Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarization, phase or the like

Industry

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G03F7/70191

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70191Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarization, phase or the like

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Film formation device, film formation method, and article manufactu...
- Patent number 12,313,977
- Issue date May 27, 2025
- Canon Kabushiki Kaisha
- Hiroshi Kurosawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling extreme ultraviolet light
- Patent number 12,282,262
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical device, exposure device, method for manufacturing flat pane...
- Patent number 12,248,253
- Issue date Mar 11, 2025
- Nikon Corporation
- Yasushi Mizuno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 12,235,096
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Henricus Petrus Maria Pellemans
- G01 - MEASURING TESTING
Information Patent Grant
Device and method for setting relative laser intensities
- Patent number 12,197,135
- Issue date Jan 14, 2025
- Mycronic AB
- Fredric Ihren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning interference lithographic system
- Patent number 12,189,300
- Issue date Jan 7, 2025
- Tsinghua University; Beijing U-Precision Tech Co., Ltd.
- Leijie Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective two-dimensional spatial light modulators
- Patent number 12,181,657
- Issue date Dec 31, 2024
- Silicon Light Machines Corporation
- Alexander Payne
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure device
- Patent number 12,158,702
- Issue date Dec 3, 2024
- NANOSYSTEM SOLUTIONS, INC.
- Kazuhiko Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and manufacturing method of semiconductor device
- Patent number 12,147,157
- Issue date Nov 19, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Double-scanning opto-mechanical configurations to improve throughpu...
- Patent number 12,140,870
- Issue date Nov 12, 2024
- ASML Holding N.V.
- Michal Emanuel Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gray tone uniformity control over substrate topography
- Patent number 12,140,871
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- YingChiao Wang
- G02 - OPTICS
Information Patent Grant
Phase plate and fabrication method for color-separated laser backli...
- Patent number 12,124,070
- Issue date Oct 22, 2024
- Meta Platforms Technologies, LLC
- Jian Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for an illumination optical unit of a projection exposure ap...
- Patent number 12,111,578
- Issue date Oct 8, 2024
- Carl Zeiss SMT GmbH
- Christof Jalics
- G02 - OPTICS
Information Patent Grant
Method and device for correcting a telecentricity error of an imagi...
- Patent number 12,105,427
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Susanne Toepfer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device manufacturing methods
- Patent number 12,078,935
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Rizvi Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle-masking structure, extreme ultra violet apparatus, and meth...
- Patent number 12,066,760
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ching-Hsiang Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask processing apparatus and substrate processing apparatus
- Patent number 12,055,857
- Issue date Aug 6, 2024
- SEMES CO., LTD.
- Tae Hee Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical lithography system and method of using the same
- Patent number 12,032,295
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation system
- Patent number 11,984,236
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- G02 - OPTICS
Information Patent Grant
Optical lithography system and method of using the same
- Patent number 11,960,211
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical diffraction component
- Patent number 11,947,265
- Issue date Apr 2, 2024
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Droplet splash control for extreme ultra violet photolithography
- Patent number 11,940,738
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Ming Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
MEMS based spatial light modulators and applications
- Patent number 11,933,962
- Issue date Mar 19, 2024
- SILICON LIGHT MACHINES CORPORATION
- Stephen Hamann
- G02 - OPTICS
Information Patent Grant
Extreme ultraviolet light generation apparatus and electronic devic...
- Patent number 11,924,955
- Issue date Mar 5, 2024
- Gigaphoton Inc.
- Yoshiyuki Honda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Photoresist, method of manufacturing a semiconductor device and met...
- Patent number 11,914,301
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chieh-Hsin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for characterizing a microlithographic mask
- Patent number 11,914,303
- Issue date Feb 27, 2024
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical device, exposure device, method for manufacturing flat pane...
- Patent number 11,899,372
- Issue date Feb 13, 2024
- Nikon Corporation
- Yasushi Mizuno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for nanoscale data recording
- Patent number 11,886,123
- Issue date Jan 30, 2024
- Franklin Mark Schellenberg
- G11 - INFORMATION STORAGE
Information Patent Grant
Exposure device and method
- Patent number 11,860,545
- Issue date Jan 2, 2024
- Chun-Jung Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical pulse stretcher, laser device, and electronic device manufa...
- Patent number 11,837,839
- Issue date Dec 5, 2023
- Gigaphoton Inc.
- Hirotaka Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL DEVICE, EXPOSURE DEVICE, METHOD FOR MANUFACTURING FLAT PANE...
- Publication number 20250170671
- Publication date May 29, 2025
- Nikon Corporation
- Yasushi MIZUNO
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20250164889
- Publication date May 22, 2025
- Gigaphoton Inc.
- Kotaro MIYASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND
- Publication number 20250147438
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Krishanu SHOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY
- Publication number 20250068082
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- YingChiao WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20250020993
- Publication date Jan 16, 2025
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...
- Publication number 20240427251
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Douglas C. CAPPELLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE APPARATUS, EUV LITHOGRAP...
- Publication number 20240369939
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIEN-HSING LU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMS Based Spatial Light Modulators and Applications
- Publication number 20240369824
- Publication date Nov 7, 2024
- SILICON LIGHT MACHINES CORPORATION
- Stephen Hamann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE DEVICE
- Publication number 20240345486
- Publication date Oct 17, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
Optical Lithography System and Method of Using the Same
- Publication number 20240319609
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST UNIFORMITY DRIFT CORRECTION
- Publication number 20240319608
- Publication date Sep 26, 2024
- ASML Holding N.V.
- Roberto B. WIENER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20240295808
- Publication date Sep 5, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNING INTERFERENCE LITHOGRAPHIC SYSTEM
- Publication number 20240264534
- Publication date Aug 8, 2024
- TSINGHUA UNIVERSITY
- Leijie WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSU...
- Publication number 20240248409
- Publication date Jul 25, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING
- Publication number 20240248407
- Publication date Jul 25, 2024
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...
- Publication number 20240248410
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
DETECTION APPARATUS, ALIGNMENT MICROSCOPE, AND EXPOSURE APPARATUS
- Publication number 20240241457
- Publication date Jul 18, 2024
- Ushio Denki Kabushiki Kaisha
- Naoya SOHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242919
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY
- Publication number 20240231239
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- YingChiao WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DROPLET SPLASH CONTROL FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY
- Publication number 20240231241
- Publication date Jul 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Ming SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20240186760
- Publication date Jun 6, 2024
- Gigaphoton Inc.
- Takayuki YABU
- G02 - OPTICS
Information Patent Application
EUV LIGHT UNIFORMITY CONTROL APPARATUS, EUV EXPOSURE EQUIPMENT INCL...
- Publication number 20240176247
- Publication date May 30, 2024
- EUNHEE JEANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
- Publication number 20240152057
- Publication date May 9, 2024
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL DEVICE, EXPOSURE DEVICE, METHOD FOR MANUFACTURING FLAT PANE...
- Publication number 20240134288
- Publication date Apr 25, 2024
- Nikon Corporation
- Yasushi MIZUNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY
- Publication number 20240134287
- Publication date Apr 25, 2024
- Applied Materials, Inc.
- YingChiao WANG
- G02 - OPTICS
Information Patent Application
BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...
- Publication number 20240128702
- Publication date Apr 18, 2024
- Gigaphoton Inc.
- Shinichi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR E...
- Publication number 20240111215
- Publication date Apr 4, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND FLAT PANEL DISPLAY MANUFAC...
- Publication number 20240103379
- Publication date Mar 28, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPH...
- Publication number 20240044639
- Publication date Feb 8, 2024
- ASML NETHERLANDS B.V.
- Henricus Petrus Maria PELLEMANS
- G01 - MEASURING TESTING
Information Patent Application
EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, METHOD FOR MAN...
- Publication number 20240027898
- Publication date Jan 25, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarization, phase or the like

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Film formation device, film formation method, and article manufactu...

Method for controlling extreme ultraviolet light

Optical device, exposure device, method for manufacturing flat pane...

Inspection method and apparatus, lithographic apparatus, lithograph...

Device and method for setting relative laser intensities

Scanning interference lithographic system

Reflective two-dimensional spatial light modulators

Exposure device

Photomask and manufacturing method of semiconductor device

Double-scanning opto-mechanical configurations to improve throughpu...

Gray tone uniformity control over substrate topography

Phase plate and fabrication method for color-separated laser backli...

Mirror for an illumination optical unit of a projection exposure ap...

Method and device for correcting a telecentricity error of an imagi...

Device manufacturing methods

Reticle-masking structure, extreme ultra violet apparatus, and meth...

Mask processing apparatus and substrate processing apparatus

Optical lithography system and method of using the same

Radiation system

Optical lithography system and method of using the same

Optical diffraction component

Droplet splash control for extreme ultra violet photolithography

MEMS based spatial light modulators and applications

Extreme ultraviolet light generation apparatus and electronic devic...

Photoresist, method of manufacturing a semiconductor device and met...

Apparatus and method for characterizing a microlithographic mask

Optical device, exposure device, method for manufacturing flat pane...

Method and system for nanoscale data recording

Exposure device and method

Optical pulse stretcher, laser device, and electronic device manufa...

Patents Applicationslast 30 patents

OPTICAL DEVICE, EXPOSURE DEVICE, METHOD FOR MANUFACTURING FLAT PANE...

EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...

INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND

GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY

PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...

EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE APPARATUS, EUV LITHOGRAP...

MEMS Based Spatial Light Modulators and Applications

EXPOSURE DEVICE

Optical Lithography System and Method of Using the Same

FAST UNIFORMITY DRIFT CORRECTION

PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

SCANNING INTERFERENCE LITHOGRAPHIC SYSTEM

PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSU...

METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING

EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...

DETECTION APPARATUS, ALIGNMENT MICROSCOPE, AND EXPOSURE APPARATUS

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY

DROPLET SPLASH CONTROL FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY

LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD

EUV LIGHT UNIFORMITY CONTROL APPARATUS, EUV EXPOSURE EQUIPMENT INCL...

APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK

OPTICAL DEVICE, EXPOSURE DEVICE, METHOD FOR MANUFACTURING FLAT PANE...

GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY

BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR E...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND FLAT PANEL DISPLAY MANUFAC...

INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPH...

EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, METHOD FOR MAN...