Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength

Industry

CPC
G03F1/22

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/22Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength

Industries

Patents Grantslast 30 patents

Information Patent Grant
Reticle pod provided with optically identifiable marks and method f...
- Patent number 11,982,937
- Issue date May 14, 2024
- Gudeng Precision Industrial Co., Ltd.
- Chia-Ho Chuang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Extreme ultraviolet (EUV) photomask and method of manufacturing sem...
- Patent number 11,927,879
- Issue date Mar 12, 2024
- Samsung Electronics Co., Ltd.
- Moosong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for reticle enhancement technology
- Patent number 11,921,420
- Issue date Mar 5, 2024
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle assembly and method for advanced lithography
- Patent number 11,914,286
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Amo Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV mask inspection device using multilayer reflection zone plate
- Patent number 11,898,970
- Issue date Feb 13, 2024
- ESOL Inc.
- Dong Gun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Stud attachment device and stud attachment method with independent...
- Patent number 11,892,767
- Issue date Feb 6, 2024
- Samsung Electronics Co., Ltd.
- Byungchul Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple patterning with organometallic photopatternable layers wit...
- Patent number 11,886,116
- Issue date Jan 30, 2024
- Inpria Corporation
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask including fiducial mark and method of making a semiconduc...
- Patent number 11,860,532
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography mask with a black border regions and method of fabricat...
- Patent number 11,852,966
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chin-Hsiang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for measuring phase of extreme ultraviolet (EU...
- Patent number 11,852,583
- Issue date Dec 26, 2023
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Grant
Multi-function overlay marks for reducing noise and extracting focu...
- Patent number 11,835,864
- Issue date Dec 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Ching Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle transportation container
- Patent number 11,837,486
- Issue date Dec 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Ching Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for high numerical aperture thru-slit source mask optimization
- Patent number 11,815,808
- Issue date Nov 14, 2023
- ASML Netherlands B.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 11,796,922
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 11,789,355
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing EUV photo masks
- Patent number 11,789,356
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask assembly and method of forming the same
- Patent number 11,789,360
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Hao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor resist composition, and method of forming patterns us...
- Patent number 11,789,361
- Issue date Oct 17, 2023
- Samsung SDI Co., Ltd.
- Kyung Soo Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 11,784,046
- Issue date Oct 10, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jia-Lin Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 11,782,339
- Issue date Oct 10, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 11,774,844
- Issue date Oct 3, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fast surface particle and scratch detection for EUV mask...
- Patent number 11,768,431
- Issue date Sep 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Cheng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photomask
- Patent number 11,762,277
- Issue date Sep 19, 2023
- Samsung Electronics Co., Ltd.
- Moosong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultra-thin, ultra-low density films for EUV lithography
- Patent number 11,740,548
- Issue date Aug 29, 2023
- LINTEC OF AMERICA, INC.
- Marcio D. Lima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing extreme ultraviolet mask with reduced wafer...
- Patent number 11,740,547
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen-Chang Hsueh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for inspecting a reticle, a method for manufacturing a retic...
- Patent number 11,726,398
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Seulgi Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for layout enhancement based on inter-cell correl...
- Patent number 11,726,402
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wei-Lin Chu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Particle removing assembly and method of cleaning mask for lithography
- Patent number 11,698,592
- Issue date Jul 11, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Yang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV pattern transfer using graded hardmask
- Patent number 11,681,213
- Issue date Jun 20, 2023
- International Business Machines Corporation
- Nelson Felix
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet mask blank defect reduction methods
- Patent number 11,669,008
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Wen Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) MASK FOR FORMING...
- Publication number 20240152043
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Minseung SONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
- Publication number 20240118614
- Publication date Apr 11, 2024
- INPRIA CORPORATION
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask for X-Ray Lithography and Metrology
- Publication number 20240112913
- Publication date Apr 4, 2024
- Anne Sakdinawat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV TRANSMISSIVE MEMBRANE, METHOD OF USE THEREOF, AND EXPOSURE METHOD
- Publication number 20240094620
- Publication date Mar 21, 2024
- NGK Insulators, Ltd.
- Naoki GORIKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...
- Publication number 20240069427
- Publication date Feb 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Pi SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...
- Publication number 20240036462
- Publication date Feb 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20240019787
- Publication date Jan 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Function Overlay Marks for Reducing Noise and Extracting Focu...
- Publication number 20240012340
- Publication date Jan 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Ching Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET (EUV) PHOTOMASK
- Publication number 20230400758
- Publication date Dec 14, 2023
- Samsung Electronics Co., Ltd.
- Yigwon KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHY
- Publication number 20230393456
- Publication date Dec 7, 2023
- LINTEC OF AMERICA, INC.
- Marcio D. LIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20230393465
- Publication date Dec 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20230393466
- Publication date Dec 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK ASSEMBLY AND METHOD OF FORMING THE SAME
- Publication number 20230384664
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Hao LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV PHOTOMASK AND RELATED METHODS
- Publication number 20230386838
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hung LIAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK WITH REDUCED WAFER NEIGHBORING EFFECT
- Publication number 20230367194
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Chang HSUEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20230367195
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FAST SURFACE PARTICLE AND SCRATCH DETECTION FOR EUV MASK...
- Publication number 20230367192
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng CHEN
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF MANUFACTURING EUV PHOTO MASKS
- Publication number 20230367193
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20230369048
- Publication date Nov 16, 2023
- Jia-Lin WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20230367203
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20230359115
- Publication date Nov 9, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND PROCESS FOR CLEANING A MEMBRANE
- Publication number 20230359116
- Publication date Nov 9, 2023
- Intel Corporation
- Safak SAYAN
- B08 - CLEANING
Information Patent Application
METHOD AND SYSTEM FOR LAYOUT ENHANCEMENT BASED ON INTER-CELL CORREL...
- Publication number 20230341765
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- WEI-LIN CHU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20230341775
- Publication date Oct 26, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PARTICLE REMOVING ASSEMBLY AND METHOD OF CLEANING MASK FOR LITHOGRAPHY
- Publication number 20230314963
- Publication date Oct 5, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Yang LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MASK REPAIR
- Publication number 20230305386
- Publication date Sep 28, 2023
- Carl Zeiss SMT GMBH
- Christian Felix Hermanns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REGISTRATION METROLOGY TOOL USING DARKFIELD AND PHASE CONTRAST IMAGING
- Publication number 20230306579
- Publication date Sep 28, 2023
- Intel Corporation
- Deepan KISHORE KUMAR
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROTECTIVE COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20230268178
- Publication date Aug 24, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY,N LTD.
- An-Ren ZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE FRAME FOR EUV LITHOGRAPHY
- Publication number 20230259019
- Publication date Aug 17, 2023
- Kristof CUSTERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD OF FORMING THE SAME
- Publication number 20230259014
- Publication date Aug 17, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS

Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Reticle pod provided with optically identifiable marks and method f...

Extreme ultraviolet (EUV) photomask and method of manufacturing sem...

Method and system for reticle enhancement technology

Pellicle assembly and method for advanced lithography

EUV mask inspection device using multilayer reflection zone plate

Stud attachment device and stud attachment method with independent...

Multiple patterning with organometallic photopatternable layers wit...

Photomask including fiducial mark and method of making a semiconduc...

Lithography mask with a black border regions and method of fabricat...

Apparatus and method for measuring phase of extreme ultraviolet (EU...

Multi-function overlay marks for reducing noise and extracting focu...

Reticle transportation container

Method for high numerical aperture thru-slit source mask optimization

Method of manufacturing semiconductor devices

Extreme ultraviolet mask and method of manufacturing the same

Method of manufacturing EUV photo masks

Photomask assembly and method of forming the same

Semiconductor resist composition, and method of forming patterns us...

Method of manufacturing a semiconductor device

Pellicle for an EUV lithography mask and a method of manufacturing...

Extreme ultraviolet mask and method of manufacturing the same

Method of fast surface particle and scratch detection for EUV mask...

EUV photomask

Ultra-thin, ultra-low density films for EUV lithography

Method of manufacturing extreme ultraviolet mask with reduced wafer...

Method for inspecting a reticle, a method for manufacturing a retic...

Method and system for layout enhancement based on inter-cell correl...

Particle removing assembly and method of cleaning mask for lithography

EUV pattern transfer using graded hardmask

Extreme ultraviolet mask blank defect reduction methods

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) MASK FOR FORMING...

MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...

Mask for X-Ray Lithography and Metrology

EUV TRANSMISSIVE MEMBRANE, METHOD OF USE THEREOF, AND EXPOSURE METHOD

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

Multi-Function Overlay Marks for Reducing Noise and Extracting Focu...

EXTREME ULTRAVIOLET (EUV) PHOTOMASK

ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHY

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

PHOTOMASK ASSEMBLY AND METHOD OF FORMING THE SAME

EUV PHOTOMASK AND RELATED METHODS

EXTREME ULTRAVIOLET MASK WITH REDUCED WAFER NEIGHBORING EFFECT

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

METHOD OF FAST SURFACE PARTICLE AND SCRATCH DETECTION FOR EUV MASK...

METHOD OF MANUFACTURING EUV PHOTO MASKS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

SYSTEM AND PROCESS FOR CLEANING A MEMBRANE

METHOD AND SYSTEM FOR LAYOUT ENHANCEMENT BASED ON INTER-CELL CORREL...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

PARTICLE REMOVING ASSEMBLY AND METHOD OF CLEANING MASK FOR LITHOGRAPHY

METHOD AND APPARATUS FOR MASK REPAIR

REGISTRATION METROLOGY TOOL USING DARKFIELD AND PHASE CONTRAST IMAGING

PROTECTIVE COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

PELLICLE FRAME FOR EUV LITHOGRAPHY

MASK AND METHOD OF FORMING THE SAME