Measurement of illumination distribution, in pupil plane or field plane

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CPC
G03F7/70133

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70133Measurement of illumination distribution, in pupil plane or field plane

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Patents Grantslast 30 patents

Information Patent Grant
Method for measuring an effect of a wavelength-dependent measuring...
- Patent number 12,174,546
- Issue date Dec 24, 2024
- Carl Zeiss SMT GmbH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser system for target metrology and alteration in an EUV light so...
- Patent number 12,078,934
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and lithographic apparatuses
- Patent number 12,025,925
- Issue date Jul 2, 2024
- ASML Netherlands B.V.
- Filippo Alpeggiani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Real time registration in lithography system
- Patent number 11,906,903
- Issue date Feb 20, 2024
- Visitech AS
- Øyvind Tafjord
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 11,747,736
- Issue date Sep 5, 2023
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Grant
Frequency broadening apparatus and method
- Patent number 11,733,617
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement illumination optical unit for guiding illumination ligh...
- Patent number 11,720,028
- Issue date Aug 8, 2023
- Carl Zeiss SMT GmbH
- Thomas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light source device, illuminating apparatus, exposing apparatus, an...
- Patent number 11,698,589
- Issue date Jul 11, 2023
- Canon Kabushiki Kaisha
- Noboru Osaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Exposure apparatus, exposure method, and method of manufacturing ar...
- Patent number 11,656,554
- Issue date May 23, 2023
- Canon Kabushiki Kaisha
- Yuhei Sumiyoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and illumination uniformity correction system
- Patent number 11,656,555
- Issue date May 23, 2023
- ASML Holding N.V.
- Janardan Nath
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for characterizing a microlithographic mask
- Patent number 11,619,882
- Issue date Apr 4, 2023
- Carl Zeiss SMT GmbH
- Ulrich Matejka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 11,579,532
- Issue date Feb 14, 2023
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pupil stop for an illumination optical unit of a metrology system
- Patent number 11,531,272
- Issue date Dec 20, 2022
- Carl Zeiss SMT GmbH
- Matthias Roesch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining information about a patterning process, metho...
- Patent number 11,531,274
- Issue date Dec 20, 2022
- ASML Netherlands B.V.
- Mariya Vyacheslavivna Medvedyeva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of measuring refractive index of EUV mask absorber
- Patent number 11,467,499
- Issue date Oct 11, 2022
- Applied Materials, Inc.
- Wen Xiao
- G01 - MEASURING TESTING
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Measurement apparatus for measuring a wavefront aberration of an im...
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- Issue date Sep 13, 2022
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
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Information Patent Grant
Methods and apparatus for predicting performance of a measurement m...
- Patent number 11,391,677
- Issue date Jul 19, 2022
- ASML Netherlands B.V.
- Stefan Michiel Witte
- G01 - MEASURING TESTING
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Method and apparatus for determining a radiation beam intensity pro...
- Patent number 11,353,796
- Issue date Jun 7, 2022
- ASML Netherlands B.V.
- Teis Johan Coenen
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Method to determine a patterning process parameter
- Patent number 11,300,883
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
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Information Patent Grant
Frequency broadening apparatus and method
- Patent number 11,262,665
- Issue date Mar 1, 2022
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 11,256,175
- Issue date Feb 22, 2022
- Nikon Corporation
- Yuichi Shibazaki
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Performance optimized scanning sequence for eBeam metrology and ins...
- Patent number 11,209,737
- Issue date Dec 28, 2021
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure apparatus and method of manufacturing article
- Patent number 11,181,825
- Issue date Nov 23, 2021
- Canon Kabushiki Kaisha
- Akihito Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and apparatus
- Patent number 11,106,144
- Issue date Aug 31, 2021
- ASML Netherlands B.V.
- Paulus Hubertus Petrus Koller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, exposure apparatus, and device manufacturing method
- Patent number 11,067,894
- Issue date Jul 20, 2021
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment measurement system
- Patent number 11,042,096
- Issue date Jun 22, 2021
- ASML Netherlands B.V.
- Stefan Michiel Witte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 11,022,892
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Patrick Warnaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement system and grating pattern array
- Patent number 10,921,721
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Jinxin Fu
- G01 - MEASURING TESTING
Information Patent Grant
Light irradiation method
- Patent number 10,866,520
- Issue date Dec 15, 2020
- Ushio Denki Kabushiki Kaisha
- Daisuke Yajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 10,852,639
