Number | Name | Date | Kind |
---|---|---|---|
3999990 | Janai et al. | Dec 1976 | |
4127437 | Bersin et al. | Nov 1978 | |
4252891 | Kostyshin et al. | Feb 1981 | |
4320191 | Yoshikawa et al. | Mar 1982 | |
4368099 | Huggett et al. | Jan 1983 | |
4371608 | Das | Feb 1983 | |
4405710 | Balasubramanyam et al. | Sep 1983 | |
4434217 | Masters et al. | Feb 1984 | |
4454221 | Chen et al. | Jun 1984 |
Entry |
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Yoshikawa et al., "A Novel Inorganic Photoresist Utilizing Ag Photodoping in Se-Ge Glass Films", Applied Physics Letters, vol. 29(10), 1976, pp. 677-679. |
J. W. Coburn, "Plasma Etching and Reactive Ion Etching", AVS Monograph Series Article, pp. 38 and 40, (1982). |