Mechanical means for changing the gas flow

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CPC
C23C16/45587

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CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/45587Mechanical means for changing the gas flow

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Processing apparatus and processing method
- Patent number 12,173,405
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Hiroki Iriuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, reaction container, method of manuf...
- Patent number 12,163,226
- Issue date Dec 10, 2024
- Kokusai Electric Corporation
- Kazuki Nonomura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for manufacturing semiconductor film
- Patent number 12,146,220
- Issue date Nov 19, 2024
- PIOTECH INC.
- Huaqiang Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing system and method of delivering a reactant gas
- Patent number 12,139,790
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution system and reactor system including same
- Patent number 12,024,775
- Issue date Jul 2, 2024
- ASM IP Holding B.V.
- Sonti Sreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas injector for epitaxy and CVD chamber
- Patent number 12,018,372
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Asymmetric injection for better wafer uniformity
- Patent number 11,959,169
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Eric Kihara Shono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,804,366
- Issue date Oct 31, 2023
- Tokyo Electron Limited
- Yuki Hosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid vaporizer
- Patent number 11,788,190
- Issue date Oct 17, 2023
- ASM IP Holding B.V.
- Jereld Lee Winkler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution system and reactor system including same
- Patent number 11,718,913
- Issue date Aug 8, 2023
- ASM IP Holding B.V.
- Sonti Sreeram
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Remote plasma oxidation chamber
- Patent number 11,615,944
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Christopher S. Olsen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition apparatus with cleaning gas flow guiding...
- Patent number 11,532,459
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Hung Yeh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Asymmetric injection for better wafer uniformity
- Patent number 11,486,038
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Eric Kihara Shono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chamber components for epitaxial growth apparatus
- Patent number 11,441,236
- Issue date Sep 13, 2022
- Applied Materials, Inc.
- Shinichi Oki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Valve device, fluid control device and semiconductor manufacturing...
- Patent number 11,427,911
- Issue date Aug 30, 2022
- Fujikin Incorporated
- Kazunari Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stage and electrode member
- Patent number 11,421,323
- Issue date Aug 23, 2022
- Tokyo Electron Limited
- Daisuke Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-forming device
- Patent number 11,377,731
- Issue date Jul 5, 2022
- Murata Manufacturing Co., Ltd.
- Yasuhiro Chikaishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inline thin film processing device
- Patent number 11,315,818
- Issue date Apr 26, 2022
- Ying Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injection apparatus with heating channels
- Patent number 11,268,193
- Issue date Mar 8, 2022
- Applied Materials, Inc.
- Lara Hawrylchak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,101,114
- Issue date Aug 24, 2021
- Tokyo Electron Limited
- Yuki Hosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-port gas injection system and reactor system including same
- Patent number 11,053,591
- Issue date Jul 6, 2021
- ASM IP Holding B.V.
- Mingyang Ma
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Chamber liner for high temperature processing
- Patent number 11,047,043
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Sanjeev Baluja
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus including upper shower head and lower shower head
- Patent number 11,018,045
- Issue date May 25, 2021
- Samsung Electronics Co., Ltd.
- Ji Youn Seo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chamber design for semiconductor processing
- Patent number 11,004,663
- Issue date May 11, 2021
- Applied Materials, Inc.
- Juan Carlos Rocha-Alvarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, nozzle base, and manufacturing meth...
- Patent number 11,001,924
- Issue date May 11, 2021
- Kokusai Electric Corporation
- Hidenari Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Toroidal plasma channel with varying cross-section areas along the...
- Patent number 10,930,474
- Issue date Feb 23, 2021
- MKS Instruments, Inc.
- Chaolin Hu
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Film forming apparatus
- Patent number 10,896,831
- Issue date Jan 19, 2021
- NuFlare Technology, Inc.
- Kunihiko Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply device and valve device
- Patent number 10,870,920
- Issue date Dec 22, 2020
- Tokyo Electron Limited
- Shigeyuki Okura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution showerhead for semiconductor processing
- Patent number 10,829,855
- Issue date Nov 10, 2020
- Applied Materials, Inc.
- Anh N. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injector used for semiconductor equipment
- Patent number 10,731,253
- Issue date Aug 4, 2020
- Hermes-Epitek Corporation
- Tsan-Hua Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING DEVICE AND METHOD FOR CLEANING SUBSTRATE PROCE...
- Publication number 20250027200
- Publication date Jan 23, 2025
- Jusung Engineering Co., Ltd.
- Won Tae CHO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL VAPOR DEPOSITION EQUIPMENT AND METHOD THEREFOR
- Publication number 20250027203
- Publication date Jan 23, 2025
- Advanced Micro-Fabrication Equipment Inc. China
- Gerald Zheyao YIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS INJECTOR FOR EPITAXY AND CVD CHAMBER
- Publication number 20240337020
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Tetsuya ISHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PROCESS VESSEL, METHOD OF PROCESSIN...
- Publication number 20240337021
- Publication date Oct 10, 2024
- KOKUSAI ELECTRONIC CORPORATION
- Yusaku OKAJIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR...
- Publication number 20240327980
- Publication date Oct 3, 2024
- Suzhou Everbright Photonics Co., Ltd.
- Yang CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD
- Publication number 20240087916
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LIQUID VAPORIZER
- Publication number 20240026538
- Publication date Jan 25, 2024
- ASM IP HOLDING B.V.
- Jereld Lee Winkler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION SYSTEM AND REACTOR SYSTEM INCLUDING SAME
- Publication number 20230313377
- Publication date Oct 5, 2023
- ASM IP HOLDING B.V.
- Sonti Sreeram
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AUTOMATED SHOWERHEAD TILT ADJUSTMENT
- Publication number 20230272533
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Sam Jafarian Tehrani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL VAPOR INFILTRATION APPARATUS AND ASSEMBLY FOR GAS INFLOW I...
- Publication number 20230235456
- Publication date Jul 27, 2023
- Zimmer, Inc.
- Akshay Vinayak Dhamankar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230203651
- Publication date Jun 29, 2023
- TOKYO ELECTRON LIMITED
- Kiyoshi MORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS AND THE METHOD THEREOF
- Publication number 20230203654
- Publication date Jun 29, 2023
- ASM IP HOLDING, B.V.
- Paridhi Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GACHEMICAL VAPOR DEPOSITION APPARATUS WITH CLEANING GAS FLOW GUIDIN...
- Publication number 20230098570
- Publication date Mar 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hung YEH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ASYMMETRIC INJECTION FOR BETTER WAFER UNIFORMITY
- Publication number 20230028054
- Publication date Jan 26, 2023
- Applied Materials, Inc.
- Eric Kihara Shono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEM AND METHOD OF DELIVERING A REACTANT GAS
- Publication number 20220411927
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD
- Publication number 20220403509
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS OF CONTROLLING GAS FLOWS IN SEMICONDUCTOR PROCE...
- Publication number 20220380900
- Publication date Dec 1, 2022
- ASM IP HOLDING B.V.
- Mark Fessler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS INJECTOR FOR EPITAXY AND CVD CHAMBER
- Publication number 20220364231
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Tetsuya ISHIKAWA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR FILM
- Publication number 20220205102
- Publication date Jun 30, 2022
- PIOTECH INC.
- Huaqiang Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20220081771
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Hiroki IRIUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPRAY HEAD, CHEMICAL VAPOR DEPOSITION DEVICE, AND WORKING METHOD OF...
- Publication number 20220049355
- Publication date Feb 17, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Lifeng Qiu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, REACTION CONTAINER, METHOD OF MANUF...
- Publication number 20220002871
- Publication date Jan 6, 2022
- Kokusai Electric Corporation
- Kazuki NONOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210375597
- Publication date Dec 2, 2021
- TOKYO ELECTRON LIMITED
- Yuki HOSAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-PORT GAS INJECTION SYSTEM AND REACTOR SYSTEM INCLUDING SAME
- Publication number 20210310125
- Publication date Oct 7, 2021
- ASM IP HOLDING B.V.
- Mingyang Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER DESIGN FOR SEMICONDUCTOR PROCESSING
- Publication number 20210217592
- Publication date Jul 15, 2021
- Applied Materials, Inc.
- Juan Carlos ROCHA-ALVAREZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS INJECTION APPARATUS WITH HEATING CHANNELS
- Publication number 20210040612
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INLINE THIN FILM PROCESSING DEVICE
- Publication number 20210005474
- Publication date Jan 7, 2021
- Ying HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND ELECTRODE MEMBER
- Publication number 20200407840
- Publication date Dec 31, 2020
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VALVE DEVICE, FLUID CONTROL DEVICE AND SEMICONDUCTOR MANUFACTURING...
- Publication number 20200354835
- Publication date Nov 12, 2020
- Fujikin Incorporated
- Kazunari WATANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER LINER FOR HIGH TEMPERATURE PROCESSING
- Publication number 20200080198
- Publication date Mar 12, 2020
- Applied Materials, Inc.
- Sanjeev BALUJA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Mechanical means for changing the gas flow

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Processing apparatus and processing method

Substrate processing apparatus, reaction container, method of manuf...

Apparatus and method for manufacturing semiconductor film

Processing system and method of delivering a reactant gas

Gas distribution system and reactor system including same

Gas injector for epitaxy and CVD chamber

Asymmetric injection for better wafer uniformity

Plasma processing apparatus

Liquid vaporizer

Gas distribution system and reactor system including same

Remote plasma oxidation chamber

Chemical vapor deposition apparatus with cleaning gas flow guiding...

Asymmetric injection for better wafer uniformity

Chamber components for epitaxial growth apparatus

Valve device, fluid control device and semiconductor manufacturing...

Stage and electrode member

Film-forming device

Inline thin film processing device

Gas injection apparatus with heating channels

Plasma processing apparatus

Multi-port gas injection system and reactor system including same

Chamber liner for high temperature processing

Deposition apparatus including upper shower head and lower shower head

Chamber design for semiconductor processing

Substrate processing apparatus, nozzle base, and manufacturing meth...

Toroidal plasma channel with varying cross-section areas along the...

Film forming apparatus

Gas supply device and valve device

Gas distribution showerhead for semiconductor processing

Gas injector used for semiconductor equipment

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING DEVICE AND METHOD FOR CLEANING SUBSTRATE PROCE...

CHEMICAL VAPOR DEPOSITION EQUIPMENT AND METHOD THEREFOR

GAS INJECTOR FOR EPITAXY AND CVD CHAMBER

SUBSTRATE PROCESSING APPARATUS, PROCESS VESSEL, METHOD OF PROCESSIN...

METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR...

VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD

LIQUID VAPORIZER

GAS DISTRIBUTION SYSTEM AND REACTOR SYSTEM INCLUDING SAME

AUTOMATED SHOWERHEAD TILT ADJUSTMENT

CHEMICAL VAPOR INFILTRATION APPARATUS AND ASSEMBLY FOR GAS INFLOW I...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS AND THE METHOD THEREOF

GACHEMICAL VAPOR DEPOSITION APPARATUS WITH CLEANING GAS FLOW GUIDIN...

ASYMMETRIC INJECTION FOR BETTER WAFER UNIFORMITY

PROCESSING SYSTEM AND METHOD OF DELIVERING A REACTANT GAS

VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD

SYSTEMS AND METHODS OF CONTROLLING GAS FLOWS IN SEMICONDUCTOR PROCE...

GAS INJECTOR FOR EPITAXY AND CVD CHAMBER

APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR FILM

PROCESSING APPARATUS AND PROCESSING METHOD

SPRAY HEAD, CHEMICAL VAPOR DEPOSITION DEVICE, AND WORKING METHOD OF...

SUBSTRATE PROCESSING APPARATUS, REACTION CONTAINER, METHOD OF MANUF...

PLASMA PROCESSING APPARATUS

MULTI-PORT GAS INJECTION SYSTEM AND REACTOR SYSTEM INCLUDING SAME

CHAMBER DESIGN FOR SEMICONDUCTOR PROCESSING

GAS INJECTION APPARATUS WITH HEATING CHANNELS

INLINE THIN FILM PROCESSING DEVICE

STAGE AND ELECTRODE MEMBER

VALVE DEVICE, FLUID CONTROL DEVICE AND SEMICONDUCTOR MANUFACTURING...

CHAMBER LINER FOR HIGH TEMPERATURE PROCESSING