Mask alignment

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CPC
Y10S148/102

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S148/00Metal treatment

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Y10S148/102Mask alignment

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Patents Grantslast 30 patents

Information Patent Grant
Method of producing exposure mask
- Patent number 6,635,549
- Issue date Oct 21, 2003
- Kabushiki Kaisha Toshiba
- Suigen Kyoh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Semiconductor wafer, wafer alignment patterns and method of forming...
- Patent number 6,605,516
- Issue date Aug 12, 2003
- Mark E. Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing methods and structures for determining ali...
- Patent number 6,544,859
- Issue date Apr 8, 2003
- Koninklijke Philips Electronics N.V.
- David Ziger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing methods and structures for determining ali...
- Patent number 6,465,322
- Issue date Oct 15, 2002
- Koninklijke Philips Electronics N.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage and supporting mechanism for supporting movable mirror on stage
- Patent number 6,264,165
- Issue date Jul 24, 2001
- Nikon Corporation
- Toshiya Ohtomo
- G02 - OPTICS
Information Patent Grant
Semiconductor wafer,wafer alignment patterns and method of forming...
- Patent number 6,207,529
- Issue date Mar 27, 2001
- Micron Technology, Inc.
- Mark E. Jost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor wafer, wafer alignment patterns and method of forming...
- Patent number 6,137,186
- Issue date Oct 24, 2000
- Micron Technology, Inc.
- Mark E. Jost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Readable alignment mark structure formed using enhanced chemical me...
- Patent number 6,049,137
- Issue date Apr 11, 2000
- Taiwan Semiconductor Manufacturing Company
- Syun-Ming Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming wafer alignment patterns
- Patent number 6,046,094
- Issue date Apr 4, 2000
- Micron Technology, Inc.
- Mark E. Jost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage and supporting mechanism for supporting movable mirror on stage
- Patent number 6,012,697
- Issue date Jan 11, 2000
- Nikon Corporation
- Toshiya Ohtomo
- G02 - OPTICS
Information Patent Grant
Method of forming a fiducial for aligning an integrated circuit die
- Patent number 6,001,703
- Issue date Dec 14, 1999
- Intel Corporation
- Paul Winer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment pattern and algorithm for photolithographic alignment mar...
- Patent number 5,982,044
- Issue date Nov 9, 1999
- Vanguard International Semiconductor Corporation
- Hua-Tai Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for aligning shallow trench isolation
- Patent number 5,950,093
- Issue date Sep 7, 1999
- Chi-Hung Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fiducial for aligning an integrated circuit die
- Patent number 5,942,805
- Issue date Aug 24, 1999
- Intel Corporation
- Paul Winer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer, wafer alignment patterns
- Patent number 5,925,937
- Issue date Jul 20, 1999
- Micron Technology, Inc.
- Mark E. Jost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask containing alignment mark protection pattern
- Patent number 5,902,707
- Issue date May 11, 1999
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsu-Yu Chu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process of forming bipolar alignment mark for semiconductor
- Patent number 5,882,980
- Issue date Mar 16, 1999
- Hyundai Electronics Industries Co., Ltd.
- Sang Man Bae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a composite silicon-on-insulator substrate
- Patent number 5,869,386
- Issue date Feb 9, 1999
- NEC Corporation
- Tomohiro Hamajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a walled-emitter transistor
- Patent number 5,846,868
- Issue date Dec 8, 1998
- Integrated Device Technology, Inc.
- Chuen-Der Lien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of sub divided pattern for alignment mark recovery after inter-...
- Patent number 5,843,600
- Issue date Dec 1, 1998
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsu-Yu Chu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming embedded diffusion layers using an alignment mark
- Patent number 5,830,799
- Issue date Nov 3, 1998
- Sony Corporation
- Hiroaki Ammo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High step process for manufacturing alignment marks for twin-well i...
- Patent number 5,814,552
- Issue date Sep 29, 1998
- Holtek Microelectronics, Inc.
- Bing-Yau Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming wafer alignment patterns
- Patent number 5,798,292
- Issue date Aug 25, 1998
- Micron Technology, Inc.
- Mark E. Jost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating a readable alignment mark structure using enh...
- Patent number 5,786,260
- Issue date Jul 28, 1998
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Syun-Ming Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a resistor having a serpentine pattern through mu...
- Patent number 5,753,391
- Issue date May 19, 1998
- Micrel, Incorporated
- Marshall D. Stone
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Edge overlay measurement target for sub-0.5 micron ground rules
- Patent number 5,712,707
- Issue date Jan 27, 1998
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor wafer, wafer alignment patterns and method of forming...
- Patent number 5,700,732
- Issue date Dec 23, 1997
- Micron Technology, Inc.
- Mark E. Jost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer structure in a semiconductor device manufacturing process
- Patent number 5,684,333
- Issue date Nov 4, 1997
- Oki Electric Industry Co., Ltd.
- Norio Moriyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing semiconductor device having alignment mark
- Patent number 5,663,099
- Issue date Sep 2, 1997
- Canon Kabushiki Kaisha
- Takahiko Okabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for minimizing unwanted metallization in periphery die on a...
- Patent number 5,580,829
- Issue date Dec 3, 1996
- Motorola, Inc.
- Clyde H. Browning
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor processing methods and structures for determining ali...
- Publication number 20020048922
- Publication date Apr 25, 2002
- DAVID ZIGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of producing exposure mask
- Publication number 20020037625
- Publication date Mar 28, 2002
- Kabushiki Kaisha Toshiba
- Suigen Kyoh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
SEMICONDUCTOR PROCESSING METHODS AND STRUCTURES FOR DETERMINING ALI...
- Publication number 20010051441
- Publication date Dec 13, 2001
- DAVID ZIGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor wafer, wafer alignment patterns and method of forming...
- Publication number 20010007786
- Publication date Jul 12, 2001
- Mark E. Jost
- H01 - BASIC ELECTRIC ELEMENTS

