Non-planar pattern area or non-planar masks

Industry

CPC
G03F7/703

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/703Non-planar pattern area or non-planar masks

Industries

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for producing ultrapure water for semiconductor...
- Patent number 12,221,371
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- En Tian Lin
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Exposure apparatus and method of manufacturing article
- Patent number 12,216,410
- Issue date Feb 4, 2025
- Canon Kabushiki Kaisha
- Keiji Emoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 12,210,289
- Issue date Jan 28, 2025
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography film stack and lithography method
- Patent number 12,204,247
- Issue date Jan 21, 2025
- United Semiconductor (Xiamen) Co., Ltd.
- Ching-Shu Lo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate table, immersion lithographic apparatus and device manufa...
- Patent number 12,197,140
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Marco Koert Stavenga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure system and method for manufacturing electronic devices
- Patent number 12,197,132
- Issue date Jan 14, 2025
- Gigaphoton Inc.
- Koichi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced spatial/temporal overlaps to increase temporal overlaps to...
- Patent number 12,191,110
- Issue date Jan 7, 2025
- The University of Liverpool
- Nigel D Browning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical proximity correction method and method of manufacturing ext...
- Patent number 12,181,792
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Narak Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,174,541
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Exposure control in photolithographic direct exposure methods for m...
- Patent number 12,169,370
- Issue date Dec 17, 2024
- Laser Imaging Systems GmbH
- Christian Schwarz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle removal device and method
- Patent number 12,158,701
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Hsuan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for reproducing a target wavefront of an imaging optical pro...
- Patent number 12,158,703
- Issue date Dec 3, 2024
- Carl Zeiss SMT GmbH
- Lukas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint lithography
- Patent number 12,147,162
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Catharinus De Schiffart
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus with movable stages
- Patent number 12,147,167
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Junichi Kanehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Offset alignment method and micro-lithographic printing device
- Patent number 12,147,168
- Issue date Nov 19, 2024
- Mycronic AB
- Anders Svensson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for direct writing photoetching by parallel in...
- Patent number 12,130,554
- Issue date Oct 29, 2024
- ZHEJIANG LAB
- Cuifang Kuang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 12,117,721
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Nicolaas Rudolf Kemper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate stage and substrate processing system using the same
- Patent number 12,111,582
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Huan Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer stage and method of using
- Patent number 12,092,958
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,085,857
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Near-field lithography immersion system, immersion unit and interfa...
- Patent number 12,078,937
- Issue date Sep 3, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and a method of operating the apparatus
- Patent number 12,072,635
- Issue date Aug 27, 2024
- ASML Netherlands B.V.
- Christian Gerardus Norbertus Hendricus Marie Cloin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid handling system and lithographic apparatus
- Patent number 12,072,636
- Issue date Aug 27, 2024
- ASML Netherlands B.V.
- Theodorus Wilhelmus Polet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single grab overlay measurement of tall targets
- Patent number 12,066,322
- Issue date Aug 20, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Substrate holder, lithographic apparatus, device manufacturing meth...
- Patent number 12,055,862
- Issue date Aug 6, 2024
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lithography system and methods
- Patent number 12,050,405
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Eng Hock Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam position image optimization
- Patent number 12,044,978
- Issue date Jul 23, 2024
- Mycronic AB
- Anders Svensson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulse width expansion apparatus and electronic device manufacturing...
- Patent number 12,038,567
- Issue date Jul 16, 2024
- Gigaphoton Inc.
- Hirotaka Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
A METHOD AND APPARATUS FOR IMPROVING THE UNIFORMITY OF EXPOSURE OF...
- Publication number 20250053095
- Publication date Feb 13, 2025
- EULITHA A.G.
- FRANCIS CLUBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imprint Apparatus with Movable Stages
- Publication number 20250028259
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Junichi KANEHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DI...
- Publication number 20250028251
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES
- Publication number 20250021012
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jasper WINTERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS AND DEVICE FOR CHEMICAL PROCESSING OF A SURFACE
- Publication number 20250021013
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Jan Philip KRAACK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...
- Publication number 20250013156
- Publication date Jan 9, 2025
- Nikon Corporation
- Hideki Komatsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL DEVICE, METHOD FOR MEASURING AN ACTUAL TILT OF AN OPTICAL S...
- Publication number 20240426603
- Publication date Dec 26, 2024
- Carl Zeiss SMT GMBH
- Heiner ZWICKEL
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...
- Publication number 20240427251
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Douglas C. CAPPELLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240419082
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Hsin CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH RESOLUTION PHOTOLITHOGRAPHY
- Publication number 20240411229
- Publication date Dec 12, 2024
- TERA-PRINT LLC
- Andrey IVANKIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A FLUID EXTRACTION SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20240411230
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Benjamin Cunnegonda Henricus SMEETS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240402623
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Pin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES
- Publication number 20240402607
- Publication date Dec 5, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Thomas Klein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE M...
- Publication number 20240393700
- Publication date Nov 28, 2024
- Canon Kabushiki Kaisha
- JUN KITAGAWA
- G05 - CONTROLLING REGULATING
Information Patent Application
SYSTEMS AND METHODS FOR PRODUCING ULTRAPURE WATER FOR SEMICONDUCTOR...
- Publication number 20240383789
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- En Tian Lin
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Application
SEMICONDUCTOR SUBSTRATE STAGE FOR CARRING SUBSTRATE
- Publication number 20240377762
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Huan CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC...
- Publication number 20240345490
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Paul VAN DONGEN
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
EXPOSURE DEVICE
- Publication number 20240345486
- Publication date Oct 17, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240337949
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Eng Hock LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CYCLIC EXPOSURE SCANNING SYSTEM HAVING DISTRIBUTED MULTI-LENS AND M...
- Publication number 20240329541
- Publication date Oct 3, 2024
- National Cheng Kung University
- YUNG-CHUN LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHIP PREPARATION METHOD AND SYSTEM, AND CHIP
- Publication number 20240334843
- Publication date Oct 3, 2024
- TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
- Jingjing HU
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
LIGHTING OPTICAL SYSTEM AND EXPOSURE APPARATUS
- Publication number 20240319610
- Publication date Sep 26, 2024
- Ushio Denki Kabushiki Kaisha
- Osamu OSAWA
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY SYSTEM AND METHOD OF DETECTING FLUID LEAKAGE IN LIQUID...
- Publication number 20240319611
- Publication date Sep 26, 2024
- United Microelectronics Corp.
- Zhi Fan Sun
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...
- Publication number 20240302753
- Publication date Sep 12, 2024
- ASML Holding N.V.
- Mahesh Upendra AJGAONKAR
- G01 - MEASURING TESTING
Information Patent Application
PHOTOLITHOGRAPHY METHOD BASED ON BILAYER PHOTORESIST
- Publication number 20240295817
- Publication date Sep 5, 2024
- SHANGHAI MICROSTART PHOTOELECTRIC TECHNOLOGY CO., LTD.
- Yijiao GAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COOLING HOOD FOR RETICLE
- Publication number 20240288783
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF FORMING OPTICALLY-A...
- Publication number 20240288678
- Publication date Aug 29, 2024
- FUJIFILM CORPORATION
- Hirotoshi ANDO
- G02 - OPTICS

