Issue date Mar 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quantum dot-polymer composite film, method of manufacturing the sam...
- Patent number 11,034,884
- Issue date Jun 15, 2021
- Samsung Electronics Co., Ltd.
- Tae Gon Kim
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 11,016,386
- Issue date May 25, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Zirconium nitride powder and production method therefor
- Patent number 10,974,963
- Issue date Apr 13, 2021
- Mitsubishi Materials Electronic Chemicals Co., Ltd.
- Kensuke Kageyama
- G02 - OPTICS
Information Patent Grant
Quantum dots, a composition or composite including the same, and en...
- Patent number 10,782,611
- Issue date Sep 22, 2020
- Samsung Electronics Co., Ltd.
- Hyeyeon Yang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Development unit, substrate processing apparatus, development metho...
- Patent number 10,754,251
- Issue date Aug 25, 2020
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern-forming method
- Patent number 10,725,376
- Issue date Jul 28, 2020
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compositions, preparation methods thereof, and quant...
- Patent number 10,670,962
- Issue date Jun 2, 2020
- Samsung Electronics Co., Ltd.
- Shang Hyeun Park
- G02 - OPTICS
Information Patent Grant
Photosensitive compositions, quantum dot polymer composite produced...
- Patent number 10,663,860
- Issue date May 26, 2020
- Samsung Electronics Co., Ltd.
- Ha Il Kwon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Secondary electron generating composition
- Patent number 10,599,032
- Issue date Mar 24, 2020
- The University of Manchester
- Scott Lewis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition, method for forming pattern, and method...
- Patent number 8,163,462
- Issue date Apr 24, 2012
- Renesas Electronics Corporation
- Minoru Toriumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High resolution, multi-layer resist for microlithography and method...
- Patent number 5,314,772
- Issue date May 24, 1994
- Arizona Board of Regents
- Michael N. Kozicki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Oxygen ion-beam microlithography
- Patent number 5,041,361
- Issue date Aug 20, 1991
- Midwest Research Institute
- Y. Simon Tsuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensitizing bath for chalcogenide resists
- Patent number 4,550,074
- Issue date Oct 29, 1985
- AT&T Bell Laboratories
- Costas H. Tzinis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of catalytic etching
- Patent number 4,506,005
- Issue date Mar 19, 1985
- GCA Corporation
- Steven A. Lis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist system having increased light response
- Patent number 4,371,608
- Issue date Feb 1, 1983
- Ionomet Company
- Amitabha Das
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Doping from a photoresist layer
- Patent number 4,350,541
- Issue date Sep 21, 1982
- Nippon Telegraph and Telephone Public Corp.
- Yoshihiko Mizushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensitizing bath for silver containing resist
- Patent number 4,343,887
- Issue date Aug 10, 1982
- Bell Telephone Laboratories, Incorporated
- Adam Heller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming process
- Patent number 4,320,191
- Issue date Mar 16, 1982
- Nippon Telegraph & Telephone Public Corporation
- Akira Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface sensitized chalcogenide product and process for making and...
- Patent number 4,316,946
- Issue date Feb 23, 1982
- Ionomet Company, Inc.
- Joseph I. Masters
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoinduced migration of silver into chalcogenide layer
- Patent number 4,276,368
- Issue date Jun 30, 1981
- Bell Telephone Laboratories, Incorporated
- Adam Heller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing a lithographic printing plate with a thiourea...
- Patent number 4,177,072
- Issue date Dec 4, 1979
- Fuji Photo Film Co., Ltd.
- Yoshihiro Ono
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Pattern-forming materials having a radiation sensitive chalcogenide...
- Patent number 4,127,414
- Issue date Nov 28, 1978
- Nippon Telegraph & Telephone Public Corporation
- Akira Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...
- Publication number 20250020998
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Kyungoh Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...
- Publication number 20250020997
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Suk Koo Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOTIN ALKOXIDES AS PRECURSORS FOR PATTERNING COMPOSITIONS WITH...
- Publication number 20240427239
- Publication date Dec 26, 2024
- INPRIA CORPORATION
- Robert E. Jilek
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ORGANOTIN CLUSTER PHOTORESISTS AND STABILIZATION METHODS
- Publication number 20240353752
- Publication date Oct 24, 2024
- Feng Lu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST
- Publication number 20240329535
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Yu KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND MATERIALS FOR METALLIC PHOTORESIST
- Publication number 20240288767
- Publication date Aug 29, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST AND FORMATION METHOD THEREOF
- Publication number 20240242966
- Publication date Jul 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui-Chun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20240231225
- Publication date Jul 11, 2024
- Samsung Electronics Co., Ltd.
- Haengdeog KOH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SWITCHABLE SUBSTRATE FOR EXTREME ULTRAVIOLET OR E-BEAM METALLIC RESIST
- Publication number 20240210822
- Publication date Jun 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE COMPOSITION
- Publication number 20240192593
- Publication date Jun 13, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuki URAKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERS...
- Publication number 20240168375
- Publication date May 23, 2024
- Samsung SDI Co., Ltd.
- Minyoung LEE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ORGANOMETALLIC TIN CLUSTERS AS EUV PHOTORESIST
- Publication number 20240134275
- Publication date Apr 25, 2024
- Feng Lu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ADDITIVES FOR METAL OXIDE PHOTORESISTS, POSITIVE TONE DEVELOPMENT W...
- Publication number 20240085785
- Publication date Mar 14, 2024
- INPRIA CORPORATION
- Kazuki Kasahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ZINC-BASED METAL ORGANIC NANOPARTICLE, PREPARATION METHOD THEREFOR,...
- Publication number 20240077801
- Publication date Mar 7, 2024
- TSINGHUA UNIVERSITY
- Hong XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240061336
- Publication date Feb 22, 2024
- Samsung SDI Co., Ltd.
- Changsoo WOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR NANOMATERIAL DISTRIBUTION WITHIN A MATRIX MATERIAL
- Publication number 20240034847
- Publication date Feb 1, 2024
- Irradiant Technologies Inc.
- Daniel Oran
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20230384670
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sensitivity Enhanced Photoresists
- Publication number 20230273520
- Publication date Aug 31, 2023
- Alex P.G. ROBINSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SECONDARY ELECTRON GENERATING COMPOSITION
- Publication number 20230266665
- Publication date Aug 24, 2023
- The University of Manchester
- Scott LEWIS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230213849
- Publication date Jul 6, 2023
- SKC solmics Co., Ltd.
- GeonGon LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...
- Publication number 20230135117
- Publication date May 4, 2023
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE SUPPORT
- Publication number 20230131548
- Publication date Apr 27, 2023
- Hamamatsu Photonics K.K.
- Akira TASHIRO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20230076633
- Publication date Mar 9, 2023
- Samsung Electronics Co., Ltd.
- Sungkun KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20220351964
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOCURABLE COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20220334475
- Publication date Oct 20, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Kenri KONNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...
- Publication number 20220252976
- Publication date Aug 11, 2022
- Samsung Electronics Co., Ltd.
- Hyun-Ji SONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VAPOR DEPOSITION OF CARBON-DOPED METAL OXIDES FOR USE AS PHOTORESISTS
- Publication number 20220199406
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF USE
- Publication number 20210302834
- Publication date Sep 30, 2021
- Philipp Viehmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
QUANTUM DOT-POLYMER COMPOSITE FILM, METHOD OF MANUFACTURING THE SAM...
- Publication number 20210301200
- Publication date Sep 30, 2021
- Samsung Electronics Co., Ltd.
- Tae Gon KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20210278762
- Publication date Sep 9, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- H01 - BASIC ELECTRIC ELEMENTS

involving an interaction between the metallic and non-metallic component

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Sample support

Photoresist composition and method of forming photoresist pattern

Lithographic printing plate precursor and method of use

Quantum dot-polymer composite film, method of manufacturing the sam...

Solution, solution storage body, actinic ray-sensitive or radiation...

Secondary electron generating composition

Actinic ray-sensitive or radiation-sensitive composition, method fo...

Photoresist composition and method of forming photoresist pattern

Quantum dot-polymer composite film, method of manufacturing the sam...

Photoresist composition and method of forming photoresist pattern

Zirconium nitride powder and production method therefor

Quantum dots, a composition or composite including the same, and en...

Development unit, substrate processing apparatus, development metho...

Pattern-forming method

Photosensitive compositions, preparation methods thereof, and quant...

Photosensitive compositions, quantum dot polymer composite produced...

Secondary electron generating composition

Photosensitive composition, method for forming pattern, and method...

High resolution, multi-layer resist for microlithography and method...

Oxygen ion-beam microlithography

Sensitizing bath for chalcogenide resists

Method of catalytic etching

Resist system having increased light response

Doping from a photoresist layer

Sensitizing bath for silver containing resist

Pattern-forming process

Surface sensitized chalcogenide product and process for making and...

Photoinduced migration of silver into chalcogenide layer

Process for preparing a lithographic printing plate with a thiourea...

Pattern-forming materials having a radiation sensitive chalcogenide...

Patents Applicationslast 30 patents

PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...

PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...

ORGANOTIN ALKOXIDES AS PRECURSORS FOR PATTERNING COMPOSITIONS WITH...

ORGANOTIN CLUSTER PHOTORESISTS AND STABILIZATION METHODS

DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST

METHODS AND MATERIALS FOR METALLIC PHOTORESIST

PHOTORESIST AND FORMATION METHOD THEREOF

RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

SWITCHABLE SUBSTRATE FOR EXTREME ULTRAVIOLET OR E-BEAM METALLIC RESIST

PHOTOSENSITIVE COMPOSITION

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERS...

ORGANOMETALLIC TIN CLUSTERS AS EUV PHOTORESIST

ADDITIVES FOR METAL OXIDE PHOTORESISTS, POSITIVE TONE DEVELOPMENT W...

ZINC-BASED METAL ORGANIC NANOPARTICLE, PREPARATION METHOD THEREFOR,...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

METHOD FOR NANOMATERIAL DISTRIBUTION WITHIN A MATRIX MATERIAL

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

Sensitivity Enhanced Photoresists

SECONDARY ELECTRON GENERATING COMPOSITION

BLANK MASK AND PHOTOMASK USING THE SAME

SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...

SAMPLE SUPPORT

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

PHOTOCURABLE COMPOSITION AND PATTERN FORMING METHOD

PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...

VAPOR DEPOSITION OF CARBON-DOPED METAL OXIDES FOR USE AS PHOTORESISTS

LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF USE

QUANTUM DOT-POLYMER COMPOSITE FILM, METHOD OF MANUFACTURING THE SAM...

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN