Non-aqueous alkaline compositions

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G03F7/327

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/327Non-aqueous alkaline compositions

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,240,804
- Issue date Mar 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method and semiconductor chip manufacturing...
- Patent number 12,210,287
- Issue date Jan 28, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface charge release in lithography developing process
- Patent number 12,204,248
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Ling Tseng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition and resist pattern...
- Patent number 12,164,227
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for forming resist pattern...
- Patent number 12,158,700
- Issue date Dec 3, 2024
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 12,092,957
- Issue date Sep 17, 2024
- JSR Corporation
- Kazuya Kiriyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,032,290
- Issue date Jul 9, 2024
- FUJIFILM Corporation
- Daisuke Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation based patterning methods
- Patent number 11,988,961
- Issue date May 21, 2024
- Inpria Corporation
- Jason K. Stowers
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,934,099
- Issue date Mar 19, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi Hori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method for cured substance, manufacturing method for...
- Patent number 11,934,102
- Issue date Mar 19, 2024
- FUJIFILM Corporation
- Atsuyasu Nozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for making hard masks useful in next-generation lithography
- Patent number 11,921,427
- Issue date Mar 5, 2024
- Lam Research Corporation
- Timothy William Weidman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor chip, and kit
- Patent number 11,914,300
- Issue date Feb 27, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductive polymer composition, coated product and patterning process
- Patent number 11,852,974
- Issue date Dec 26, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Nagasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive resin composition, resin sheet, cured film, organic...
- Patent number 11,852,973
- Issue date Dec 26, 2023
- Toray Industries, Inc.
- Yusuke Komori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,835,859
- Issue date Dec 5, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 11,747,725
- Issue date Sep 5, 2023
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation based patterning methods
- Patent number 11,693,312
- Issue date Jul 4, 2023
- Inpria Corporation
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, pat...
- Patent number 11,640,113
- Issue date May 2, 2023
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming organic film, substrate for manufacturing s...
- Patent number 11,635,691
- Issue date Apr 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation based patterning methods
- Patent number 11,599,022
- Issue date Mar 7, 2023
- Inpria Corporation
- Jason K. Stowers
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative photosensitive resin composition, cured film, element prov...
- Patent number 11,561,470
- Issue date Jan 24, 2023
- Toray Industries, Inc.
- Yugo Tanigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monomers, polymers and photoresist compositions
- Patent number 11,480,878
- Issue date Oct 25, 2022
- Rohm and Haas Electronic Materials Korea Ltd.
- Eui Hyun Ryu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method for forming resist pattern, and polyphen...
- Patent number 11,480,877
- Issue date Oct 25, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation based patterning methods
- Patent number 11,392,031
- Issue date Jul 19, 2022
- Inpria Corporation
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Curable composition, lithographic printing plate precursor, method...
- Patent number 11,333,977
- Issue date May 17, 2022
- FUJIFILM Corporation
- Yohei Ishiji
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,333,973
- Issue date May 17, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuishi Tanno
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method and composition for improving LWR in patterning step using n...
- Patent number 11,187,985
- Issue date Nov 30, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Color developing composition, lithographic printing plate precursor...
- Patent number 11,117,364
- Issue date Sep 14, 2021
- FUJIFILM Corporation
- Takeshi Inasaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
High-χ block copolymers for directed self-assembly
- Patent number 11,078,337
- Issue date Aug 3, 2021
- Brewer Science, Inc.
- Daniel Sweat
- B32 - LAYERED PRODUCTS

