Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarization, phase or the like

Industry

CPC
G03F7/70191

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70191Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarization, phase or the like

Industries

Patents Grantslast 30 patents

Information Patent Grant
Optical lithography system and method of using the same
- Patent number 11,960,211
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical diffraction component
- Patent number 11,947,265
- Issue date Apr 2, 2024
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Droplet splash control for extreme ultra violet photolithography
- Patent number 11,940,738
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Ming Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
MEMS based spatial light modulators and applications
- Patent number 11,933,962
- Issue date Mar 19, 2024
- SILICON LIGHT MACHINES CORPORATION
- Stephen Hamann
- G02 - OPTICS
Information Patent Grant
Extreme ultraviolet light generation apparatus and electronic devic...
- Patent number 11,924,955
- Issue date Mar 5, 2024
- Gigaphoton Inc.
- Yoshiyuki Honda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Photoresist, method of manufacturing a semiconductor device and met...
- Patent number 11,914,301
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chieh-Hsin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for characterizing a microlithographic mask
- Patent number 11,914,303
- Issue date Feb 27, 2024
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical device, exposure device, method for manufacturing flat pane...
- Patent number 11,899,372
- Issue date Feb 13, 2024
- Nikon Corporation
- Yasushi Mizuno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for nanoscale data recording
- Patent number 11,886,123
- Issue date Jan 30, 2024
- Franklin Mark Schellenberg
- G11 - INFORMATION STORAGE
Information Patent Grant
Exposure device and method
- Patent number 11,860,545
- Issue date Jan 2, 2024
- Chun-Jung Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical pulse stretcher, laser device, and electronic device manufa...
- Patent number 11,837,839
- Issue date Dec 5, 2023
- Gigaphoton Inc.
- Hirotaka Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light source and extreme ultraviolet light source system using the...
- Patent number 11,828,952
- Issue date Nov 28, 2023
- Samsung Electronics Co., Ltd.
- Dohyung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 11,828,585
- Issue date Nov 28, 2023
- ASML Netherlands B.V.
- Henricus Petrus Maria Pellemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Large area self imaging lithography based on broadband light source
- Patent number 11,829,073
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Arvinder Chadha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to achieve non-crystalline evenly distributed shot pattern f...
- Patent number 11,815,818
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contaminant detection metrology system, lithographic apparatus, and...
- Patent number 11,803,119
- Issue date Oct 31, 2023
- ASML Holding N.V.
- Michal Emanuel Pawlowski
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus, metrology system, and illumination systems...
- Patent number 11,789,368
- Issue date Oct 17, 2023
- ASML Holding N.V.
- Yuxiang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for a narrow band high transmittance interferen...
- Patent number 11,768,439
- Issue date Sep 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wolf Hung
- G02 - OPTICS
Information Patent Grant
Membrane for EUV lithography
- Patent number 11,762,281
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Maxim Aleksandrovich Nasalevich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and method of processing substrate
- Patent number 11,733,612
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Kazuya Iwata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for generating extreme ultraviolet (EUV), method of manuf...
- Patent number 11,729,896
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Jihoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography device and method for monitoring position of a lig...
- Patent number 11,669,015
- Issue date Jun 6, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xueyu Liang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and illumination uniformity correction system
- Patent number 11,656,555
- Issue date May 23, 2023
- ASML Holding N.V.
- Janardan Nath
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase plate and fabrication method for color-separated laser backli...
- Patent number 11,644,610
- Issue date May 9, 2023
- Meta Platforms Technologies, LLC
- Jian Xu
- G02 - OPTICS
Information Patent Grant
Method to achieve tilted patterning with a through resist thickness
- Patent number 11,586,112
- Issue date Feb 21, 2023
- Intel Corporation
- Changhua Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing effects of lens heating and/or cooling in a lith...
- Patent number 11,573,496
- Issue date Feb 7, 2023
- ASML Netherlands B.V.
- Nick Kant
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic mask correction using volume correction techniques
- Patent number 11,531,273
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Zhiru Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Prism-mask for angled patterning applications
- Patent number 11,506,982
- Issue date Nov 22, 2022
- Intel Corporation
- Vahidreza Parichehreh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology sensor, illumination system and method of generating meas...
- Patent number 11,474,435
- Issue date Oct 18, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method for manufacturing the same, lithography method, dis...
- Patent number 11,474,434
- Issue date Oct 18, 2022
- Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Dengfeng Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL DEVICE, EXPOSURE DEVICE, METHOD FOR MANUFACTURING FLAT PANE...
- Publication number 20240134288
- Publication date Apr 25, 2024
- Nikon Corporation
- Yasushi MIZUNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY
- Publication number 20240134287
- Publication date Apr 25, 2024
- Applied Materials, Inc.
- YingChiao WANG
- G02 - OPTICS
Information Patent Application
BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...
- Publication number 20240128702
- Publication date Apr 18, 2024
- Gigaphoton Inc.
- Shinichi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR E...
- Publication number 20240111215
- Publication date Apr 4, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND FLAT PANEL DISPLAY MANUFAC...
- Publication number 20240103379
- Publication date Mar 28, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPH...
- Publication number 20240044639
- Publication date Feb 8, 2024
- ASML NETHERLANDS B.V.
- Henricus Petrus Maria PELLEMANS
- G01 - MEASURING TESTING
Information Patent Application
EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, METHOD FOR MAN...
- Publication number 20240027898
- Publication date Jan 25, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM FOR A LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20240012333
- Publication date Jan 11, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ROLL-TO-ROLL BASED 3D PRINTING THROUGH COMPUTED AXIAL LITHOGRAPHY
- Publication number 20240012330
- Publication date Jan 11, 2024
- The Regents of the University of California
- Joseph Toombs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMBRANE FOR EUV LITHOGRAPHY
- Publication number 20240004283
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Maxim Aleksandrovich Nasalevich
- G02 - OPTICS
Information Patent Application
ULTRAVIOLET LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20230378713
- Publication date Nov 23, 2023
- Gigaphoton Inc.
- Yuki TAMARU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOUBLE-SCANNING OPTO-MECHANICAL CONFIGURATIONS TO IMPROVE THROUGHPU...
- Publication number 20230350308
- Publication date Nov 2, 2023
- ASML Holding N.V.
- Michal Emanuel PAWLOWSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION WITH NOVEL SOLVENT
- Publication number 20230341773
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR SETTING RELATIVE LASER INTENSITIES
- Publication number 20230333484
- Publication date Oct 19, 2023
- Mycronic AB
- Fredric IHREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...
- Publication number 20230292426
- Publication date Sep 14, 2023
- Gigaphoton Inc.
- Yoshiyuki HONDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE PLATE AND FABRICATION METHOD FOR COLOR-SEPARATED LASER BACKLI...
- Publication number 20230244023
- Publication date Aug 3, 2023
- Meta Platforms Technologies, LLC
- Jian XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT WAVE PHASE INTERFERENCE IMPROVEMENT OF DIGITAL MICROMIRROR DE...
- Publication number 20230221521
- Publication date Jul 13, 2023
- Applied Materials, Inc.
- Timothy N. THOMAS
- G02 - OPTICS
Information Patent Application
OPTICAL COMPONENT
- Publication number 20230221648
- Publication date Jul 13, 2023
- Carl Zeiss SMT GMBH
- Valentin Jonatan Bolsinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230213867
- Publication date Jul 6, 2023
- SEMES CO., LTD.
- Tae Hee KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF PATTERNING A PHOTORESIST, AND RELATED PATTERNING SYSTEMS
- Publication number 20230161263
- Publication date May 25, 2023
- KULICKE & SOFFA LITEQ B.V.
- Jeroen de Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20230152709
- Publication date May 18, 2023
- Taiwan Semiconductor Manufacturing Company Limited
- Shih-Ming CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE DEVICE AND METHOD
- Publication number 20230137963
- Publication date May 4, 2023
- Chun-Jung Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure Device
- Publication number 20230136440
- Publication date May 4, 2023
- NanoSymtem Solutions, Inc.
- Kazuhiko KIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL LITHOGRAPHY SYSTEM AND METHOD OF USING THE SAME
- Publication number 20230109913
- Publication date Apr 13, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTAMINANT DETECTION METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND...
- Publication number 20230106481
- Publication date Apr 6, 2023
- ASML Holding N.V.
- Michal Emanuel PAWLOWSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of Forming Patterns
- Publication number 20230052800
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR CORRECTING A TELECENTRICITY ERROR OF AN IMAGI...
- Publication number 20230050291
- Publication date Feb 16, 2023
- Carl Zeiss SMT GMBH
- Susanne Toepfer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND MET...
- Publication number 20230036859
- Publication date Feb 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chieh-Hsin HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL LITHOGRAPHY SYSTEM AND METHOD OF USING THE SAME
- Publication number 20230011701
- Publication date Jan 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jui Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL DEVICE, EXPOSURE DEVICE, METHOD FOR MANUFACTURING FLAT PANE...
- Publication number 20230004094
- Publication date Jan 5, 2023
- Nikon Corporation
- Yasushi MIZUNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarization, phase or the like

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Optical lithography system and method of using the same

Optical diffraction component

Droplet splash control for extreme ultra violet photolithography

MEMS based spatial light modulators and applications

Extreme ultraviolet light generation apparatus and electronic devic...

Photoresist, method of manufacturing a semiconductor device and met...

Apparatus and method for characterizing a microlithographic mask

Optical device, exposure device, method for manufacturing flat pane...

Method and system for nanoscale data recording

Exposure device and method

Optical pulse stretcher, laser device, and electronic device manufa...

Light source and extreme ultraviolet light source system using the...

Inspection method and apparatus, lithographic apparatus, lithograph...

Large area self imaging lithography based on broadband light source

Method to achieve non-crystalline evenly distributed shot pattern f...

Contaminant detection metrology system, lithographic apparatus, and...

Lithographic apparatus, metrology system, and illumination systems...

Systems and methods for a narrow band high transmittance interferen...

Membrane for EUV lithography

Substrate processing apparatus and method of processing substrate

Apparatus for generating extreme ultraviolet (EUV), method of manuf...

Photolithography device and method for monitoring position of a lig...

Lithographic apparatus and illumination uniformity correction system

Phase plate and fabrication method for color-separated laser backli...

Method to achieve tilted patterning with a through resist thickness

Method of reducing effects of lens heating and/or cooling in a lith...

Lithographic mask correction using volume correction techniques

Prism-mask for angled patterning applications

Metrology sensor, illumination system and method of generating meas...

Mask and method for manufacturing the same, lithography method, dis...

Patents Applicationslast 30 patents

OPTICAL DEVICE, EXPOSURE DEVICE, METHOD FOR MANUFACTURING FLAT PANE...

GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY

BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR E...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND FLAT PANEL DISPLAY MANUFAC...

INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPH...

EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, METHOD FOR MAN...

OPTICAL SYSTEM FOR A LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

ROLL-TO-ROLL BASED 3D PRINTING THROUGH COMPUTED AXIAL LITHOGRAPHY

MEMBRANE FOR EUV LITHOGRAPHY

ULTRAVIOLET LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD

DOUBLE-SCANNING OPTO-MECHANICAL CONFIGURATIONS TO IMPROVE THROUGHPU...

PHOTORESIST COMPOSITION WITH NOVEL SOLVENT

DEVICE AND METHOD FOR SETTING RELATIVE LASER INTENSITIES

EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...

PHASE PLATE AND FABRICATION METHOD FOR COLOR-SEPARATED LASER BACKLI...

LIGHT WAVE PHASE INTERFERENCE IMPROVEMENT OF DIGITAL MICROMIRROR DE...

OPTICAL COMPONENT

MASK PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS

METHODS OF PATTERNING A PHOTORESIST, AND RELATED PATTERNING SYSTEMS

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

EXPOSURE DEVICE AND METHOD

Exposure Device

OPTICAL LITHOGRAPHY SYSTEM AND METHOD OF USING THE SAME

CONTAMINANT DETECTION METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND...

Methods of Forming Patterns

METHOD AND DEVICE FOR CORRECTING A TELECENTRICITY ERROR OF AN IMAGI...

PHOTORESIST, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND MET...

OPTICAL LITHOGRAPHY SYSTEM AND METHOD OF USING THE SAME

OPTICAL DEVICE, EXPOSURE DEVICE, METHOD FOR MANUFACTURING FLAT PANE...