Originals characterised by structural details

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G03F1/14

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/14Originals characterised by structural details

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Stretchable layout design for EUV defect mitigation
- Patent number 10,877,370
- Issue date Dec 29, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsing-Lin Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask pattern correction system, and semiconductor device manufactur...
- Patent number 10,852,648
- Issue date Dec 1, 2020
- TOSHIBA MEMORY CORPORATION
- Kazuyuki Hino
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems for parameter-sensitive and orthogonal gauge de...
- Patent number 10,846,442
- Issue date Nov 24, 2020
- ASML Netherlands B.V.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Three-dimensional mask model for photolithography simulation
- Patent number 10,839,131
- Issue date Nov 17, 2020
- ASML Netherlands B.V.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Creating inductors, resistors, capacitors and other structures in p...
- Patent number 10,834,828
- Issue date Nov 10, 2020
- International Business Machines Corporation
- Gerald Bartley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, related display device, and related exposure method for manuf...
- Patent number 10,809,627
- Issue date Oct 20, 2020
- Samsung Display Co., Ltd.
- Inwoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming layout definition of semiconductor device
- Patent number 10,795,255
- Issue date Oct 6, 2020
- United Microelectronics Corp.
- Wei-Lun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reproduction of a stem cell niche of an organism and method for the...
- Patent number 10,780,613
- Issue date Sep 22, 2020
- Technische Universitaet Ilmenau
- Andreas Schober
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mechanisms for forming patterns using multiple lithography processes
- Patent number 10,770,303
- Issue date Sep 8, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and masks for line end formation for back end of line (BEOL...
- Patent number 10,770,291
- Issue date Sep 8, 2020
- Intel Corporation
- Richard E. Schenker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods, structures, and designs for self-aligning local interconne...
- Patent number 10,734,383
- Issue date Aug 4, 2020
- Tela Innovations, Inc.
- Michael C. Smayling
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for manufacturing a membrane assembly
- Patent number 10,712,657
- Issue date Jul 14, 2020
- ASML Netherlands B.V.
- Johan Hendrik Klootwijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-based optical proximity correction
- Patent number 10,691,869
- Issue date Jun 23, 2020
- Mentor Graphics Corporation
- Ahmed Abouelseoud
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction (OPC) method and method of manufacturi...
- Patent number 10,684,544
- Issue date Jun 16, 2020
- Samsung Electronics Co., Ltd.
- Da-woon Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask design for generating plasmonic effect
- Patent number 10,685,950
- Issue date Jun 16, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle and method of using the same
- Patent number 10,670,959
- Issue date Jun 2, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chue San Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle frame and a pellicle using the same
- Patent number 10,649,326
- Issue date May 12, 2020
- Shin-Etsu Chemical Co., Ltd.
- Akinori Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle support frame and production method
- Patent number 10,642,151
- Issue date May 5, 2020
- NIPPON LIGHT METAL COMPANY, LTD.
- Nobuyuki Ishito
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,634,990
- Issue date Apr 28, 2020
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preventing corner violations in fill region of layout using exclusi...
- Patent number 10,628,551
- Issue date Apr 21, 2020
- GLOBALFOUNDRIES Inc.
- Gazi M. Huda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multiple-mask multiple-exposure lithography and masks
- Patent number 10,620,530
- Issue date Apr 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, masking exposure method, mask system and pattern control device
- Patent number 10,606,168
- Issue date Mar 31, 2020
- BOE Technology Group Co., Ltd.
- Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fast freeform source and mask co-optimization method
- Patent number 10,592,633
- Issue date Mar 17, 2020
- ASML Netherlands B.V.
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Shifting of patterns to reduce line waviness
- Patent number 10,591,815
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle, pellicle production method and exposure method using pell...
- Patent number 10,585,348
- Issue date Mar 10, 2020
- Mitsui Chemicals, Inc.
- Kazuo Kohmura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay-correction method and a control system using the same
- Patent number 10,566,252
- Issue date Feb 18, 2020
- Samsung Electronics Co., Ltd.
- Seungyoon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Statistical overlay error prediction for feed forward and feedback...
- Patent number 10,545,412
- Issue date Jan 28, 2020
- KLA-Tencor Corporation
- Wei Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and device for determining an OPC model
- Patent number 10,539,865
- Issue date Jan 21, 2020
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Pellicle assembly and method for advanced lithography
- Patent number 10,534,256
- Issue date Jan 14, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Amo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout optimization of a main pattern and a cut pattern
- Patent number 10,528,693
