Non-planar pattern area or non-planar masks

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G03F7/703

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/703Non-planar pattern area or non-planar masks

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Substrate holder, lithographic apparatus, device manufacturing meth...
- Patent number 12,366,808
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Dynamic generation of layout adaptive packaging
- Patent number 12,360,467
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Uwe Hollerbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-speed nanopatterning method and apparatus of two-color super-r...
- Patent number 12,353,138
- Issue date Jul 8, 2025
- Foundation of Soongsil University-Industry Cooperation
- Dong-Ryoung Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holder and method of manufacturing a substrate holder
- Patent number 12,353,139
- Issue date Jul 8, 2025
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Optical system
- Patent number 12,346,033
- Issue date Jul 1, 2025
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo resist as opaque aperture mask on multispectral filter arrays
- Patent number 12,345,903
- Issue date Jul 1, 2025
- Materion Corporation
- Kevin R. Downing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavelength conversion apparatus, solid-state laser system, and elec...
- Patent number 12,334,700
- Issue date Jun 17, 2025
- Gigaphoton Inc.
- Yohei Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic patterning method and system therefore
- Patent number 12,332,574
- Issue date Jun 17, 2025
- Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Diederik Jan Maas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor lithography system and/or method
- Patent number 12,321,100
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for fabricating unique chips using a charged part...
- Patent number 12,322,569
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for generating EUV radiation
- Patent number 12,321,099
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Min Wang
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus having a device for determining the c...
- Patent number 12,306,551
- Issue date May 20, 2025
- Carl Zeiss SMT GmbH
- Dirk Ehm
- G01 - MEASURING TESTING
Information Patent Grant
Optical element, EUV lithography system, and method for forming nan...
- Patent number 12,306,539
- Issue date May 20, 2025
- Carl Zeiss SMT GmbH
- Anastasia Gonchar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure tool
- Patent number 12,306,542
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,298,672
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination correction apparatus
- Patent number 12,298,671
- Issue date May 13, 2025
- Samsung Electronics Co., Ltd.
- Donghyeong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid handling system, method and lithographic apparatus
- Patent number 12,287,580
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Cornelius Maria Rops
- B06 - GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
Information Patent Grant
Method for fabricating anti-reflective layer on quartz surface by u...
- Patent number 12,287,454
- Issue date Apr 29, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Lina Shi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of manufacturing semiconductor devices using a photomask
- Patent number 12,287,581
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Oxygen-loss resistant top coating for optical elements
- Patent number 12,287,455
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for microlithography
- Patent number 12,276,917
- Issue date Apr 15, 2025
- Carl Zeiss SMT GmbH
- Jan Horn
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV collector mirror
- Patent number 12,276,815
- Issue date Apr 15, 2025
- Carl Zeiss SMT GmbH
- Marcus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus
- Patent number 12,265,337
- Issue date Apr 1, 2025
- ASML Netherlands B.V.
- Junichi Kanehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and method of detecting fluid leakage in liquid...
- Patent number 12,259,657
- Issue date Mar 25, 2025
- United Microelectronics Corp.
- Zhi Fan Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for optically processing an object
- Patent number 12,253,803
- Issue date Mar 18, 2025
- Karlsruher Institut für Technologie
- Matthias Lauermann
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Substrate holder for use in a lithographic apparatus
- Patent number 12,249,535
- Issue date Mar 11, 2025
- ASML Netherlands B.V.
- Niek Jacobus Johannes Roset
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of using wafer stage
- Patent number 12,242,199
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography apparatus and a method of manufacturing a device
- Patent number 12,242,200
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Erik Henricus Egidius Catharina Eummelen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for producing ultrapure water for semiconductor...
- Patent number 12,221,371
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- En Tian Lin
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Exposure apparatus and method of manufacturing article
- Patent number 12,216,410
- Issue date Feb 4, 2025
- Canon Kabushiki Kaisha
- Keiji Emoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS, COMPUTER PROGRAMS AND APPARATUSES FOR TREATING AN OPTICAL...
