Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength

Industry

CPC
G03F1/22

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/22Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method of fast surface particle and scratch detection for EUV mask...
- Patent number 12,140,857
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle enclosure for lithography systems
- Patent number 12,135,499
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask with reduced wafer neighboring effect
- Patent number 12,130,548
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen-Chang Hsueh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle removing assembly and method of cleaning mask for lithography
- Patent number 12,085,866
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Yang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultra-thin, ultra-low density films for EUV lithography
- Patent number 12,085,844
- Issue date Sep 10, 2024
- LINTEC OF AMERICA, INC.
- Marcio D. Lima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing EUV photo masks
- Patent number 12,085,843
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask and method of forming the same
- Patent number 12,066,757
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for lithography process
- Patent number 12,066,756
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 12,066,758
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
- Patent number 12,060,317
- Issue date Aug 13, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Multi-function overlay marks for reducing noise and extracting focu...
- Patent number 12,055,860
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Ching Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for reducing hydrogen permeation from lithogr...
- Patent number 12,025,922
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hung Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Grounding cap module and gas injection device
- Patent number 12,020,906
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Shi Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle having vent hole
- Patent number 12,013,632
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chue San Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch processing system having reflective endpoint detection
- Patent number 12,007,686
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming structure of pellicle-mask structure with vent s...
- Patent number 12,007,685
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protection layer on low thermal expansion material (LTEM) substrate...
- Patent number 12,001,132
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Underlayer for photoresist adhesion and dose reduction
- Patent number 11,988,965
- Issue date May 21, 2024
- Lam Research Corporation
- Samantha S. H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
EUV masks to prevent carbon contamination
- Patent number 11,988,953
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle pod provided with optically identifiable marks and method f...
- Patent number 11,982,937
- Issue date May 14, 2024
- Gudeng Precision Industrial Co., Ltd.
- Chia-Ho Chuang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Extreme ultraviolet (EUV) photomask and method of manufacturing sem...
- Patent number 11,927,879
- Issue date Mar 12, 2024
- Samsung Electronics Co., Ltd.
- Moosong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for reticle enhancement technology
- Patent number 11,921,420
- Issue date Mar 5, 2024
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle assembly and method for advanced lithography
- Patent number 11,914,286
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Amo Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV mask inspection device using multilayer reflection zone plate
- Patent number 11,898,970
- Issue date Feb 13, 2024
- ESOL Inc.
- Dong Gun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Stud attachment device and stud attachment method with independent...
- Patent number 11,892,767
- Issue date Feb 6, 2024
- Samsung Electronics Co., Ltd.
- Byungchul Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple patterning with organometallic photopatternable layers wit...
- Patent number 11,886,116
- Issue date Jan 30, 2024
- Inpria Corporation
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask including fiducial mark and method of making a semiconduc...
- Patent number 11,860,532
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography mask with a black border regions and method of fabricat...
- Patent number 11,852,966
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chin-Hsiang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for measuring phase of extreme ultraviolet (EU...
- Patent number 11,852,583
- Issue date Dec 26, 2023
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Grant
Multi-function overlay marks for reducing noise and extracting focu...
- Patent number 11,835,864
- Issue date Dec 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Ching Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS
- Publication number 20240385511
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hung LIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY
- Publication number 20240385505
- Publication date Nov 21, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD OF FORMING THE SAME
- Publication number 20240377722
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240377741
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20240369919
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING EUV PHOTO MASKS
- Publication number 20240369918
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS
- Publication number 20240369921
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EXPOSURE CAPABLE OF EASY ADJUSTMENT OF ATMOSPHERIC PRE...
- Publication number 20240337921
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiro KUBOTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE HAVING VENT HOLE
- Publication number 20240329517
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK FOR EUV LITHOGRAPHY WITH ABSORBING FILM, AND PHOTOMASK FA...
- Publication number 20240329515
- Publication date Oct 3, 2024
- S&S TECH Co., Ltd.
- Min-Kyu PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGR...
- Publication number 20240310743
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hung LIAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING COMPOSITION AND METHOD OF CLEANING MASK BY USING THE SAME
- Publication number 20240288785
- Publication date Aug 29, 2024
- Samsung Electronics Co., Ltd.
- Jungah KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING STRUCTURE OF PELLICLE-MASK STRUCTURE WITH VENT S...
- Publication number 20240280894
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
- Publication number 20240255850
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Samantha S.H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AR...
- Publication number 20240248387
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Min WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR RETICLE ENHANCEMENT TECHNOLOGY
- Publication number 20240201577
- Publication date Jun 20, 2024
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pellicle Frame, Pellicle, Photomask with Pellicle, Exposure Method,...
- Publication number 20240184205
- Publication date Jun 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Akinori Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) MASK FOR FORMING...
- Publication number 20240152043
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Minseung SONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
- Publication number 20240118614
- Publication date Apr 11, 2024
- INPRIA CORPORATION
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask for X-Ray Lithography and Metrology
- Publication number 20240112913
- Publication date Apr 4, 2024
- Anne Sakdinawat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV TRANSMISSIVE MEMBRANE, METHOD OF USE THEREOF, AND EXPOSURE METHOD
- Publication number 20240094620
- Publication date Mar 21, 2024
- NGK Insulators, Ltd.
- Naoki GORIKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...
- Publication number 20240069427
- Publication date Feb 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Pi SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...
- Publication number 20240036462
- Publication date Feb 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20240019787
- Publication date Jan 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Function Overlay Marks for Reducing Noise and Extracting Focu...
- Publication number 20240012340
- Publication date Jan 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Ching Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET (EUV) PHOTOMASK
- Publication number 20230400758
- Publication date Dec 14, 2023
- Samsung Electronics Co., Ltd.
- Yigwon KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHY
- Publication number 20230393456
- Publication date Dec 7, 2023
- LINTEC OF AMERICA, INC.
- Marcio D. LIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20230393465
- Publication date Dec 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20230393466
- Publication date Dec 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK ASSEMBLY AND METHOD OF FORMING THE SAME
- Publication number 20230384664
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Hao LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of fast surface particle and scratch detection for EUV mask...

