Originals having inorganic imaging layers

Industry

CPC
G03F1/08

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/08Originals having inorganic imaging layers

Industries

Patents Grantslast 30 patents

Information Patent Grant
Sulfonium salt, resist composition and resist pattern forming process
- Patent number 9,285,678
- Issue date Mar 15, 2016
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative resist composition and patterning process
- Patent number 8,828,645
- Issue date Sep 9, 2014
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank and production method thereof, and photomask produc...
- Patent number 8,697,315
- Issue date Apr 15, 2014
- Hoya Corporation
- Takeyuki Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and patterning process
- Patent number 8,603,724
- Issue date Dec 10, 2013
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Reflective exposure mask, method of fabricating reflective exposure...
- Patent number 8,535,854
- Issue date Sep 17, 2013
- Kabushiki Kaisha Toshiba
- Takashi Kamo
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photomask blank and method for manufacturing the same
- Patent number 8,404,406
- Issue date Mar 26, 2013
- Hoya Corporation
- Hiroyuki Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and structure for fabricating dark-periphery mask for the ma...
- Patent number 8,404,409
- Issue date Mar 26, 2013
- Semiconductor Manufacturing International (Shanghai) Corporation
- Guang Yea Simon Tarng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment method, coating film removing apparatus, and su...
- Patent number 8,366,872
- Issue date Feb 5, 2013
- Tokyo Electron Limited
- Kenji Tsutsumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank, photomask, and methods of manufacturing the same
- Patent number 8,323,858
- Issue date Dec 4, 2012
- Hoya Corporation
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask and method for manufacturing semiconductor device usi...
- Patent number 8,313,876
- Issue date Nov 20, 2012
- Hynix Semiconductor Inc.
- Soon Ho Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 8,288,062
- Issue date Oct 16, 2012
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Half-tone mask, half-tone mask blank and method for manufacturing h...
- Patent number 8,216,745
- Issue date Jul 10, 2012
- Ulvac Coating Corporation
- Kagehiro Kageyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomasks
- Patent number 8,192,903
- Issue date Jun 5, 2012
- Micron Technology, Inc.
- Fei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Creating mask data of integrated circuit patterns using calculated...
- Patent number 8,196,071
- Issue date Jun 5, 2012
- Kabushiki Kaisha Toshiba
- Hiromitsu Mashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method for fabricating the same
- Patent number 8,163,445
- Issue date Apr 24, 2012
- Hynix Semiconductor Inc.
- Sung Hyun Oh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photomask for extreme ultraviolet lithography and method for fabric...
- Patent number 8,158,305
- Issue date Apr 17, 2012
- Hynix Semiconductor Inc.
- Sung Hyun Oh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photomask blank and production method thereof, and photomask produc...
- Patent number 8,114,556
- Issue date Feb 14, 2012
- Hoya Corporation
- Takeyuki Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomasks, methods of forming photomasks, and methods of photolith...
- Patent number 8,034,516
- Issue date Oct 11, 2011
- Micron Technology, Inc.
- Fei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask, and methods of manufacturing the same
- Patent number 8,029,948
- Issue date Oct 4, 2011
- Hoya Corporation
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 8,029,950
- Issue date Oct 4, 2011
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Manufacturing method and apparatus of phase shift mask blank
- Patent number 8,012,314
- Issue date Sep 6, 2011
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating liquid crystal display device
- Patent number 7,989,147
- Issue date Aug 2, 2011
- LG Display Co., Ltd.
- Woong Sik Kim
- G02 - OPTICS
Information Patent Grant
Use of mixed bases to enhance patterned resist profiles on chrome o...
- Patent number 7,960,095
- Issue date Jun 14, 2011
- International Business Machines Corporation
- Wayne M. Moreau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone mask, method of manufacturing the same, and method of manu...
- Patent number 7,951,631
- Issue date May 31, 2011
- Samsung Electronics Co., Ltd.
- Woo-Seok Jeon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and structure for fabricating dark-periphery mask for the ma...
- Patent number 7,939,227
- Issue date May 10, 2011
- Semiconductor Manufacturing International (Shanghai) Corporation
- Guang Yea (Simon) Tarng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming photomasks
- Patent number 7,923,181
- Issue date Apr 12, 2011
- Micron Technology, Inc.
- Fei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift mask and method of forming the same
- Patent number 7,897,299
- Issue date Mar 1, 2011
- Samsung Electronics Co., Ltd.
- Gi-Sung Yoon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone type phase shift mask blank and phase shift mask thereof
- Patent number 7,862,963
- Issue date Jan 4, 2011
- Hoya Corporation
- Yuuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-layer, attenuated phase-shifting mask
- Patent number 7,838,183
- Issue date Nov 23, 2010
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure design and fabrication on photomask for contact hole manu...
- Patent number 7,838,173
- Issue date Nov 23, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya Hui Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK BLANK, AND PREPARATION METHOD THEREOF
