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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/202Movement

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method, apparatus, and system for dynamically controlling an electr...
- Patent number 12,368,067
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Yixiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for improved high pressure plasma processing
- Patent number 12,368,028
- Issue date Jul 22, 2025
- Applied Materials, Inc.
- William R. Johanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition method and deposition apparatus
- Patent number 12,368,030
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for uniform ion milling
- Patent number 12,362,130
- Issue date Jul 15, 2025
- E. A. Fischione Instruments, Inc.
- Paul E Fischione
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated sample alignment for microscopy
- Patent number 12,362,137
- Issue date Jul 15, 2025
- FEI Company
- John Flanagan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and substrate processing apparatus
- Patent number 12,362,142
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Takashi Chiba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 12,354,871
- Issue date Jul 8, 2025
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming plasma coating
- Patent number 12,347,652
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Lance A. Scudder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microscope stage fixture for horizontal rotation
- Patent number 12,340,971
- Issue date Jun 24, 2025
- Gabriel Demeneghi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing target material in deposition chamber with ti...
- Patent number 12,341,042
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsuan-Chih Chu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 12,341,001
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Wakako Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle gun, charged particle beam system, and lock nut
- Patent number 12,334,298
- Issue date Jun 17, 2025
- HITACHI HIGH-TECH CORPORATION
- Teruaki Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Auto-focus sensor implementation for multi-column microscopes
- Patent number 12,322,568
- Issue date Jun 3, 2025
- KLA Corporation
- Nicholas Petrone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table structure, substrate processing apparatus, and metho...
- Patent number 12,315,707
- Issue date May 27, 2025
- Tokyo Electron Limited
- Motoi Yamagata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carrier device, semiconductor apparatus, and residual charge detect...
- Patent number 12,315,706
- Issue date May 27, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jian Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with plasma and thermal processing s...
- Patent number 12,308,209
- Issue date May 20, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of post-curing additive manufacturing parts using electron...
- Patent number 12,285,915
- Issue date Apr 29, 2025
- Ford Global Technologies, LLC
- Christopher Michael Seubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertically adjustable plasma source
- Patent number 12,288,677
- Issue date Apr 29, 2025
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanopositioning systems and associated methods
- Patent number 12,266,501
- Issue date Apr 1, 2025
- The Texas A&M University System
- ChaBum Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for sputtering and depositing metal on surface of...
- Patent number 12,266,513
- Issue date Apr 1, 2025
- Lanzhou Institute of Chemical Physics, CAS
- Bin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,266,562
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Hajime Naito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system and control method therefor
- Patent number 12,261,013
- Issue date Mar 25, 2025
- Jeol Ltd.
- Takeshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection apparatus
- Patent number 12,261,015
- Issue date Mar 25, 2025
- NuFlare Technology, Inc.
- Atsushi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D fiducial for precision 3D NAND channel tilt/shift analysis
- Patent number 12,260,583
- Issue date Mar 25, 2025
- FEI Company
- Mark Najarian
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,028
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Shuichi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and support for coating eyeglass lenses
- Patent number 12,261,031
- Issue date Mar 25, 2025
- Schneider GmbH & Co. KG
- Gunter Schneider
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method for producing layers with improved uniformity in...
- Patent number 12,258,661
- Issue date Mar 25, 2025
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Michael Vergöhl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nano-coating protection method for electrical devices
- Patent number 12,252,789
- Issue date Mar 18, 2025
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scanning electron microscope and image generation method using scan...
- Patent number 12,255,043
- Issue date Mar 18, 2025
- Jeol Ltd.
- Takeshi Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to eliminate of deposition on wafer bevel and backside
- Patent number 12,255,054
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLE PARTICLE BEAM SYSTEM WITH PROLONGED MAINTENANCE INTERVAL
- Publication number 20250232943