Reticle enclosure for lithography systems

Extreme ultraviolet mask with reduced wafer neighboring effect

Particle removing assembly and method of cleaning mask for lithography

Ultra-thin, ultra-low density films for EUV lithography

Method of manufacturing EUV photo masks

Mask and method of forming the same

Method for lithography process

Pellicle and pellicle assembly

Onium salt, chemically amplified negative resist composition, and p...

Multi-function overlay marks for reducing noise and extracting focu...

Methods and apparatus for reducing hydrogen permeation from lithogr...

Grounding cap module and gas injection device

Pellicle having vent hole

Etch processing system having reflective endpoint detection

Method for forming structure of pellicle-mask structure with vent s...

Protection layer on low thermal expansion material (LTEM) substrate...

Underlayer for photoresist adhesion and dose reduction

EUV masks to prevent carbon contamination

Reticle pod provided with optically identifiable marks and method f...

Extreme ultraviolet (EUV) photomask and method of manufacturing sem...

Method and system for reticle enhancement technology

Pellicle assembly and method for advanced lithography

EUV mask inspection device using multilayer reflection zone plate

Stud attachment device and stud attachment method with independent...

Multiple patterning with organometallic photopatternable layers wit...

Photomask including fiducial mark and method of making a semiconduc...

Lithography mask with a black border regions and method of fabricat...

Apparatus and method for measuring phase of extreme ultraviolet (EU...

Multi-function overlay marks for reducing noise and extracting focu...

Patents Applicationslast 30 patents

RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS

DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY

MASK AND METHOD OF FORMING THE SAME

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD

METHOD OF MANUFACTURING EUV PHOTO MASKS

RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS

PELLICLE FOR EXPOSURE CAPABLE OF EASY ADJUSTMENT OF ATMOSPHERIC PRE...

PELLICLE HAVING VENT HOLE

BLANKMASK FOR EUV LITHOGRAPHY WITH ABSORBING FILM, AND PHOTOMASK FA...

METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGR...

CLEANING COMPOSITION AND METHOD OF CLEANING MASK BY USING THE SAME

METHOD FOR FORMING STRUCTURE OF PELLICLE-MASK STRUCTURE WITH VENT S...

UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION

METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AR...

METHOD AND SYSTEM FOR RETICLE ENHANCEMENT TECHNOLOGY

Pellicle Frame, Pellicle, Photomask with Pellicle, Exposure Method,...

METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) MASK FOR FORMING...

MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...

Mask for X-Ray Lithography and Metrology

EUV TRANSMISSIVE MEMBRANE, METHOD OF USE THEREOF, AND EXPOSURE METHOD

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

Multi-Function Overlay Marks for Reducing Noise and Extracting Focu...

EXTREME ULTRAVIOLET (EUV) PHOTOMASK

ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHY

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

PHOTOMASK ASSEMBLY AND METHOD OF FORMING THE SAME