Non-planar pattern area or non-planar masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods for producing ultrapure water for semiconductor...

Exposure apparatus and method of manufacturing article

Mirror, in particular for a microlithographic projection exposure a...

Lithography film stack and lithography method

Substrate table, immersion lithographic apparatus and device manufa...

Exposure system and method for manufacturing electronic devices

Reduced spatial/temporal overlaps to increase temporal overlaps to...

Optical proximity correction method and method of manufacturing ext...

Composition for forming silicon-containing resist underlayer film a...

Exposure control in photolithographic direct exposure methods for m...

Particle removal device and method

Method for reproducing a target wavefront of an imaging optical pro...

Imprint lithography

Imprint apparatus with movable stages

Offset alignment method and micro-lithographic printing device

Method and apparatus for direct writing photoetching by parallel in...

Lithographic apparatus and device manufacturing method

Substrate stage and substrate processing system using the same

Wafer stage and method of using

Composition for forming silicon-containing resist underlayer film a...

Near-field lithography immersion system, immersion unit and interfa...

Lithographic apparatus and a method of operating the apparatus

Fluid handling system and lithographic apparatus

Single grab overlay measurement of tall targets

Substrate holder, lithographic apparatus, device manufacturing meth...

Lithography system and methods

Beam position image optimization

Multi-charged-particle-beam writing method, multi-charged-particle-...

Method of manufacturing photo masks

Pulse width expansion apparatus and electronic device manufacturing...

Patents Applicationslast 30 patents

A METHOD AND APPARATUS FOR IMPROVING THE UNIFORMITY OF EXPOSURE OF...

Imprint Apparatus with Movable Stages

LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DI...

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES

PROCESS AND DEVICE FOR CHEMICAL PROCESSING OF A SURFACE

IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...

OPTICAL DEVICE, METHOD FOR MEASURING AN ACTUAL TILT OF AN OPTICAL S...

INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...

LITHOGRAPHY SYSTEM AND METHODS

HIGH RESOLUTION PHOTOLITHOGRAPHY

A FLUID EXTRACTION SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS

LITHOGRAPHY SYSTEM AND METHODS

UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES

INFORMATION PROCESSING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE M...

SYSTEMS AND METHODS FOR PRODUCING ULTRAPURE WATER FOR SEMICONDUCTOR...

SEMICONDUCTOR SUBSTRATE STAGE FOR CARRING SUBSTRATE

AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC...

EXPOSURE DEVICE

METHOD OF MANUFACTURING PHOTO MASKS

LITHOGRAPHY SYSTEM AND METHODS

CYCLIC EXPOSURE SCANNING SYSTEM HAVING DISTRIBUTED MULTI-LENS AND M...

CHIP PREPARATION METHOD AND SYSTEM, AND CHIP

LIGHTING OPTICAL SYSTEM AND EXPOSURE APPARATUS

LITHOGRAPHY SYSTEM AND METHOD OF DETECTING FLUID LEAKAGE IN LIQUID...

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...

PHOTOLITHOGRAPHY METHOD BASED ON BILAYER PHOTORESIST

COOLING HOOD FOR RETICLE

EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF FORMING OPTICALLY-A...