Patents Applicationslast 30 patents

Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20250004365
- Publication date Jan 2, 2025
- INPRIA CORPORATION
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT
- Publication number 20240152055
- Publication date May 9, 2024
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
- Publication number 20240142876
- Publication date May 2, 2024
- JSR Corporation
- Hiroyuki MIYAUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Adhesive Film, Patterning Process, And Meth...
- Publication number 20240103370
- Publication date Mar 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
- Publication number 20230350304
- Publication date Nov 2, 2023
- SEMES CO, LTD.
- Hae Won CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR...
- Publication number 20230350305
- Publication date Nov 2, 2023
- FUJIFILM CORPORATION
- Atsuyasu NOZAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20230341772
- Publication date Oct 26, 2023
- JSR Corporation
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20230305390
- Publication date Sep 28, 2023
- INPRIA CORPORATION
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING COMPOSITION AND METHOD OF PRODUCING SEMICONDUCTO...
- Publication number 20230250238
- Publication date Aug 10, 2023
- JSR Corporation
- Ryuichi SERIZAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230161257
- Publication date May 25, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20230118534
- Publication date Apr 20, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IODINE-CONTAINING ACID CLEAVABLE COMPOUNDS, POLYMERS DERIVED THEREF...
- Publication number 20230103685
- Publication date Apr 6, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20220413382
- Publication date Dec 29, 2022
- INPRIA CORPORATION
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING COMPOSITION AND METHOD OF PRODUCING SEMICONDUCTO...
- Publication number 20220403116
- Publication date Dec 22, 2022
- JSR Corporation
- Ryuichi SERIZAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SURFACE CHARGE RELEASE IN LITHOGRAPHY DEVELOPING PROCESS
- Publication number 20220365439
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Ling Tseng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD FOR CONDUCTIVE SUBSTRATE AND CONDUCTIVE SUBSTRATE
- Publication number 20220342300
- Publication date Oct 27, 2022
- FUJIFILM CORPORATION
- Aya NAKAYAMA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF MANUFACTURING CONDUCTIVE SUBSTRATE, CONDUCTIVE SUBSTRATE,...
- Publication number 20220342303
- Publication date Oct 27, 2022
- FUJIFILM CORPORATION
- Shinichi KANNA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20220308447
- Publication date Sep 29, 2022
- INPRIA CORPORATION
- Jason K. Stowers
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20220276557
- Publication date Sep 1, 2022
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING MET...
- Publication number 20220252985
- Publication date Aug 11, 2022
- FUJIFILM CORPORATION
- Toshiaki FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...
- Publication number 20220252982
- Publication date Aug 11, 2022
- SAMSUNG ELECTRONICS CO., LTD.
- SUKKOO HONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION...
- Publication number 20220197140
- Publication date Jun 23, 2022
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, METHO...
- Publication number 20220155684
- Publication date May 19, 2022
- TORAY INDUSTRIES, INC.
- Yuki KATSURADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20220146937
- Publication date May 12, 2022
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20220137512
- Publication date May 5, 2022
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING...
- Publication number 20220127225
- Publication date Apr 28, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20220043350
- Publication date Feb 10, 2022
- JSR Corporation
- Kazuya Kiriyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220004100
- Publication date Jan 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMING METHOD AND SEMICONDUCTOR CHIP MANUFACTURING...
- Publication number 20210405535
- Publication date Dec 30, 2021
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210405531
- Publication date Dec 30, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi HORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Non-aqueous alkaline compositions

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Onium salt, chemically amplified resist composition and patterning...

Pattern formation methods

Resist pattern forming method and semiconductor chip manufacturing...

Surface charge release in lithography developing process

Chemically amplified negative resist composition and resist pattern...

Photosensitive resin composition, method for forming resist pattern...

Radiation-sensitive resin composition, method for forming resist pa...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Radiation based patterning methods

Resist composition and method of forming resist pattern

Manufacturing method for cured substance, manufacturing method for...

Methods for making hard masks useful in next-generation lithography

Manufacturing method of semiconductor chip, and kit

Conductive polymer composition, coated product and patterning process

Photosensitive resin composition, resin sheet, cured film, organic...

Resist composition and patterning process

Radiation-sensitive resin composition and method for forming resist...

Radiation based patterning methods

Actinic ray-sensitive or radiation-sensitive resin composition, pat...

Composition for forming organic film, substrate for manufacturing s...

Radiation based patterning methods

Negative photosensitive resin composition, cured film, element prov...

Monomers, polymers and photoresist compositions

Resist composition, method for forming resist pattern, and polyphen...

Radiation based patterning methods

Curable composition, lithographic printing plate precursor, method...

Resist composition and method of forming resist pattern

Method and composition for improving LWR in patterning step using n...

Color developing composition, lithographic printing plate precursor...

High-χ block copolymers for directed self-assembly

Patents Applicationslast 30 patents

RADIATION BASED PATTERNING METHODS

MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT

SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION

Composition For Forming Adhesive Film, Patterning Process, And Meth...

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

RADIATION BASED PATTERNING METHODS

SILICON-CONTAINING COMPOSITION AND METHOD OF PRODUCING SEMICONDUCTO...

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

IODINE-CONTAINING ACID CLEAVABLE COMPOUNDS, POLYMERS DERIVED THEREF...

RADIATION BASED PATTERNING METHODS

SILICON-CONTAINING COMPOSITION AND METHOD OF PRODUCING SEMICONDUCTO...

SURFACE CHARGE RELEASE IN LITHOGRAPHY DEVELOPING PROCESS

MANUFACTURING METHOD FOR CONDUCTIVE SUBSTRATE AND CONDUCTIVE SUBSTRATE

METHOD OF MANUFACTURING CONDUCTIVE SUBSTRATE, CONDUCTIVE SUBSTRATE,...

RADIATION BASED PATTERNING METHODS

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING MET...

PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...

ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, METHO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST PATTERN FORMING METHOD AND SEMICONDUCTOR CHIP MANUFACTURING...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN