Multilayer resist systems

Industry

CPC
G03F7/094

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/094Multilayer resist systems

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Planarization method and photocurable composition
- Patent number 12,179,231
- Issue date Dec 31, 2024
- Canon Kabushiki Kaisha
- Toshiki Ito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,174,540
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for resist underlayer, and pattern forming method using...
- Patent number 12,130,552
- Issue date Oct 29, 2024
- Samsung SDI Co., Ltd.
- Yoojeong Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film processing method
- Patent number 12,119,242
- Issue date Oct 15, 2024
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating-type composition for forming organic film, patterning proce...
- Patent number 12,105,420
- Issue date Oct 1, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keisuke Niida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Forming variable depth structures with laser ablation
- Patent number 12,099,241
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Peter Kurunczi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method of patterning a substrate using a sidewall spacer etch mask
- Patent number 12,099,299
- Issue date Sep 24, 2024
- Tokyo Electron Limited
- Jodi Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow cells
- Patent number 12,085,499
- Issue date Sep 10, 2024
- Illumina, Inc.
- Sahngki Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing novolac resin...
- Patent number 12,072,629
- Issue date Aug 27, 2024
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist structure, patterned deposition layer, semiconductor ch...
- Patent number 12,040,188
- Issue date Jul 16, 2024
- Tencent Technology (Shenzhen) Company Limited
- Wenlong Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing multi-layered type microchannel device using p...
- Patent number 12,032,286
- Issue date Jul 9, 2024
- Asahi Kasei Kabushiki Kaisha
- Hidenori Nagai
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,013,640
- Issue date Jun 18, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi Nakahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Rapid large-scale fabrication of metasurfaces with complex unit cells
- Patent number 12,007,695
- Issue date Jun 11, 2024
- Board of Regents, The University of Texas System
- Robert Magnusson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dose reduction of patterned metal oxide photoresists
- Patent number 11,994,800
- Issue date May 28, 2024
- Applied Materials, Inc.
- Tejinder Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image sensor device and manufacturing method thereof
- Patent number 11,996,432
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Chao Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Underlayer for photoresist adhesion and dose reduction
- Patent number 11,988,965
- Issue date May 21, 2024
- Lam Research Corporation
- Samantha S. H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 11,990,339
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming patterns using resist underlayer composition
- Patent number 11,982,943
- Issue date May 14, 2024
- Samsung SDI Co., Ltd.
- Jaeyeol Baek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solvent compatible nozzle plate
- Patent number 11,958,292
- Issue date Apr 16, 2024
- Funai Electric Co., Ltd.
- Sean T. Weaver
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 11,948,797
- Issue date Apr 2, 2024
- Mitsubishi Electric Corporation
- Takahiro Ueno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating compositions and methods of forming electronic devices
- Patent number 11,940,732
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomers, polymers and lithographic compositions comprising same
- Patent number 11,932,713
- Issue date Mar 19, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fabricating a device using a multilayer stack
- Patent number 11,935,748
- Issue date Mar 19, 2024
- Google LLC
- Anthony Edward Megrant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sulfonium salt, photoacid generator, curable composition, and resis...
- Patent number 11,926,581
- Issue date Mar 12, 2024
- SAN-APRO LIMITED
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Hard mask-forming composition and method for manufacturing electron...
- Patent number 11,921,425
- Issue date Mar 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyethylene film and dry film resist
- Patent number 11,914,297
- Issue date Feb 27, 2024
- TAMAPOLY CO., LTD.
- Shinichi Oya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Ethynyl derived composite, a composition comprising thereof, a meth...
- Patent number 11,914,296
- Issue date Feb 27, 2024
- Merck Patent GmbH
- Shigemasa Nakasugi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Material for forming underlayer film, resist underlayer film, metho...
- Patent number 11,886,119
- Issue date Jan 30, 2024
- Mitsui Chemicals, Inc.
- Koji Inoue
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
FLOW CELLS
- Publication number 20240418630
- Publication date Dec 19, 2024
- Illumina, Inc.
- Sahngki Hong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material For Forming Organic Film, Patterning Process, And Organic...
- Publication number 20240402605
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240393690
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Tse Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIS...
- Publication number 20240377740
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Jooyoung Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES
- Publication number 20240377744
- Publication date Nov 14, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20240355632
- Publication date Oct 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yasuyuki YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20240345483
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Underlayer Film Material, Pattern Forming Method, And Method...
- Publication number 20240337944
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHIP PREPARATION METHOD AND SYSTEM, AND CHIP
- Publication number 20240334843
- Publication date Oct 3, 2024
- TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
- Jingjing HU
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
- Publication number 20240327321
- Publication date Oct 3, 2024
- Samsung SDI Co., Ltd.
- Seil CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Silicon-Containing Resist Underlayer Film A...
- Publication number 20240319598
- Publication date Sep 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takehiro SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240321585
- Publication date Sep 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20240310732
- Publication date Sep 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240295816
- Publication date Sep 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Patterning Process
- Publication number 20240297041
- Publication date Sep 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240282575
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE SENSOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240274637
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Chao CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
- Publication number 20240255850
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Samantha S.H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240248404
- Publication date Jul 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240241445
- Publication date Jul 18, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SOLVENT COMPATIBLE NOZZLE PLATE
- Publication number 20240198675
- Publication date Jun 20, 2024
- Funai Electric Co., Ltd.
- Sean T. WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240201595
- Publication date Jun 20, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MANUFACTURING METHOD OF METAL MASK AND METAL MASK THEREOF
- Publication number 20240192600
- Publication date Jun 13, 2024
- Darwin Precisions Corporation
- Cheng-Wei Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL
- Publication number 20240192601
- Publication date Jun 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tzu-Yang LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DESIGN, CONTROL, AND OPTIMIZATION OF PHOTOSENSITIVITY MODULATION AL...
- Publication number 20240194484
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- RUIYING HAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATING A DEVICE USING A MULTILAYER STACK
- Publication number 20240186143
- Publication date Jun 6, 2024
- Google LLC
- Anthony Edward Megrant
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST UNDERLAYER COMPOSITION
- Publication number 20240126172
- Publication date Apr 18, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Anton CHAVEZ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240116958
- Publication date Apr 11, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for Making Probe Arrays Utilizing Deformed Templates
- Publication number 20240094636
- Publication date Mar 21, 2024
- Microfabrica Inc.
- Onnik Yaglioglu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-METAL FILL WITH SELF-ALIGNED PATTERNING AND DIELECTRIC WITH V...
- Publication number 20240085803
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-I YANG
- H01 - BASIC ELECTRIC ELEMENTS

Multilayer resist systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Planarization method and photocurable composition

Method of manufacturing a semiconductor device

Resist underlayer film material, patterning process, and method for...

Photocurable composition and method for producing semiconductor device

Composition for resist underlayer, and pattern forming method using...

Film processing method

Coating-type composition for forming organic film, patterning proce...

Forming variable depth structures with laser ablation

Method of patterning a substrate using a sidewall spacer etch mask

Flow cells

Resist underlayer film-forming composition containing novolac resin...

Photoresist structure, patterned deposition layer, semiconductor ch...

Method for producing multi-layered type microchannel device using p...

Resist underlayer film material, patterning process, and method for...

Rapid large-scale fabrication of metasurfaces with complex unit cells

Dose reduction of patterned metal oxide photoresists

Image sensor device and manufacturing method thereof

Underlayer for photoresist adhesion and dose reduction

Semiconductor device and method of manufacture

Method of forming patterns using resist underlayer composition

Solvent compatible nozzle plate

Method for manufacturing semiconductor device

Coating compositions and methods of forming electronic devices

Monomers, polymers and lithographic compositions comprising same

Fabricating a device using a multilayer stack

Sulfonium salt, photoacid generator, curable composition, and resis...

Hard mask-forming composition and method for manufacturing electron...

Polyethylene film and dry film resist

Ethynyl derived composite, a composition comprising thereof, a meth...

Material for forming underlayer film, resist underlayer film, metho...

Patents Applicationslast 30 patents

FLOW CELLS

Material For Forming Organic Film, Patterning Process, And Organic...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIS...

LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES

Composition For Forming Organic Film, Method For Forming Organic Fi...

Method For Forming Resist Underlayer Film And Patterning Process

Resist Underlayer Film Material, Pattern Forming Method, And Method...

CHIP PREPARATION METHOD AND SYSTEM, AND CHIP

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

Composition For Forming Silicon-Containing Resist Underlayer Film A...

Compound For Forming Metal-Containing Film, Composition For Forming...

Method For Forming Resist Underlayer Film And Patterning Process

Compound For Forming Metal-Containing Film, Composition For Forming...

Patterning Process

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

IMAGE SENSOR DEVICE AND MANUFACTURING METHOD THEREOF

UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION

Compound For Forming Metal-Containing Film, Composition For Forming...

Compound For Forming Metal-Containing Film, Composition For Forming...

SOLVENT COMPATIBLE NOZZLE PLATE

Compound For Forming Metal-Containing Film, Composition For Forming...

MANUFACTURING METHOD OF METAL MASK AND METAL MASK THEREOF

PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL

DESIGN, CONTROL, AND OPTIMIZATION OF PHOTOSENSITIVITY MODULATION AL...

FABRICATING A DEVICE USING A MULTILAYER STACK

PHOTORESIST UNDERLAYER COMPOSITION

Compound For Forming Metal-Containing Film, Composition For Forming...

Methods for Making Probe Arrays Utilizing Deformed Templates

MULTI-METAL FILL WITH SELF-ALIGNED PATTERNING AND DIELECTRIC WITH V...