Optical materials and coatings

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G03F7/70958

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70958Optical materials and coatings

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Optical system with an aperture stop
- Patent number 12,105,429
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 12,025,818
- Issue date Jul 2, 2024
- Carl Zeiss SMT GmbH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for manufacturing a membrane assembly
- Patent number 11,971,656
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Johan Hendrik Klootwijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simultaneous double-side coating of multilayer graphene pellicle by...
- Patent number 11,947,256
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Evgenia Kurganova
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Optical system in particular for microlithography
- Patent number 11,906,753
- Issue date Feb 20, 2024
- Carl Zeiss SMT GmbH
- Johannes Kraus
- G02 - OPTICS
Information Patent Grant
Optical element and lithography system
- Patent number 11,874,525
- Issue date Jan 16, 2024
- Carl Zeiss SMT GmbH
- Eric Eva
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electrodeposition compatible anti-reflection coatings for laser int...
- Patent number 11,815,822
- Issue date Nov 14, 2023
- Toyota Motor Engineering & Manufacturing North America, Inc.
- Shailesh N. Joshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Membrane for EUV lithography
- Patent number 11,762,281
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Maxim Aleksandrovich Nasalevich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for generating extreme ultraviolet (EUV), method of manuf...
- Patent number 11,729,896
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Jihoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for in-situ dynamic protection of a surface and optical asse...
- Patent number 11,681,236
- Issue date Jun 20, 2023
- Carl Zeiss SMT GmbH
- Vitaliy Shklover
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wide field of view hybrid holographic display
- Patent number 11,543,773
- Issue date Jan 3, 2023
- Real View Imaging Ltd.
- Shaul Alexander Gelman
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Method for in situ protection of an aluminum layer and optical arra...
- Patent number 11,525,946
- Issue date Dec 13, 2022
- Carl Zeiss SMT GmbH
- Vitaliy Shklover
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multilayer mirror for reflecting EUV radiation and method for produ...
- Patent number 11,500,137
- Issue date Nov 15, 2022
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Philipp Naujok
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Anti-reflection coating
- Patent number 11,422,289
- Issue date Aug 23, 2022
- ASML Holding N.V.
- Parag Vinayak Kelkar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a reflecting optical element of a projection e...
- Patent number 11,415,892
- Issue date Aug 16, 2022
- Carl Zeiss SMT GmbH
- Matthias Kaes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical device, and method for preventing contamination of optical...
- Patent number 11,353,802
- Issue date Jun 7, 2022
- Lasertec Corporation
- Haruhiko Kusunose
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for treating a reflective optical element for the EUV wavele...
- Patent number 11,328,831
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Christian Grasse
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination optical system for projection lithography
- Patent number 11,327,403
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Tian Gang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-situ light detection methods and apparatus for ultraviolet semic...
- Patent number 11,215,934
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Ralph Peter Antonio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask design for generating plasmonic effect
- Patent number 11,211,374
- Issue date Dec 28, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Minfeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical assembly having a thermally conductive component
- Patent number 11,194,119
- Issue date Dec 7, 2021
- Carl Zeiss SMT GmbH
- Julian Kaller
- G02 - OPTICS
Information Patent Grant
Method for figure correction of optical element by reactive ion etc...
- Patent number 11,163,237
- Issue date Nov 2, 2021
- The Institute of Optics and Electronics, The Chinese Academy of Science
- Zhiwei Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical lithography system for patterning semiconductor devices and...
- Patent number 11,143,965
- Issue date Oct 12, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet light condensation mirror, extreme ultraviolet...
- Patent number 11,119,421
- Issue date Sep 14, 2021
- Gigaphoton Inc.
- Tomoyoshi Toida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 11,112,543
- Issue date Sep 7, 2021
- Carl Zeiss SMT GmbH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 11,086,055
- Issue date Aug 10, 2021
- Carl Zeiss SMT GmbH
- Peter Huber
- G02 - OPTICS
Information Patent Grant
Display apparatus
- Patent number 11,016,393
- Issue date May 25, 2021
- Samsung Electronics Co., Ltd.
- Yoonki Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-reflection optical substrates and methods of manufacture
- Patent number 11,009,794
- Issue date May 18, 2021
- ASML Holding N.V.
- Parag Vinayak Kelkar
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pellicle
- Patent number 11,009,802
- Issue date May 18, 2021
- CNM TECHNOLOGIES GMBH
- Albert Schnieders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Debris mitigation system, radiation source and lithographic apparatus
