Liquid compositions therefor

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/32Liquid compositions therefor

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Patents Grantslast 30 patents

Information Patent Grant
Chemical liquid, rinsing solution, and resist pattern forming method
- Patent number 12,366,805
- Issue date Jul 22, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 12,360,451
- Issue date Jul 15, 2025
- Samsung Electronics Co., Ltd.
- Chawon Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stabilized interfaces of inorganic radiation patterning composition...
- Patent number 12,360,454
- Issue date Jul 15, 2025
- Inpria Corporation
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,360,452
- Issue date Jul 15, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing indium-containing organic polymer film, pa...
- Patent number 12,353,131
- Issue date Jul 8, 2025
- Kioxia Corporation
- Koji Asakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing composition and method of producing semiconducto...
- Patent number 12,353,133
- Issue date Jul 8, 2025
- JSR Corporation
- Ryuichi Serizawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Filter device, purification device, chemical solution production me...
- Patent number 12,343,681
- Issue date Jul 1, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming underlayer film, resist pattern forming met...
- Patent number 12,346,026
- Issue date Jul 1, 2025
- FUJIFILM Corporation
- Toshiaki Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quantum dot light-emitting structure and manufacturing method there...
- Patent number 12,344,787
- Issue date Jul 1, 2025
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Wenhai Mei
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Developing method and substrate treatment system
- Patent number 12,339,593
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Yuya Kamei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microcapsule imaging system including non-photopolymerizable reacti...
- Patent number 12,321,095
- Issue date Jun 3, 2025
- POLAROID IP B.V.
- Wei You
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Storage container storing treatment liquid for manufacturing semico...
- Patent number 12,313,976
- Issue date May 27, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographically patterned electrically conductive hydrogels, photo...
- Patent number 12,313,969
- Issue date May 27, 2025
- The Board of Trustees of the Leland Stanford Junior University
- Jia Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Micro- and nano-fluidic chip, method of fabricating the same, and a...
- Patent number 12,303,897
- Issue date May 20, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alkaline cleaning composition, cleaning method, and manufacturing m...
- Patent number 12,292,689
- Issue date May 6, 2025
- Daxin Materials Corporation
- Hui-yi Tang
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method and apparatus for fabrication of large area 3D photonic crys...
- Patent number 12,287,571
- Issue date Apr 29, 2025
- Steven R.J. Brueck
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoresist and method of formation and use
- Patent number 12,287,575
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keng-Chu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin composition
- Patent number 12,282,253
- Issue date Apr 22, 2025
- JSR Corporation
- Kimiyuki Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,282,254
- Issue date Apr 22, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid chemical, method for producing liquid chemical, and method f...
- Patent number 12,282,259
- Issue date Apr 22, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,275,693
- Issue date Apr 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electronic-sensing and magnetic-modulation (ESMM) biosensor for pha...
- Patent number 12,275,008
- Issue date Apr 15, 2025
- Rutgers, The State University of New Jersey
- Umer Hassan
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Photosensitive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,259,651
- Issue date Mar 25, 2025
- The University of Chicago
- Dmitri V. Talapin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 12,259,653
- Issue date Mar 25, 2025
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transparent electrode, process for producing transparent electrode,...
- Patent number 12,262,571
- Issue date Mar 25, 2025
- Kabushiki Kaisha Toshiba
- Naomi Shida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Manufacturing method of flexographic printing plate and printing me...
- Patent number 12,259,655
- Issue date Mar 25, 2025
- Asahi Kasei Kabushiki Kaisha
- Hiroki Akiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,253,801
- Issue date Mar 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,253,802
- Issue date Mar 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LIQUID CHEMICAL, METHOD FOR PRODUCING LIQUID CHEMICAL, AND METHOD F...
- Publication number 20250237957
- Publication date Jul 24, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250231486
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...
- Publication number 20250231492
- Publication date Jul 17, 2025
- SUNTIFIC MATERIALS (WEIFANG), LTD.
- Sam SUN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...
- Publication number 20250224682
- Publication date Jul 10, 2025
- Samsung SDI Co., Ltd.
- Jin-Hee BAE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...
- Publication number 20250224680
- Publication date Jul 10, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST AND METHOD OF FORMATION AND USE
- Publication number 20250224673
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Keng-Chu Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMATION METHOD
- Publication number 20250224679
- Publication date Jul 10, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASKING PROCESS USING SWITCHABLE POLYMER
- Publication number 20250216782
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION
- Publication number 20250216784
- Publication date Jul 3, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIF...
- Publication number 20250216763
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER
- Publication number 20250216783
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...
- Publication number 20250196140
- Publication date Jun 19, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...
- Publication number 20250196139
- Publication date Jun 19, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF INCREASING CROSSLINKING DENSITY OF PHOTORESIST
- Publication number 20250199412
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yuan Chih LO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PH...
- Publication number 20250189892
- Publication date Jun 12, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Binod B. De
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...
- Publication number 20250189887
- Publication date Jun 12, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE SURFACE TREATING AGENT, PATTERN FORMATION SUBSTRATE,...
- Publication number 20250189894
- Publication date Jun 12, 2025
- Nikon Corporation
- Yusuke KAWAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF SMOOTHENING PROFILE OF PHOTORESIST
- Publication number 20250183034
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jia-Lin WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN COMPOUND AND RESIST SOLUTION USING THE SAME, PATTERN FORMING ME...
- Publication number 20250179100
- Publication date Jun 5, 2025
- MITSUBISHI CHEMICAL CORPORATION
- Yuta HIOKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN,...
- Publication number 20250164877
- Publication date May 22, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST-FREE OPTICAL PATTERNING METHOD FOR COLLOIDAL NANOCRYSTA...
- Publication number 20250164879
- Publication date May 22, 2025
- Nanjing University
- Yuanyuan WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMING METHOD AND SEMICONDUCTOR CHIP MANUFACTURING...
- Publication number 20250155818
- Publication date May 15, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
LOW VOLUME SHRINKAGE, HIGH ETCH RESISTANCE AND HIGH RESOLUTION PHOT...
- Publication number 20250157818
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jia-Lin WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD...
- Publication number 20250155807
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Jinha KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT
- Publication number 20250147424
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Hui WENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITIONS, METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICE...
- Publication number 20250138416
- Publication date May 1, 2025
- Inha University Research and Business Foundation
- JIN-KYUN LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Process and Material for Negative Tone Development
- Publication number 20250138428
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NARROW LINE CUT MASKING PROCESS
- Publication number 20250132156
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION, TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, LAMIN...
- Publication number 20250123561
- Publication date Apr 17, 2025
- FUJIFILM CORPORATION
- Keigo YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...
- Publication number 20250116927
- Publication date Apr 10, 2025
- DuPont Electronic Materials International, LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY

Liquid compositions therefor

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Chemical liquid, rinsing solution, and resist pattern forming method

Method of manufacturing semiconductor device

Stabilized interfaces of inorganic radiation patterning composition...

Resist underlayer film-forming composition

Method for manufacturing indium-containing organic polymer film, pa...

Silicon-containing composition and method of producing semiconducto...

Filter device, purification device, chemical solution production me...

Composition for forming underlayer film, resist pattern forming met...

Quantum dot light-emitting structure and manufacturing method there...

Developing method and substrate treatment system

Microcapsule imaging system including non-photopolymerizable reacti...

Storage container storing treatment liquid for manufacturing semico...

Lithographically patterned electrically conductive hydrogels, photo...

Micro- and nano-fluidic chip, method of fabricating the same, and a...

Treatment liquid and pattern forming method

Alkaline cleaning composition, cleaning method, and manufacturing m...

Method and apparatus for fabrication of large area 3D photonic crys...

Photoresist and method of formation and use

Photosensitive resin composition

Photoresist compositions and pattern formation methods

Liquid chemical, method for producing liquid chemical, and method f...

Organotin oxide hydroxide patterning compositions, precursors, and...

Onium salt, chemically amplified resist composition and patterning...

Electronic-sensing and magnetic-modulation (ESMM) biosensor for pha...

Photosensitive, inorganic ligand-capped inorganic nanocrystals

Radiation-sensitive resin composition, method of forming resist pat...

Transparent electrode, process for producing transparent electrode,...

Manufacturing method of flexographic printing plate and printing me...

Solution, solution storage body, actinic ray-sensitive or radiation...

Positive resist composition and pattern forming process

Patents Applicationslast 30 patents

LIQUID CHEMICAL, METHOD FOR PRODUCING LIQUID CHEMICAL, AND METHOD F...

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...

ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...

PHOTORESIST AND METHOD OF FORMATION AND USE

RESIST PATTERN FORMATION METHOD

MASKING PROCESS USING SWITCHABLE POLYMER

IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION

ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIF...

ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

METHOD OF INCREASING CROSSLINKING DENSITY OF PHOTORESIST

POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PH...

SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...

PHOTOSENSITIVE SURFACE TREATING AGENT, PATTERN FORMATION SUBSTRATE,...

METHOD OF SMOOTHENING PROFILE OF PHOTORESIST

TIN COMPOUND AND RESIST SOLUTION USING THE SAME, PATTERN FORMING ME...

RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN,...

PHOTORESIST-FREE OPTICAL PATTERNING METHOD FOR COLLOIDAL NANOCRYSTA...

RESIST PATTERN FORMING METHOD AND SEMICONDUCTOR CHIP MANUFACTURING...

LOW VOLUME SHRINKAGE, HIGH ETCH RESISTANCE AND HIGH RESOLUTION PHOT...

POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD...

LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT

RESIST COMPOSITIONS, METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICE...

Lithography Process and Material for Negative Tone Development

NARROW LINE CUT MASKING PROCESS

COMPOSITION, TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, LAMIN...

PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...