Microwave generated discharge

Industry

CPC
H01J37/32192

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32192Microwave generated discharge

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Systems and processes for producing fixed-nitrogen compounds
- Patent number 12,186,728
- Issue date Jan 7, 2025
- Nitricity Inc.
- Joshua Michael McEnaney
- C05 - FERTILISERS MANUFACTURE THEREOF
Information Patent Grant
Controlling exhaust gas pressure of a plasma reactor for plasma sta...
- Patent number 12,159,768
- Issue date Dec 3, 2024
- Recarbon, Inc.
- George Stephen Leonard
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,094,687
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and prediction method of the condition...
- Patent number 12,080,529
- Issue date Sep 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 12,077,865
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Hideki Yuasa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for in-situ plasma modification
- Patent number 12,074,013
- Issue date Aug 27, 2024
- Qi Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 12,068,208
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 12,060,641
- Issue date Aug 13, 2024
- Tokyo Electron Limited
- Hirokazu Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition system with integrated cooling on a rotating drum
- Patent number 12,057,297
- Issue date Aug 6, 2024
- Richard DeVito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flim forming method of carbon-containing film by microwave plasma
- Patent number 12,018,375
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Ryota Ifuku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method of low temperature thin film deposition and in-si...
- Patent number 12,018,374
- Issue date Jun 25, 2024
- DSGI Technologies, Inc.
- Jeffrey Edward Kowalski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Optical system for monitoring plasma reactions and reactors
- Patent number 12,014,900
- Issue date Jun 18, 2024
- Recarbon, Inc.
- Curtis Peter Tom
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alternating and continuous microwave fiber tow coating thermo-chemi...
- Patent number 12,000,049
- Issue date Jun 4, 2024
- RTX Corporation
- John J. Gangloff
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
- Patent number 11,972,930
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for parts cleaning
- Patent number 11,967,491
- Issue date Apr 23, 2024
- Semes Co., Ltd.
- Soon-Cheon Cho
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus having electrostatic chuck and subst...
- Patent number 11,929,251
- Issue date Mar 12, 2024
- ASM IP Holding B.V.
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature-controlled chemical processing reactor
- Patent number 11,923,176
- Issue date Mar 5, 2024
- LytEn, Inc.
- Michael W. Stowell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for a treatment to deposit a barrier coating
- Patent number 11,898,241
- Issue date Feb 13, 2024
- INNOVATIVE SYSTEMS ET TECHNOLOGIES (ISYTECH)
- Nasser Beldi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply apparatus and gas supply method
- Patent number 11,866,825
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Hiroyuki Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor manufacturing apparatus and manufacturing method of s...
- Patent number 11,859,286
- Issue date Jan 2, 2024
- Kioxia Corporation
- Yuya Matsubara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for microwave plasma assisted chemical vapor...
- Patent number 11,854,775
- Issue date Dec 26, 2023
- Board of Trustees of Michigan State University
- Timothy A. Grotjohn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spheroidal dehydrogenated metals and metal alloy particles
- Patent number 11,839,919
- Issue date Dec 12, 2023
- 6K Inc.
- Kamal Hadidi
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,842,885
- Issue date Dec 12, 2023
- HITACHI HIGH-TECH CORPORATION
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for the fabrication of diamond by shockwaves
- Patent number 11,802,053
- Issue date Oct 31, 2023
- Daniel Hodes
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
DC bulk conductive ceramic with low RF and microwave loss
- Patent number 11,773,026
- Issue date Oct 3, 2023
- Euclid Techlabs, LLC
- Alexei Kanareykin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma observation system and plasma observation method
- Patent number 11,749,511
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Ryoji Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with local lorentz force
- Patent number 11,721,532
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for microwave plasma assisted chemical vapor...
- Patent number 11,702,749
- Issue date Jul 18, 2023
- Board of Trustees of Michigan State University
- Jes Asmussen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device
- Patent number 11,682,542
- Issue date Jun 20, 2023
- HITACHI HIGH-TECH CORPORATION
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,658,011
- Issue date May 23, 2023
- HITACHI HIGH-TECH CORPORATION
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF SELECTIVELY ETCHING SILICON NITRIDE
- Publication number 20240420962