- Patent number 10,990,015
- Issue date Apr 27, 2021
- ASML Netherlands B.V.
- Michel Riepen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
LASER LITHOGRAPHY DEVICE AND METHOD FOR PRODUCING A THREE-DIMENSION...
- Publication number 20240288786
- Publication date Aug 29, 2024
- Nanoscribe Holding GmbH
- Marc Hippler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING OPTICAL PROPERTIES OF DEPOSITI...
- Publication number 20240219844
- Publication date Jul 4, 2024
- Carl Zeiss SMT GMBH
- Nicole Auth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20240201029
- Publication date Jun 20, 2024
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
MEMBRANE FOR EUV LITHOGRAPHY
- Publication number 20240004283
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Maxim Aleksandrovich Nasalevich
- G02 - OPTICS
Information Patent Application
PROCESS FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT FOR THE EXTREME...
- Publication number 20230417961
- Publication date Dec 28, 2023
- Carl Zeiss SMT GMBH
- Thomas SCHICKETANZ
- B24 - GRINDING POLISHING
Information Patent Application
FLUID PURGING SYSTEM
- Publication number 20230314964
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- José Nilton FONSECA JUNIOR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRODEPOSITION COMPATIBLE ANTI-REFLECTION COATINGS FOR LASER INT...
- Publication number 20230314965
- Publication date Oct 5, 2023
- Toyota Motor Engineering & Manufacturing North America, Inc.
- Shailesh N. Joshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FO...
- Publication number 20230257866
- Publication date Aug 17, 2023
- Carl Zeiss SMT GMBH
- Anastasia GONCHAR
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY
- Publication number 20230213851
- Publication date Jul 6, 2023
- ASML NETHERLANDS B.V.
- Johan Hendrik KLOOTWIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT, ILLUMINATION OPTICAL UNIT, PROJECTION E...
- Publication number 20230205090
- Publication date Jun 29, 2023
- Carl Zeiss SMT GMBH
- Sandro HOFFMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, OPTICAL SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR...
- Publication number 20230138850
- Publication date May 4, 2023
- Carl Zeiss SMT GMBH
- Johannes Kimling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDING BOARD, MANUFACTURING METHOD OF DEVICE, AND EXPOSU...
- Publication number 20230125632
- Publication date Apr 27, 2023
- Canon Kabushiki Kaisha
- Shinji Fukui
- B32 - LAYERED PRODUCTS
Information Patent Application
COLORING COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELE...
- Publication number 20230126240
- Publication date Apr 27, 2023
- FUJIFILM CORPORATION
- Yushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM WITH AN APERTURE STOP
- Publication number 20230123115
- Publication date Apr 20, 2023
- Carl Zeiss SMT GMBH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK INCLUDING PELLICLE
- Publication number 20230111608
- Publication date Apr 13, 2023
- SK HYNIX INC.
- Tae Joong HA
- C01 - INORGANIC CHEMISTRY
Information Patent Application
EXTREME ULTRAVIOLET MASK WITH CAPPING LAYER
- Publication number 20230116213
- Publication date Apr 13, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Hao LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR GENERATING EUV RADIATION
- Publication number 20230064760
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Min WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES
- Publication number 20230069707
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Ping YEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING AN EUV LITHOGRAPHTY APPARATUS, AND EUV LITHOGR...
- Publication number 20230041588
- Publication date Feb 9, 2023
- Carl Zeiss SMT GMBH
- Moritz BECKER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRAPHY BASED ON YTTRIUM
- Publication number 20220326601
- Publication date Oct 13, 2022
- Korea Electronics Technology Institute
- Hyeong Keun KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT AND LITHOGRAPHY SYSTEM
- Publication number 20220299731
- Publication date Sep 22, 2022
- Carl Zeiss SMT GMBH
- Eric Eva
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
OXYGEN-LOSS RESISTANT TOP COATING FOR OPTICAL ELEMENTS
- Publication number 20220260756
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT AND EUV LITHOGRAPHIC SYSTEM
- Publication number 20220179329
- Publication date Jun 9, 2022
- Carl Zeiss SMT GMBH
- Anastasia Gonchar
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ENHANCED GRATING ALIGNED PATTERNING FOR EUV DIRECT PRINT PROCESSES
- Publication number 20220172857
- Publication date Jun 2, 2022
- Intel Corporation
- Seyedhamed M BARGHI
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
APPARATUS FOR GENERATING EXTREME ULTRAVIOLET (EUV), METHOD OF MANUF...
- Publication number 20220167492
- Publication date May 26, 2022
- Research & Business Foundation Sungkyunkwan University
- JIHOON NA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL DEVICE, AND METHOD FOR PREVENTING CONTAMINATION OF OPTICAL...
- Publication number 20210373447
- Publication date Dec 2, 2021
- Lasertec Corporation
- Haruhiko KUSUNOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...
- Publication number 20210364677
- Publication date Nov 25, 2021
- Carl Zeiss SMT GMBH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR IN-SITU DYNAMIC PROTECTION OF A SURFACE AND OPTICAL ASSE...
- Publication number 20210341848
- Publication date Nov 4, 2021
- Carl Zeiss SMT GMBH
- Vitaliy SHKLOVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR IN SITU PROTECTION OF AN ALUMINUM LAYER AND OPTICAL ARRA...
- Publication number 20210293998
- Publication date Sep 23, 2021
- Carl Zeiss SMT GMBH
- Vitaliy SHKLOVER
- G01 - MEASURING TESTING

