Organic absorbers

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CPC
G03F1/56

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/56Organic absorbers

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method of forming the same
- Patent number 12,050,398
- Issue date Jul 30, 2024
- Micron Technology, Inc.
- Hidenori Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography techniques for reducing defects
- Patent number 12,025,920
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin-on compositions comprising an inorganic oxide component and an...
- Patent number 11,767,398
- Issue date Sep 26, 2023
- Merck Patent GmbH
- M. Dalil Rahman
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Photomask and exposure system
- Patent number 11,137,676
- Issue date Oct 5, 2021
- HKC CORPORATION LIMITED
- Zeyao Li
- G02 - OPTICS
Information Patent Grant
Film mask, method for manufacturing same, and method for forming pa...
- Patent number 10,969,677
- Issue date Apr 6, 2021
- LG Chem, Ltd.
- Ji Young Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Template and template manufacturing method
- Patent number 10,459,335
- Issue date Oct 29, 2019
- TOSHIBA MEMORY CORPORATION
- Toshiaki Komukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical amplification resist composition, resist film using the sa...
- Patent number 10,139,727
- Issue date Nov 27, 2018
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
UV mask and fabrication method thereof
- Patent number 9,638,845
- Issue date May 2, 2017
- BOE Technology Group Co., Ltd.
- Sung Hun Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplification resist composition, resist film using the co...
- Patent number 9,625,813
- Issue date Apr 18, 2017
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for processing a carrier, a carrier, an electronic device an...
- Patent number 9,613,812
- Issue date Apr 4, 2017
- Infineon Technologies AG
- Jens Schneider
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electron beam exposure system and methods of performing exposing an...
- Patent number 9,588,415
- Issue date Mar 7, 2017
- Samsung Electronics Co., Ltd.
- Sukjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymerizable composition for solder resist, and solder resist patt...
- Patent number 9,389,505
- Issue date Jul 12, 2016
- FUJIFILM Corporation
- Kazuto Shimada
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Actinic-ray- or radiation sensitive resin composition, actinic-ray-...
- Patent number 9,235,116
- Issue date Jan 12, 2016
- FUJIFILM Corporation
- Takeshi Inasaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Mask plate and manufacturing method thereof
- Patent number 9,223,198
- Issue date Dec 29, 2015
- Hefei Boe Optoelectronics Technology Co., Ltd.
- Xiangyang Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for electron beam patterning
- Patent number 9,182,660
- Issue date Nov 10, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Chuan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay mark and method of forming the same
- Patent number 9,017,926
- Issue date Apr 28, 2015
- Nanya Technology Corporation
- Chui-Fu Chiu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for producing structure and method for producing liquid disc...
- Patent number 8,974,718
- Issue date Mar 10, 2015
- Canon Kabushiki Kaisha
- Hiroe Ishikura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Black curable composition for wafer level lens and wafer level lens
- Patent number 8,975,005
- Issue date Mar 10, 2015
- FUJIFILM Corporation
- Kazuto Shimada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical amplification resist composition, and resist film, resist-...
- Patent number 8,778,593
- Issue date Jul 15, 2014
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
High resolution photomask
- Patent number 8,187,775
- Issue date May 29, 2012
- Battelle Memorial Institute
- Eric L. Hogue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for the manufacture of microstructures
- Patent number 8,124,325
- Issue date Feb 28, 2012
- 3T Technologies Limited
- Stuart Philip Speakman
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for making a reflection lithographic mask and mask obtained...
- Patent number 7,923,177
- Issue date Apr 12, 2011
- Commissariat a l'Energie Atomique
- Christelle Charpin-Nicolle
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Dye-containing resist composition and color filter using same
- Patent number 7,776,504
- Issue date Aug 17, 2010
- Nissan Chemical Industries, Ltd.
- Masayoshi Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, manufacturing method thereof, and manufacturing method o...
- Patent number 7,776,492
- Issue date Aug 17, 2010
- Seiko Epson Corporation
- Hirotsuna Miura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dye-containing resist composition and color filter using same
- Patent number 7,749,664
- Issue date Jul 6, 2010
- Nissan Chemical Industries, Ltd.
- Masayoshi Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High resolution imaging process using an in-situ image modifying layer
- Patent number 7,709,187
- Issue date May 4, 2010
- International Business Machines Corporation
- Kaushal Patel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning compositions, masks, and methods
- Patent number 7,626,185
- Issue date Dec 1, 2009
- Battelle Memorial Institute
- Stephen J. Krak
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Laminated photosensitive relief printing original plate and method...
- Patent number 7,399,575
- Issue date Jul 15, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiya Takagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating a semiconductor integrated circuit that inclu...
- Patent number 7,361,530
- Issue date Apr 22, 2008
- Renesas Technology Corporation
- Tsuneo Terasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making an article bearing a relief image using a removabl...
- Patent number 7,279,254
- Issue date Oct 9, 2007
- Eastman Kodak Company
