Non-homogeneous intensity distribution in the mask plane

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CPC
G03F7/70083

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70083Non-homogeneous intensity distribution in the mask plane

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Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and illumination uniformity correction system
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- ASML Holding N.V.
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Method and apparatus for determining a radiation beam intensity pro...
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- ASML Netherlands B.V.
- Teis Johan Coenen
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Fast freeform source and mask co-optimization method
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- Issue date Jun 22, 2021
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Fast freeform source and mask co-optimization method
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Method for determining an imaging aberration contribution of an ima...
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- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
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Illumination intensity correction device for predefining an illumin...
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Information Patent Grant
Illumination system for illuminating a mask in a microlithographic...
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Information Patent Grant
Fast freeform source and mask co-optimization method
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Projection exposure method and projection exposure apparatus for mi...
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Illumination system of a microlithographic projection exposure appa...
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Assembly for a projection exposure apparatus for EUV projection lit...
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Information Patent Grant
Mirror
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Information Patent Grant
Horizontal development bias in negative tone development of photore...
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- Mentor Graphics, A Siemens Business
- Yunfei Deng
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Programmable imaging assembly for manufacturing biotest post arrays
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Illumination optical unit for EUV projection lithography
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Method of operating a microlithographic apparatus
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- Issue date Apr 4, 2017
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Illumination system for microlithography
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- Issue date Mar 28, 2017
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Information Patent Grant
Illumination system for illuminating a mask in a microlithographic...
- Patent number 9,599,904
- Issue date Mar 21, 2017
- Carl Zeiss SMT GmbH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

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FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD
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METHOD FOR DETERMINING AN IMAGING ABERRATION CONTRIBUTION OF AN IMA...
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LIGHT INTENSITY MODULATION METHOD
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- Publication date Apr 18, 2019
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
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LITHOGRAPHIC APPARATUS AND ASSOCIATED METHOD
- Publication number 20190056669
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Non-homogeneous intensity distribution in the mask plane

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Lithographic apparatus and illumination uniformity correction system

Method and apparatus for determining a radiation beam intensity pro...

Fast freeform source and mask co-optimization method

Lithographic apparatus and associated method

Substrate processing apparatus and substrate processing method

Fast freeform source and mask co-optimization method

Method for determining an imaging aberration contribution of an ima...

Light intensity modulation method

Divisional exposure apparatus and method of manufacturing liquid cr...

Illumination system for illuminating a mask in a microlithographic...

Lithographic apparatus and method

Illumination optical unit for EUV projection lithography

Illumination optical apparatus, exposure apparatus, and device manu...

Illumination system for microlithography

Illumination intensity correction device for predefining an illumin...

Illumination system for illuminating a mask in a microlithographic...

Fast freeform source and mask co-optimization method

Microlithography illumination optical system and microlithography p...

Illumination optical unit

Projection exposure methods and systems

Projection exposure method and projection exposure apparatus for mi...

Illumination system of a microlithographic projection exposure appa...

Assembly for a projection exposure apparatus for EUV projection lit...

Mirror

Horizontal development bias in negative tone development of photore...

Programmable imaging assembly for manufacturing biotest post arrays

Illumination optical unit for EUV projection lithography

Method of operating a microlithographic apparatus

Illumination system for microlithography

Illumination system for illuminating a mask in a microlithographic...

Patents Applicationslast 30 patents

OPTIMIZATION USING A NON-UNIFORM ILLUMINATION INTENSITY PROFILE

LITHOGRAPHIC APPARATUS AND ILLUMINATION UNIFORMITY CORRECTION SYSTEM

FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD

METHOD FOR DETERMINING AN IMAGING ABERRATION CONTRIBUTION OF AN IMA...

LIGHT INTENSITY MODULATION METHOD

LITHOGRAPHIC APPARATUS AND ASSOCIATED METHOD

ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...

ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANU...

FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD

Lithographic Apparatus and Method

PROJECTION EXPOSURE METHODS AND SYSTEMS

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...

ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...

METHOD AND APPARATUS FOR USING PATTERNING DEVICE TOPOGRAPHY INDUCED...

DIVISIONAL EXOPSURE APPARATUS AND METHOD OF MANUFACTURING LIQUID CR...

ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...

ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...

MASKLESS EXPOSURE DEVICE AND METHOD FOR COMPENSATING CUMULATIVE ILL...

METHOD FOR COMPENSATING SLIT ILLUMINATION UNIFORMITY

ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANU...

PROJECTION EXPOSURE METHODS AND SYSTEMS

ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY

FIELD FACET MIRROR FOR AN ILLUMINATION OPTICS OF A PROJECTION EXPOS...

FAST ILLUMINATION SIMULATOR BASED ON A CALIBRATED FLEXIBLE POINT- S...

MICROLITHOGRAPHIC ILLUMINATION SYSTEM

Fly Eye Lens and Proximity Exposure Machine Optical System

FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...