- Issue date Jan 7, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming Chang
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
DETECTION METHOD AND SYSTEM FOR PELLICLE MEMBRANE OF PHOTOMASK
- Publication number 20210181619
- Publication date Jun 17, 2021
- SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY
- YU-CHING LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROXIMITY CORRECTION (OPC) METHOD USING A MULTI-OPC MODEL A...
- Publication number 20210116800
- Publication date Apr 22, 2021
- Samsung Electronics Co., Ltd.
- Pilsoo Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20210096458
- Publication date Apr 1, 2021
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PERFORMING OPTICAL PROXIMITY CORRECTION AND METHOD OF MAN...
- Publication number 20210072636
- Publication date Mar 11, 2021
- Samsung Electronics Co., Ltd.
- Sanghun KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK RULE CHECKING FOR CURVILINEAR MASKS FOR ELECTRONIC CIRCUITS
- Publication number 20200387660
- Publication date Dec 10, 2020
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EUV PELLICLES
- Publication number 20200341365
- Publication date Oct 29, 2020
- ASML NETHERLANDS B.V.
- Zomer Silvester HOUWELING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A...
- Publication number 20200341366
- Publication date Oct 29, 2020
- ASML NETHERLANDS B.V.
- Derk Servatius Gertruda BROUNS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REAL TIME COUNTER-BASED METHOD FOR THE DETERMINATION AND MEASUREMEN...
- Publication number 20200336151
- Publication date Oct 22, 2020
- TEXAS INSTRUMENTS INCORPORATED
- Ibukun Oluwagbenga Olumuyiwa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MEASURING APPARATUS FOR VACUUM CHAMBER AND MEASURING SYSTEM INCLUDI...
- Publication number 20200333716
- Publication date Oct 22, 2020
- Samsung Electronics Co., Ltd.
- Daesung Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK DESIGN FOR GENERATING PLASMONIC EFFECT
- Publication number 20200312835
- Publication date Oct 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY
- Publication number 20200301269
- Publication date Sep 24, 2020
- ASML NETHERLANDS B.V.
- Johan Hendrik KLOOTWIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY MODEL CALIBRATION
- Publication number 20200278604
- Publication date Sep 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Hsiang LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE AND METHOD OF USING THE SAME
- Publication number 20200264505
- Publication date Aug 20, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK WITH ELECTROSTATIC DISCHARGE PROTECTION
- Publication number 20200233298
- Publication date Jul 23, 2020
- Yangtze Memory Technologies Co., Ltd.
- Peng Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD
- Publication number 20200218850
- Publication date Jul 9, 2020
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PELLICLE AND METHOD FOR MANUFACTURING PELLICLE
- Publication number 20200166831
- Publication date May 28, 2020
- AIR WATER INC.
- Hidehiko OKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pellicle Assembly and Method for Advanced Lithography
- Publication number 20200150527
- Publication date May 14, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- AMO CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Layout Optimization of a Main Pattern and a Cut Pattern
- Publication number 20200125784
- Publication date Apr 23, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK PATTERN CORRECTION SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTUR...
- Publication number 20200117104
- Publication date Apr 16, 2020
- Toshiba Memory Corporation
- Kazuyuki HINO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK
- Publication number 20200089099
- Publication date Mar 19, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD FOR FORMING THE SAME
- Publication number 20200089098
- Publication date Mar 19, 2020
- Taiwan Semiconductor Manufacturing company Ltd.
- HSUAN-WEN WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR REMOVING A PELLICLE FRAME FROM A PHOTOMASK AND THE ME...
- Publication number 20200073231
- Publication date Mar 5, 2020
- Taiwan Semiconductor Manufacturing company Ltd.
- Wei Cheng HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETECTING EUV PELLICLE RUPTURE
- Publication number 20200057383
- Publication date Feb 20, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Tsung SHIH
- G01 - MEASURING TESTING
Information Patent Application
Multiple-Mask Multiple-Exposure Lithography and Masks
- Publication number 20200050102
- Publication date Feb 13, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHIFTING OF PATTERNS TO REDUCE LINE WAVINESS
- Publication number 20200004132
- Publication date Jan 2, 2020
- Applied Materials, Inc.
- Joseph R. JOHNSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION OF A LITHOGRAPHY APPARATUS OR PATTERNING PROCESS BASED...
- Publication number 20190369480
- Publication date Dec 5, 2019
- ASML NETHERLANDS B.V.
- Steven George HANSEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR STRUCTURE FOR OPTICAL VALIDATION
- Publication number 20190346773
- Publication date Nov 14, 2019
- International Business Machines Corporation
- Daniel Corliss
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PREVENTING CORNER VIOLATIONS IN FILL REGION OF LAYOUT USING EXCLUSI...
- Publication number 20190340326
- Publication date Nov 7, 2019
- GLOBALFOUNDRIES INC.
- Gazi M. Huda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20190332006
- Publication date Oct 31, 2019
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern-Based Optical Proximity Correction
- Publication number 20190266311
- Publication date Aug 29, 2019
- Mentor Graphics Corporation
- Ahmed Abouelseoud
- G06 - COMPUTING CALCULATING COUNTING

