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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

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Industries

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Patents Grantslast 30 patents

Information Patent Grant
Nanopositioning systems and associated methods
- Patent number 12,266,501
- Issue date Apr 1, 2025
- The Texas A&M University System
- ChaBum Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for sputtering and depositing metal on surface of...
- Patent number 12,266,513
- Issue date Apr 1, 2025
- Lanzhou Institute of Chemical Physics, CAS
- Bin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,266,562
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Hajime Naito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system and control method therefor
- Patent number 12,261,013
- Issue date Mar 25, 2025
- Jeol Ltd.
- Takeshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection apparatus
- Patent number 12,261,015
- Issue date Mar 25, 2025
- NuFlare Technology, Inc.
- Atsushi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D fiducial for precision 3D NAND channel tilt/shift analysis
- Patent number 12,260,583
- Issue date Mar 25, 2025
- FEI Company
- Mark Najarian
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,028
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Shuichi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and support for coating eyeglass lenses
- Patent number 12,261,031
- Issue date Mar 25, 2025
- Schneider GmbH & Co. KG
- Gunter Schneider
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method for producing layers with improved uniformity in...
- Patent number 12,258,661
- Issue date Mar 25, 2025
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Michael Vergöhl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nano-coating protection method for electrical devices
- Patent number 12,252,789
- Issue date Mar 18, 2025
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scanning electron microscope and image generation method using scan...
- Patent number 12,255,043
- Issue date Mar 18, 2025
- Jeol Ltd.
- Takeshi Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to eliminate of deposition on wafer bevel and backside
- Patent number 12,255,054
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holding device
- Patent number 12,249,479
- Issue date Mar 11, 2025
- Nissin Ion Equipment Co., Ltd.
- Yusuke Otsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus including electrostatic chuck, subst...
- Patent number 12,243,727
- Issue date Mar 4, 2025
- Semes Co., Ltd.
- Dong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lift pin interface in a substrate support
- Patent number 12,237,200
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Alexander Sulyman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature-controlled surface with a cryo-nanomanipulator for impr...
- Patent number 12,230,473
- Issue date Feb 18, 2025
- Applied Materials Israel Ltd.
- Yehuda Zur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas mixing method to enhance plasma
- Patent number 12,224,159
- Issue date Feb 11, 2025
- SKY TECH INC.
- Ta-Hao Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,211,669
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,211,665
- Issue date Jan 28, 2025
- HITACHI HIGH-TECH CORPORATION
- Akito Tanokuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for metal and ceramic nanolayering for acciden...
- Patent number 12,211,679
- Issue date Jan 28, 2025
- Starfire Industries LLC
- Brian E. Jurczyk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing film and film deposition system
- Patent number 12,205,817
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inert gas sample transfer for beam systems
- Patent number 12,183,539
- Issue date Dec 31, 2024
- FEI Company
- Libor Novák
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with thermal processing systems
- Patent number 12,183,558
- Issue date Dec 31, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dixit Desai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus, semiconductor device and man...
- Patent number 12,183,538
- Issue date Dec 31, 2024
- Kioxia Corporation
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of hysteresis compensation
- Patent number 12,183,537
- Issue date Dec 31, 2024
- FEI Company
- Edwin Verschueren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, device and system for reducing off-axial aberration in elec...
- Patent number 12,176,179
- Issue date Dec 24, 2024
- FEI Company
- Maarten Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning ion beam deposition and etch
- Patent number 12,176,178
- Issue date Dec 24, 2024
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating apparatus and coating method
- Patent number 12,170,189
- Issue date Dec 17, 2024
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,165,854
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing equipment and surface processing method
- Patent number 12,154,768
- Issue date Nov 26, 2024
- Industrial Technology Research Institute
- Chih-Chieh Chen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF ASSESSING A SAMPLE, APPARATUS FOR ASSESSING A SAMPLE
- Publication number 20250116587
- Publication date Apr 10, 2025
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES FOR BACKSIDE WAFER PROCESSING WITH EDGE-ONLY WAFER CONTACT
- Publication number 20250118592
- Publication date Apr 10, 2025
- LAM RESEARCH CORPORATION
- Nick Ray Linebarger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM ANGLE ROTATION AND SAMPLE ROTATION
- Publication number 20250104963
- Publication date Mar 27, 2025
- Carl Zeiss SMT GMBH
- Thomas Korb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave Capillary Nanodiamond Reactor
- Publication number 20250101577
- Publication date Mar 27, 2025
- Board of Trustees of Michigan State University
- Tanvi NIKHAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SAMPLE CARRIER AND USES THEREOF
- Publication number 20250104962
- Publication date Mar 27, 2025
- FEI Company
- Christopher Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONOSCOPIC WAFER ORIENTATION APPARATUS AND ION IMPLANTER INCLUDING...
- Publication number 20250095952
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Ori Noked
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION
- Publication number 20250095958
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Frank SINCLAIR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHALLOW ETCHING PROCESS CHAMBER
- Publication number 20250087467
- Publication date Mar 13, 2025
- VM Inc.
- Sang Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT APPARATUS
- Publication number 20250079126
- Publication date Mar 6, 2025
- SHIBAURA MACHINE CO., LTD.
- Rintaro SUEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Vacuum Rotatable RF Component
- Publication number 20250079116
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Michael Mason Carrell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PASSIVE LIFT PIN ASSEMBLY
- Publication number 20250079137
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Thomas BREZOCZKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING MET...
- Publication number 20250069869
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Jonghwa LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250069862
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Nobutaka SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, A...
- Publication number 20250069871
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Jonghwa LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL BEAM SYSTEMS AND METHODS FOR DECOUPLING THE WORKING DISTANCE O...
- Publication number 20250069958
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Alex Buxbaum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20250069848
- Publication date Feb 27, 2025
- KIOXIA Corporation
- Kazuya HATANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROSCOPY SAMPLE PREPARATION METHODS AND ASSOCIATED SYSTEMS
- Publication number 20250060289
- Publication date Feb 20, 2025
- FEI Company
- Petra Binknerová
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR SUBSTRATE SUPPORT LEVELING APPARATUS
- Publication number 20250054797
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Katherine Woo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS MIXING METHOD TO ENHANCE PLASMA
- Publication number 20250054732
- Publication date Feb 13, 2025
- SKY TECH INC.
- TA-HAO KUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD FACEPLATE CONFIGURATIONS
- Publication number 20250054734
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Bin LUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU MECHANICAL MICRO-ELECTRO-MECHANICAL DEVICE AND SYSTEM, AS W...
- Publication number 20250054725
- Publication date Feb 13, 2025
- BEIJING UNIVERSITY OF TECHNOLOGY
- Xiaodong HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device
- Publication number 20250046567
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONCURRENT OR CYCLICAL ETCH AND DIRECTIONAL DEPOSITION
- Publication number 20250046601
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Morgan EVANS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER FOR SUBSTRATE BACKSIDE AND BEVEL DEPOSITION
- Publication number 20250037974
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION
- Publication number 20250037961
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Martin Frans, Pierre SMEETS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
JIG AND SAMPLE PROCESSING METHOD
- Publication number 20250037964
- Publication date Jan 30, 2025
- KIOXIA Corporation
- Takafumi INAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-DIFFERENTIAL CONFOCAL TILT SENSOR FOR MEASURING LEVEL VARIATIO...
- Publication number 20250037966
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Jinmei YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR SUBSTRATE, APPARATUS, AND METHOD
- Publication number 20250029811
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Arthur Eduard OVERLACK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR MANIPULATING A MICROSCOPIC SAMPLE
- Publication number 20250022677
- Publication date Jan 16, 2025
- FEI Company
- Joseph M. Lebow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...
- Publication number 20250022694
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Pranav Vijay Gadre
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Nanopositioning systems and associated methods

Device and method for sputtering and depositing metal on surface of...

Substrate processing method and substrate processing apparatus

Charged particle beam system and control method therefor

Electron beam inspection apparatus

3D fiducial for precision 3D NAND channel tilt/shift analysis

Plasma processing apparatus

System, method and support for coating eyeglass lenses

Device and method for producing layers with improved uniformity in...

Nano-coating protection method for electrical devices

Scanning electron microscope and image generation method using scan...

Methods to eliminate of deposition on wafer bevel and backside

Substrate holding device

Substrate processing apparatus including electrostatic chuck, subst...

Lift pin interface in a substrate support

Temperature-controlled surface with a cryo-nanomanipulator for impr...

Gas mixing method to enhance plasma

Multiple charged-particle beam apparatus with low crosstalk

Charged particle beam device

Method and apparatus for metal and ceramic nanolayering for acciden...

Method for depositing film and film deposition system

Inert gas sample transfer for beam systems

Workpiece processing apparatus with thermal processing systems

Semiconductor manufacturing apparatus, semiconductor device and man...

Systems and methods of hysteresis compensation

Method, device and system for reducing off-axial aberration in elec...

Scanning ion beam deposition and etch

Coating apparatus and coating method

Substrate support and substrate processing apparatus

Surface processing equipment and surface processing method

Patents Applicationslast 30 patents

METHOD OF ASSESSING A SAMPLE, APPARATUS FOR ASSESSING A SAMPLE

APPARATUSES FOR BACKSIDE WAFER PROCESSING WITH EDGE-ONLY WAFER CONTACT

BEAM ANGLE ROTATION AND SAMPLE ROTATION

Microwave Capillary Nanodiamond Reactor

SAMPLE CARRIER AND USES THEREOF

CONOSCOPIC WAFER ORIENTATION APPARATUS AND ION IMPLANTER INCLUDING...

CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION

SHALLOW ETCHING PROCESS CHAMBER

SURFACE TREATMENT APPARATUS

In-Vacuum Rotatable RF Component

PASSIVE LIFT PIN ASSEMBLY

PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING MET...

SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS

SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, A...

DUAL BEAM SYSTEMS AND METHODS FOR DECOUPLING THE WORKING DISTANCE O...

CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF

MICROSCOPY SAMPLE PREPARATION METHODS AND ASSOCIATED SYSTEMS

SEMICONDUCTOR SUBSTRATE SUPPORT LEVELING APPARATUS

GAS MIXING METHOD TO ENHANCE PLASMA

SHOWERHEAD FACEPLATE CONFIGURATIONS

IN-SITU MECHANICAL MICRO-ELECTRO-MECHANICAL DEVICE AND SYSTEM, AS W...

Ion Milling Device

CONCURRENT OR CYCLICAL ETCH AND DIRECTIONAL DEPOSITION

CHAMBER FOR SUBSTRATE BACKSIDE AND BEVEL DEPOSITION

BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION

JIG AND SAMPLE PROCESSING METHOD

SELF-DIFFERENTIAL CONFOCAL TILT SENSOR FOR MEASURING LEVEL VARIATIO...

SENSOR SUBSTRATE, APPARATUS, AND METHOD

APPARATUS AND METHOD FOR MANIPULATING A MICROSCOPIC SAMPLE

HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...