Non-aqueous compositions

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/325Non-aqueous compositions

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 12,360,451
- Issue date Jul 15, 2025
- Samsung Electronics Co., Ltd.
- Chawon Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing indium-containing organic polymer film, pa...
- Patent number 12,353,131
- Issue date Jul 8, 2025
- Kioxia Corporation
- Koji Asakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Quantum dot light-emitting structure and manufacturing method there...
- Patent number 12,344,787
- Issue date Jul 1, 2025
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Wenhai Mei
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Developing method and substrate treatment system
- Patent number 12,339,593
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Yuya Kamei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Storage container storing treatment liquid for manufacturing semico...
- Patent number 12,313,976
- Issue date May 27, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographically patterned electrically conductive hydrogels, photo...
- Patent number 12,313,969
- Issue date May 27, 2025
- The Board of Trustees of the Leland Stanford Junior University
- Jia Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist and method of formation and use
- Patent number 12,287,575
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keng-Chu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin composition
- Patent number 12,282,253
- Issue date Apr 22, 2025
- JSR Corporation
- Kimiyuki Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid chemical, method for producing liquid chemical, and method f...
- Patent number 12,282,259
- Issue date Apr 22, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method of flexographic printing plate and printing me...
- Patent number 12,259,655
- Issue date Mar 25, 2025
- Asahi Kasei Kabushiki Kaisha
- Hiroki Akiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,253,801
- Issue date Mar 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical liquid, chemical liquid storage body, resist pattern formi...
- Patent number 12,235,584
- Issue date Feb 25, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,235,578
- Issue date Feb 25, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor structure
- Patent number 12,222,653
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide resist patterning with electrical field guided post-exp...
- Patent number 12,204,246
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Huixiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,189,286
- Issue date Jan 7, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography process and material for negative tone development
- Patent number 12,189,296
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet photolithography method with developer composition
- Patent number 12,181,798
- Issue date Dec 31, 2024
- TAIWAIN SEMICONDUCTOR MANUFACTURING CO., LTD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,174,541
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical liquid, chemical liquid storage body, chemical liquid fill...
- Patent number 12,169,362
- Issue date Dec 17, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organically modified metal oxide nanoparticle, method for producing...
- Patent number 12,153,347
- Issue date Nov 26, 2024
- National Institute of Advanced Industrial Science and Technology
- Kiwamu Sue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organotin clusters, solutions of organotin clusters, and applicatio...
- Patent number 12,129,271
- Issue date Oct 29, 2024
- Inpria Corporation
- Brian J. Cardineau
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Carboxylate, resist composition and method for producing resist pat...
- Patent number 12,124,167
- Issue date Oct 22, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film-forming composition, silicon-containing film, and resist patte...
- Patent number 12,098,282
- Issue date Sep 24, 2024
- JSR Corporation
- Tomoaki Seko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,085,857
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive resin composition, pattern forming method, cured fil...
- Patent number 12,078,929
- Issue date Sep 3, 2024
- FUJIFILM Corporation
- Toshihide Aoshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LIQUID CHEMICAL, METHOD FOR PRODUCING LIQUID CHEMICAL, AND METHOD F...
- Publication number 20250237957
- Publication date Jul 24, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...
- Publication number 20250224682
- Publication date Jul 10, 2025
- Samsung SDI Co., Ltd.
- Jin-Hee BAE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...
- Publication number 20250224680
- Publication date Jul 10, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST AND METHOD OF FORMATION AND USE
- Publication number 20250224673
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Keng-Chu Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER
- Publication number 20250216783
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...
- Publication number 20250189887
- Publication date Jun 12, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF SMOOTHENING PROFILE OF PHOTORESIST
- Publication number 20250183034
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jia-Lin WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST PATTERN FORMING METHOD AND SEMICONDUCTOR CHIP MANUFACTURING...
- Publication number 20250155818
- Publication date May 15, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
LOW VOLUME SHRINKAGE, HIGH ETCH RESISTANCE AND HIGH RESOLUTION PHOT...
- Publication number 20250157818
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jia-Lin WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithography Process and Material for Negative Tone Development
- Publication number 20250138428
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHICALLY PATTERNED ELECTRICALLY CONDUCTIVE HYDROGELS, PHOTO...
- Publication number 20250110401
- Publication date Apr 3, 2025
- The Board of Trustees of the Leland Stanford Junior University
- Jia LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20250093773
- Publication date Mar 20, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20250085628
- Publication date Mar 13, 2025
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE AND PRINTING ME...
- Publication number 20250076769
- Publication date Mar 6, 2025
- Asahi Kasei Kabushiki Kaisha
- Hiroki AKIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT
- Publication number 20250068079
- Publication date Feb 27, 2025
- Phillip Dene Hustad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST STRIPPER COMPOSITION AND METHOD FOR FORMING PATTERN USI...
- Publication number 20250060675
- Publication date Feb 20, 2025
- SAMSUNG DISPLAY CO., LTD.
- KYU-SOON PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE
- Publication number 20250044700
- Publication date Feb 6, 2025
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...
- Publication number 20250021025
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Youngho HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN CLUSTERS, SOLUTIONS OF ORGANOTIN CLUSTERS, AND APPLICATIO...
- Publication number 20250011346
- Publication date Jan 9, 2025
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A RELIEF PRECURSOR WITH VEGETABLE OILS AS PLASTICIZERS SUITABLE FOR...
- Publication number 20250004368
- Publication date Jan 2, 2025
- XSYS Germany GmbH
- Patrick-Kurt Dannecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20250004374
- Publication date Jan 2, 2025
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20240427243
- Publication date Dec 26, 2024
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS
- Publication number 20240419069
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BIODERIVED ORGANIC SOLVENTS
- Publication number 20240408590
- Publication date Dec 12, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Sanjay Malik
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Material For Forming Organic Film, Patterning Process, And Organic...
- Publication number 20240402605
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEADS FROM METAL-CONTAINING RESISTS,...
- Publication number 20240393698
- Publication date Nov 28, 2024
- Samsung SDI Co., Ltd.
- Si-Kyun PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20240393684
- Publication date Nov 28, 2024
- Samsung SDI Co., Ltd.
- Jongpil HO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN...
- Publication number 20240389227
- Publication date Nov 21, 2024
- JSR Corporation
- Ryouji TATARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION
- Publication number 20240377731
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20240377737
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Gentaro Hida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Non-aqueous compositions

