Optical correction elements, filters and phase plates for manipulating

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G03F7/70308

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70308Optical correction elements, filters and phase plates for manipulating

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Patents Grantslast 30 patents

Information Patent Grant
Optical proximity correction method and method of manufacturing ext...
- Patent number 12,181,792
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Narak Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for reproducing a target wavefront of an imaging optical pro...
- Patent number 12,158,703
- Issue date Dec 3, 2024
- Carl Zeiss SMT GmbH
- Lukas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pulse width expansion apparatus and electronic device manufacturing...
- Patent number 12,038,567
- Issue date Jul 16, 2024
- Gigaphoton Inc.
- Hirotaka Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy correction module for an optical source apparatus
- Patent number 11,947,268
- Issue date Apr 2, 2024
- Cymer, LLC
- Yingbo Zhao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and projection lens with setting of the...
- Patent number 11,906,904
- Issue date Feb 20, 2024
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Imaging via zeroth order suppression
- Patent number 11,892,776
- Issue date Feb 6, 2024
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection device for masks for semiconductor lithography and method
- Patent number 11,867,642
- Issue date Jan 9, 2024
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Diffractive optical element
- Patent number 11,762,134
- Issue date Sep 19, 2023
- Lumentum Operations LLC
- John Michael Miller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo resist as opaque aperture mask on multispectral filter arrays
- Patent number 11,762,137
- Issue date Sep 19, 2023
- Materion Corporation
- Kevin R. Downing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 11,762,304
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Güneş Nakiboğlu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming shape on mask based on deep learning, and mask ma...
- Patent number 11,747,721
- Issue date Sep 5, 2023
- Samsung Electronics Co., Ltd.
- Useong Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus for generating extreme ultraviolet (EUV), method of manuf...
- Patent number 11,729,896
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Jihoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for industrial scale continuous holographic litho...
- Patent number 11,687,004
- Issue date Jun 27, 2023
- Photia Incorporated
- Joseph Bernhardt Geddes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV phase-shift SRAF masks by means of embedded phase shift layers
- Patent number 11,300,885
- Issue date Apr 12, 2022
- Intel Corporation
- Robert Bristol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo resist as opaque aperture mask on multispectral filter arrays
- Patent number 11,269,120
- Issue date Mar 8, 2022
- Materion Corporation
- Kevin R. Downing
- G02 - OPTICS
Information Patent Grant
Method and device for characterizing a mask for microlithography
- Patent number 11,188,000
- Issue date Nov 30, 2021
- Carl Zeiss SMT GmbH
- Michael Kamp-Froese
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical lithography system for patterning semiconductor devices and...
- Patent number 11,143,965
- Issue date Oct 12, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection exposure method and projection lens with setting of the...
- Patent number 11,143,967
- Issue date Oct 12, 2021
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Mask, device and method for exposure
- Patent number 11,086,228
- Issue date Aug 10, 2021
- BOE Technology Group Co., Ltd.
- Chunlong Yan
- G02 - OPTICS
Information Patent Grant
Method to mitigate defect printability for ID pattern
- Patent number 11,086,227
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Cheng Lu
- G02 - OPTICS
Information Patent Grant
Optical element, and method for correcting the wavefront effect of...
- Patent number 11,029,515
- Issue date Jun 8, 2021
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G02 - OPTICS
Information Patent Grant
Sensor, lithographic apparatus, and device manufacturing method
- Patent number 11,022,902
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for the correction of imaging defects
- Patent number 11,003,088
- Issue date May 11, 2021
- Carl Zeiss SMT GmbH
- Franz Sorg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for detecting optimal focal plane of lithograp...
- Patent number 10,976,670
- Issue date Apr 13, 2021
- The Institute of Optics and Electronics, the Chinese Academy of Sciences
- Jiajun Xu
- G02 - OPTICS
Information Patent Grant
Extreme ultraviolet lithography system, device, and method for prin...
- Patent number 10,976,655
- Issue date Apr 13, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical manipulator, projection lens and projection exposure apparatus
- Patent number 10,976,667
- Issue date Apr 13, 2021
- Carl Zeiss SMT GmbH
- Eric Eva
- G02 - OPTICS
Information Patent Grant
Wafer holding device and projection microlithography system
- Patent number 10,948,833
- Issue date Mar 16, 2021
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection device for masks for semiconductor lithography and method
- Patent number 10,928,332
- Issue date Feb 23, 2021
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Optical imaging arrangement with actively adjustable metrology supp...
- Patent number 10,890,850
- Issue date Jan 12, 2021
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical correction arrangement, projection objective having such an...
- Patent number 10,859,815
- Issue date Dec 8, 2020
- Carl Zeiss SMT GmbH
- Holger Walter
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...
- Publication number 20240427251
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Douglas C. CAPPELLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHTING OPTICAL SYSTEM AND EXPOSURE APPARATUS
- Publication number 20240319610
- Publication date Sep 26, 2024
- Ushio Denki Kabushiki Kaisha
- Osamu OSAWA
- G02 - OPTICS
Information Patent Application
EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...
- Publication number 20240248410
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
IMAGING VIA ZEROTH ORDER SUPPRESSION
- Publication number 20240219843
- Publication date Jul 4, 2024
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus BASELMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY FILM STACK AND LITHOGRAPHY METHOD
- Publication number 20240201598
- Publication date Jun 20, 2024
- United Semiconductor (Xiamen) Co., Ltd.
- Ching-Shu Lo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASSEMBLY FOR SEPARATING RADIATION IN THE FAR FIELD
- Publication number 20240168392
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Petrus Wilhelmus SMORENBURG
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...
- Publication number 20240128702
- Publication date Apr 18, 2024
- Gigaphoton Inc.
- Shinichi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ILLUMINATION CORRECTION APPARATUS
- Publication number 20240069443
- Publication date Feb 29, 2024
- Samsung Electronics Co., Ltd.
- Donghyeong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTO RESIST AS OPAQUE APERTURE MASK ON MULTISPECTRAL FILTER ARRAYS
- Publication number 20230375761
- Publication date Nov 23, 2023
- MATERION CORPORATION
- Kevin R. Downing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS, PRODUCTS, AND METHODS FOR GENERATING PATTERNING DEVICES AN...
- Publication number 20230185183
- Publication date Jun 15, 2023
- ASML NETHERLANDS B.V.
- Jiuning HU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REPRODUCING A TARGET WAVEFRONT OF AN IMAGING OPTICAL PRO...
- Publication number 20230130187
- Publication date Apr 27, 2023
- Carl Zeiss SMT GMBH
- Lukas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20230122333
- Publication date Apr 20, 2023
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENERGY CORRECTION MODULE FOR AN OPTICAL SOURCE APPARATUS
- Publication number 20230019832
- Publication date Jan 19, 2023
- CYMER, LLC
- Yingbo Zhao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF MANUFACTURING EXT...
- Publication number 20220413377
- Publication date Dec 29, 2022
- Samsung Electronics Co., Ltd.
- Narak Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PULSE WIDTH EXPANSION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20220350120
- Publication date Nov 3, 2022
- Gigaphoton Inc.
- Hirotaka MIYAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROJECTION EXPOSURE APPARATUS HAVING A DEVICE FOR DETERMINING THE C...
- Publication number 20220308457
- Publication date Sep 29, 2022
- Carl Zeiss SMT GMBH
- Dirk EHM
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20220260924
- Publication date Aug 18, 2022
- Carl Zeiss SMT GMBH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR FABRICATION APPARATUS AND METHOD OF USING THE SAME
- Publication number 20220252989
- Publication date Aug 11, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Der Chih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTO RESIST AS OPAQUE APERTURE MASK ON MULTISPECTRAL FILTER ARRAYS
- Publication number 20220146722
- Publication date May 12, 2022
- MATERION CORPORATION
- Kevin R. Downing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPROVED IMAGING VIA ZEROTH ORDER SUPPRESSION
- Publication number 20220066327
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus BASELMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING OR SETTING A PROJECTION EXPOSURE APPARATUS
- Publication number 20220043358
- Publication date Feb 10, 2022
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING SHAPE ON MASK BASED ON DEEP LEARNING, AND MASK MA...
- Publication number 20220035236
- Publication date Feb 3, 2022
- Samsung Electronics Co., Ltd.
- Useong KIM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION LENS WITH SETTING OF THE...
- Publication number 20220026814
- Publication date Jan 27, 2022
- Carl Zeiss SMT GMBH
- Toralf Gruner
- G02 - OPTICS
Information Patent Application
COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE
- Publication number 20210405543
- Publication date Dec 30, 2021
- Carl Zeiss SMT GMBH
- Marwène Nefzi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIFFRACTIVE OPTICAL ELEMENT
- Publication number 20210278576
- Publication date Sep 9, 2021
- Lumentum Operations LLC
- John Michael MILLER
- G02 - OPTICS
Information Patent Application
SYSTEM AND METHOD FOR INDUSTRIAL SCALE CONTINUOUS HOLOGRAPHIC LITHO...
- Publication number 20210173311
- Publication date Jun 10, 2021
- Photia Incorporated
- Joseph Bernhardt Geddes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION DEVICE FOR MASKS FOR SEMICONDUCTOR LITHOGRAPHY AND METHOD
- Publication number 20210156809
- Publication date May 27, 2021
- Carl Zeiss SMT GMBH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Application
OVERLAY METROLOGY TOOL AND METHODS OF PERFORMING OVERLAY MEASUREMENTS
- Publication number 20210116819
- Publication date Apr 22, 2021
- Taiwan Semiconductor Manufacturing company Ltd.
- Hung-Chih Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sensor, Lithographic Apparatus, and Device Manufacturing Method
- Publication number 20210072647
- Publication date Mar 11, 2021
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, AND METHOD FOR CORRECTING THE WAVEFRONT EFFECT OF...
- Publication number 20200393673
- Publication date Dec 17, 2020
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Optical correction elements, filters and phase plates for manipulating