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Doreen Wei Ying Yong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPHEROIDAL DEHYDROGENATED METALS AND METAL ALLOY PARTICLES
- Publication number 20240326128
- Publication date Oct 3, 2024
- 6K Inc.
- Kamal Hadidi
- B22 - CASTING POWDER METALLURGY
Information Patent Application
ALTERNATING AND CONTINUOUS MICROWAVE FIBER TOW COATING THERMO-CHEMI...
- Publication number 20240301556
- Publication date Sep 12, 2024
- RTX Corporation
- John J. Gangloff
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING DEVICE AND ETCHING METHOD
- Publication number 20240242938
- Publication date Jul 18, 2024
- ULVAC, Inc.
- Kazuhiko Tonari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
- Publication number 20240222084
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for the fabrication of diamond by shockwaves
- Publication number 20240208826
- Publication date Jun 27, 2024
- Daniel Hodes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240203702
- Publication date Jun 20, 2024
- SEMES CO., LTD.
- SUNGIK PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROCHEMICAL REDUCTION OF SURFACE METAL OXIDES
- Publication number 20240191353
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Yoon Ah Shin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240170267
- Publication date May 23, 2024
- Tokyo Electron Limited
- Yoshiki NAKANO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULAR MICROWAVE SOURCE WITH INTEGRATED OPTICAL SENSORS
- Publication number 20240153795
- Publication date May 9, 2024
- Applied Materials, Inc.
- Adam Fischbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240120183
- Publication date Apr 11, 2024
- Tokyo Electron Limited
- Makoto WADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240047194
- Publication date Feb 8, 2024
- Tokyo Electron Limited
- Kenichi KOTE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR PROCESSING GASES
- Publication number 20240010492
- Publication date Jan 11, 2024
- TRANSFORM MATERIALS LLC
- David S. Soane
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHOD AND DEVICE FOR THE OUTER-WALL AND/OR INNER-WALL COATING OF H...
- Publication number 20230323529
- Publication date Oct 12, 2023
- RHEINISCH-WESTFÄLISCHE TECHNISCHE HOCHSCHULE (RWTH) AACHEN KÖRPERSCHAFT DES Ö...
- Montgomery JARITZ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus And Method Of Treating Substrate
- Publication number 20230298860
- Publication date Sep 21, 2023
- SEMES CO., LTD.
- Seungjun OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20230290623
- Publication date Sep 14, 2023
- ULVAC, Inc.
- Kenta Doi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230282491
- Publication date Sep 7, 2023
- HITACHI HIGH-TECH CORPORATION
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAMONDS HAVING ARTIFICIALLY EMBEDDED INCLUSIONS
- Publication number 20230210231
- Publication date Jul 6, 2023
- EllansaLabs Inc.
- Omar Besim HAKIM
- A44 - HABERDASHERY JEWELLERY
Information Patent Application
SPHEROIDAL TITANIUM METALLIC POWDERS WITH CUSTOM MICROSTRUCTURES
- Publication number 20230211407
- Publication date Jul 6, 2023
- 6K Inc.
- Kamal Hadidi
- B22 - CASTING POWDER METALLURGY
Information Patent Application
METHOD OF TREATING SUBSTRATE
- Publication number 20230207290
- Publication date Jun 29, 2023
- SEMES CO., LTD.
- Sang Lim KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPLEX MODALITY REACTOR FOR MATERIALS PRODUCTION AND SYNTHESIS
- Publication number 20230201788
- Publication date Jun 29, 2023
- Lyten, Inc.
- Michael W. Stowell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPOR-PHASE PRECURSOR SEEDING FOR DIAMOND FILM DEPOSITION
- Publication number 20230175120
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- Sze Chieh Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATMOSPHERIC COLD PLASMA JET COATING AND SURFACE TREATMENT
- Publication number 20230160067
- Publication date May 25, 2023
- Starfire Industires, LLC
- Brian Edward Jurczyk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPTICAL SYSTEM FOR MONITORING PLASMA REACTIONS AND REACTORS
- Publication number 20230110414
- Publication date Apr 13, 2023
- RECARBON, INC.
- Curtis Peter Tom
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
ATMOSPHERIC PRESSURE REMOTE PLASMA CVD DEVICE, FILM FORMATION METHO...
- Publication number 20230110364
- Publication date Apr 13, 2023
- Suntory Holdings Limited
- Masanori Nishiyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20230061151
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Hideki YUASA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND LID MEMBER
- Publication number 20230058928
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Hiroshi KONDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMATION METHOD AND FILM FORMATION APPARATUS
- Publication number 20230042099
- Publication date Feb 9, 2023
- Tokyo Electron Limited
- Makoto WADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20230005715
- Publication date Jan 5, 2023
- SEMES CO., LTD.
- Jin Woo CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20220406611
- Publication date Dec 22, 2022
- KIOXIA Corporation
- Atsushi TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS

Microwave generated discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and processes for producing fixed-nitrogen compounds

Controlling exhaust gas pressure of a plasma reactor for plasma sta...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and prediction method of the condition...

Film forming method and film forming apparatus

System and method for in-situ plasma modification

Plasma processing apparatus and control method

Film forming method and film forming apparatus

Deposition system with integrated cooling on a rotating drum

Flim forming method of carbon-containing film by microwave plasma

System and method of low temperature thin film deposition and in-si...

Optical system for monitoring plasma reactions and reactors

Alternating and continuous microwave fiber tow coating thermo-chemi...

Cylindrical cavity with impedance shifting by irises in a power-sup...

Method and apparatus for parts cleaning

Substrate processing apparatus having electrostatic chuck and subst...

Temperature-controlled chemical processing reactor

Method for a treatment to deposit a barrier coating

Gas supply apparatus and gas supply method

Semiconductor manufacturing apparatus and manufacturing method of s...

Methods and apparatus for microwave plasma assisted chemical vapor...

Spheroidal dehydrogenated metals and metal alloy particles

Plasma processing apparatus and plasma processing method

Method and apparatus for the fabrication of diamond by shockwaves

DC bulk conductive ceramic with low RF and microwave loss

Plasma observation system and plasma observation method

Modular microwave source with local lorentz force

Methods and apparatus for microwave plasma assisted chemical vapor...

Plasma processing device

Plasma processing apparatus

Patents Applicationslast 30 patents

METHODS OF SELECTIVELY ETCHING SILICON NITRIDE

SPHEROIDAL DEHYDROGENATED METALS AND METAL ALLOY PARTICLES

ALTERNATING AND CONTINUOUS MICROWAVE FIBER TOW COATING THERMO-CHEMI...

ETCHING DEVICE AND ETCHING METHOD

CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...

Method and Apparatus for the fabrication of diamond by shockwaves

SUBSTRATE PROCESSING APPARATUS

ELECTROCHEMICAL REDUCTION OF SURFACE METAL OXIDES

CLEANING METHOD AND PLASMA PROCESSING APPARATUS

MODULAR MICROWAVE SOURCE WITH INTEGRATED OPTICAL SENSORS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SYSTEMS AND METHODS FOR PROCESSING GASES

METHOD AND DEVICE FOR THE OUTER-WALL AND/OR INNER-WALL COATING OF H...

Apparatus And Method Of Treating Substrate

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

DIAMONDS HAVING ARTIFICIALLY EMBEDDED INCLUSIONS

SPHEROIDAL TITANIUM METALLIC POWDERS WITH CUSTOM MICROSTRUCTURES

METHOD OF TREATING SUBSTRATE

COMPLEX MODALITY REACTOR FOR MATERIALS PRODUCTION AND SYNTHESIS

VAPOR-PHASE PRECURSOR SEEDING FOR DIAMOND FILM DEPOSITION

ATMOSPHERIC COLD PLASMA JET COATING AND SURFACE TREATMENT

OPTICAL SYSTEM FOR MONITORING PLASMA REACTIONS AND REACTORS

ATMOSPHERIC PRESSURE REMOTE PLASMA CVD DEVICE, FILM FORMATION METHO...

FILM FORMING METHOD AND FILM FORMING APPARATUS

PLASMA PROCESSING APPARATUS AND LID MEMBER

FILM FORMATION METHOD AND FILM FORMATION APPARATUS

APPARATUS AND METHOD FOR TREATING SUBSTRATE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE