Multiple exposures

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CPC
G03F7/70466

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70466Multiple exposures

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Wet-dry bilayer resist dual tone exposure
- Patent number 12,327,726
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor lithography system and/or method
- Patent number 12,321,100
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective patterning with wet-dry bilayer resist
- Patent number 12,249,508
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for coloring circuit layout and system for performing the same
- Patent number 12,159,092
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Ping Chiang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask, exposure method and touch panel
- Patent number 12,050,397
- Issue date Jul 30, 2024
- Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Jie Lei
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Picometer optical comb, and device and method for generating the same
- Patent number 12,025,819
- Issue date Jul 2, 2024
- Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Changhe Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Printed circuit board and method for manufacturing the same
- Patent number 12,022,621
- Issue date Jun 25, 2024
- SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Mi Jeong Jeon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Pattern decomposition method
- Patent number 11,977,335
- Issue date May 7, 2024
- United Microelectronics Corp.
- Min Cheng Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Digital exposure machine and exposure control method thereof
- Patent number 11,971,662
- Issue date Apr 30, 2024
- BOE Technology Group Co., Ltd.
- Zhichong Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing overlay results with absolute reference for se...
- Patent number 11,966,171
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor lithography system and/or method
- Patent number 11,921,430
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for extreme ultraviolet lithography mask treatment
- Patent number 11,906,897
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to achieve non-crystalline evenly distributed shot pattern f...
- Patent number 11,815,818
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for coloring circuit layout and system for performing the same
- Patent number 11,790,145
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Ping Chiang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for manufacturing semiconductor structure
- Patent number 11,768,443
- Issue date Sep 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Ching Lee
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of forming semiconductor structure
- Patent number 11,764,062
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ping-Hao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for performing a manufacturing process and associated appara...
- Patent number 11,733,606
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Thomas Theeuwes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing a plurality of resonators in a wafer
- Patent number 11,709,431
- Issue date Jul 25, 2023
- Richemont International SA
- Susana del Carmen Tobenas Borron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabrication technique for forming ultra-high density integrated cir...
- Patent number 11,710,634
- Issue date Jul 25, 2023
- Synopsys, Inc.
- Xi-Wei Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for illuminating image points
- Patent number 11,681,228
- Issue date Jun 20, 2023
- EV Group E. Thallner GmbH
- Bernhard Thallner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of pattern alignment for field stitching
- Patent number 11,640,118
- Issue date May 2, 2023
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor device manufacturing system
- Patent number 11,635,697
- Issue date Apr 25, 2023
- Samsung Electronics Co., Ltd.
- Soon Hwan Cha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing overlay results with absolute reference for se...
- Patent number 11,630,397
- Issue date Apr 18, 2023
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing photo masks
- Patent number 11,592,751
- Issue date Feb 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ken-Hsien Hsieh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus for lithographically forming wafer identification marks a...
- Patent number 11,562,968
- Issue date Jan 24, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hu-Wei Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coaxial see-through alignment imaging system
- Patent number 11,526,088
- Issue date Dec 13, 2022
- Tokyo Electron Limited
- Anton J. Devilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Tunable wavelength see-through layer stack
- Patent number 11,513,445
- Issue date Nov 29, 2022
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask and method for manufacturing the same, lithography method, dis...
- Patent number 11,474,434
- Issue date Oct 18, 2022
- Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Dengfeng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,454,887
- Issue date Sep 27, 2022
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor lithography system and/or method
- Patent number 11,402,761
- Issue date Aug 2, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR CALIBRATING A FLUID DISPENSER
- Publication number 20250189899