Optical materials and coatings

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Optical system with an aperture stop

Optical element having a coating for influencing heating radiation...

Method for manufacturing a membrane assembly

Simultaneous double-side coating of multilayer graphene pellicle by...

Optical system in particular for microlithography

Optical element and lithography system

Electrodeposition compatible anti-reflection coatings for laser int...

Membrane for EUV lithography

Apparatus for generating extreme ultraviolet (EUV), method of manuf...

Method for in-situ dynamic protection of a surface and optical asse...

Wide field of view hybrid holographic display

Method for in situ protection of an aluminum layer and optical arra...

Multilayer mirror for reflecting EUV radiation and method for produ...

Anti-reflection coating

Method for producing a reflecting optical element of a projection e...

Optical device, and method for preventing contamination of optical...

Method for treating a reflective optical element for the EUV wavele...

Illumination optical system for projection lithography

In-situ light detection methods and apparatus for ultraviolet semic...

Photomask design for generating plasmonic effect

Optical assembly having a thermally conductive component

Method for figure correction of optical element by reactive ion etc...

Optical lithography system for patterning semiconductor devices and...

Extreme ultraviolet light condensation mirror, extreme ultraviolet...

Optical element having a coating for influencing heating radiation...

Mirror, in particular for a microlithographic projection exposure a...

Display apparatus

Anti-reflection optical substrates and methods of manufacture

Pellicle

Debris mitigation system, radiation source and lithographic apparatus

Patents Applicationslast 30 patents

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

LASER LITHOGRAPHY DEVICE AND METHOD FOR PRODUCING A THREE-DIMENSION...

METHOD AND APPARATUS FOR DETERMINING OPTICAL PROPERTIES OF DEPOSITI...

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

MEMBRANE FOR EUV LITHOGRAPHY

PROCESS FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT FOR THE EXTREME...

FLUID PURGING SYSTEM

ELECTRODEPOSITION COMPATIBLE ANTI-REFLECTION COATINGS FOR LASER INT...

METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FO...

METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY

REFLECTIVE OPTICAL ELEMENT, ILLUMINATION OPTICAL UNIT, PROJECTION E...

OPTICAL ELEMENT, OPTICAL SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR...

SUBSTRATE HOLDING BOARD, MANUFACTURING METHOD OF DEVICE, AND EXPOSU...

COLORING COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELE...

OPTICAL SYSTEM WITH AN APERTURE STOP

PHOTOMASK INCLUDING PELLICLE

EXTREME ULTRAVIOLET MASK WITH CAPPING LAYER

METHOD FOR GENERATING EUV RADIATION

MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES

METHOD FOR OPERATING AN EUV LITHOGRAPHTY APPARATUS, AND EUV LITHOGR...

PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRAPHY BASED ON YTTRIUM

OPTICAL ELEMENT AND LITHOGRAPHY SYSTEM

OXYGEN-LOSS RESISTANT TOP COATING FOR OPTICAL ELEMENTS

OPTICAL ELEMENT AND EUV LITHOGRAPHIC SYSTEM

ENHANCED GRATING ALIGNED PATTERNING FOR EUV DIRECT PRINT PROCESSES

APPARATUS FOR GENERATING EXTREME ULTRAVIOLET (EUV), METHOD OF MANUF...

OPTICAL DEVICE, AND METHOD FOR PREVENTING CONTAMINATION OF OPTICAL...

OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...

METHOD FOR IN-SITU DYNAMIC PROTECTION OF A SURFACE AND OPTICAL ASSE...

METHOD FOR IN SITU PROTECTION OF AN ALUMINUM LAYER AND OPTICAL ARRA...