Obtaining or maintaining desired pressure

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CPC
H01J2237/182

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/182Obtaining or maintaining desired pressure

Industries

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Patents Grantslast 30 patents

Information Patent Grant
High aspect ratio etch with infinite selectivity
- Patent number 12,354,880
- Issue date Jul 8, 2025
- Lam Research Corporation
- Leonid Belau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 12,354,871
- Issue date Jul 8, 2025
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Focused ion beam system
- Patent number 12,354,828
- Issue date Jul 8, 2025
- V Technology Co., Ltd.
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma ultraviolet enhanced deposition
- Patent number 12,334,317
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hai-Dang Trinh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,334,313
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Hwajun Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier device, semiconductor apparatus, and residual charge detect...
- Patent number 12,315,706
- Issue date May 27, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jian Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic susceptor
- Patent number 12,283,513
- Issue date Apr 22, 2025
- MiCo Ceramics Ltd.
- Jusung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma coating solid fuels and coated soli...
- Patent number 12,264,289
- Issue date Apr 1, 2025
- The United States of America as represented by the Secretary of the Army
- Shaun M. Debow
- B08 - CLEANING
Information Patent Grant
Device and method for sputtering and depositing metal on surface of...
- Patent number 12,266,513
- Issue date Apr 1, 2025
- Lanzhou Institute of Chemical Physics, CAS
- Bin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming method of plasma resistant oxyfluoride coating layer
- Patent number 12,237,153
- Issue date Feb 25, 2025
- KOREA INSTITUTE OF CERAMIC ENGINEERING AND TECHNOLOGY
- Sung min Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of material comprising silicon and oxygen usin...
- Patent number 12,227,835
- Issue date Feb 18, 2025
- ASM IP Holding B.V.
- Viraj Madhiwala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pressure-induced temperature modification during atomic scale proce...
- Patent number 12,205,803
- Issue date Jan 21, 2025
- Kurt J. Lesker Company
- Gilbert Bruce Rayner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,191,124
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Tatsuo Matsudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 12,106,929
- Issue date Oct 1, 2024
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 12,087,561
- Issue date Sep 10, 2024
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and prediction method of the condition...
- Patent number 12,080,529
- Issue date Sep 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Etching apparatus and methods of cleaning thereof
- Patent number 12,080,582
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
High density carbon films for patterning applications
- Patent number 11,842,897
- Issue date Dec 12, 2023
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for evacuating a chamber
- Patent number 11,830,701
- Issue date Nov 28, 2023
- ASML Netherlands B.V.
- Fangfu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and processing method, and gas cluster generat...
- Patent number 11,772,138
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Kazuya Dobashi
- B08 - CLEANING
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 11,710,623
- Issue date Jul 25, 2023
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Coupling for connecting analytical systems with vibrational isolation
- Patent number 11,699,582
- Issue date Jul 11, 2023
- FEI Company
- Alexander Makarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 11,651,931
- Issue date May 16, 2023
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,569,068
- Issue date Jan 31, 2023
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-pressure plasma chamber, low-pressure plasma installation and m...
- Patent number 11,532,465
- Issue date Dec 20, 2022
- Christof-Herbert Diener
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Grant
Ion implanter toxic gas delivery system
- Patent number 11,527,380
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ying-Chieh Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced electron beam generation
- Patent number 11,517,975
- Issue date Dec 6, 2022
- Arcam AB
- Mattias Fager
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Plasma processing apparatus
- Patent number 11,387,083
- Issue date Jul 12, 2022
- Shibaura Mechatronics Corporation
- Hidehito Azumano
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM TUBE
- Publication number 20250218719
- Publication date Jul 3, 2025
- Carl Zeiss MultiSEM GmbH
- Michael Kelp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF VERIFYING WORKPIECE ALIGNMENT
- Publication number 20250191944
- Publication date Jun 12, 2025
- Axcelis Technologies, Inc.
- Yusef Nouri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU BACK SIDE PLASMA TREATMENT FOR RESIDUE REMOVAL FROM SUBSTRATES
- Publication number 20250140530
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- Tu HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION OF MATERIAL COMPRISING SILICON AND OXYGEN USIN...
- Publication number 20250092515
- Publication date Mar 20, 2025
- ASM IP HOLDING B.V.
- Viraj Madhiwala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS
- Publication number 20250022704
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiang Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INCREASED ETCH RATES OF SILICON-CONTAINING MATERIALS
- Publication number 20240429062
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF SELECTIVELY ETCHING SILICON NITRIDE
- Publication number 20240420962
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Doreen Wei Ying Yong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICES AND MEMBRANE ASSEMBLIES USEFUL THEREIN
- Publication number 20240412940
- Publication date Dec 12, 2024
- AIRSEM TECHNOLOGIES LTD.
- Jenny SHKLOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20240404794
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Derek William Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALOGEN-FREE ETCHING OF SILICON NITRIDE
- Publication number 20240404837
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Zhiren Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT
- Publication number 20240395514
- Publication date Nov 28, 2024
- Prashant AGARWAL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING CAPACITOR STRUCTURE
- Publication number 20240387606
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Qinghui ZHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Program, Information Processing Method, Information Processing Devi...
- Publication number 20240355653
- Publication date Oct 24, 2024
- SPP Technologies Co., Ttd.
- Tatsuo Hiramura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR APPLYING VACUUM-PLASMA TREATMENT
- Publication number 20240355594
- Publication date Oct 24, 2024
- ADDON OPTICS LTD.
- Arye Bar Erez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND METHODS OF CLEANING THEREOF
- Publication number 20240355663
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DENSIFIED SEAM-FREE SILICON GAP FILL PROCESSES
- Publication number 20240331975
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Shuchi Sunil Ojha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT C...
- Publication number 20240290585
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Pradeep SAMPATH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHODS TO IMPROVE ETCHED SILICON-AND-GERMANIUM-CONTAINI...
- Publication number 20240290623
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Bin Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20240282548
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Yeoseon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING GROUP III-NITRIDE SEMICONDUCTOR
- Publication number 20240266168
- Publication date Aug 8, 2024
- SCREEN Holdings Co., Ltd.
- Masaki INABA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ceramic Susceptor
- Publication number 20240234194
- Publication date Jul 11, 2024
- MICO CERAMICS LTD.
- Jusung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN CHAMBER FOR SCANNING ELECTRON MICROSCOPE, ELECTRON GUN...
- Publication number 20240212971
- Publication date Jun 27, 2024
- National Institute for Materials Science
- Han ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20240203694
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Takuji SAKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240175125
- Publication date May 30, 2024
- TOKYO ELECTRON LIMITED
- Sung Duk SON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING FACILITY AND METHOD OF OPERATING THE SAME
- Publication number 20240128065
- Publication date Apr 18, 2024
- LOT CES CO., LTD.
- Jin Ho BAE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240120183
- Publication date Apr 11, 2024
- Tokyo Electron Limited
- Makoto WADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU CARBON LINER FOR HIGH ASPECT RATIO FEATURES
- Publication number 20240096641
- Publication date Mar 21, 2024
- Applied Materials, Inc.
- Hailong Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240047194
- Publication date Feb 8, 2024
- Tokyo Electron Limited
- Kenichi KOTE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR FORMING LAYERS HAVING SINGLE CR...
- Publication number 20240035195
- Publication date Feb 1, 2024
- Applied Materials, Inc.
- Qinghua ZHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEUTRAL BEAM ANNEALING APPARATUS AND METHOD OF MANUFACTURING DISPLA...
- Publication number 20240030043
- Publication date Jan 25, 2024
- SAMSUNG DISPLAY CO., LTD.
- Takayuki FUKASAWA
- H01 - BASIC ELECTRIC ELEMENTS

Obtaining or maintaining desired pressure

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

High aspect ratio etch with infinite selectivity

Ultrathin atomic layer deposition film accuracy thickness control

Focused ion beam system

Remote plasma ultraviolet enhanced deposition

Plasma processing apparatus and plasma processing method

Carrier device, semiconductor apparatus, and residual charge detect...

Ceramic susceptor

Apparatus and method for plasma coating solid fuels and coated soli...

Device and method for sputtering and depositing metal on surface of...

Forming method of plasma resistant oxyfluoride coating layer

Selective deposition of material comprising silicon and oxygen usin...

Pressure-induced temperature modification during atomic scale proce...

Plasma processing apparatus and plasma processing method

Refillable ion chamber with automated purging system

Vacuum pump protection against deposition byproduct buildup

Plasma processing apparatus and prediction method of the condition...

Etching apparatus and methods of cleaning thereof

Vacuum chamber arrangement for charged particle beam generator

High density carbon films for patterning applications

System for evacuating a chamber

Processing apparatus and processing method, and gas cluster generat...

Vacuum pump protection against deposition byproduct buildup

Vacuum chamber arrangement for charged particle beam generator

Coupling for connecting analytical systems with vibrational isolation

Refillable ion chamber with automated purging system

Plasma processing apparatus

Low-pressure plasma chamber, low-pressure plasma installation and m...

Ion implanter toxic gas delivery system

Enhanced electron beam generation

Plasma processing apparatus

Patents Applicationslast 30 patents

MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM TUBE

SYSTEM AND METHOD OF VERIFYING WORKPIECE ALIGNMENT

IN-SITU BACK SIDE PLASMA TREATMENT FOR RESIDUE REMOVAL FROM SUBSTRATES

SELECTIVE DEPOSITION OF MATERIAL COMPRISING SILICON AND OXYGEN USIN...

DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS

INCREASED ETCH RATES OF SILICON-CONTAINING MATERIALS

METHODS OF SELECTIVELY ETCHING SILICON NITRIDE

CHARGED PARTICLE BEAM DEVICES AND MEMBRANE ASSEMBLIES USEFUL THEREIN

PLASMA PROCESSING METHOD AND APPARATUS

HALOGEN-FREE ETCHING OF SILICON NITRIDE

MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT

METHOD FOR MANUFACTURING CAPACITOR STRUCTURE

Program, Information Processing Method, Information Processing Devi...

APPARATUS AND METHODS FOR APPLYING VACUUM-PLASMA TREATMENT

ETCHING APPARATUS AND METHODS OF CLEANING THEREOF

DENSIFIED SEAM-FREE SILICON GAP FILL PROCESSES

HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT C...

PROCESSING METHODS TO IMPROVE ETCHED SILICON-AND-GERMANIUM-CONTAINI...

FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF

METHOD OF MANUFACTURING GROUP III-NITRIDE SEMICONDUCTOR

Ceramic Susceptor

ELECTRON GUN CHAMBER FOR SCANNING ELECTRON MICROSCOPE, ELECTRON GUN...

ETCHING METHOD AND ETCHING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SEMICONDUCTOR MANUFACTURING FACILITY AND METHOD OF OPERATING THE SAME

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

IN-SITU CARBON LINER FOR HIGH ASPECT RATIO FEATURES

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHODS, SYSTEMS, AND APPARATUS FOR FORMING LAYERS HAVING SINGLE CR...

NEUTRAL BEAM ANNEALING APPARATUS AND METHOD OF MANUFACTURING DISPLA...