- Publication date Jun 12, 2025
- Canon Kabushiki Kaisha
- Qi Ni
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR PRODUCING OPTICAL ELEMENT
- Publication number 20250130507
- Publication date Apr 24, 2025
- MITSUBISHI CHEMICAL CORPORATION
- Ken SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method of semiconductor pattern
- Publication number 20250102922
- Publication date Mar 27, 2025
- UNITED MICROELECTRONICS CORP.
- Shin-Hung Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE PLACEMENT WITH SPATIAL LIGHT MODULATOR WRITING
- Publication number 20250093783
- Publication date Mar 20, 2025
- Mycronic AB
- Martin GLIMTOFT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...
- Publication number 20250036032
- Publication date Jan 30, 2025
- Canon Kabushiki Kaisha
- FUMA KIZU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DI...
- Publication number 20250028251
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES
- Publication number 20240402607
- Publication date Dec 5, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Thomas Klein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material for Enhancing the Effects of Exercise
- Publication number 20240385529
- Publication date Nov 21, 2024
- Michael Rudan
- A41 - WEARING APPAREL
Information Patent Application
EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE DEVICE, AND...
- Publication number 20240377754
- Publication date Nov 14, 2024
- Nikon Corporation
- Yoji WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES
- Publication number 20240377744
- Publication date Nov 14, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK, EXPOSURE METHOD AND TOUCH PANEL
- Publication number 20240345470
- Publication date Oct 17, 2024
- HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Jie LEI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR LITHOGRAPHY SYSTEM AND/OR METHOD
- Publication number 20240248412
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD OF MANUFACTURING DISPLAY PANEL USING THE SAME
- Publication number 20240045339
- Publication date Feb 8, 2024
- SAMSUNG DISPLAY CO., LTD.
- Soon-Hwan So
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUF...
- Publication number 20240045342
- Publication date Feb 8, 2024
- Samsung Electronics Co., Ltd.
- Su Bin KONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE
- Publication number 20240004300
- Publication date Jan 4, 2024
- NANYA TECHNOLOGY CORPORATION
- CHIH-YING TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR COLORING CIRCUIT LAYOUT AND SYSTEM FOR PERFORMING THE SAME
- Publication number 20230367942
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Ping CHIANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PRINTED CIRCUIT BOARD AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20230337367
- Publication date Oct 19, 2023
- Samsung Electro-Mechanics Co., Ltd.
- Mi Jeong JEON
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHODS FOR MULTI-EXPOSURE OF A SUBSTRATE
- Publication number 20230296986
- Publication date Sep 21, 2023
- ASML Holding N.V.
- Timothy Allan BRUNNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOG...
- Publication number 20230288812
- Publication date Sep 14, 2023
- Applied Materials, Inc.
- Chi-Ming TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR THE EXPOSURE OF A PHOTOSENSITIVE COATING
- Publication number 20230251580
- Publication date Aug 10, 2023
- EV GROUP E. THALLNER GMBH
- Bernhard Thallner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20230205093
- Publication date Jun 29, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ken-Hsien HSIEH
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INCREASING OVERLAY MARGINS FOR LINES THAT SPAN RETICLE BOUNDARIES I...
- Publication number 20230194997
- Publication date Jun 22, 2023
- Intel Corporation
- Mark Phillips
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FABRICATION TECHNIQUE FOR FORMING ULTRA-HIGH DENSITY INTEGRATED CIR...
- Publication number 20230154751
- Publication date May 18, 2023
- Synopsys, Inc.
- XI-WEI LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING RESIN ASYMMETRICAL STRUCTURES
- Publication number 20220404704
- Publication date Dec 22, 2022
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Stefan LANDIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN DECOMPOSITION METHOD
- Publication number 20220382169
- Publication date Dec 1, 2022
- United Microelectronics Corp.
- Min Cheng Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO ACHIEVE NON-CRYSTALLINE EVENLY DISTRIBUTED SHOT PATTERN F...
- Publication number 20220357670
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Joseph R. JOHNSON
- G02 - OPTICS
Information Patent Application
SEMICONDUCTOR LITHOGRAPHY SYSTEM AND/OR METHOD
- Publication number 20220357671
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING A PLURALITY OF RESONATORS IN A WAFER
- Publication number 20220350255
- Publication date Nov 3, 2022
- RICHEMONT INTERNATIONAL S.A.
- Susana del Carmen TOBENAS BORRON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK, EXPOSURE METHOD AND TOUCH PANEL
- Publication number 20220342295
- Publication date Oct 27, 2022
- HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Jie LEI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR COLORING CIRCUIT LAYOUT AND SYSTEM FOR PERFORMING THE SAME
- Publication number 20220335192
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Ping CHIANG
- G06 - COMPUTING CALCULATING COUNTING

