Multilayer resist systems

Industry

CPC
G03F7/094

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/094Multilayer resist systems

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,360,452
- Issue date Jul 15, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating pattern of cured product and methods for man...
- Patent number 12,362,176
- Issue date Jul 15, 2025
- Canon Kabushiki Kaisha
- Jun Kato
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Metallic photoresist patterning and defect improvement
- Patent number 12,353,132
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Chih Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure, method for manufacturing same and memory
- Patent number 12,354,971
- Issue date Jul 8, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shaowen Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of replicating a microstructure pattern
- Patent number 12,353,128
- Issue date Jul 8, 2025
- Viavi Solutions Inc.
- Riberet Almeida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming adhesive film, patterning process, and method...
- Patent number 12,351,742
- Issue date Jul 8, 2025
- Shin-Etsu Chemical Co., Ltd.
- Mamoru Watabe
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Wet-dry bilayer resist dual tone exposure
- Patent number 12,327,726
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating layer for multilayer printed circuit board, multilayer p...
- Patent number 12,313,973
- Issue date May 27, 2025
- LG Chem, Ltd.
- Jeong Wook Mun
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Metallic photoresist patterning and defect improvement
- Patent number 12,306,536
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Chih Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of replicating a microstructure pattern
- Patent number 12,287,573
- Issue date Apr 29, 2025
- Viavi Solutions Inc.
- Riberet Almeida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabricating a device using a multilayer stack
- Patent number 12,288,687
- Issue date Apr 29, 2025
- Google LLC
- Anthony Edward Megrant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer photo etching mask including organic and inorganic mate...
- Patent number 12,272,553
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,265,332
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Tse Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing lithography defects and pattern transfer
- Patent number 12,265,326
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Angélique D. Raley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,259,654
- Issue date Mar 25, 2025
- Sumitomo Electric Industries, Ltd.
- Tadashi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective patterning with wet-dry bilayer resist
- Patent number 12,249,508
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing cured film and use of the same
- Patent number 12,242,195
- Issue date Mar 4, 2025
- Merck Patent GmbH
- Takashi Sekito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,237,213
- Issue date Feb 25, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Libin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist underlayer and method of manufacturing a semiconductor...
- Patent number 12,222,650
- Issue date Feb 11, 2025
- TAIWAN SEMICONDUCTOR MANUFACURING COMPANY, LTD.
- An-Ren Zi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Material for forming organic film, method for forming organic film,...
- Patent number 12,215,221
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist and method
- Patent number 12,197,128
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Liang-Yi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Superstrate and a method of using the same
- Patent number 12,195,382
- Issue date Jan 14, 2025
- Canon Kabushiki Kaisha
- Steven C. Shackleton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,189,293
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chieh-Hsin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarization method and photocurable composition
- Patent number 12,179,231
- Issue date Dec 31, 2024
- Canon Kabushiki Kaisha
- Toshiki Ito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,174,540
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for resist underlayer, and pattern forming method using...
- Patent number 12,130,552
- Issue date Oct 29, 2024
- Samsung SDI Co., Ltd.
- Yoojeong Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film processing method
- Patent number 12,119,242
- Issue date Oct 15, 2024
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate
- Publication number 20250237947
- Publication date Jul 24, 2025
- HANGZHOU FIRST ELECTRONIC MATERIAL CO., LTD
- Li YUAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING...
- Publication number 20250237953
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takashi SAWAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250237954
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250231486
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250231485
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Nobuhiro NAGAMACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST
- Publication number 20250231491
- Publication date Jul 17, 2025
- SUNTIFIC MATERIALS (WEIFANG), LTD.
- Sam SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226222
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20250224676
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Kazuki YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226223
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMATION METHOD
- Publication number 20250224679
- Publication date Jul 10, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION
- Publication number 20250216784
- Publication date Jul 3, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST TOPCOAT COMPOSITIONS, AND METHODS OF FORMING PATTERNS USING...
- Publication number 20250216785
- Publication date Jul 3, 2025
- Samsung SDI Co., Ltd.
- Kyoungjin HA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE
- Publication number 20250218775
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208511
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208510
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACIDIC SPIN-ON CARBON (SOC) LAYER FOR EUV LITHOGRAPHY
- Publication number 20250208517
- Publication date Jun 26, 2025
- Brewer Science, Inc.
- Si Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208509
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING FLUORENE SKEL...
- Publication number 20250199407
- Publication date Jun 19, 2025
- NISSAN CHEMICAL CORPORATION
- Shou SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250199408
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Tse LAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LAYER PHOTO ETCHING MASK INCLUDING ORGANIC AND INORGANIC MATE...
- Publication number 20250201556
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...
- Publication number 20250172873
- Publication date May 29, 2025
- TORAY INDUSTRIES, INC.
- Yusuke KOMORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DEVELOPER TOLERANCE RESIST UNDERLAYER COMPOSITION AND METHOD FOR MA...
- Publication number 20250172876
- Publication date May 29, 2025
- Merck Patent GmbH
- Hiroshi Yanagita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250129203
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Resist Underlayer Film, Resist Underlayer F...
- Publication number 20250129209
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250115736
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SEMICONDUCTOR DESIGN LITHOGRAPHIC SEAM IMPLEMENTATION METHODOLOGY F...
- Publication number 20250112167
- Publication date Apr 3, 2025
- Intel Corporation
- Kimberly Pierce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME
- Publication number 20250102917
- Publication date Mar 27, 2025
- Merck Patent GmbH
- Takashi SEKITO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Photoresist and Method
- Publication number 20250102916
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Liang-Yi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250093779
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chieh-Hsin HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV)...
- Publication number 20250093778
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Lior Huli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Multilayer resist systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist underlayer film-forming composition

