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Macromolecular compounds containing Si-O, Si-C or Si-N bonds
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PHYSICS
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Photography
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PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
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Photomechanical
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G03F7/0757
Macromolecular compounds containing Si-O, Si-C or Si-N bonds
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Patents Grants
last 30 patents
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Patent Grant
Positive tone photoresist formulation using crosslinkable siloxane...
Patent number
11,982,942
Issue date
May 14, 2024
Merck Patent GmbH
Karsten Koppe
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Dual cure compositions
Patent number
11,976,172
Issue date
May 7, 2024
Saint-Gobain Performance Plastics Corporation
Qiaoxi Li
B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information
Patent Grant
Water-developable flexographic printing original plate
Patent number
11,975,556
Issue date
May 7, 2024
TOYOBO MC CORPORATION
Kazuya Yoshimoto
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information
Patent Grant
Semiconductor device production method employing silicon-containing...
Patent number
11,966,164
Issue date
Apr 23, 2024
NISSAN CHEMICAL CORPORATION
Wataru Shibayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composition for forming silicon-containing resist underlayer film a...
Patent number
11,934,100
Issue date
Mar 19, 2024
Shin-Etsu Chemical Co., Ltd.
Daisuke Kori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
Patent number
11,914,295
Issue date
Feb 27, 2024
Shin-Etsu Chemical Co., Ltd.
Tsutomu Ogihara
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Blocked silicone dual cure resins for additive manufacturing
Patent number
11,905,423
Issue date
Feb 20, 2024
Carbon, Inc.
Jessica D. Drazba
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Photosensitive siloxane composition and pattern forming method usin...
Patent number
11,899,365
Issue date
Feb 13, 2024
Merck Patent GmbH
Naofumi Yoshida
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive resin composition, patterning process, method for fo...
Patent number
11,892,773
Issue date
Feb 6, 2024
Shin-Etsu Chemical Co., Ltd.
Hiroyuki Urano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Acetal-protected silanol group-containing polysiloxane composition
Patent number
11,884,839
Issue date
Jan 30, 2024
NISSAN CHEMICAL CORPORATION
Yuki Endo
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Polysiloxane, composition comprising the same and cured film using...
Patent number
11,866,553
Issue date
Jan 9, 2024
Merck Patent GmbH
Naofumi Yoshida
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Negative type photosensitive siloxane composition and methods for p...
Patent number
11,868,048
Issue date
Jan 9, 2024
Merck Patent GmbH
Masanobu Hayashi
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Positive type photosensitive siloxane composition and cured film fo...
Patent number
11,860,537
Issue date
Jan 2, 2024
Merck Patent GmbH
Naofumi Yoshida
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Methods for producing three-dimensional objects with apparatus havi...
Patent number
11,850,803
Issue date
Dec 26, 2023
Carbon, Inc.
Jason P. Rolland
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Negative-type photosensitive resin composition, cured film, element...
Patent number
11,822,243
Issue date
Nov 21, 2023
Toray Industries, Inc.
Yugo Tanigaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive photosensitive resin composition, cured film therefrom, an...
Patent number
11,789,363
Issue date
Oct 17, 2023
Toray Industries, Inc.
Yoshinori Matoba
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Methods for producing three-dimensional objects with apparatus havi...
Patent number
11,707,893
Issue date
Jul 25, 2023
Carbon, Inc.
Jason P. Rolland
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Patent Grant
Photosensitive resin composition, pattern forming process, and fabr...
Patent number
11,693,317
Issue date
Jul 4, 2023
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive resin composition, photosensitive resin coating, pho...
Patent number
11,693,318
Issue date
Jul 4, 2023
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
EUV pattern transfer using graded hardmask
Patent number
11,681,213
Issue date
Jun 20, 2023
International Business Machines Corporation
Nelson Felix
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Flow cells
Patent number
11,680,292
Issue date
Jun 20, 2023
Illumina, Inc.
Jeffrey S. Fisher
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive siloxane composition and cured film formed by using...
Patent number
11,644,754
Issue date
May 9, 2023
Merck Patent GmbH
Naofumi Yoshida
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Composition for forming organic film, substrate for manufacturing s...
Patent number
11,635,691
Issue date
Apr 25, 2023
Shin-Etsu Chemical Co., Ltd.
Daisuke Kori
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Siloxane polymer compositions and their use
Patent number
11,634,610
Issue date
Apr 25, 2023
OPTITUNE OY
Ari Karkkainen
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Negative type photosensitive composition curable at low temperature
Patent number
11,630,390
Issue date
Apr 18, 2023
Merck Patent GmbH
Motoki Misumi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and patterning process
Patent number
11,614,686
Issue date
Mar 28, 2023
Shin-Etsu Chemical Co., Ltd.
Hironori Satoh
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
Patent number
11,573,489
Issue date
Feb 7, 2023
FUJIFILM Corporation
Tetsuya Kamimura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive-type photosensitive resin composition and cured film prepa...
Patent number
11,573,490
Issue date
Feb 7, 2023
Rohm and Haas Electronic Materials Korea Ltd.
Ji Ung Kim
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Negative photosensitive resin composition, cured film, element prov...
Patent number
11,561,470
Issue date
Jan 24, 2023
Toray Industries, Inc.
Yugo Tanigaki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Radiation sensitive composition
Patent number
11,561,472
Issue date
Jan 24, 2023
Nissan Chemical Industries, Ltd.
Makoto Nakajima
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
Publication number
20240160105
Publication date
May 16, 2024
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION
Publication number
20240142875
Publication date
May 2, 2024
Merck Patent GmbH
Akira YAMASAKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Publication number
20240118619
Publication date
Apr 11, 2024
Tokyo Ohka Kogyo Co., Ltd.
Keiichi Ibata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHODS FOR PRODUCING THREE-DIMENSIONAL OBJECTS
Publication number
20240116251
Publication date
Apr 11, 2024
Carbon, Inc.
Jason P. Rolland
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
Publication number
20240118618
Publication date
Apr 11, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Chun-Chih HO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PHOTOSENSITIVE COMPOSITION COMPRISING ORGANIC METAL COMPOUND AND PO...
Publication number
20240101765
Publication date
Mar 28, 2024
HUNETPLUS CO.,LTD
Hyuk Jin CHA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
Publication number
20240096623
Publication date
Mar 21, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Chieh-Hsin HSIEH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
POSITIVE TONE PHOTORESIST FORMULATION USING CROSSLINKABLE SILOXANE...
Publication number
20240053681
Publication date
Feb 15, 2024
Merck Patent GmbH
Karsten KOPPE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHODS FOR PRODUCING THREE-DIMENSIONAL OBJECTS
Publication number
20240034000
Publication date
Feb 1, 2024
Carbon, Inc.
Jason P. Rolland
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
QUANTUM DOT DEVICE, DISPLAY APPARATUS, AND MANUFACTURING METHOD FOR...
Publication number
20240032319
Publication date
Jan 25, 2024
BOE TECHNOLOGY GROUP CO., LTD.
Haowei WANG
B82 - NANO-TECHNOLOGY
Information
Patent Application
SUBSTRATE LAMINATE, IMAGE SENSOR, AND METHOD FOR MANUFACTURING SUBS...
Publication number
20230408923
Publication date
Dec 21, 2023
Kaneka Corporation
Yuta SAITO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
APPLICATION LIQUID FOR OPTICAL MEMBER, POLYMER, PHOTOSENSITIVE APPL...
Publication number
20230408922
Publication date
Dec 21, 2023
Central Glass Company, Limited
Yuri OIKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
BLOCK COPOLYMER FOR LITHOGRAPHY AND LITHOGRAPHY METHOD USING THE SAME
Publication number
20230367215
Publication date
Nov 16, 2023
Industry-Academic Cooperation Foundation, Yonsei University
Du Yeol RYU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHODS FOR MAKING FLOW CELL SURFACES
Publication number
20230350297
Publication date
Nov 2, 2023
Illumina Cambridge Limited
Alexandra Szemjonov
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM,...
Publication number
20230333468
Publication date
Oct 19, 2023
Central Glass Company, Limited
Takashi MASUBUCHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...
Publication number
20230333472
Publication date
Oct 19, 2023
Shin-Etsu Chemical Co., Ltd.
Tsutomu OGIHARA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
FLOW CELLS
Publication number
20230332224
Publication date
Oct 19, 2023
Illumina, Inc.
Jeffrey S. Fisher
C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information
Patent Application
SILICON COMPOUND, REACTIVE MATERIAL, RESIN COMPOSITION, PHOTOSENSIT...
Publication number
20230322818
Publication date
Oct 12, 2023
Central Glass Company, Limited
Takashi MASUBUCHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST MIXTURE
Publication number
20230324799
Publication date
Oct 12, 2023
FaradaIC Sensors GmbH
Ryan GUTERMAN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
GAS-PHASE METHOD OF FORMING RADIATION-SENSITIVE PATTERNABLE MATERIAL
Publication number
20230324803
Publication date
Oct 12, 2023
ASM IP HOLDING, B.V.
Jan Deckers
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE-TONE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20230314945
Publication date
Oct 5, 2023
Tokyo Ohka Kogyo Co., Ltd.
Keiichi IBATA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SILICON-CONTAINING COMPOSITION AND METHOD OF PRODUCING SEMICONDUCTO...
Publication number
20230250238
Publication date
Aug 10, 2023
JSR Corporation
Ryuichi SERIZAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
SILICON-CONTAINING MONOMER MIXTURE, POLYSILOXANE, RESIN COMPOSITION...
Publication number
20230244145
Publication date
Aug 3, 2023
Central Glass Company, Limited
Takashi MASUBUCHI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPA...
Publication number
20230244144
Publication date
Aug 3, 2023
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
Jung-Hwa LEE
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND WIRING...
Publication number
20230229079
Publication date
Jul 20, 2023
Namics Corporation
Pawel CZUBAROW
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPH...
Publication number
20230203229
Publication date
Jun 29, 2023
JSR Corporation
Miki TAMADA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION FOR FORMING RESIST UNDERLYING FILM
Publication number
20230168582
Publication date
Jun 1, 2023
NISSAN CHEMICAL CORPORATION
Shuhei SHIGAKI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PATTERNING MATERIAL AND PATTERNED FILM
Publication number
20230168583
Publication date
Jun 1, 2023
Huawei Technologies Co., Ltd
Yu ZHANG
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPO...
Publication number
20230161251
Publication date
May 25, 2023
Shin-Etsu Chemical Co., Ltd.
Daisuke KORI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
COATING COMPOSITION FOR PRODUCING INTERLAYER INSULATION FILM, INTER...
Publication number
20230159707
Publication date
May 25, 2023
DIC CORPORATION
Takeshi Ibe
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL