Optical proximity correction

Industry

CPC
G03F7/70441

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70441Optical proximity correction

Industries

Patents Grantslast 30 patents

Information Patent Grant
Computational metrology
- Patent number 12,189,302
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-component kernels for vector optical image simulation
- Patent number 12,153,349
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kenneth Lik Kin Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and computing device for manufacturing semiconductor device
- Patent number 12,093,630
- Issue date Sep 17, 2024
- Samsung Electronics Co., Ltd.
- Sooyong Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor device manufacturing method and extreme ultraviolet m...
- Patent number 12,092,961
- Issue date Sep 17, 2024
- Samsung Electronics Co., Ltd.
- Sang Chul Yeo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for inverse optical proximity correction of super-resolution...
- Patent number 12,085,846
- Issue date Sep 10, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout correction method
- Patent number 12,078,924
- Issue date Sep 3, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Tingting Xu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
IC device layout method
- Patent number 12,079,559
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Wei Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for fabricating mask, method for fabricating semiconductor d...
- Patent number 12,068,327
- Issue date Aug 20, 2024
- Samsung Electronics Co., Ltd.
- Myoung-Ho Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for correcting semiconductor mask pattern and semiconductor...
- Patent number 12,055,849
- Issue date Aug 6, 2024
- United Microelectronics Corp.
- Sheng-Lun Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 12,019,973
- Issue date Jun 25, 2024
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of modeling a mask having patterns with arbitrary angles
- Patent number 11,994,796
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Jen Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improving a process for a patterning process
- Patent number 11,977,336
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Jen-Shiang Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining patterning device pattern based on manufactu...
- Patent number 11,972,194
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Roshni Biswas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement method and apparatus
- Patent number 11,953,823
- Issue date Apr 9, 2024
- ASML Netherlands B.V.
- Christopher Alan Spence
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction device and method
- Patent number 11,934,106
- Issue date Mar 19, 2024
- United Microelectronics Corp.
- Shu-Yen Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
OPC operation method and OPC operation device
- Patent number 11,927,887
- Issue date Mar 12, 2024
- United Microelectronics Corp.
- Guo-Xin Hu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Stochastic-aware lithographic models for mask synthesis
- Patent number 11,900,042
- Issue date Feb 13, 2024
- Synopsys, Inc.
- Kevin Dean Lucas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electronic device for manufacturing semiconductor device and operat...
- Patent number 11,900,043
- Issue date Feb 13, 2024
- Samsung Electronics Co., Ltd.
- Sooyong Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Flows of optimization for patterning processes
- Patent number 11,886,124
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for continuous passwordless authentication across...
- Patent number 11,868,039
- Issue date Jan 9, 2024
- SecureAuth Corporation
- Shahrokh Shahidzadeh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for mask data synthesis with wafer target adjustment
- Patent number 11,841,619
- Issue date Dec 12, 2023
- TAIWAN SEMINCONDUTOR MANUFACTURING COMPANY, LTD.
- Hsu-Ting Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern layout and the forming method thereof
- Patent number 11,825,641
- Issue date Nov 21, 2023
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Yifei Yan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for generating patterning device pattern at patch boundary
- Patent number 11,797,748
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Quan Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction and photomasks
- Patent number 11,789,370
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 11,783,110
- Issue date Oct 10, 2023
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
IC device manufacturing method
- Patent number 11,783,109
- Issue date Oct 10, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Wei Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Training methods for machine learning assisted optical proximity er...
- Patent number 11,768,440
- Issue date Sep 26, 2023
- ASML Netherlands B.V.
- Jing Su
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and computing device for manufacturing semiconductor device
- Patent number 11,763,058
- Issue date Sep 19, 2023
- Samsung Electronics Co., Ltd.
- Sooyong Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for layout pattern selection
- Patent number 11,755,814
- Issue date Sep 12, 2023
- ASML Netherlands B.V.
- Wei-jie Chen
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR OPTIMIZING LAYOUT PATTERN AND SEMICONDUCTOR WAFER
- Publication number 20250006562
- Publication date Jan 2, 2025
- WINBOND ELECTRONICS CORP.
- Chun-Hung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMIC...
- Publication number 20240419084
- Publication date Dec 19, 2024
- Samsung Electronics Co., Ltd.
- HEUNGSUK OH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FABRICATING MASK, METHOD FOR FABRICATING SEMICONDUCTOR D...
- Publication number 20240371886
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- Myoung-Ho KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IC DEVICE
- Publication number 20240370628
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Wei PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN SELECTION FOR SOURCE MASK OPTIMIZATION AND TARGET OPTIMIZATION
- Publication number 20240369940
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR GENERATING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...
- Publication number 20240353748
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Sang Chul YEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF EVALUATING SELECTED SET OF PATTERNS
- Publication number 20240345487
- Publication date Oct 17, 2024
- Rencheng SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED RULE-BASED SHIFTING OF INTEGRATED CIRCUIT VIAS LAYOUTS TO...
- Publication number 20240334611
- Publication date Oct 3, 2024
- Intel Corporation
- Sunita Thulasi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...
- Publication number 20240289532
- Publication date Aug 29, 2024
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING LOCALIZED IMAGE PREDICTION ERRORS TO IMPROVE A MACHINE...
- Publication number 20240288764
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Ayman HAMOUDA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING ROUNDED CONTOURS FOR LITHOGRAPHY RELATED PATTERNS
- Publication number 20240272543
- Publication date Aug 15, 2024
- ASML NETHERLANDS B.V.
- Wen LYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR INVERSE OPTICAL PROXIMITY CORRECTION OF SUPER-RESOLUTION...
- Publication number 20240264521
- Publication date Aug 8, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL ULTRAVIOLET LITHOGRAPHY METHOD AND APPARATUS
- Publication number 20240210837
- Publication date Jun 27, 2024
- The Hong Kong Polytechnic University
- Aping ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DESIGNING MASK LAYOUT FOR IMAGE SENSOR
- Publication number 20240210838
- Publication date Jun 27, 2024
- Samsung Electronics Co., Ltd.
- Yujeong SIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND METHOD OF MANUFACTURI...
- Publication number 20240201578
- Publication date Jun 20, 2024
- Samsung Electronics Co., Ltd.
- Myoungho KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FREE-FORM LAYOUT FEATURE RETARGETING
- Publication number 20240193338
- Publication date Jun 13, 2024
- Siemens Industry Software Inc.
- Vladislav Liubich
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPC MODELING METHOD
- Publication number 20240192609
- Publication date Jun 13, 2024
- HeFeChip Corporation Limited
- Yinuo PAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL IMAGING METHOD, DEVICE AND SYSTEM FOR PHOTOLITHOGRAPHY SYSTEM
- Publication number 20240126179
- Publication date Apr 18, 2024
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR RULE-BASED RETARGETING OF TARGET PATTERN
- Publication number 20240126183
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Ayman HAMOUDA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR GENERATING PATTERNING DEVICE PATTERN AT PATCH BOUNDARY
- Publication number 20240095437
- Publication date Mar 21, 2024
- ASML NETHERLANDS B.V.
- Quan ZHANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK AND METHODS FOR MEASURING AND MANUFACTURING THE PHOTOMASK
- Publication number 20240077804
- Publication date Mar 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ping-Hsun LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MASK DATA SYNTHESIS WITH WAFER TARGET ADJUSTMENT
- Publication number 20240061344
- Publication date Feb 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu-Ting HUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK INSPECTION APPARATUS AND METHOD OF INSPECTING PHOTOMASK U...
- Publication number 20240044741
- Publication date Feb 8, 2024
- SAMSUNG DISPLAY CO., LTD.
- CHANHYEONG CHO
- G01 - MEASURING TESTING
Information Patent Application
Pattern layout and the forming method thereof
- Publication number 20240040764
- Publication date Feb 1, 2024
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Yifei Yan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD US...
- Publication number 20240036478
- Publication date Feb 1, 2024
- Samsung Electronics Co., Ltd.
- Han Veen KOH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND COMPUTING DEVICE FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240020450
- Publication date Jan 18, 2024
- Samsung Electronics Co., Ltd.
- Sooyong LEE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TRAINING METHODS FOR MACHINE LEARNING ASSISTED OPTICAL PROXIMITY ER...
- Publication number 20240012335
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Jing SU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL PROXIMITY CORRECTION AND PHOTOMASKS
- Publication number 20230384691
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROXIMITY CORRECTION DEVICE AND METHOD
- Publication number 20230384689
- Publication date Nov 30, 2023
- United Microelectronics Corp.
- Shu-Yen LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Optical proximity correction

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Computational metrology

Multi-component kernels for vector optical image simulation

Method and computing device for manufacturing semiconductor device

Semiconductor device manufacturing method and extreme ultraviolet m...