Method for fabricating pattern of cured product and methods for man...

Metallic photoresist patterning and defect improvement

Semiconductor structure, method for manufacturing same and memory

Method of replicating a microstructure pattern

Material for forming adhesive film, patterning process, and method...

Wet-dry bilayer resist dual tone exposure

Insulating layer for multilayer printed circuit board, multilayer p...

Metallic photoresist patterning and defect improvement

Method of replicating a microstructure pattern

Fabricating a device using a multilayer stack

Multi-layer photo etching mask including organic and inorganic mate...

Method of manufacturing a semiconductor device

Method for reducing lithography defects and pattern transfer

Method for manufacturing semiconductor device

Selective patterning with wet-dry bilayer resist

Resist underlayer film-forming composition comprising epoxy adduct...

Method for manufacturing cured film and use of the same

Method for manufacturing semiconductor device

Photoresist underlayer and method of manufacturing a semiconductor...

Material for forming organic film, method for forming organic film,...

Photoresist and method

Superstrate and a method of using the same

Method of manufacturing a semiconductor device

Planarization method and photocurable composition

Method of manufacturing a semiconductor device

Resist underlayer film material, patterning process, and method for...

Photocurable composition and method for producing semiconductor device

Composition for resist underlayer, and pattern forming method using...

Film processing method

Patents Applicationslast 30 patents

Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate

SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING...

Composition For Forming Metal-Containing Film And Patterning Process

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

Compound For Forming Metal-Containing Film, Composition For Forming...

PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

FILM FORMING METHOD AND FILM FORMING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

RESIST PATTERN FORMATION METHOD

IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION

RESIST TOPCOAT COMPOSITIONS, AND METHODS OF FORMING PATTERNS USING...

MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE

Compound For Forming Metal-Containing Film, Composition For Forming...

Compound For Forming Metal-Containing Film, Composition For Forming...

ACIDIC SPIN-ON CARBON (SOC) LAYER FOR EUV LITHOGRAPHY

Compound For Forming Metal-Containing Film, Composition For Forming...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING FLUORENE SKEL...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

MULTI-LAYER PHOTO ETCHING MASK INCLUDING ORGANIC AND INORGANIC MATE...

PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...

DEVELOPER TOLERANCE RESIST UNDERLAYER COMPOSITION AND METHOD FOR MA...

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

Composition For Forming Resist Underlayer Film, Resist Underlayer F...

Composition For Forming Metal-Containing Film And Patterning Process

SEMICONDUCTOR DESIGN LITHOGRAPHIC SEAM IMPLEMENTATION METHODOLOGY F...

METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME

Photoresist and Method

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV)...