Ion sources Ion guns

Industry

CPC
H01J37/08

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/08Ion sources Ion guns

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for setting gap between cathode and filament
- Patent number 12,354,834
- Issue date Jul 8, 2025
- Axcelis Technologies, Inc.
- Steven T. Drummond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and systems useful for producing aluminum ions
- Patent number 12,347,639
- Issue date Jul 1, 2025
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen supply device, and ion beam irradiation apparatus equipped...
- Patent number 12,340,974
- Issue date Jun 24, 2025
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya Hirai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam device having a deflection unit
- Patent number 12,288,664
- Issue date Apr 29, 2025
- Carl Zeiss Microscopy GmbH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle gun and charged particle beam device
- Patent number 12,266,500
- Issue date Apr 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Tomoyo Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter, ion implantation method, and semiconductor device ma...
- Patent number 12,255,039
- Issue date Mar 18, 2025
- Sumitomo Heavy Industries, Ltd.
- Sayumi Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repellent electrode for electron repelling
- Patent number 12,243,707
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Heng Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator and ion implanter
- Patent number 12,243,708
- Issue date Mar 4, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 12,230,471
- Issue date Feb 18, 2025
- HITACHI HIGH-TECH CORPORATION
- Shota Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source, substrate process apparatus including the same, an...
- Patent number 12,224,163
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- SeungWan Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge carrier generation source
- Patent number 12,211,663
- Issue date Jan 28, 2025
- SCIA SYSTEMS GMBH
- Enrico Loos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for preparing a microscopic sample from a volume...
- Patent number 12,198,895
- Issue date Jan 14, 2025
- Carl Zeiss Microscopy GmbH
- Fabian Perez Willard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repeller assembly for mounting into an arc chamber of an ion implan...
- Patent number 12,198,890
- Issue date Jan 14, 2025
- Plansee USA LLC
- Nam Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controller and control techniques for linear accelerator and ion im...
- Patent number 12,193,140
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Keith E. Kowal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam chamber fluid delivery apparatus and method and ion beam e...
- Patent number 12,176,177
- Issue date Dec 24, 2024
- Techinsights Inc.
- Christopher Pawlowicz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single beam plasma source
- Patent number 12,165,829
- Issue date Dec 10, 2024
- Board of Trustees of Michigan State University
- Qi Hua Fan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Molten liquid transport for tunable vaporization in ion sources
- Patent number 12,154,754
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- Craig R. Chaney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device to control uniformity of extracted ion beam
- Patent number 12,154,753
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- Jay T. Scheuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Toroidal motion enhanced ion source
- Patent number 12,154,755
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- June Young Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydraulic feed system for an ion source
- Patent number 12,154,763
- Issue date Nov 26, 2024
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for monitoring faults, anomalies, and other cha...
- Patent number 12,142,452
- Issue date Nov 12, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for implanting particles into a substrate
- Patent number 12,125,670
- Issue date Oct 22, 2024
- MI2-FACTORY GMBH
- Constantin Csato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam source, surface processing apparatus and surf...
- Patent number 12,125,664
- Issue date Oct 22, 2024
- Oxford Instruments Nanotechnology Tools Limited
- David Pearson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation system
- Patent number 12,125,665
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Kai-Yun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Vaporizer, ion source and method for generating aluminum-containing...
- Patent number 12,112,915
- Issue date Oct 8, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Sami K. Hahto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 12,106,929
- Issue date Oct 1, 2024
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanned angled etching apparatus and techniques providing separate...
- Patent number 12,106,936
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power ion beam generator systems and methods
- Patent number 12,101,870
- Issue date Sep 24, 2024
- SHINE Technologies, LLC
- Arne Kobernik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid ion source for aluminum ion generation using a target holder...
- Patent number 12,094,681
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Graham Wright
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION BEAM PROCESSING SYSTEM
- Publication number 20250239432
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Backkyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION EXTRACTION OPTICS FOR ION PROCESSING SYSTEM
- Publication number 20250232942
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Costel BILOIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STATIC ELECTRCITY CONTROL DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEM
- Publication number 20250218745
- Publication date Jul 3, 2025
- NEXTIN, INC.
- Heung-Gyoon PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STRESS MANAGEMENT USING DIRECT SELECTIVE AREA PROCESSING
- Publication number 20250218788
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Morgan EVANS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE AND NEUTRON CAPTURE THERAPY APPARATUS
- Publication number 20250210298
- Publication date Jun 26, 2025
- Sumitomo Heavy Industries, Ltd.
- Ryu MURASE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radiation Heating to Clean Deposits from Air Bearing Shaft
- Publication number 20250201514
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Roger B. Fish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Natural Frequency Adjuster For Extraction Electrodes
- Publication number 20250201508
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIFACETED TARGET FOR AN ION SOURCE
- Publication number 20250191901
- Publication date Jun 12, 2025
- Axcelis Technologies, Inc.
- Steve T. Drummond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATOR AND ION IMPLANTER
- Publication number 20250174424
- Publication date May 29, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR MONITORING FAULTS, ANOMALIES, AND OTHER CHA...
- Publication number 20250166957
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device
- Publication number 20250149287
- Publication date May 8, 2025
- Hitachi High-Tech Corporation
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRID FOR SEMICONDUCTOR PROCESS
- Publication number 20250132133
- Publication date Apr 24, 2025
- Samsung Electronics Co., Ltd.
- Jisoo Im
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH WIRE FORM METAL DOPANT
- Publication number 20250125119
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Roger B. Fish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVELY HEATED TARGET TO GENERATE AN ION BEAM
- Publication number 20250118524
- Publication date Apr 10, 2025
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM INSPECTION SYSTEM AND CHARGED PARTICLE BEAM I...
- Publication number 20250095956
- Publication date Mar 20, 2025
- Hitachi High-Tech Corporation
- Hang DU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES
- Publication number 20250095949
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Christopher A. Rowland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING M...
- Publication number 20250095960
- Publication date Mar 20, 2025
- Samsung Electronics Co., Ltd.
- Sang Woo SEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE MULTIPLE FILAMENT ION BEAM DEPOSITION SYSTEM
- Publication number 20250087441
- Publication date Mar 13, 2025
- INTEVAC, INC.
- Thomas P. Nolan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NANOSCALE FAILURE ANALYSIS METHOD
- Publication number 20250087453
- Publication date Mar 13, 2025
- Shanghai Huali Microeloctronics Corporation
- Yunong Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Source Containing a Sputter Target
- Publication number 20250079113
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Graham Wright
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION PROBE WITH COUPLING TO PLASMA
- Publication number 20250079114
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- ANDREI KHOMENKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU ION BEAM ANGLE MEASUREMENT
- Publication number 20250069850
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLED SPUTTERING TARGET FOR ION SOURCE
- Publication number 20250054722
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Ori NOKED
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20250046564
- Publication date Feb 6, 2025
- Korea Research Institute of Standards and Science
- Takashi OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATORS OF ION IMPLANTERS WITH MOVABLE REPELLER
- Publication number 20250046561
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ying-Chieh Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20250014861
- Publication date Jan 9, 2025
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION
- Publication number 20250005714
- Publication date Jan 2, 2025
- FEI Company
- Matej Dolník
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...
- Publication number 20240429019
- Publication date Dec 26, 2024
- SHINE Technologies, LLC
- Daniel Martin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED GAS BOX AND ION SOURCE
- Publication number 20240420920
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- William H. Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20240404787
- Publication date Dec 5, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya HIRAI
- H01 - BASIC ELECTRIC ELEMENTS

Ion sources Ion guns

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for setting gap between cathode and filament

Method and systems useful for producing aluminum ions

Hydrogen supply device, and ion beam irradiation apparatus equipped...

Particle beam device having a deflection unit

Charged particle gun and charged particle beam device

Ion implanter, ion implantation method, and semiconductor device ma...

Repellent electrode for electron repelling

Ion generator and ion implanter

Ion milling device

Ion beam source, substrate process apparatus including the same, an...

Charge carrier generation source

Method and device for preparing a microscopic sample from a volume...

Repeller assembly for mounting into an arc chamber of an ion implan...

Controller and control techniques for linear accelerator and ion im...

Ion beam chamber fluid delivery apparatus and method and ion beam e...

Single beam plasma source

Molten liquid transport for tunable vaporization in ion sources

Device to control uniformity of extracted ion beam

Toroidal motion enhanced ion source

Hydraulic feed system for an ion source

Systems and methods for monitoring faults, anomalies, and other cha...

Device and method for implanting particles into a substrate

Charged particle beam source, surface processing apparatus and surf...

Ion implantation system

Ion beam processing apparatus, electrode assembly, and method of cl...

Vaporizer, ion source and method for generating aluminum-containing...

Refillable ion chamber with automated purging system

Scanned angled etching apparatus and techniques providing separate...

High power ion beam generator systems and methods

Hybrid ion source for aluminum ion generation using a target holder...

Patents Applicationslast 30 patents

ION BEAM PROCESSING SYSTEM

ION EXTRACTION OPTICS FOR ION PROCESSING SYSTEM

STATIC ELECTRCITY CONTROL DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEM

SUBSTRATE STRESS MANAGEMENT USING DIRECT SELECTIVE AREA PROCESSING

ION SOURCE AND NEUTRON CAPTURE THERAPY APPARATUS

Radiation Heating to Clean Deposits from Air Bearing Shaft

Natural Frequency Adjuster For Extraction Electrodes

MULTIFACETED TARGET FOR AN ION SOURCE

ION GENERATOR AND ION IMPLANTER

SYSTEMS AND METHODS FOR MONITORING FAULTS, ANOMALIES, AND OTHER CHA...

Ion Milling Device

GRID FOR SEMICONDUCTOR PROCESS

ION SOURCE WITH WIRE FORM METAL DOPANT

ACTIVELY HEATED TARGET TO GENERATE AN ION BEAM

CHARGED PARTICLE BEAM INSPECTION SYSTEM AND CHARGED PARTICLE BEAM I...

ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES

ION IMPLANTATION APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING M...

ADJUSTABLE MULTIPLE FILAMENT ION BEAM DEPOSITION SYSTEM

NANOSCALE FAILURE ANALYSIS METHOD

Ion Source Containing a Sputter Target

ION PROBE WITH COUPLING TO PLASMA

IN-SITU ION BEAM ANGLE MEASUREMENT

COOLED SPUTTERING TARGET FOR ION SOURCE

CHARGED PARTICLE BEAM APPARATUS

ION GENERATORS OF ION IMPLANTERS WITH MOVABLE REPELLER

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION

MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...

INTEGRATED GAS BOX AND ION SOURCE

ION IMPLANTER AND ION IMPLANTATION METHOD