- Issue date Dec 1, 2020
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...
- Publication number 20250060677
- Publication date Feb 20, 2025
- Carl Zeiss SMT GMBH
- Walter Pauls
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MEASURING THE ILLUMINATION PUPIL IN A SCANNER TAKING INT...
- Publication number 20250044705
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Robert BUSCHLINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...
- Publication number 20240419083
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...
- Publication number 20240402613
- Publication date Dec 5, 2024
- Carl Zeiss SMT GMBH
- Alexander Winkler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...
- Publication number 20240377723
- Publication date Nov 14, 2024
- Carl Zeiss SMT GMBH
- Niklas Georg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FAST UNIFORMITY DRIFT CORRECTION
- Publication number 20240319608
- Publication date Sep 26, 2024
- ASML Holding N.V.
- Roberto B. WIENER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20240295824
- Publication date Sep 5, 2024
- Gigaphoton Inc.
- Tomoyoshi TOIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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INSPECTION SYSTEM FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL...
- Publication number 20240272058
- Publication date Aug 15, 2024
- ASML NETHERLANDS B.V.
- Michal Emanuel PAWLOWSKI
- G01 - MEASURING TESTING
Information Patent Application
HIGH-PERFORMANCE EUV MICROSCOPE DEVICE WITH FREE-FORM ILLUMINATION...
- Publication number 20240219699
- Publication date Jul 4, 2024
- ESOL Inc.
- Dong Gun LEE
- G02 - OPTICS
Information Patent Application
APPARATUS AND METHOD OF LASER INTERFERENCE LITHOGRAPHY
- Publication number 20230408927
- Publication date Dec 21, 2023
- The University of Hong Kong
- Wendi LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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METHOD OF PERFORMING METROLOGY, METHOD OF TRAINING A MACHINE LEARNI...
- Publication number 20230280662
- Publication date Sep 7, 2023
- ASML NETHERLANDS B.V.
- Evgenia KURGANOVA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, IN PARTICULAR FOR CHARACTERIZING A MICROLITHOGRAPHY...
- Publication number 20230221571
- Publication date Jul 13, 2023
- Carl Zeiss SMT GMBH
- Ulrich Matejka
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20230143407
- Publication date May 11, 2023
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD FOR DRIFT COMPENSATION
- Publication number 20230035511
- Publication date Feb 2, 2023
- ASML NETHERLANDS B.V.
- Ronny DER KINDEREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND LITHOGRAPHIC APPARATUSES
- Publication number 20220397832
- Publication date Dec 15, 2022
- ASML NETHERLANDS B.V.
- Filippo ALPEGGIANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...
- Publication number 20220350258
- Publication date Nov 3, 2022
- Carl Zeiss SMT GMBH
- Walter Pauls
- G01 - MEASURING TESTING
Information Patent Application
PUPIL STOP FOR AN ILLUMINATION OPTICAL UNIT OF A METROLOGY SYSTEM
- Publication number 20220342317
- Publication date Oct 27, 2022
- Carl Zeiss SMT GMBH
- Matthias Roesch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REAL TIME REGISTRATION IN LITHOGRAPHY SYSTEM
- Publication number 20220276566
- Publication date Sep 1, 2022
- VISITECH AS
- Øyvind Tafjord
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PHOTOLITHOGRAPHIC IMAGING
- Publication number 20220236645
- Publication date Jul 28, 2022
- ASML NETHERLANDS B.V.
- Joern-Holger FRANKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING A REFLECTIVITY OF AN OBJECT FOR MEASUREMENT LI...
- Publication number 20220236648
- Publication date Jul 28, 2022
- Carl Zeiss SMT GMBH
- Renzo Capelli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND ILLUMINATION UNIFORMITY CORRECTION SYSTEM
- Publication number 20220214622
- Publication date Jul 7, 2022
- ASML Holding N.V.
- Janardan NATH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FREQUENCY BROADENING APPARATUS AND METHOD
- Publication number 20220128912
- Publication date Apr 28, 2022
- ASML NETHERLANDS B.V.
- Patrick Sebastian UEBEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20220121125
- Publication date Apr 21, 2022
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
- Publication number 20220075272
- Publication date Mar 10, 2022
- Carl Zeiss SMT GMBH
- Ulrich Matejka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT ILLUMINATION OPTICAL UNIT FOR GUIDING ILLUMINATION LIGH...
- Publication number 20220057717
- Publication date Feb 24, 2022
- Carl Zeiss SMT GMBH
- Thomas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Performance Optimized Scanning Sequence for eBeam Metrology and Ins...
- Publication number 20210405540
- Publication date Dec 30, 2021
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and Method of Measuring Refractive Index of EUV Mask Absorber
- Publication number 20210382398
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...
- Publication number 20210263422
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- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHO...
- Publication number 20210191280
- Publication date Jun 24, 2021
- ASML NETHERLANDS B.V.
- Mariya Vyacheslavivna Medvedyeva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Method and Apparatus
- Publication number 20210132507
- Publication date May 6, 2021
- ASML NETHERLANDS B.V.
- Paulus Hubertus Petrus KOLLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Measurement of illumination distribution, in pupil plane or field plane