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of manufacturing semiconductor device

Method for manufacturing indium-containing organic polymer film, pa...

Quantum dot light-emitting structure and manufacturing method there...

Developing method and substrate treatment system

Storage container storing treatment liquid for manufacturing semico...

Lithographically patterned electrically conductive hydrogels, photo...

Treatment liquid and pattern forming method

Photoresist and method of formation and use

Photosensitive resin composition

Liquid chemical, method for producing liquid chemical, and method f...

Organotin oxide hydroxide patterning compositions, precursors, and...

Manufacturing method of flexographic printing plate and printing me...

Solution, solution storage body, actinic ray-sensitive or radiation...

Chemical liquid, chemical liquid storage body, resist pattern formi...

Organometallic solution based high resolution patterning compositions

Pattern formation methods

Solution, solution storage body, actinic ray-sensitive or radiation...

Method for forming semiconductor structure

Metal oxide resist patterning with electrical field guided post-exp...

Organometallic solution based high resolution patterning compositions

Lithography process and material for negative tone development

Extreme ultraviolet photolithography method with developer composition

Composition for forming silicon-containing resist underlayer film a...

Chemical liquid, chemical liquid storage body, chemical liquid fill...

Organically modified metal oxide nanoparticle, method for producing...

Organotin clusters, solutions of organotin clusters, and applicatio...

Carboxylate, resist composition and method for producing resist pat...

Film-forming composition, silicon-containing film, and resist patte...

Composition for forming silicon-containing resist underlayer film a...

Photosensitive resin composition, pattern forming method, cured fil...

Patents Applicationslast 30 patents

LIQUID CHEMICAL, METHOD FOR PRODUCING LIQUID CHEMICAL, AND METHOD F...

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...

ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...

PHOTORESIST AND METHOD OF FORMATION AND USE

ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER

SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...

METHOD OF SMOOTHENING PROFILE OF PHOTORESIST

RESIST PATTERN FORMING METHOD AND SEMICONDUCTOR CHIP MANUFACTURING...

LOW VOLUME SHRINKAGE, HIGH ETCH RESISTANCE AND HIGH RESOLUTION PHOT...

Lithography Process and Material for Negative Tone Development

LITHOGRAPHICALLY PATTERNED ELECTRICALLY CONDUCTIVE HYDROGELS, PHOTO...

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE AND PRINTING ME...

BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT

PHOTORESIST STRIPPER COMPOSITION AND METHOD FOR FORMING PATTERN USI...

PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...

ORGANOTIN CLUSTERS, SOLUTIONS OF ORGANOTIN CLUSTERS, AND APPLICATIO...

A RELIEF PRECURSOR WITH VEGETABLE OILS AS PLASTICIZERS SUITABLE FOR...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS

BIODERIVED ORGANIC SOLVENTS

Material For Forming Organic Film, Patterning Process, And Organic...

COMPOSITION FOR REMOVING EDGE BEADS FROM METAL-CONTAINING RESISTS,...

METHOD OF FORMING PATTERNS

RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN...

EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...