- Publication number 20180180985
- Publication date Jun 28, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20140190632
- Publication date Jul 10, 2014
- Applied Materials, Inc.
- Ajay KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20140051025
- Publication date Feb 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Akinobu TANAKA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PHOTOMASK BLANK AND PRODUCTION METHOD THEREOF, AND PHOTOMASK PRODUC...
- Publication number 20120129084
- Publication date May 24, 2012
- HOYA CORPORATION
- Takeyuki Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20120107733
- Publication date May 3, 2012
- ASAHI GLASS COMPANY, LIMITED
- Kazuyuki HAYASHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photomasks
- Publication number 20120003573
- Publication date Jan 5, 2012
- Micron Technology, Inc.
- Fei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME
- Publication number 20110318674
- Publication date Dec 29, 2011
- HOYA CORPORATION
- Masahiro HASHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT METHOD, COATING FILM REMOVING APPARATUS, AND SU...
- Publication number 20110240597
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Kenji TSUTSUMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND STRUCTURE FOR FABRICATING DARK-PERIPHERY MASK FOR THE MA...
- Publication number 20110207033
- Publication date Aug 25, 2011
- Semiconductor Manufacturing International (Shanghai) Corporation
- Guang Yea (Simon) Tarng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomasks, Methods of Forming Photomasks, and Methods of Photolith...
- Publication number 20110165505
- Publication date Jul 7, 2011
- Micron Technology, Inc.
- Fei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE EXPOSURE MASK, METHOD OF FABRICATING REFLECTIVE EXPOSURE...
- Publication number 20110151358
- Publication date Jun 23, 2011
- Takashi KAMO
- B82 - NANO-TECHNOLOGY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20110143266
- Publication date Jun 16, 2011
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT MASK AND METHOD OF FORMING THE SAME
- Publication number 20110104593
- Publication date May 5, 2011
- Samsung Electronics Co., Ltd.
- Gi-Sung Yoon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20110081605
- Publication date Apr 7, 2011
- HOYA CORPORATION
- Hiroyuki Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing mask structure
- Publication number 20110065029
- Publication date Mar 17, 2011
- Hwan-Seok Seo
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20100304283
- Publication date Dec 2, 2010
- ASAHI GLASS COMPANY, LIMITED
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photomask for Extreme Ultraviolet Lithography and Method for Fabric...
- Publication number 20100304277
- Publication date Dec 2, 2010
- Hynix Semiconductor Inc.
- Sung Hyun Oh
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROCESS FOR PRODUCING GRAY TONE MASK
- Publication number 20100294651
- Publication date Nov 25, 2010
- ULVAC COATING CORPORATION
- Fumihiko Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALF-TONE MASK, HALF-TONE MASK BLANK AND METHOD FOR MANUFACTURING H...
- Publication number 20100261096
- Publication date Oct 14, 2010
- ULVAC COATING CORPORATION
- Kagehiro Kageyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomasks, Methods Of Forming Photomasks, And Methods Of Photolith...
- Publication number 20100227260
- Publication date Sep 9, 2010
- Fei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN DATA CREATING METHOD, COMPUTER PROGRAM PRODUCT, AND SEMICON...
- Publication number 20100185313
- Publication date Jul 22, 2010
- Hiromitsu MASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE MASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USI...
- Publication number 20100136466
- Publication date Jun 3, 2010
- Hynix Semiconductor Inc.
- Soon Ho Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, MASK FORMED FROM THE BLANK, AND METHOD OF FORMING A MASK
- Publication number 20100119958
- Publication date May 13, 2010
- Taiwan Semiconductor Manufacturing Co., LTD
- Chue San YOO
- B82 - NANO-TECHNOLOGY
Information Patent Application
HALFTONE TYPE PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK THEREOF
- Publication number 20100040961
- Publication date Feb 18, 2010
- HOYA CORPORATION
- Yuuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-LAYER, ATTENUATED PHASE-SHIFTING MASK
- Publication number 20100040962
- Publication date Feb 18, 2010
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Structure for Fabricating Dark-Periphery Mask for the Ma...
- Publication number 20090325080
- Publication date Dec 31, 2009
- Semiconductor Manufacturing International (Shanghai) Corporation
- Guang Yea (Simon) Tarng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME
- Publication number 20090246647
- Publication date Oct 1, 2009
- HOYA COPPORATION
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask and Method for Fabricating the Same
- Publication number 20090233185
- Publication date Sep 17, 2009
- Hynix Semiconductor Inc.
- Sung Hyun Oh
- B82 - NANO-TECHNOLOGY
Information Patent Application
HALFTONE MASK, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANU...
- Publication number 20090176325
- Publication date Jul 9, 2009
- Woo-Seok JEON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND PRODUCTION METHOD THEREOF, AND PHOTOMASK PRODUC...
- Publication number 20090155698
- Publication date Jun 18, 2009
- HOYA CORPORATION
- Takeyuki Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Originals having inorganic imaging layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Sulfonium salt, resist composition and resist pattern forming process