- Publication date Jul 17, 2025
- Carl Zeiss MultiSEM GmbH
- Ticia Buhr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shield for an Ion Implanter
- Publication number 20250232949
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Tseh-Jen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20250232963
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Motoi YAMAGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICALLY ADJUSTABLE PLASMA SOURCE
- Publication number 20250232964
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EFFICIENT DECHUCKING AND PARTICLE MANAGEMENT IN PROCESS CHAMBERS
- Publication number 20250226255
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Arvinder Manmohan Singh Chadha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STRESS MANAGEMENT USING DIRECT SELECTIVE AREA PROCESSING
- Publication number 20250218788
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Morgan EVANS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
- Publication number 20250201531
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Chan Young CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSTALLATION, METHOD, AND CARRIER FOR COATING EYEGLASS LENSES
- Publication number 20250191900
- Publication date Jun 12, 2025
- SCHNEIDER GMBH & CO. KG
- Gunter SCHNEIDER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Apparatus
- Publication number 20250174441
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Naoya FUKUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIFT PIN INTERFACE IN A SUBSTRATE SUPPORT
- Publication number 20250167030
- Publication date May 22, 2025
- Applied Materials, Inc.
- Alexander SULYMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE ADJUSTMENT METHOD AND CHARGED PARTICLE...
- Publication number 20250157785
- Publication date May 15, 2025
- HITACHI HIGH-TECH CORPORATION
- Hidenori MACHIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, METHOD OF MANUFACTURING ELECTROSTATIC CHUCK, A...
- Publication number 20250157795
- Publication date May 15, 2025
- SEMES CO., LTD.
- Jun Seok PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING IRREGULARITIES WITHIN A PLASMA-BAS...
- Publication number 20250157794
- Publication date May 15, 2025
- Applied Materials, Inc.
- Sheng Yi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING CHAMBER WITH A ROTATABLE PEDESTAL HUB
- Publication number 20250157796
- Publication date May 15, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device
- Publication number 20250149287
- Publication date May 8, 2025
- Hitachi High-Tech Corporation
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device, and Inspection System
- Publication number 20250149288
- Publication date May 8, 2025
- Hitachi High-Tech Corporation
- Naohiro FUJITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING MACHINE AND LOWER ELECTRODE STRUCTURE THEREOF
- Publication number 20250140512
- Publication date May 1, 2025
- JIANGSU LEUVEN INSTRUMENTS CO., LTD.
- Huaidong ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU BACK SIDE PLASMA TREATMENT FOR RESIDUE REMOVAL FROM SUBSTRATES
- Publication number 20250140530
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- Tu HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...
- Publication number 20250140521
- Publication date May 1, 2025
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250140534
- Publication date May 1, 2025
- SEMES CO., LTD.
- Young Seo AN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSESSMENT APPARATUS AND METHODS
- Publication number 20250132122
- Publication date Apr 24, 2025
- ASML NETHERLANDS B.V.
- Thomas Izaak Fred HAARTSEN
- G01 - MEASURING TESTING
Information Patent Application
Charged Particle Beam Device
- Publication number 20250132123
- Publication date Apr 24, 2025
- Hitachi High-Tech Corporation
- Hiroyuki YAMAMOTO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TWO-ELECTRODE CONTINUOUS PLASMA PROCESSING SYSTEM
- Publication number 20250125121
- Publication date Apr 17, 2025
- UVAT TECHNOLOGY CO.,LTD.
- YUAN-CHI LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20250125132
- Publication date Apr 17, 2025
- TOKYO ELECTRON LIMITED
- Naoki KUBOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TESTING ASSEMBLY INCLUDING A MULTIPLE DEGREE OF FREEDOM STAGE
- Publication number 20250123192
- Publication date Apr 17, 2025
- Bruker Nano, Inc.
- Edward Cyrankowski
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF ASSESSING A SAMPLE, APPARATUS FOR ASSESSING A SAMPLE
- Publication number 20250116587
- Publication date Apr 10, 2025
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES FOR BACKSIDE WAFER PROCESSING WITH EDGE-ONLY WAFER CONTACT
- Publication number 20250118592
- Publication date Apr 10, 2025
- LAM RESEARCH CORPORATION
- Nick Ray Linebarger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM ANGLE ROTATION AND SAMPLE ROTATION
- Publication number 20250104963
- Publication date Mar 27, 2025
- Carl Zeiss SMT GMBH
- Thomas Korb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave Capillary Nanodiamond Reactor
- Publication number 20250101577
- Publication date Mar 27, 2025
- Board of Trustees of Michigan State University
- Tanvi NIKHAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SAMPLE CARRIER AND USES THEREOF
- Publication number 20250104962
- Publication date Mar 27, 2025
- FEI Company
- Christopher Thompson
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method, apparatus, and system for dynamically controlling an electr...