- Gregory L. Zwadlo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS
- Publication number 20240310735
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hui WENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
- Publication number 20240192602
- Publication date Jun 13, 2024
- SEMES CO., LTD.
- Min Jung PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming an Interconnect Structure
- Publication number 20240036470
- Publication date Feb 1, 2024
- IMEC vzw
- Waikin Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20230143851
- Publication date May 11, 2023
- TOPPAN PHOTOMASK CO., LTD.
- Ayumi GODA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING AN UNDERLAYER WITH INCREASED EXTREME ULTRAVIOLET...
- Publication number 20230071197
- Publication date Mar 9, 2023
- ASM IP HOLDING B.V.
- Arpita Saha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERSTITIAL TYPE ABSORBER FOR EXTREME ULTRAVIOLET MASK
- Publication number 20230013260
- Publication date Jan 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Jhih LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS
- Publication number 20220299879
- Publication date Sep 22, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hui WENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME
- Publication number 20210364911
- Publication date Nov 25, 2021
- Micron Technology, Inc.
- Hidenori Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK HAVING REFLECTIVE LAYER WITH NON-REFLECTIVE REGIONS
- Publication number 20200124957
- Publication date Apr 23, 2020
- Astrileux Corporation
- Supriya JAISWAL
- B82 - NANO-TECHNOLOGY
Information Patent Application
FILM MASK, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING PA...
- Publication number 20180329286
- Publication date Nov 15, 2018
- LG CHEM, LTD.
- Ji Young HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPLATE AND TEMPLATE MANUFACTURING METHOD
- Publication number 20180267400
- Publication date Sep 20, 2018
- Toshiba Memory Corporation
- Toshiaki KOMUKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING A CARRIER, A CARRIER, AN ELECTRONIC DEVICE AN...
- Publication number 20140231970
- Publication date Aug 21, 2014
- INFINEON TECHNOLOGIES AG
- Jens Schneider
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK PLATE AND MANUFACTURING METHOD THEREOF
- Publication number 20140120461
- Publication date May 1, 2014
- BOE TECHNOLOGY GROUP CO., LTD.
- Xiangyang XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY- OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20140099572
- Publication date Apr 10, 2014
- FUJIFILM CORPORATION
- Takeshi INASAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
OVERLAY MARK AND METHOD OF FORMING THE SAME
- Publication number 20140065380
- Publication date Mar 6, 2014
- NANYA TECHNOLOGY CORPORATION
- Chui-Fu Chiu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
METHODS FOR ELECTRON BEAM PATTERNING
- Publication number 20130323918
- Publication date Dec 5, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Chuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE CO...
- Publication number 20130302726
- Publication date Nov 14, 2013
- Tomotaka TSUCHIMURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NEGATIVE CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, AN...
- Publication number 20130084518
- Publication date Apr 4, 2013
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMERIZABLE COMPOSITION FOR SOLDER RESIST, AND SOLDER RESIST PATT...
- Publication number 20130034812
- Publication date Feb 7, 2013
- FUJIFILM Corporation
- Kazuto Shimada
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM, RESIST-...
- Publication number 20130029254
- Publication date Jan 31, 2013
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PROCESS FOR PRODUCING FINE PATTERN
- Publication number 20130029272
- Publication date Jan 31, 2013
- Canon Kabushiki Kaisha
- Hiroe Ishikura
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
BLACK CURABLE COMPOSITION FOR WAFER - LEVEL LENS, AND WAFER - LEVEL...
- Publication number 20120262793
- Publication date Oct 18, 2012
- FUJIFILM Corporation
- Masaru Yoshikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
BLACK CURABLE COMPOSITION FOR WAFER LEVEL LENS AND WAFER LEVEL LENS
- Publication number 20120202154
- Publication date Aug 9, 2012
- FUJIFILM Corporation
- Kazuto Shimada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING STRUCTURE AND METHOD FOR PRODUCING LIQUID DISC...
- Publication number 20110316188
- Publication date Dec 29, 2011
- Canon Kabushiki Kaisha
- Hiroe Ishikura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH RESOLUTION PHOTOMASK
- Publication number 20100261098
- Publication date Oct 14, 2010
- Battelle Memorial Institute
- Eric L. Hogue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR THE MANUFACTURE OF MICROSTRUCTURES
- Publication number 20100193912
- Publication date Aug 5, 2010
- 3T Technologies Limited
- Stuart Philip Speakman
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
NANO ELECTRONIC DEVICES
- Publication number 20100045169
- Publication date Feb 25, 2010
- Seoul National University Research & Development Business Foundation (SNU R&D...
- Youngtack SHIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MAKING A REFLECTION LITHOGRAPHIC MASK AND MASK OBTAINED...
- Publication number 20090269678
- Publication date Oct 29, 2009
- COMMISSARIAT A L'ENERGIE ATOMIQUE
- Christelle Charpin-Nicolle
- B82 - NANO-TECHNOLOGY
Information Patent Application
High Resolution Imaging Process Using an In-Situ Image Modifying Layer
- Publication number 20080145793
- Publication date Jun 19, 2008
- International Business Machines Corporation
- Kaushal Patel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING COMPOSITIONS, MASKS, AND METHODS
- Publication number 20080135784
- Publication date Jun 12, 2008
- Battelle Memorial Institute
- Stephen J. Krak
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Organic absorbers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor device and method of forming the same

