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Plasma processing apparatus
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Patent number 11,961,710
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Issue date Apr 16, 2024
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Canon Anelva Corporation
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Tadashi Inoue
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Semiconductor wafer
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Patent number 11,929,229
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Issue date Mar 12, 2024
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MI2-FACTORY GMBH
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Florian Krippendorf
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Charged particle beam device
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Patent number 11,929,231
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Issue date Mar 12, 2024
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HITACHI HIGH-TECH CORPORATION
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Akito Tanokuchi
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H01 - BASIC ELECTRIC ELEMENTS
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Wafer supporting device
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Patent number 11,929,266
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Issue date Mar 12, 2024
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NISSIN ION EQUIPMENT CO., LTD.
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Takashi Sakamoto
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H01 - BASIC ELECTRIC ELEMENTS
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Ion milling device
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Patent number 11,894,213
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Issue date Feb 6, 2024
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HITACHI HIGH-TECH CORPORATION
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Asako Kaneko
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H01 - BASIC ELECTRIC ELEMENTS
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