Originals characterised by structural details

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Stretchable layout design for EUV defect mitigation

Mask pattern correction system, and semiconductor device manufactur...

Methods and systems for parameter-sensitive and orthogonal gauge de...

Three-dimensional mask model for photolithography simulation

Creating inductors, resistors, capacitors and other structures in p...

Mask, related display device, and related exposure method for manuf...

Method of forming layout definition of semiconductor device

Reproduction of a stem cell niche of an organism and method for the...

Mechanisms for forming patterns using multiple lithography processes

Methods and masks for line end formation for back end of line (BEOL...

Methods, structures, and designs for self-aligning local interconne...

Method for manufacturing a membrane assembly

Pattern-based optical proximity correction

Optical proximity correction (OPC) method and method of manufacturi...

Photomask design for generating plasmonic effect

Pellicle and method of using the same

Pellicle frame and a pellicle using the same

Pellicle support frame and production method

Photomask and methods for manufacturing and correcting photomask

Preventing corner violations in fill region of layout using exclusi...

Multiple-mask multiple-exposure lithography and masks

Mask, masking exposure method, mask system and pattern control device

Fast freeform source and mask co-optimization method

Shifting of patterns to reduce line waviness

Pellicle, pellicle production method and exposure method using pell...

Overlay-correction method and a control system using the same

Statistical overlay error prediction for feed forward and feedback...

Method and device for determining an OPC model

Pellicle assembly and method for advanced lithography

Layout optimization of a main pattern and a cut pattern

Patents Applicationslast 30 patents

DETECTION METHOD AND SYSTEM FOR PELLICLE MEMBRANE OF PHOTOMASK

OPTICAL PROXIMITY CORRECTION (OPC) METHOD USING A MULTI-OPC MODEL A...

PELLICLE FOR EUV LITHOGRAPHY AND METHOD FOR MANUFACTURING THE SAME

METHOD OF PERFORMING OPTICAL PROXIMITY CORRECTION AND METHOD OF MAN...

MASK RULE CHECKING FOR CURVILINEAR MASKS FOR ELECTRONIC CIRCUITS

EUV PELLICLES

APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A...

REAL TIME COUNTER-BASED METHOD FOR THE DETERMINATION AND MEASUREMEN...

MEASURING APPARATUS FOR VACUUM CHAMBER AND MEASURING SYSTEM INCLUDI...

PHOTOMASK DESIGN FOR GENERATING PLASMONIC EFFECT

METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY

LITHOGRAPHY MODEL CALIBRATION

PELLICLE AND METHOD OF USING THE SAME

PHOTOMASK WITH ELECTROSTATIC DISCHARGE PROTECTION

FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD

PELLICLE AND METHOD FOR MANUFACTURING PELLICLE

Pellicle Assembly and Method for Advanced Lithography

Layout Optimization of a Main Pattern and a Cut Pattern

MASK PATTERN CORRECTION SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTUR...

PHOTOMASK

PHOTOMASK AND METHOD FOR FORMING THE SAME

APPARATUS FOR REMOVING A PELLICLE FRAME FROM A PHOTOMASK AND THE ME...

METHOD FOR DETECTING EUV PELLICLE RUPTURE

Multiple-Mask Multiple-Exposure Lithography and Masks

SHIFTING OF PATTERNS TO REDUCE LINE WAVINESS

OPTIMIZATION OF A LITHOGRAPHY APPARATUS OR PATTERNING PROCESS BASED...

SEMICONDUCTOR STRUCTURE FOR OPTICAL VALIDATION

PREVENTING CORNER VIOLATIONS IN FILL REGION OF LAYOUT USING EXCLUSI...

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

Pattern-Based Optical Proximity Correction