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Optical proximity correction method and method of manufacturing ext...

Method for reproducing a target wavefront of an imaging optical pro...

Pulse width expansion apparatus and electronic device manufacturing...

Energy correction module for an optical source apparatus

Projection exposure method and projection lens with setting of the...

Imaging via zeroth order suppression

Inspection device for masks for semiconductor lithography and method

Diffractive optical element

Photo resist as opaque aperture mask on multispectral filter arrays

Lithographic apparatus

Method of forming shape on mask based on deep learning, and mask ma...

Apparatus for generating extreme ultraviolet (EUV), method of manuf...

System and method for industrial scale continuous holographic litho...

EUV phase-shift SRAF masks by means of embedded phase shift layers

Photo resist as opaque aperture mask on multispectral filter arrays

Method and device for characterizing a mask for microlithography

Optical lithography system for patterning semiconductor devices and...

Projection exposure method and projection lens with setting of the...

Mask, device and method for exposure

Method to mitigate defect printability for ID pattern

Optical element, and method for correcting the wavefront effect of...

Sensor, lithographic apparatus, and device manufacturing method

Method and device for the correction of imaging defects

Apparatus and method for detecting optimal focal plane of lithograp...

Extreme ultraviolet lithography system, device, and method for prin...

Optical manipulator, projection lens and projection exposure apparatus

Wafer holding device and projection microlithography system

Inspection device for masks for semiconductor lithography and method

Optical imaging arrangement with actively adjustable metrology supp...

Optical correction arrangement, projection objective having such an...

Patents Applicationslast 30 patents

INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...

LIGHTING OPTICAL SYSTEM AND EXPOSURE APPARATUS

EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...

IMAGING VIA ZEROTH ORDER SUPPRESSION

LITHOGRAPHY FILM STACK AND LITHOGRAPHY METHOD

ASSEMBLY FOR SEPARATING RADIATION IN THE FAR FIELD

BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...

ILLUMINATION CORRECTION APPARATUS

PHOTO RESIST AS OPAQUE APERTURE MASK ON MULTISPECTRAL FILTER ARRAYS

SYSTEMS, PRODUCTS, AND METHODS FOR GENERATING PATTERNING DEVICES AN...

METHOD FOR REPRODUCING A TARGET WAVEFRONT OF AN IMAGING OPTICAL PRO...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

ENERGY CORRECTION MODULE FOR AN OPTICAL SOURCE APPARATUS

OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF MANUFACTURING EXT...

PULSE WIDTH EXPANSION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...

PROJECTION EXPOSURE APPARATUS HAVING A DEVICE FOR DETERMINING THE C...

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

SEMICONDUCTOR FABRICATION APPARATUS AND METHOD OF USING THE SAME

PHOTO RESIST AS OPAQUE APERTURE MASK ON MULTISPECTRAL FILTER ARRAYS

IMPROVED IMAGING VIA ZEROTH ORDER SUPPRESSION

METHOD FOR PRODUCING OR SETTING A PROJECTION EXPOSURE APPARATUS

METHOD OF FORMING SHAPE ON MASK BASED ON DEEP LEARNING, AND MASK MA...

PROJECTION EXPOSURE METHOD AND PROJECTION LENS WITH SETTING OF THE...

COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE

DIFFRACTIVE OPTICAL ELEMENT

SYSTEM AND METHOD FOR INDUSTRIAL SCALE CONTINUOUS HOLOGRAPHIC LITHO...

INSPECTION DEVICE FOR MASKS FOR SEMICONDUCTOR LITHOGRAPHY AND METHOD

OVERLAY METROLOGY TOOL AND METHODS OF PERFORMING OVERLAY MEASUREMENTS

Sensor, Lithographic Apparatus, and Device Manufacturing Method

OPTICAL ELEMENT, AND METHOD FOR CORRECTING THE WAVEFRONT EFFECT OF...