Apparatus for improved high pressure plasma processing

Deposition method and deposition apparatus

System and method for uniform ion milling

Automated sample alignment for microscopy

Plasma processing method and substrate processing apparatus

Ultrathin atomic layer deposition film accuracy thickness control

Method for forming plasma coating

Microscope stage fixture for horizontal rotation

Method for depositing target material in deposition chamber with ti...

Cleaning method and plasma processing apparatus

Charged particle gun, charged particle beam system, and lock nut

Auto-focus sensor implementation for multi-column microscopes

Mounting table structure, substrate processing apparatus, and metho...

Carrier device, semiconductor apparatus, and residual charge detect...

Workpiece processing apparatus with plasma and thermal processing s...

Methods of post-curing additive manufacturing parts using electron...

Vertically adjustable plasma source

Nanopositioning systems and associated methods

Device and method for sputtering and depositing metal on surface of...

Substrate processing method and substrate processing apparatus

Charged particle beam system and control method therefor

Electron beam inspection apparatus

3D fiducial for precision 3D NAND channel tilt/shift analysis

Plasma processing apparatus

System, method and support for coating eyeglass lenses

Device and method for producing layers with improved uniformity in...

Nano-coating protection method for electrical devices

Scanning electron microscope and image generation method using scan...

Methods to eliminate of deposition on wafer bevel and backside

Patents Applicationslast 30 patents

MULTIPLE PARTICLE BEAM SYSTEM WITH PROLONGED MAINTENANCE INTERVAL

Shield for an Ion Implanter

Substrate Processing Apparatus

VERTICALLY ADJUSTABLE PLASMA SOURCE

EFFICIENT DECHUCKING AND PARTICLE MANAGEMENT IN PROCESS CHAMBERS

SUBSTRATE STRESS MANAGEMENT USING DIRECT SELECTIVE AREA PROCESSING

HEATING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

INSTALLATION, METHOD, AND CARRIER FOR COATING EYEGLASS LENSES

Substrate Processing Apparatus

LIFT PIN INTERFACE IN A SUBSTRATE SUPPORT

CHARGED PARTICLE BEAM DEVICE ADJUSTMENT METHOD AND CHARGED PARTICLE...

ELECTROSTATIC CHUCK, METHOD OF MANUFACTURING ELECTROSTATIC CHUCK, A...

SYSTEMS AND METHODS FOR REDUCING IRREGULARITIES WITHIN A PLASMA-BAS...

PROCESSING CHAMBER WITH A ROTATABLE PEDESTAL HUB

Ion Milling Device

Ion Milling Device, and Inspection System

ION BEAM ETCHING MACHINE AND LOWER ELECTRODE STRUCTURE THEREOF

IN-SITU BACK SIDE PLASMA TREATMENT FOR RESIDUE REMOVAL FROM SUBSTRATES

MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

ASSESSMENT APPARATUS AND METHODS

Charged Particle Beam Device

TWO-ELECTRODE CONTINUOUS PLASMA PROCESSING SYSTEM

Substrate Processing Apparatus

TESTING ASSEMBLY INCLUDING A MULTIPLE DEGREE OF FREEDOM STAGE

METHOD OF ASSESSING A SAMPLE, APPARATUS FOR ASSESSING A SAMPLE

APPARATUSES FOR BACKSIDE WAFER PROCESSING WITH EDGE-ONLY WAFER CONTACT

BEAM ANGLE ROTATION AND SAMPLE ROTATION

Microwave Capillary Nanodiamond Reactor

SAMPLE CARRIER AND USES THEREOF