Negative resist composition and patterning process

Photomask blank and production method thereof, and photomask produc...

Negative resist composition and patterning process

Reflective exposure mask, method of fabricating reflective exposure...

Photomask blank and method for manufacturing the same

Method and structure for fabricating dark-periphery mask for the ma...

Substrate treatment method, coating film removing apparatus, and su...

Photomask blank, photomask, and methods of manufacturing the same

Exposure mask and method for manufacturing semiconductor device usi...

Reflective mask blank for EUV lithography

Half-tone mask, half-tone mask blank and method for manufacturing h...

Photomasks

Creating mask data of integrated circuit patterns using calculated...

Extreme ultraviolet mask and method for fabricating the same

Photomask for extreme ultraviolet lithography and method for fabric...

Photomask blank and production method thereof, and photomask produc...

Photomasks, methods of forming photomasks, and methods of photolith...

Photomask blank, photomask, and methods of manufacturing the same

Reflective mask blank for EUV lithography

Manufacturing method and apparatus of phase shift mask blank

Method for fabricating liquid crystal display device

Use of mixed bases to enhance patterned resist profiles on chrome o...

Halftone mask, method of manufacturing the same, and method of manu...

Method and structure for fabricating dark-periphery mask for the ma...

Methods of forming photomasks

Phase-shift mask and method of forming the same

Halftone type phase shift mask blank and phase shift mask thereof

Multi-layer, attenuated phase-shifting mask

Structure design and fabrication on photomask for contact hole manu...

Patents Applicationslast 30 patents

PHOTOMASK BLANK, AND PREPARATION METHOD THEREOF

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS

PHOTOMASK BLANK AND PRODUCTION METHOD THEREOF, AND PHOTOMASK PRODUC...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

Photomasks

PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME

SUBSTRATE TREATMENT METHOD, COATING FILM REMOVING APPARATUS, AND SU...

METHOD AND STRUCTURE FOR FABRICATING DARK-PERIPHERY MASK FOR THE MA...

Photomasks, Methods of Forming Photomasks, and Methods of Photolith...

REFLECTIVE EXPOSURE MASK, METHOD OF FABRICATING REFLECTIVE EXPOSURE...

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS

PHASE-SHIFT MASK AND METHOD OF FORMING THE SAME

PHOTOMASK BLANK AND METHOD FOR MANUFACTURING THE SAME

Method of manufacturing mask structure

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

Photomask for Extreme Ultraviolet Lithography and Method for Fabric...

PROCESS FOR PRODUCING GRAY TONE MASK

HALF-TONE MASK, HALF-TONE MASK BLANK AND METHOD FOR MANUFACTURING H...

Photomasks, Methods Of Forming Photomasks, And Methods Of Photolith...

PATTERN DATA CREATING METHOD, COMPUTER PROGRAM PRODUCT, AND SEMICON...

EXPOSURE MASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USI...

MASK BLANK, MASK FORMED FROM THE BLANK, AND METHOD OF FORMING A MASK

HALFTONE TYPE PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK THEREOF

MULTI-LAYER, ATTENUATED PHASE-SHIFTING MASK

Method and Structure for Fabricating Dark-Periphery Mask for the Ma...

PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME

Extreme Ultraviolet Mask and Method for Fabricating the Same

HALFTONE MASK, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANU...

PHOTOMASK BLANK AND PRODUCTION METHOD THEREOF, AND PHOTOMASK PRODUC...