- Publication number 20250237960
- Publication date Jul 24, 2025
- Carl Zeiss SMS Ltd.
- Sergey Oshemkov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE
- Publication number 20250237962
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- Manfred Petrus Johannes Maria DIKKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR LASER LITHOGRAPHIC FABRICATION OF SURFACE...
- Publication number 20250237964
- Publication date Jul 24, 2025
- David John McGee
- G02 - OPTICS
Information Patent Application
Transferable Nanostructure Fabrication by Gapless Stencil Lithography
- Publication number 20250236105
- Publication date Jul 24, 2025
- Massachusetts Institute of Technology
- Riccardo Comin
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20250231399
- Publication date Jul 17, 2025
- Carl Zeiss SMT GMBH
- Eric EVA
- G02 - OPTICS
Information Patent Application
ANALYTIC METHOD AND DEVICE FOR QUANTITATIVELY CALCULATING LINE EDGE...
- Publication number 20250224684
- Publication date Jul 10, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Dandan Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR DEVICE, PROJECTION OBJECTIVE AND METHOD FOR MEASURING THE TE...
- Publication number 20250216801
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Andreas Raba
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL ELEMENT FOR A PROJECTION EXPOSURE SYSTEM, OPTICAL SYSTEM CO...
- Publication number 20250216797
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Sonia Anaelle BISSIE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF USING LITHOGRAPHY APPARATUS
- Publication number 20250216795
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Ahyun Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Facet Mirror, Illumination Optical Unit, Arrangement of a Facet Mir...
- Publication number 20250216796
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF USING WAFER STAGE
- Publication number 20250199415
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Yao LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER PROCESSING SYSTEM AND LASER PROCESSING METHOD
- Publication number 20250199416
- Publication date Jun 19, 2025
- Gigaphoton Inc.
- Akira SUWA
- G02 - OPTICS
Information Patent Application
LEARNING CONTROL SYSTEM AND METHOD FOR ULTRA-PRECISION LITHOGRAPHIC...
- Publication number 20250199417
- Publication date Jun 19, 2025
- HARBIN INSTITUTE OF TECHNOLOGY
- Fazhi SONG
- G05 - CONTROLLING REGULATING
Information Patent Application
CRITICAL DIMENSION UNIFORMITY TUNING BASED ON MASK DESIGN FEATURE D...
- Publication number 20250189901
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Daniel FULFORD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECT...
- Publication number 20250189900
- Publication date Jun 12, 2025
- Carl Zeiss SMT GMBH
- Sandro HOFFMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR CALIBRATING A FLUID DISPENSER
- Publication number 20250189899
- Publication date Jun 12, 2025
- Canon Kabushiki Kaisha
- Qi Ni
- B82 - NANO-TECHNOLOGY
Information Patent Application
DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20250180998
- Publication date Jun 5, 2025
- Carl Zeiss SMT GMBH
- Oliver HERBST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20250180999
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsieh-Yu WEI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAYER STACK FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20250164891
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Soo Doo Chae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS...
- Publication number 20250164890
- Publication date May 22, 2025
- Carl Zeiss SMT GMBH
- Stephan Six
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SCANNER THROUGHPUT
- Publication number 20250164892
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Chieh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATE 3D PHOTORESIST PROFILES USING DIGITAL LITHOGRAPHY
- Publication number 20250155797
- Publication date May 15, 2025
- Applied Materials, Inc.
- Chi-Ming TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOETCHING MACHINE WITH OPTICAL FIBER ARRAYS
- Publication number 20250155822
- Publication date May 15, 2025
- WESTLAKE UNIVERSITY
- Xijun LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FACET MIRROR ASSEMBLY
- Publication number 20250147426
- Publication date May 8, 2025
- Carl Zeiss SMT GMBH
- Ralf Ameling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND
- Publication number 20250147438
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Krishanu SHOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20250147427
- Publication date May 8, 2025
- Carl Zeiss SMT GMBH
- Carlos Alberto JANSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY, PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITH...
- Publication number 20250138302
- Publication date May 1, 2025
- Carl Zeiss SMT GMBH
- Thilo Pollak
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICOND...
- Publication number 20250135716
- Publication date May 1, 2025
- Carl Zeiss SMT GMBH
- Eduard SCHWEIGERT
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250140596
- Publication date May 1, 2025
- ASML NETHERLANDS B.V
- Niek Jacobus Johannes ROSET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MIRROR FOR A PROJECTION EXPOSURE APPARATUS
- Publication number 20250138228
- Publication date May 1, 2025
- Carl Zeiss SMT GMBH
- Valentin Jonatan Bolsinger
- G02 - OPTICS

Non-planar pattern area or non-planar masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate holder, lithographic apparatus, device manufacturing meth...

Dynamic generation of layout adaptive packaging

High-speed nanopatterning method and apparatus of two-color super-r...

Substrate holder and method of manufacturing a substrate holder

Optical system

Photo resist as opaque aperture mask on multispectral filter arrays

Wavelength conversion apparatus, solid-state laser system, and elec...

Lithographic patterning method and system therefore

Semiconductor lithography system and/or method

Method and system for fabricating unique chips using a charged part...

Method for generating EUV radiation

Projection exposure apparatus having a device for determining the c...

Optical element, EUV lithography system, and method for forming nan...

Immersion exposure tool

Semiconductor processing tool and methods of operation

Illumination correction apparatus

Fluid handling system, method and lithographic apparatus

Method for fabricating anti-reflective layer on quartz surface by u...

Method of manufacturing semiconductor devices using a photomask

Oxygen-loss resistant top coating for optical elements

Mirror, in particular for microlithography

EUV collector mirror

Exposure apparatus

Lithography system and method of detecting fluid leakage in liquid...

Apparatus and method for optically processing an object

Substrate holder for use in a lithographic apparatus

Method of using wafer stage

Lithography apparatus and a method of manufacturing a device

Systems and methods for producing ultrapure water for semiconductor...

Exposure apparatus and method of manufacturing article

Patents Applicationslast 30 patents

METHODS, COMPUTER PROGRAMS AND APPARATUSES FOR TREATING AN OPTICAL...

APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE

METHOD AND APPARATUS FOR LASER LITHOGRAPHIC FABRICATION OF SURFACE...

Transferable Nanostructure Fabrication by Gapless Stencil Lithography

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

ANALYTIC METHOD AND DEVICE FOR QUANTITATIVELY CALCULATING LINE EDGE...

MIRROR DEVICE, PROJECTION OBJECTIVE AND METHOD FOR MEASURING THE TE...

OPTICAL ELEMENT FOR A PROJECTION EXPOSURE SYSTEM, OPTICAL SYSTEM CO...

METHOD OF USING LITHOGRAPHY APPARATUS

Facet Mirror, Illumination Optical Unit, Arrangement of a Facet Mir...

METHOD OF USING WAFER STAGE

LASER PROCESSING SYSTEM AND LASER PROCESSING METHOD

LEARNING CONTROL SYSTEM AND METHOD FOR ULTRA-PRECISION LITHOGRAPHIC...

CRITICAL DIMENSION UNIFORMITY TUNING BASED ON MASK DESIGN FEATURE D...

INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECT...

APPARATUS AND METHOD FOR CALIBRATING A FLUID DISPENSER

DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

LAYER STACK FOR EXTREME ULTRAVIOLET LITHOGRAPHY

LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS...

LITHOGRAPHY SCANNER THROUGHPUT

GENERATE 3D PHOTORESIST PROFILES USING DIGITAL LITHOGRAPHY

PHOTOETCHING MACHINE WITH OPTICAL FIBER ARRAYS

FACET MIRROR ASSEMBLY

INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

OPTICAL ASSEMBLY, PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITH...

METHOD FOR PRODUCING A MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICOND...

SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS

MIRROR FOR A PROJECTION EXPOSURE APPARATUS