Method for inverse optical proximity correction of super-resolution...

Layout correction method

IC device layout method

Method for fabricating mask, method for fabricating semiconductor d...

Method for correcting semiconductor mask pattern and semiconductor...

Method of manufacturing photo masks

Method for reticle enhancement technology of a design pattern to be...

Method of modeling a mask having patterns with arbitrary angles

Method for improving a process for a patterning process

Method for determining patterning device pattern based on manufactu...

Measurement method and apparatus

Optical proximity correction device and method

OPC operation method and OPC operation device

Stochastic-aware lithographic models for mask synthesis

Electronic device for manufacturing semiconductor device and operat...

Flows of optimization for patterning processes

System and method for continuous passwordless authentication across...

Method for mask data synthesis with wafer target adjustment

Pattern layout and the forming method thereof

Method for generating patterning device pattern at patch boundary

Optical proximity correction and photomasks

Method for reticle enhancement technology of a design pattern to be...

IC device manufacturing method

Training methods for machine learning assisted optical proximity er...

Method and computing device for manufacturing semiconductor device

Method and apparatus for layout pattern selection

Patents Applicationslast 30 patents

METHOD FOR OPTIMIZING LAYOUT PATTERN AND SEMICONDUCTOR WAFER

OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMIC...

METHOD FOR FABRICATING MASK, METHOD FOR FABRICATING SEMICONDUCTOR D...

IC DEVICE

PATTERN SELECTION FOR SOURCE MASK OPTIMIZATION AND TARGET OPTIMIZATION

METHOD FOR GENERATING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...

METHOD OF EVALUATING SELECTED SET OF PATTERNS

METHOD OF MANUFACTURING PHOTO MASKS

ENHANCED RULE-BASED SHIFTING OF INTEGRATED CIRCUIT VIAS LAYOUTS TO...

METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...

DETERMINING LOCALIZED IMAGE PREDICTION ERRORS TO IMPROVE A MACHINE...

DETERMINING ROUNDED CONTOURS FOR LITHOGRAPHY RELATED PATTERNS

METHOD FOR INVERSE OPTICAL PROXIMITY CORRECTION OF SUPER-RESOLUTION...

DIGITAL ULTRAVIOLET LITHOGRAPHY METHOD AND APPARATUS

METHOD OF DESIGNING MASK LAYOUT FOR IMAGE SENSOR

OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND METHOD OF MANUFACTURI...

FREE-FORM LAYOUT FEATURE RETARGETING

OPC MODELING METHOD

OPTICAL IMAGING METHOD, DEVICE AND SYSTEM FOR PHOTOLITHOGRAPHY SYSTEM

METHOD FOR RULE-BASED RETARGETING OF TARGET PATTERN

METHOD FOR GENERATING PATTERNING DEVICE PATTERN AT PATCH BOUNDARY

PHOTOMASK AND METHODS FOR MEASURING AND MANUFACTURING THE PHOTOMASK

METHOD FOR MASK DATA SYNTHESIS WITH WAFER TARGET ADJUSTMENT

PHOTOMASK INSPECTION APPARATUS AND METHOD OF INSPECTING PHOTOMASK U...

Pattern layout and the forming method thereof

LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD US...

METHOD AND COMPUTING DEVICE FOR MANUFACTURING SEMICONDUCTOR DEVICE

TRAINING METHODS FOR MACHINE LEARNING ASSISTED OPTICAL PROXIMITY ER...

OPTICAL PROXIMITY CORRECTION AND PHOTOMASKS

OPTICAL PROXIMITY CORRECTION DEVICE AND METHOD