Multiple exposures

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Wet-dry bilayer resist dual tone exposure

Semiconductor lithography system and/or method

Selective patterning with wet-dry bilayer resist

Method for coloring circuit layout and system for performing the same

Mask, exposure method and touch panel

Picometer optical comb, and device and method for generating the same

Printed circuit board and method for manufacturing the same

Pattern decomposition method

Digital exposure machine and exposure control method thereof

Method for producing overlay results with absolute reference for se...

Semiconductor lithography system and/or method

Method for extreme ultraviolet lithography mask treatment

Method to achieve non-crystalline evenly distributed shot pattern f...

Method for coloring circuit layout and system for performing the same

Method for manufacturing semiconductor structure

Method of forming semiconductor structure

Method for performing a manufacturing process and associated appara...

Method for manufacturing a plurality of resonators in a wafer

Fabrication technique for forming ultra-high density integrated cir...

Method and apparatus for illuminating image points

Method of pattern alignment for field stitching

Semiconductor device manufacturing system

Method for producing overlay results with absolute reference for se...

Method of manufacturing photo masks

Apparatus for lithographically forming wafer identification marks a...

Coaxial see-through alignment imaging system

Tunable wavelength see-through layer stack

Mask and method for manufacturing the same, lithography method, dis...

Metrology apparatus and method for determining a characteristic of...

Semiconductor lithography system and/or method

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR CALIBRATING A FLUID DISPENSER

METHOD FOR PRODUCING OPTICAL ELEMENT

Exposure method of semiconductor pattern

EDGE PLACEMENT WITH SPATIAL LIGHT MODULATOR WRITING

LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...

LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DI...

UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES

Material for Enhancing the Effects of Exercise

EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE DEVICE, AND...

LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES

MASK, EXPOSURE METHOD AND TOUCH PANEL

SEMICONDUCTOR LITHOGRAPHY SYSTEM AND/OR METHOD

PHOTOMASK AND METHOD OF MANUFACTURING DISPLAY PANEL USING THE SAME

CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUF...

METHOD OF PROCESSING A SUBSTRATE

METHOD FOR COLORING CIRCUIT LAYOUT AND SYSTEM FOR PERFORMING THE SAME

PRINTED CIRCUIT BOARD AND METHOD FOR MANUFACTURING THE SAME

LITHOGRAPHIC APPARATUS AND METHODS FOR MULTI-EXPOSURE OF A SUBSTRATE

METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOG...

METHOD AND DEVICE FOR THE EXPOSURE OF A PHOTOSENSITIVE COATING

METHOD OF MANUFACTURING PHOTO MASKS

INCREASING OVERLAY MARGINS FOR LINES THAT SPAN RETICLE BOUNDARIES I...

FABRICATION TECHNIQUE FOR FORMING ULTRA-HIGH DENSITY INTEGRATED CIR...

METHOD FOR MANUFACTURING RESIN ASYMMETRICAL STRUCTURES

PATTERN DECOMPOSITION METHOD

METHOD TO ACHIEVE NON-CRYSTALLINE EVENLY DISTRIBUTED SHOT PATTERN F...

SEMICONDUCTOR LITHOGRAPHY SYSTEM AND/OR METHOD

METHOD FOR MANUFACTURING A PLURALITY OF RESONATORS IN A WAFER

MASK, EXPOSURE METHOD AND TOUCH PANEL

METHOD FOR COLORING CIRCUIT LAYOUT AND SYSTEM FOR PERFORMING THE SAME