Mask alignment

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of producing exposure mask

Semiconductor wafer, wafer alignment patterns and method of forming...

Semiconductor processing methods and structures for determining ali...

Semiconductor processing methods and structures for determining ali...

Stage and supporting mechanism for supporting movable mirror on stage

Semiconductor wafer,wafer alignment patterns and method of forming...

Semiconductor wafer, wafer alignment patterns and method of forming...

Readable alignment mark structure formed using enhanced chemical me...

Method of forming wafer alignment patterns

Stage and supporting mechanism for supporting movable mirror on stage

Method of forming a fiducial for aligning an integrated circuit die

Alignment pattern and algorithm for photolithographic alignment mar...

Method for aligning shallow trench isolation

Fiducial for aligning an integrated circuit die

Semiconductor wafer, wafer alignment patterns

Mask containing alignment mark protection pattern

Process of forming bipolar alignment mark for semiconductor

Method of fabricating a composite silicon-on-insulator substrate

Method for forming a walled-emitter transistor

Use of sub divided pattern for alignment mark recovery after inter-...

Method for forming embedded diffusion layers using an alignment mark

High step process for manufacturing alignment marks for twin-well i...

Method of forming wafer alignment patterns

Method of fabricating a readable alignment mark structure using enh...

Method of forming a resistor having a serpentine pattern through mu...

Edge overlay measurement target for sub-0.5 micron ground rules

Semiconductor wafer, wafer alignment patterns and method of forming...

Wafer structure in a semiconductor device manufacturing process

Method for producing semiconductor device having alignment mark

Method for minimizing unwanted metallization in periphery die on a...

Patents Applicationslast 30 patents

Semiconductor processing methods and structures for determining ali...

Method of producing exposure mask

SEMICONDUCTOR PROCESSING METHODS AND STRUCTURES FOR DETERMINING ALI...

Semiconductor wafer, wafer alignment patterns and method of forming...