Optical aspects of refractive systems

Industry

CPC
G03F7/70241

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70241Optical aspects of refractive systems

Industries

Patents Grantslast 30 patents

Information Patent Grant
Lithography projection objective
- Patent number 11,899,181
- Issue date Feb 13, 2024
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Yinzhang Guo
- G02 - OPTICS
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 11,385,552
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for protecting optics from vacuum ultraviolet light
- Patent number 11,262,664
- Issue date Mar 1, 2022
- KLA Corporation
- Matthew Derstine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterned stamp manufacturing method, patterned stamp and imprintin...
- Patent number 11,086,217
- Issue date Aug 10, 2021
- Koninklijke Philips N.V.
- Remco Van Brakel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection objective
- Patent number 10,983,442
- Issue date Apr 20, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Fuping An
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens, projection exposure apparatus and projection expos...
- Patent number 10,969,694
- Issue date Apr 6, 2021
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calculation method, exposure method, storage medium, exposure appar...
- Patent number 10,859,927
- Issue date Dec 8, 2020
- Canon Kabushiki Kaisha
- Koshiro Arahara
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 10,831,109
- Issue date Nov 10, 2020
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavefront correction element for use in an optical system
- Patent number 10,684,553
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Peter Huber
- G02 - OPTICS
Information Patent Grant
Optical system for field mapping and/or pupil mapping
- Patent number 10,656,411
- Issue date May 19, 2020
- Carl Zeiss SMT GmbH
- Holger Muenz
- G02 - OPTICS
Information Patent Grant
Exposure method, exposure system, and manufacturing method for semi...
- Patent number 10,599,045
- Issue date Mar 24, 2020
- TOSHIBA MEMORY CORPORATION
- Yoshio Mizuta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,551,746
- Issue date Feb 4, 2020
- ASML Netherlands B.V.
- Benjamin Cunnegonda Henricus Smeets
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Attenuation filter for projection lens, projection lens having atte...
- Patent number 10,416,569
- Issue date Sep 17, 2019
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system
- Patent number 10,386,733
- Issue date Aug 20, 2019
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adjusting device and adjusting method for exposure device
- Patent number 10,197,919
- Issue date Feb 5, 2019
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Jinglu Sun
- G02 - OPTICS
Information Patent Grant
Chromatically corrected objective with specifically structured and...
- Patent number 10,101,668
- Issue date Oct 16, 2018
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus
- Patent number 10,012,907
- Issue date Jul 3, 2018
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic system
- Patent number 9,989,863
- Issue date Jun 5, 2018
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging device and method for reducing dynamic fluctuations...
- Patent number 9,817,322
- Issue date Nov 14, 2017
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective for a microlithographic projection exposure ap...
- Patent number 9,588,445
- Issue date Mar 7, 2017
- Carl Zeiss SMT GmbH
- Norbert Wabra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with catadioptric optical subsystem
- Patent number 9,341,831
- Issue date May 17, 2016
- Canon Kabushiki Kaisha
- Masatsugu Nakano
- G02 - OPTICS
Information Patent Grant
Projection objective for a microlithographic projection exposure ap...
- Patent number 9,280,058
- Issue date Mar 8, 2016
- Carl Zeiss SMT GmbH
- Norbert Wabra
- G02 - OPTICS
Information Patent Grant
Illumination optical system and projection-type display apparatus
- Patent number 9,164,263
- Issue date Oct 20, 2015
- Canon Kabushiki Kaisha
- Kazuhiro Inoko
- G02 - OPTICS
Information Patent Grant
Projection objective lens system
- Patent number 8,970,964
- Issue date Mar 3, 2015
- Shanghai Micro Electronics Equipment Co., Ltd.
- Lirong Zhu
- G02 - OPTICS
Information Patent Grant
Projection objective for a microlithographic projection exposure ap...
- Patent number 8,902,407
- Issue date Dec 2, 2014
- Carl Zeiss SMT GmbH
- Norbert Wabra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system and exposure apparatus
- Patent number 8,208,125
- Issue date Jun 26, 2012
- Canon Kabushiki Kaisha
- Koji Aoki
- G02 - OPTICS
Information Patent Grant
Projection objective for a microlithographic projection exposure ap...
- Patent number 8,064,041
- Issue date Nov 22, 2011
- Carl Zeiss SMT GmbH
- Norbert Wabra
- G02 - OPTICS
Information Patent Grant
Optical imaging device and method for reducing dynamic fluctuations...
- Patent number 8,027,023
- Issue date Sep 27, 2011
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective for immersion lithography
- Patent number 7,969,663
- Issue date Jun 28, 2011
- Carl Zeiss SMT GmbH
- Aurelian Dodoc
- G02 - OPTICS
Information Patent Grant
Polarization rotator and a crystalline-quartz plate for use in an o...
- Patent number 7,961,298
- Issue date Jun 14, 2011
- Carl Zeiss SMT GmbH
- Michael Gerhard
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK PROCESSING APPARATUS AND METHOD OF PROCESSING PHOTOMASK