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for measuring an effect of a wavelength-dependent measuring...

Laser system for target metrology and alteration in an EUV light so...

Metrology method and lithographic apparatuses

Real time registration in lithography system

Exposure apparatus and exposure method, and device manufacturing me...

Frequency broadening apparatus and method

Measurement illumination optical unit for guiding illumination ligh...

Light source device, illuminating apparatus, exposing apparatus, an...

Exposure apparatus, exposure method, and method of manufacturing ar...

Lithographic apparatus and illumination uniformity correction system

Method and apparatus for characterizing a microlithographic mask

Exposure apparatus and exposure method, and device manufacturing me...

Pupil stop for an illumination optical unit of a metrology system

Method of determining information about a patterning process, metho...

System and method of measuring refractive index of EUV mask absorber

Measurement apparatus for measuring a wavefront aberration of an im...

Methods and apparatus for predicting performance of a measurement m...

Method and apparatus for determining a radiation beam intensity pro...

Method to determine a patterning process parameter

Frequency broadening apparatus and method

Exposure apparatus and exposure method, and device manufacturing me...

Performance optimized scanning sequence for eBeam metrology and ins...

Exposure apparatus and method of manufacturing article

Lithographic method and apparatus

Exposure method, exposure apparatus, and device manufacturing method

Alignment measurement system

Method of measuring a structure, inspection apparatus, lithographic...

Measurement system and grating pattern array

Light irradiation method

Exposure apparatus and exposure method, and device manufacturing me...

Patents Applicationslast 30 patents

METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...

METHOD FOR MEASURING THE ILLUMINATION PUPIL IN A SCANNER TAKING INT...

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...

METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...

COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...

FAST UNIFORMITY DRIFT CORRECTION

EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...

INSPECTION SYSTEM FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL...

HIGH-PERFORMANCE EUV MICROSCOPE DEVICE WITH FREE-FORM ILLUMINATION...

APPARATUS AND METHOD OF LASER INTERFERENCE LITHOGRAPHY

METHOD OF PERFORMING METROLOGY, METHOD OF TRAINING A MACHINE LEARNI...

OPTICAL SYSTEM, IN PARTICULAR FOR CHARACTERIZING A MICROLITHOGRAPHY...

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...

LITHOGRAPHIC APPARATUS AND METHOD FOR DRIFT COMPENSATION

METROLOGY METHOD AND LITHOGRAPHIC APPARATUSES

METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...

PUPIL STOP FOR AN ILLUMINATION OPTICAL UNIT OF A METROLOGY SYSTEM

REAL TIME REGISTRATION IN LITHOGRAPHY SYSTEM

METHOD AND APPARATUS FOR PHOTOLITHOGRAPHIC IMAGING

METHOD FOR MEASURING A REFLECTIVITY OF AN OBJECT FOR MEASUREMENT LI...

LITHOGRAPHIC APPARATUS AND ILLUMINATION UNIFORMITY CORRECTION SYSTEM

FREQUENCY BROADENING APPARATUS AND METHOD

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...

METHOD AND APPARATUS FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK

MEASUREMENT ILLUMINATION OPTICAL UNIT FOR GUIDING ILLUMINATION LIGH...

Performance Optimized Scanning Sequence for eBeam Metrology and Ins...

System and Method of Measuring Refractive Index of EUV Mask Absorber

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...

METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHO...

Lithographic Method and Apparatus