Lithography techniques for reducing defects

Spin-on compositions comprising an inorganic oxide component and an...

Photomask and exposure system

Film mask, method for manufacturing same, and method for forming pa...

Template and template manufacturing method

Chemical amplification resist composition, resist film using the sa...

UV mask and fabrication method thereof

Chemical amplification resist composition, resist film using the co...

Method for processing a carrier, a carrier, an electronic device an...

Electron beam exposure system and methods of performing exposing an...

Polymerizable composition for solder resist, and solder resist patt...

Actinic-ray- or radiation sensitive resin composition, actinic-ray-...

Mask plate and manufacturing method thereof

Methods for electron beam patterning

Overlay mark and method of forming the same

Method for producing structure and method for producing liquid disc...

Black curable composition for wafer level lens and wafer level lens

Chemical amplification resist composition, and resist film, resist-...

High resolution photomask

Methods and apparatus for the manufacture of microstructures

Method for making a reflection lithographic mask and mask obtained...

Dye-containing resist composition and color filter using same

Photomask, manufacturing method thereof, and manufacturing method o...

Dye-containing resist composition and color filter using same

High resolution imaging process using an in-situ image modifying layer

Patterning compositions, masks, and methods

Laminated photosensitive relief printing original plate and method...

Method of fabricating a semiconductor integrated circuit that inclu...

Method of making an article bearing a relief image using a removabl...

Patents Applicationslast 30 patents

LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE

Method for Forming an Interconnect Structure

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

METHOD OF FORMING AN UNDERLAYER WITH INCREASED EXTREME ULTRAVIOLET...

INTERSTITIAL TYPE ABSORBER FOR EXTREME ULTRAVIOLET MASK

LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS

SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME

PHOTOMASK HAVING REFLECTIVE LAYER WITH NON-REFLECTIVE REGIONS

FILM MASK, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING PA...

TEMPLATE AND TEMPLATE MANUFACTURING METHOD

METHOD FOR PROCESSING A CARRIER, A CARRIER, AN ELECTRONIC DEVICE AN...

MASK PLATE AND MANUFACTURING METHOD THEREOF

ACTINIC-RAY- OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

OVERLAY MARK AND METHOD OF FORMING THE SAME

METHODS FOR ELECTRON BEAM PATTERNING

CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE CO...

NEGATIVE CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, AN...

POLYMERIZABLE COMPOSITION FOR SOLDER RESIST, AND SOLDER RESIST PATT...

CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM, RESIST-...

PROCESS FOR PRODUCING FINE PATTERN

BLACK CURABLE COMPOSITION FOR WAFER - LEVEL LENS, AND WAFER - LEVEL...

BLACK CURABLE COMPOSITION FOR WAFER LEVEL LENS AND WAFER LEVEL LENS

METHOD FOR PRODUCING STRUCTURE AND METHOD FOR PRODUCING LIQUID DISC...

HIGH RESOLUTION PHOTOMASK

METHODS AND APPARATUS FOR THE MANUFACTURE OF MICROSTRUCTURES

NANO ELECTRONIC DEVICES

METHOD FOR MAKING A REFLECTION LITHOGRAPHIC MASK AND MASK OBTAINED...

High Resolution Imaging Process Using an In-Situ Image Modifying Layer

PATTERNING COMPOSITIONS, MASKS, AND METHODS