- Publication number 20240053685
- Publication date Feb 15, 2024
- SEMES CO., LTD.
- Youngdae Chung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM
- Publication number 20220236652
- Publication date Jul 28, 2022
- Carl Zeiss SMT GMBH
- Rolf Freimann
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20220075159
- Publication date Mar 10, 2022
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Yinzhang GUO
- G02 - OPTICS
Information Patent Application
TRANSMISSIVE DIFFUSOR
- Publication number 20210382209
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Andrey NIKIPELOV
- B82 - NANO-TECHNOLOGY
Information Patent Application
SYSTEM AND METHOD FOR PROTECTING OPTICS FROM VACUUM ULTRAVIOLET LIGHT
- Publication number 20210149315
- Publication date May 20, 2021
- KLA Corporation
- Matthew Derstine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20210026256
- Publication date Jan 28, 2021
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAVEFRONT CORRECTION ELEMENT FOR USE IN AN OPTICAL SYSTEM
- Publication number 20200033735
- Publication date Jan 30, 2020
- Carl Zeiss SMT GMBH
- Peter HUBER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION LENS, PROJECTION EXPOSURE APPARATUS AND PROJECTION EXPOS...
- Publication number 20200026199
- Publication date Jan 23, 2020
- Carl Zeiss SMT GMBH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM
- Publication number 20190354025
- Publication date Nov 21, 2019
- Carl Zeiss SMT GMBH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALCULATION METHOD, EXPOSURE METHOD, STORAGE MEDIUM, EXPOSURE APPAR...
- Publication number 20190086822
- Publication date Mar 21, 2019
- Canon Kabushiki Kaisha
- Koshiro Arahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, EXPOSURE SYSTEM, AND MANUFACTURING METHOD FOR SEMI...
- Publication number 20190079412
- Publication date Mar 14, 2019
- Toshiba Memory Corporation
- Yoshio MIZUTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATTENUATION FILTER FOR PROJECTION LENS, PROJECTION LENS HAVING ATTE...
- Publication number 20190064676
- Publication date Feb 28, 2019
- Carl Zeiss SMT GMBH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...
- Publication number 20180373155
- Publication date Dec 27, 2018
- Carl Zeiss SMT GMBH
- Norbert Wabra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20180321593
- Publication date Nov 8, 2018
- ASML NETHERLANDS B.V.
- Benjamin Cunnegonda Henricus SMEETS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM FOR FIELD MAPPING AND/OR PUPIL MAPPING
- Publication number 20180210192
- Publication date Jul 26, 2018
- Carl Zeiss SMT GMBH
- Holger Muenz
- G02 - OPTICS
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20180173112
- Publication date Jun 21, 2018
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM
- Publication number 20180101105
- Publication date Apr 12, 2018
- Carl Zeiss SMT GMBH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE DEVICE
- Publication number 20180003952
- Publication date Jan 4, 2018
- V TECHNOLOGY CO., LTD.
- Michinobu MIZUMURA
- G02 - OPTICS
Information Patent Application
PATTERNED STAMP MANUFACTURING METHOD, PATERNED STAMP AND IMPRINTING...
- Publication number 20180004084
- Publication date Jan 4, 2018
- Remco VAN BRAKEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTING DEVICE AND ADJUSTING METHOD FOR EXPOSURE DEVICE
- Publication number 20170322493
- Publication date Nov 9, 2017
- Jinglu SUN
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20170082928
- Publication date Mar 23, 2017
- Carl Zeiss SMT GMBH
- Markus DEGUENTHER
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC SYSTEM
- Publication number 20170052456
- Publication date Feb 23, 2017
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus VAN SCHOOT
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL SYSTEM WITH CATADIOPTRIC OPTICAL SUBSYSTEM
- Publication number 20140204473
- Publication date Jul 24, 2014
- Canon Kabushiki Kaisha
- Masatsugu Nakano
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL SYSTEM AND PROJECTION-TYPE DISPLAY APPARATUS
- Publication number 20140118707
- Publication date May 1, 2014
- Canon Kabushiki Kaisha
- Kazuhiro Inoko
- G02 - OPTICS
Information Patent Application
LARGE FIELD PROJECTION OBJECTIVE FOR LITHOGRAPHY
- Publication number 20130293859
- Publication date Nov 7, 2013
- SHANGHAI MICRO ELECTRONICS EQUIPMENT Co., LTD.
- Heng Wu
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL ASSEMBLY, PROJECTION OPTICAL ASSEMBLY ADJUSTMENT...
- Publication number 20130278910
- Publication date Oct 24, 2013
- Hironori Ikezawa
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE LENS SYSTEM
- Publication number 20130250434
- Publication date Sep 26, 2013
- SHANGHAI MICRO ELECTRONICS EQUIPMENT Co., LTD.
- Lirong Zhu
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...
- Publication number 20120033296
- Publication date Feb 9, 2012
- Carl Zeiss SMT GMBH
- Norbert Wabra
- G02 - OPTICS
Information Patent Application
OPTICAL IMAGING DEVICE AND METHOD FOR REDUCING DYNAMIC FLUCTUATIONS...
- Publication number 20120026479
- Publication date Feb 2, 2012
- Carl Zeiss SMT GMBH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...
- Publication number 20110228246
- Publication date Sep 22, 2011
- Carl Zeiss SMT AG
- Bernhard Kneer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Optical aspects of refractive systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Lithography projection objective

Method of measuring a structure, inspection apparatus, lithographic...

System and method for protecting optics from vacuum ultraviolet light

Patterned stamp manufacturing method, patterned stamp and imprintin...

Projection objective

Projection lens, projection exposure apparatus and projection expos...

Calculation method, exposure method, storage medium, exposure appar...

Method of measuring a structure, inspection apparatus, lithographic...

Wavefront correction element for use in an optical system

Optical system for field mapping and/or pupil mapping

Exposure method, exposure system, and manufacturing method for semi...

Lithographic apparatus and method

Attenuation filter for projection lens, projection lens having atte...

Optical system

Adjusting device and adjusting method for exposure device

Chromatically corrected objective with specifically structured and...

Optical system of a microlithographic projection exposure apparatus

Lithographic system

Optical imaging device and method for reducing dynamic fluctuations...

Projection objective for a microlithographic projection exposure ap...

Optical system with catadioptric optical subsystem

Projection objective for a microlithographic projection exposure ap...

Illumination optical system and projection-type display apparatus

Projection objective lens system

Projection objective for a microlithographic projection exposure ap...

Projection optical system and exposure apparatus

Projection objective for a microlithographic projection exposure ap...

Optical imaging device and method for reducing dynamic fluctuations...

Projection objective for immersion lithography

Polarization rotator and a crystalline-quartz plate for use in an o...

Patents Applicationslast 30 patents

PHOTOMASK PROCESSING APPARATUS AND METHOD OF PROCESSING PHOTOMASK

OPTICAL SYSTEM

LITHOGRAPHY PROJECTION OBJECTIVE

TRANSMISSIVE DIFFUSOR

SYSTEM AND METHOD FOR PROTECTING OPTICS FROM VACUUM ULTRAVIOLET LIGHT

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

WAVEFRONT CORRECTION ELEMENT FOR USE IN AN OPTICAL SYSTEM

PROJECTION LENS, PROJECTION EXPOSURE APPARATUS AND PROJECTION EXPOS...

OPTICAL SYSTEM

CALCULATION METHOD, EXPOSURE METHOD, STORAGE MEDIUM, EXPOSURE APPAR...

EXPOSURE METHOD, EXPOSURE SYSTEM, AND MANUFACTURING METHOD FOR SEMI...

ATTENUATION FILTER FOR PROJECTION LENS, PROJECTION LENS HAVING ATTE...

PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...

LITHOGRAPHIC APPARATUS AND METHOD

OPTICAL SYSTEM FOR FIELD MAPPING AND/OR PUPIL MAPPING

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

OPTICAL SYSTEM

PROJECTION EXPOSURE DEVICE

PATTERNED STAMP MANUFACTURING METHOD, PATERNED STAMP AND IMPRINTING...

ADJUSTING DEVICE AND ADJUSTING METHOD FOR EXPOSURE DEVICE

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

LITHOGRAPHIC SYSTEM

OPTICAL SYSTEM WITH CATADIOPTRIC OPTICAL SUBSYSTEM

ILLUMINATION OPTICAL SYSTEM AND PROJECTION-TYPE DISPLAY APPARATUS

LARGE FIELD PROJECTION OBJECTIVE FOR LITHOGRAPHY

PROJECTION OPTICAL ASSEMBLY, PROJECTION OPTICAL ASSEMBLY ADJUSTMENT...

PROJECTION OBJECTIVE LENS SYSTEM

PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...

OPTICAL IMAGING DEVICE AND METHOD FOR REDUCING DYNAMIC FLUCTUATIONS...

PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...