Macromolecular compounds containing Si-O, Si-C or Si-N bonds

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G03F7/0757

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Electron beam lithography with a bilayer resist
- Patent number 12,248,248
- Issue date Mar 11, 2025
- The Boeing Company
- Antonio Mei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist underlayer film-forming composition inclu...
- Patent number 12,248,251
- Issue date Mar 11, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin composition, photosensitive resin film, photos...
- Patent number 12,216,405
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive resin composition and display device using...
- Patent number 12,216,403
- Issue date Feb 4, 2025
- DONJIN SEMICHEM CO., LTD.
- Kyoungsoon Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition and film forming method
- Patent number 12,189,288
- Issue date Jan 7, 2025
- FUJIFILM Corporation
- Takahiro Okawara
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Methods of producing three-dimensional objects with apparatus havin...
- Patent number 12,179,435
- Issue date Dec 31, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Methods for producing three-dimensional objects
- Patent number 12,172,382
- Issue date Dec 24, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Energy-sensitive composition, cured product, and forming method of...
- Patent number 12,099,297
- Issue date Sep 24, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kunihiro Noda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Film-forming composition, silicon-containing film, and resist patte...
- Patent number 12,098,282
- Issue date Sep 24, 2024
- JSR Corporation
- Tomoaki Seko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,099,298
- Issue date Sep 24, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, laminate, and pattern forming pro...
- Patent number 12,055,853
- Issue date Aug 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Kumiko Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flow cells
- Patent number 11,988,957
- Issue date May 21, 2024
- Illumina, Inc.
- Jeffrey S. Fisher
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Positive tone photoresist formulation using crosslinkable siloxane...
- Patent number 11,982,942
- Issue date May 14, 2024
- Merck Patent GmbH
- Karsten Koppe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dual cure compositions
- Patent number 11,976,172
- Issue date May 7, 2024
- Saint-Gobain Performance Plastics Corporation
- Qiaoxi Li
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Water-developable flexographic printing original plate
- Patent number 11,975,556
- Issue date May 7, 2024
- TOYOBO MC CORPORATION
- Kazuya Yoshimoto
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Semiconductor device production method employing silicon-containing...
- Patent number 11,966,164
- Issue date Apr 23, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 11,934,100
- Issue date Mar 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
- Patent number 11,914,295
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Blocked silicone dual cure resins for additive manufacturing
- Patent number 11,905,423
- Issue date Feb 20, 2024
- Carbon, Inc.
- Jessica D. Drazba
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive siloxane composition and pattern forming method usin...
- Patent number 11,899,365
- Issue date Feb 13, 2024
- Merck Patent GmbH
- Naofumi Yoshida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, patterning process, method for fo...
- Patent number 11,892,773
- Issue date Feb 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acetal-protected silanol group-containing polysiloxane composition
- Patent number 11,884,839
- Issue date Jan 30, 2024
- NISSAN CHEMICAL CORPORATION
- Yuki Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polysiloxane, composition comprising the same and cured film using...
- Patent number 11,866,553
- Issue date Jan 9, 2024
- Merck Patent GmbH
- Naofumi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative type photosensitive siloxane composition and methods for p...
- Patent number 11,868,048
- Issue date Jan 9, 2024
- Merck Patent GmbH
- Masanobu Hayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive type photosensitive siloxane composition and cured film fo...
- Patent number 11,860,537
- Issue date Jan 2, 2024
- Merck Patent GmbH
- Naofumi Yoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for producing three-dimensional objects with apparatus havi...
- Patent number 11,850,803
- Issue date Dec 26, 2023
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Negative-type photosensitive resin composition, cured film, element...
- Patent number 11,822,243
- Issue date Nov 21, 2023
- Toray Industries, Inc.
- Yugo Tanigaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive resin composition, cured film therefrom, an...
- Patent number 11,789,363
- Issue date Oct 17, 2023
- Toray Industries, Inc.
- Yoshinori Matoba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for producing three-dimensional objects with apparatus havi...
- Patent number 11,707,893
- Issue date Jul 25, 2023
- Carbon, Inc.
- Jason P. Rolland
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
POLYSILOXANE COMPOSITION
- Publication number 20250123567
- Publication date Apr 17, 2025
- Merck Patent GmbH
- Megumi Yano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Dual Cure Compositions
- Publication number 20250115718
- Publication date Apr 10, 2025
- SAINT-GOBAIN PERFORMANCE PLASTICS CORPORATION
- Qiaoxi Li
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICONE CHAIN-CONTAINING POLYMER, METHOD FOR PRODUCING SILICONE CH...
- Publication number 20250109255
- Publication date Apr 3, 2025
- DIC CORPORATION
- Junpei Ueno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PRODUCING RESIST COMPOSITION PURIFIED PRODUCT, RESIST PAT...
- Publication number 20250110406
- Publication date Apr 3, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Takuma KANAMARU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250102915
- Publication date Mar 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NANOFLUIDIC CELL FOR CHARACTERIZATION OF NANO-BUBBLES IN A SIMULATE...
- Publication number 20250087443
- Publication date Mar 13, 2025
- Saudi Arabian Oil Company
- Dong Kyu Cha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20250044692
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND...
- Publication number 20240384065
- Publication date Nov 21, 2024
- TORAY INDUSTRIES, INC.
- Eisuke Iizuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HIGH REFRACTIVE INDEX PHOTORESIST COMPOSITION
- Publication number 20240337943
- Publication date Oct 10, 2024
- Dow Silicones Corporation
- Peng-Fei Fu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
A Lithographic Printing Plate Precursor
- Publication number 20240337942
- Publication date Oct 10, 2024
- AGFA Offset BV
- Hubertus Van Aert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLY...
- Publication number 20240329534
- Publication date Oct 3, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Device and Method of Manufacture
- Publication number 20240319590
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Hung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLOW CELLS
- Publication number 20240302738
- Publication date Sep 12, 2024
- Illumina, Inc.
- Jeffrey S. Fisher
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
- Publication number 20240288772
- Publication date Aug 29, 2024
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240255848
- Publication date Aug 1, 2024
- Samsung Electronics Co., Ltd.
- Chawon KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
- Publication number 20240210831
- Publication date Jun 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240201595
- Publication date Jun 20, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTO-DEFINABLE HYDROPHOBIC COMPOSITIONS
- Publication number 20240192599
- Publication date Jun 13, 2024
- Hewlett-Packard Development Company, L.P.
- Bo Song
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR PATTERNING
- Publication number 20240184206
- Publication date Jun 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Kumiko HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE FOR OPTICAL DEVICES, PROCESS FOR PREPARING THE SAME, AND...
- Publication number 20240168383
- Publication date May 23, 2024
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Hyung-Tak JEON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
- Publication number 20240160105
- Publication date May 16, 2024
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION
- Publication number 20240142875
- Publication date May 2, 2024
- Merck Patent GmbH
- Akira YAMASAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20240118619
- Publication date Apr 11, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR PRODUCING THREE-DIMENSIONAL OBJECTS
- Publication number 20240116251
- Publication date Apr 11, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240118618
- Publication date Apr 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chih HO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE COMPOSITION COMPRISING ORGANIC METAL COMPOUND AND PO...
- Publication number 20240101765
- Publication date Mar 28, 2024
- HUNETPLUS CO.,LTD
- Hyuk Jin CHA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240096623
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chieh-Hsin HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIVE TONE PHOTORESIST FORMULATION USING CROSSLINKABLE SILOXANE...
- Publication number 20240053681
- Publication date Feb 15, 2024
- Merck Patent GmbH
- Karsten KOPPE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR PRODUCING THREE-DIMENSIONAL OBJECTS
- Publication number 20240034000
- Publication date Feb 1, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
QUANTUM DOT DEVICE, DISPLAY APPARATUS, AND MANUFACTURING METHOD FOR...
- Publication number 20240032319
- Publication date Jan 25, 2024
- BOE TECHNOLOGY GROUP CO., LTD.
- Haowei WANG
- B82 - NANO-TECHNOLOGY

Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Electron beam lithography with a bilayer resist

Silicon-containing resist underlayer film-forming composition inclu...

Solution, solution storage body, actinic ray-sensitive or radiation...

Photosensitive resin composition, photosensitive resin film, photos...

Positive photosensitive resin composition and display device using...

Composition and film forming method

Methods of producing three-dimensional objects with apparatus havin...

Methods for producing three-dimensional objects

Energy-sensitive composition, cured product, and forming method of...

Film-forming composition, silicon-containing film, and resist patte...

Resist composition and method of forming resist pattern

Photosensitive resin composition, laminate, and pattern forming pro...

Flow cells

Positive tone photoresist formulation using crosslinkable siloxane...

Dual cure compositions

Water-developable flexographic printing original plate

Semiconductor device production method employing silicon-containing...

Composition for forming silicon-containing resist underlayer film a...

Thermosetting iodine- and silicon-containing material, composition...

Blocked silicone dual cure resins for additive manufacturing

Photosensitive siloxane composition and pattern forming method usin...

Photosensitive resin composition, patterning process, method for fo...

Acetal-protected silanol group-containing polysiloxane composition

Polysiloxane, composition comprising the same and cured film using...

Negative type photosensitive siloxane composition and methods for p...

Positive type photosensitive siloxane composition and cured film fo...

Methods for producing three-dimensional objects with apparatus havi...

Negative-type photosensitive resin composition, cured film, element...

Positive photosensitive resin composition, cured film therefrom, an...

Methods for producing three-dimensional objects with apparatus havi...

Patents Applicationslast 30 patents

POLYSILOXANE COMPOSITION

Dual Cure Compositions

SILICONE CHAIN-CONTAINING POLYMER, METHOD FOR PRODUCING SILICONE CH...

METHOD OF PRODUCING RESIST COMPOSITION PURIFIED PRODUCT, RESIST PAT...

PHOTOSENSITIVE RESIN COMPOSITION AND PATTERN FORMING PROCESS

NANOFLUIDIC CELL FOR CHARACTERIZATION OF NANO-BUBBLES IN A SIMULATE...

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION

SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND...

HIGH REFRACTIVE INDEX PHOTORESIST COMPOSITION

A Lithographic Printing Plate Precursor

FILM-FORMING COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLY...

Optical Device and Method of Manufacture

FLOW CELLS

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...

Compound For Forming Metal-Containing Film, Composition For Forming...

PHOTO-DEFINABLE HYDROPHOBIC COMPOSITIONS

LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR PATTERNING

STRUCTURE FOR OPTICAL DEVICES, PROCESS FOR PREPARING THE SAME, AND...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...

NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

METHODS FOR PRODUCING THREE-DIMENSIONAL OBJECTS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

PHOTOSENSITIVE COMPOSITION COMPRISING ORGANIC METAL COMPOUND AND PO...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

POSITIVE TONE PHOTORESIST FORMULATION USING CROSSLINKABLE SILOXANE...

METHODS FOR PRODUCING THREE-DIMENSIONAL OBJECTS

QUANTUM DOT DEVICE, DISPLAY APPARATUS, AND MANUFACTURING METHOD FOR...