Monitoring and controlling tubes by information coming from the object and/or discharge

Industry

CPC
H01J37/32935

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32935Monitoring and controlling tubes by information coming from the object and/or discharge

Industries

Patents Grantslast 30 patents

Information Patent Grant
Forming method of component and substrate processing system
- Patent number 11,981,993
- Issue date May 14, 2024
- Tokyo Electron Limited
- Michishige Saito
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus with switches to produce a waveform
- Patent number 11,978,611
- Issue date May 7, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
- Patent number 11,972,930
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic phased array plasma source for complete plasma coverage of...
- Patent number 11,948,783
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Glow plasma gas measurement signal processing
- Patent number 11,948,774
- Issue date Apr 2, 2024
- Servomex Group Limited
- Bahram Alizadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration jig and calibration method
- Patent number 11,935,773
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Andrew Myles
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma state detection method, and pla...
- Patent number 11,935,731
- Issue date Mar 19, 2024
- Tokyo Electron Limited
- Daisuke Hayashi
- G08 - SIGNALLING
Information Patent Grant
Temperature measurement for substrate carrier using a heater elemen...
- Patent number 11,929,241
- Issue date Mar 12, 2024
- Applied Materials, Inc.
- Phillip Criminale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of adjusting the output power of a power supply supplying el...
- Patent number 11,929,233
- Issue date Mar 12, 2024
- TRUMPF Huettinger Sp. z o. o.
- Jakub Swiatnicki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,915,951
- Issue date Feb 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for ion energy analysis of plasma processes
- Patent number 11,908,668
- Issue date Feb 20, 2024
- IMPEDANS LTD
- Paul Scullin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power and data transmission to substrate support in plasma chambers...
- Patent number 11,901,944
- Issue date Feb 13, 2024
- Lam Research Corporation
- Changyou Jing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems to modulate film stress
- Patent number 11,887,818
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Tsutomu Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High frequency power source allowing arbitrary setting of temporal...
- Patent number 11,875,968
- Issue date Jan 16, 2024
- Adtec Plasma Technology Co., Ltd.
- Toshihiro Takahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,869,753
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Takahiro Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis...
- Patent number 11,867,643
- Issue date Jan 9, 2024
- Korea Research Institute of Standards and Science
- Hyo Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,862,441
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Hironari Sasagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for microwave plasma assisted chemical vapor...
- Patent number 11,854,775
- Issue date Dec 26, 2023
- Board of Trustees of Michigan State University
- Timothy A. Grotjohn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,842,884
- Issue date Dec 12, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus
- Patent number 11,837,438
- Issue date Dec 5, 2023
- Semes Co., Ltd.
- Jung Hwan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of wafer bow in multiple stations
- Patent number 11,823,928
- Issue date Nov 21, 2023
- Lam Research Corporation
- Edward Augustyniak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hardware switch on main feed line in a radio frequency plasma proce...
- Patent number 11,823,868
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,804,364
- Issue date Oct 31, 2023
- ASM IP Holding B.V.
- ChangMin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency tuning for modulated plasma systems
- Patent number 11,804,362
- Issue date Oct 31, 2023
- Advanced Energy Industries, Inc.
- Gideon van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Probe for measuring plasma parameters
- Patent number 11,800,627
- Issue date Oct 24, 2023
- Ruhr-Universität Bochum
- Dennis Pohle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling plasma in a plasma processing...
- Patent number 11,798,784
- Issue date Oct 24, 2023
- Lam Research Corporation
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,791,135
- Issue date Oct 17, 2023
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Differential capacitive sensors for in-situ film thickness and diel...
- Patent number 11,781,214
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Patrick Tae
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Performing radio frequency matching control using a model-based dig...
- Patent number 11,784,028
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Tao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and power supply control method
- Patent number 11,776,795
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Apparatus and Method for Reducing Substrate Thickness and Surface R...
- Publication number 20240128066
- Publication date Apr 18, 2024
- SPTS TECHNOLOGIES LIMITED
- Roland Mumford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240120187
- Publication date Apr 11, 2024
- TOKYO ELECTRON LIMITED
- Hironari SASAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA HYPERMODEL INTEGRATED WITH FEATURE-SCALE PROFILE MODEL FOR A...
- Publication number 20240120186
- Publication date Apr 11, 2024
- KLA Corporation
- Chad HUARD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING...
- Publication number 20240096608
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Satoru TERUUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF PLASMA PROCESSING COMPONENTS
- Publication number 20240079213
- Publication date Mar 7, 2024
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM, METHOD, AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTI...
- Publication number 20240071721
- Publication date Feb 29, 2024
- Advanced Energy Industries, Inc.
- Victor Brouk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING DEVICE AND METHOD FOR MEASURING PARAMETERS OF A PIEZOELEC...
- Publication number 20240053301
- Publication date Feb 15, 2024
- Evatec AG
- Peter HORN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Process Control of Multi-Electrode Systems Equipped with Ion...
- Publication number 20240055228
- Publication date Feb 15, 2024
- MKS Instruments, Inc.
- Linnell MARTINEZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF WAFER BOW IN MULTIPLE STATIONS
- Publication number 20240055285
- Publication date Feb 15, 2024
- LAM RESEARCH CORPORATION
- Edward Augustyniak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS TO CONTROL ION ENERGY
- Publication number 20240055225
- Publication date Feb 15, 2024
- Advanced Energy Industries, Inc.
- Victor Brouk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20240038494
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Maju TOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240038511
- Publication date Feb 1, 2024
- Panasonic Intellectual Property Management Co., Ltd.
- Hiroshi SHIROUZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240030012
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING PLASMA IN A PLASMA PROCESSING...
- Publication number 20240021408
- Publication date Jan 18, 2024
- LAM RESEARCH CORPORATION
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTOR AND COMBINER FOR CONTROL LAW MODULES OF AN ADAPTIVE ENGINE
- Publication number 20240014017
- Publication date Jan 11, 2024
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL CAPACITIVE SENSOR FOR IN-SITU FILM THICKNESS AND DIELE...
- Publication number 20240002999
- Publication date Jan 4, 2024
- Applied Materials, Inc.
- PATRICK TAE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA REACTOR HAVING ARRAY OF COAXIAL MULTIPLE PINS AND PROCESSING...
- Publication number 20240006162
- Publication date Jan 4, 2024
- HANGZHOU CITY UNIVERSITY
- QI QIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240006165
- Publication date Jan 4, 2024
- TOKYO ELECTRON LIMITED
- Yoshihiro YANAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADAPTIVE ENGINE WITH IDENTITY MAPPING MODULES
- Publication number 20240006169
- Publication date Jan 4, 2024
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230420227
- Publication date Dec 28, 2023
- ASM IP HOLDING B.V.
- ChangMin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230420228
- Publication date Dec 28, 2023
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY CONTROL METHOD
- Publication number 20230411128
- Publication date Dec 21, 2023
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS AND PLASMA IGNITION METHOD
- Publication number 20230411120
- Publication date Dec 21, 2023
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Jing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA IGNITION VALIDATION IN A PLASMA-ASSISTED WAFER PROCESS BACKG...
- Publication number 20230402270
- Publication date Dec 14, 2023
- ASM IP HOLDING, B.V.
- BeomGyu Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20230395354
- Publication date Dec 7, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF BIAS SUPPLIES
- Publication number 20230395355
- Publication date Dec 7, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS WITH SWITCHES TO PRODUCE A WAVEFORM
- Publication number 20230377840
- Publication date Nov 23, 2023
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR TRANSMISSION AND DETECTION OF FREE RADICALS
- Publication number 20230375474
- Publication date Nov 23, 2023
- Wisconsin Alumni Research Foundation
- J. Leon Shohet
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
APPARATUS TO PRODUCE A WAVEFORM
- Publication number 20230377839
- Publication date Nov 23, 2023
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS TO CONTROL A WAVEFORM
- Publication number 20230369016
- Publication date Nov 16, 2023
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS

Monitoring and controlling tubes by information coming from the object and/or discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Forming method of component and substrate processing system

Apparatus with switches to produce a waveform

Cylindrical cavity with impedance shifting by irises in a power-sup...

Dynamic phased array plasma source for complete plasma coverage of...

Glow plasma gas measurement signal processing

Calibration jig and calibration method

Plasma processing apparatus, plasma state detection method, and pla...

Temperature measurement for substrate carrier using a heater elemen...

Method of adjusting the output power of a power supply supplying el...

Plasma processing method

Apparatus for ion energy analysis of plasma processes

Power and data transmission to substrate support in plasma chambers...

Methods and systems to modulate film stress

High frequency power source allowing arbitrary setting of temporal...

Plasma processing apparatus

Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis...

Plasma processing method and plasma processing apparatus

Methods and apparatus for microwave plasma assisted chemical vapor...

Spatial monitoring and control of plasma processing environments

Substrate treating apparatus

Control of wafer bow in multiple stations

Hardware switch on main feed line in a radio frequency plasma proce...

Substrate processing apparatus

Frequency tuning for modulated plasma systems

Probe for measuring plasma parameters

Methods and apparatus for controlling plasma in a plasma processing...

Plasma processing apparatus and plasma processing method

Differential capacitive sensors for in-situ film thickness and diel...

Performing radio frequency matching control using a model-based dig...

Plasma processing apparatus and power supply control method

Patents Applicationslast 30 patents

Apparatus and Method for Reducing Substrate Thickness and Surface R...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA HYPERMODEL INTEGRATED WITH FEATURE-SCALE PROFILE MODEL FOR A...

PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING...

SYNCHRONIZATION OF PLASMA PROCESSING COMPONENTS

SYSTEM, METHOD, AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTI...

MEASURING DEVICE AND METHOD FOR MEASURING PARAMETERS OF A PIEZOELEC...

Plasma Process Control of Multi-Electrode Systems Equipped with Ion...

CONTROL OF WAFER BOW IN MULTIPLE STATIONS

APPARATUS TO CONTROL ION ENERGY

ETCHING METHOD AND ETCHING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

DETECTION METHOD AND PLASMA PROCESSING APPARATUS

METHODS AND APPARATUS FOR CONTROLLING PLASMA IN A PLASMA PROCESSING...

SELECTOR AND COMBINER FOR CONTROL LAW MODULES OF AN ADAPTIVE ENGINE

DIFFERENTIAL CAPACITIVE SENSOR FOR IN-SITU FILM THICKNESS AND DIELE...

PLASMA REACTOR HAVING ARRAY OF COAXIAL MULTIPLE PINS AND PROCESSING...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ADAPTIVE ENGINE WITH IDENTITY MAPPING MODULES

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND POWER SUPPLY CONTROL METHOD

SEMICONDUCTOR PROCESS APPARATUS AND PLASMA IGNITION METHOD

PLASMA IGNITION VALIDATION IN A PLASMA-ASSISTED WAFER PROCESS BACKG...

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

SYNCHRONIZATION OF BIAS SUPPLIES

APPARATUS WITH SWITCHES TO PRODUCE A WAVEFORM

METHODS AND SYSTEMS FOR TRANSMISSION AND DETECTION OF FREE RADICALS

APPARATUS TO PRODUCE A WAVEFORM

APPARATUS TO CONTROL A WAVEFORM