Liquid compositions therefor

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G03F7/32

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/32Liquid compositions therefor

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Patents Grantslast 30 patents

Information Patent Grant
Resist pattern forming method and semiconductor chip manufacturing...
- Patent number 12,210,287
- Issue date Jan 28, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV photoresist with low-activation-energy ligands or high-develope...
- Patent number 12,210,283
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive composition
- Patent number 12,210,284
- Issue date Jan 28, 2025
- XSYS Germany GmbH
- Thomas Paulöhrl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal oxide resist patterning with electrical field guided post-exp...
- Patent number 12,204,246
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Huixiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface charge release in lithography developing process
- Patent number 12,204,248
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Ling Tseng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,195,568
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically sensitive sensor comprising micro-barrier and method of...
- Patent number 12,196,699
- Issue date Jan 14, 2025
- Technion Research & Development Foundation Limited
- Hossam Haick
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,189,286
- Issue date Jan 7, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography process and material for negative tone development
- Patent number 12,189,296
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet photolithography method with developer composition
- Patent number 12,181,798
- Issue date Dec 31, 2024
- TAIWAIN SEMICONDUCTOR MANUFACTURING CO., LTD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
- Patent number 12,174,538
- Issue date Dec 24, 2024
- JSR Corporation
- Naoki Nishiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,174,541
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical liquid, chemical liquid storage body, chemical liquid fill...
- Patent number 12,169,362
- Issue date Dec 17, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 12,164,229
- Issue date Dec 10, 2024
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition and resist pattern...
- Patent number 12,164,227
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition and resist pattern...
- Patent number 12,164,231
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for forming resist pattern...
- Patent number 12,158,700
- Issue date Dec 3, 2024
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organically modified metal oxide nanoparticle, method for producing...
- Patent number 12,153,347
- Issue date Nov 26, 2024
- National Institute of Advanced Industrial Science and Technology
- Kiwamu Sue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 12,140,867
- Issue date Nov 12, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoacid generators, photoresist compositions, and pattern formati...
- Patent number 12,140,866
- Issue date Nov 12, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Organotin clusters, solutions of organotin clusters, and applicatio...
- Patent number 12,129,271
- Issue date Oct 29, 2024
- Inpria Corporation
- Brian J. Cardineau
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt, photoacid generator, curable composition and resist...
- Patent number 12,129,240
- Issue date Oct 29, 2024
- San-Apro Ltd.
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative resist formulation for producing undercut pattern profiles
- Patent number 12,124,166
- Issue date Oct 22, 2024
- Merck Patent GmbH
- Anupama Mukherjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carboxylate, resist composition and method for producing resist pat...
- Patent number 12,124,167
- Issue date Oct 22, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,111,573
- Issue date Oct 8, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet photolithography method with infiltration for e...
- Patent number 12,111,576
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Christine Y Ouyang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film-forming composition, silicon-containing film, and resist patte...
- Patent number 12,098,282
- Issue date Sep 24, 2024
- JSR Corporation
- Tomoaki Seko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 12,092,957
- Issue date Sep 17, 2024
- JSR Corporation
- Kazuya Kiriyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
IMAGEABLE COMPOSITION FOR PHOTOSENSITIVE NEGATIVE-WORKING LITHOGRAP...
- Publication number 20250036026
- Publication date Jan 30, 2025
- ZHEJIANG KONITA NEW MATERIALS CO., LTD.
- Yinqiao WENG
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
CHEMICAL SOLUTION
- Publication number 20250028249
- Publication date Jan 23, 2025
- FUJIFILM CORPORATION
- Akihiko OHTSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPER SOLUTIONS CONTAINING LOW FOAM DISPERSING COMP...
- Publication number 20250021007
- Publication date Jan 16, 2025
- Yu Kang NIEH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...
- Publication number 20250021025
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Youngho HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOT...
- Publication number 20250013150
- Publication date Jan 9, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250013152
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF USE
- Publication number 20250013151
- Publication date Jan 9, 2025
- Eastman Kodak Company
- Yasushi Miyamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN CLUSTERS, SOLUTIONS OF ORGANOTIN CLUSTERS, AND APPLICATIO...
- Publication number 20250011346
- Publication date Jan 9, 2025
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A RELIEF PRECURSOR WITH VEGETABLE OILS AS PLASTICIZERS SUITABLE FOR...
- Publication number 20250004368
- Publication date Jan 2, 2025
- XSYS Germany GmbH
- Patrick-Kurt Dannecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20250004374
- Publication date Jan 2, 2025
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20250004365
- Publication date Jan 2, 2025
- INPRIA CORPORATION
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250004371
- Publication date Jan 2, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20240427243
- Publication date Dec 26, 2024
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS
- Publication number 20240419069
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BIODERIVED ORGANIC SOLVENTS
- Publication number 20240408590
- Publication date Dec 12, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Sanjay Malik
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Material For Forming Organic Film, Patterning Process, And Organic...
- Publication number 20240402605
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEADS FROM METAL-CONTAINING RESISTS,...
- Publication number 20240393698
- Publication date Nov 28, 2024
- Samsung SDI Co., Ltd.
- Si-Kyun PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHODS OF ELECTRICALLY CONDUCTIVE OPTICAL SEMICONDUC...
- Publication number 20240393697
- Publication date Nov 28, 2024
- Danbury Mission Technologies, LLC
- Bradley Dean Schwartz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20240393684
- Publication date Nov 28, 2024
- Samsung SDI Co., Ltd.
- Jongpil HO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, CURED FILM, SEMICONDUCTO...
- Publication number 20240395551
- Publication date Nov 28, 2024
- FUJIFILM CORPORATION
- Keigo YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN...
- Publication number 20240389227
- Publication date Nov 21, 2024
- JSR Corporation
- Ryouji TATARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION
- Publication number 20240377731
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20240377737
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Gentaro Hida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING MATERIALS
- Publication number 20240377743
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Chih Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240377738
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240377741
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM PATTERNING METHOD AND ELECTROLUMINESCENT DEVICE AND DISPLAY DE...
- Publication number 20240357849
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Moon Gyu HAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20240345480
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIO...
- Publication number 20240337926
- Publication date Oct 10, 2024
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC METAL CHALCOGENIDE CLUSTERS AND APPLICATION TO LITHO...
- Publication number 20240337925
- Publication date Oct 10, 2024
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Liquid compositions therefor

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist pattern forming method and semiconductor chip manufacturing...

EUV photoresist with low-activation-energy ligands or high-develope...

Photosensitive composition

Metal oxide resist patterning with electrical field guided post-exp...

Surface charge release in lithography developing process

Positive photosensitive resin composition, positive photosensitive...

Chemically sensitive sensor comprising micro-barrier and method of...

Organometallic solution based high resolution patterning compositions

Lithography process and material for negative tone development

Extreme ultraviolet photolithography method with developer composition

Resist composition and pattern forming process

Photosensitive resin composition, method for producing resist patte...

Composition for forming silicon-containing resist underlayer film a...

Chemical liquid, chemical liquid storage body, chemical liquid fill...

Resist composition and method for producing resist pattern

Chemically amplified negative resist composition and resist pattern...

Chemically amplified positive resist composition and resist pattern...

Photosensitive resin composition, method for forming resist pattern...

Organically modified metal oxide nanoparticle, method for producing...

Resist underlayer film material, patterning process, and method for...

Resist composition and resist pattern forming method

Photoacid generators, photoresist compositions, and pattern formati...

Organotin clusters, solutions of organotin clusters, and applicatio...

Sulfonium salt, photoacid generator, curable composition and resist...

Negative resist formulation for producing undercut pattern profiles

Carboxylate, resist composition and method for producing resist pat...

Resist composition and method of forming resist pattern

Extreme ultraviolet photolithography method with infiltration for e...

Film-forming composition, silicon-containing film, and resist patte...

Radiation-sensitive resin composition, method for forming resist pa...

Patents Applicationslast 30 patents

IMAGEABLE COMPOSITION FOR PHOTOSENSITIVE NEGATIVE-WORKING LITHOGRAP...

CHEMICAL SOLUTION

PHOTORESIST DEVELOPER SOLUTIONS CONTAINING LOW FOAM DISPERSING COMP...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...

RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOT...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF USE

ORGANOTIN CLUSTERS, SOLUTIONS OF ORGANOTIN CLUSTERS, AND APPLICATIO...

A RELIEF PRECURSOR WITH VEGETABLE OILS AS PLASTICIZERS SUITABLE FOR...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

RADIATION BASED PATTERNING METHODS

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS

BIODERIVED ORGANIC SOLVENTS

Material For Forming Organic Film, Patterning Process, And Organic...

COMPOSITION FOR REMOVING EDGE BEADS FROM METAL-CONTAINING RESISTS,...

APPARATUS AND METHODS OF ELECTRICALLY CONDUCTIVE OPTICAL SEMICONDUC...

METHOD OF FORMING PATTERNS

PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, CURED FILM, SEMICONDUCTO...

RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN...

EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

BOTTOM ANTIREFLECTIVE COATING MATERIALS

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

FILM PATTERNING METHOD AND ELECTROLUMINESCENT DEVICE AND DISPLAY DE...

MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIO...

ORGANOMETALLIC METAL CHALCOGENIDE CLUSTERS AND APPLICATION TO LITHO...