Pattern dimensions

Industry

CPC
G03F7/70625

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70625Pattern dimensions

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Matching process controllers for improved matching of process
- Patent number 12,265,380
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,235,590
- Issue date Feb 25, 2025
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hollow-core photonic crystal fiber based broadband radiation generator
- Patent number 12,237,639
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- John Colin Travers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 12,228,862
- Issue date Feb 18, 2025
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Interferometer systems and methods for real time etch process compe...
- Patent number 12,218,015
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency-picked methodology for diffraction-based overlay measurement
- Patent number 12,216,412
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Chih Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ lithography pattern enhancement with localized stress treat...
- Patent number 12,204,253
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Andrew Weloth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 12,204,826
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and method for process-window characterization
- Patent number 12,197,134
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 12,197,136
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 12,189,314
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology data correction using image quality metric
- Patent number 12,189,307
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Fuming Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Computational metrology
- Patent number 12,189,302
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern measurement device and pattern measurement method
- Patent number 12,174,551
- Issue date Dec 24, 2024
- Hitachi High-Technologies Corporation
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,169,365
- Issue date Dec 17, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,169,364
- Issue date Dec 17, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Voltage contrast metrology mark
- Patent number 12,169,366
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Cyrus Emil Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhancing lithography operation for manufacturing semiconductor dev...
- Patent number 12,153,351
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Chen Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monitoring system and method for verifying measurements in patterne...
- Patent number 12,152,869
- Issue date Nov 26, 2024
- Nova Ltd.
- Boaz Brill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for focus control in extreme ultraviolet lithogra...
- Patent number 12,153,352
- Issue date Nov 26, 2024
- KLA Corporation
- Roel Gronheid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,153,350
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for correcting critical dimension measurements of lithograph...
- Patent number 12,147,163
- Issue date Nov 19, 2024
- United Microelectronics Corp.
- Hsin-Yu Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining best focus and best dose in exposure process
- Patent number 12,135,504
- Issue date Nov 5, 2024
- Samsung Electronics Co., Ltd.
- Kihyun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,130,559
- Issue date Oct 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhanced cross sectional features measurement methodology
- Patent number 12,123,708
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Manoj Kumar Dayyala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic apparatus, metrology systems, illumination sources and...
- Patent number 12,124,173
- Issue date Oct 22, 2024
- ASML Netherlands B.V. & ASML Holding N.V.
- Marinus Petrus Reijnders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,117,733
- Issue date Oct 15, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical metrology utilizing short-wave infrared wavelengths
- Patent number 12,111,580
- Issue date Oct 8, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Multi-tone scheme for maskless lithography
- Patent number 12,105,424
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurements of structures in presence of signal contaminations
- Patent number 12,092,962
- Issue date Sep 17, 2024
- Onto Innovation Inc.
- Jingsheng Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT
- Publication number 20250110412
- Publication date Apr 3, 2025
- KLA Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIBER BUNDLE BASED OPTICAL SPOT SIZE SELECTOR
- Publication number 20250102924
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN PREDICTION DEVICE AND RESIST PATTERN PREDICTION DEVI...
- Publication number 20250076772
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- Hanveen Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Monitoring Ghost Image of Illumination Unit of Lithograp...
- Publication number 20250076195
- Publication date Mar 6, 2025
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Kaifeng Xu
- G01 - MEASURING TESTING
Information Patent Application
LATENT SPACE SYNCHRONIZATION OF MACHINE LEARNING MODELS FOR IN-DEVI...
- Publication number 20250060679
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Davide BARBIERI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20250060678
- Publication date Feb 20, 2025
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY METHOD USING CASTELLATION SHAPED ASSIST FEATURES T...
- Publication number 20250060672
- Publication date Feb 20, 2025
- WESTERN DIGITAL TECHNOLOGIES, INC.,
- Shinichi HISADOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Flexible Measurement Models For Model Based Measurements Of Semicon...
- Publication number 20250053096
- Publication date Feb 13, 2025
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR OPTIMIZING OPTICAL INSPECTION OF PATTERNED ST...
- Publication number 20250054128
- Publication date Feb 13, 2025
- NOVA LTD
- Boaz BRILL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250044708
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING
- Publication number 20250044710
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Jiyou FU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...
- Publication number 20250036031
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Aniruddha Ramakrishna SONDE
- G01 - MEASURING TESTING
Information Patent Application
DETECTING OUTLIERS AND ANOMALIES FOR OCD METROLOGY MACHINE LEARNING
- Publication number 20250027767
- Publication date Jan 23, 2025
- NOVA LTD
- EITAN A. ROTHSTEIN
- G01 - MEASURING TESTING
Information Patent Application
DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION
- Publication number 20250021015
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OBTAINING A PARAMETER CHARACTERIZING A FABRICATION PROCESS
- Publication number 20250021020
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Patrick Philipp HELFENSTEIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...
- Publication number 20250021025
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Youngho HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HYBRID METROLOGY METHOD AND SYSTEM
- Publication number 20250003882
- Publication date Jan 2, 2025
- NOVA LTD
- GILAD BARAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED CROSS SECTIONAL FEATURES MEASUREMENT METHODOLOGY
- Publication number 20250003742
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Manoj Kumar Dayyala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Determination of Imaging Transfer Function of a Charged-Particle Ex...
- Publication number 20240427254
- Publication date Dec 26, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A PERFORMANCE PARAMETER DISTRIBUTION
- Publication number 20240402618
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Vahid BASTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENHANCING LITHOGRAPHY OPERATION FOR MANUFACTURING SEMICONDUCTOR DEV...
- Publication number 20240393701
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Chen SU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR REAL TIME ETCH PROCESS COMPENSATION CONTROL
- Publication number 20240395637
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chansyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING SYSTEMS, MODELS, AND MANUFACTURING PROCESSES
- Publication number 20240385530
- Publication date Nov 21, 2024
- ASML NETHERLANDS B.V.
- Jiao HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC S...
- Publication number 20240385531
- Publication date Nov 21, 2024
- ASML NETHERLANDS B.V.
- Alexandru ONOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION-BASED IMAGE PROCESSING FOR METROLOGY
- Publication number 20240385532
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Waheb Bishara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY APPARATUS AND OPERATION METHOD OF THE SAME
- Publication number 20240377760
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Hyunwoong HWANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING A STOCHASTIC METRIC RELATING TO A LITHOGRAPH...
- Publication number 20240369944
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND COMPUTER PROGRAMS FOR DATA MAPPING FOR LOW DIMENSIONAL...
- Publication number 20240369943
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Kedir Mohammed ADAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20240361702
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD AND DEVICE
- Publication number 20240361705
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Sergey TARABRIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Pattern dimensions

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Matching process controllers for improved matching of process

Computer-readable storage medium recording data structure for stori...

Hollow-core photonic crystal fiber based broadband radiation generator

Selection of measurement locations for patterning processes

Interferometer systems and methods for real time etch process compe...

Frequency-picked methodology for diffraction-based overlay measurement

In-situ lithography pattern enhancement with localized stress treat...

Method and apparatus for inspection and metrology

Apparatus and method for process-window characterization

Method of determining control parameters of a device manufacturing...

Metrology method and associated metrology and lithographic apparatuses

Metrology data correction using image quality metric

Computational metrology

Pattern measurement device and pattern measurement method

Computer-readable storage medium recording data structure for stori...

Computer-readable storage medium recording data structure for stori...

Voltage contrast metrology mark

Enhancing lithography operation for manufacturing semiconductor dev...

Monitoring system and method for verifying measurements in patterne...

System and method for focus control in extreme ultraviolet lithogra...

Method of manufacturing semiconductor devices

Method for correcting critical dimension measurements of lithograph...

Method for determining best focus and best dose in exposure process

Method for measuring critical dimension

Enhanced cross sectional features measurement methodology

Lithographic apparatus, metrology systems, illumination sources and...

Method for measuring critical dimension

Optical metrology utilizing short-wave infrared wavelengths

Multi-tone scheme for maskless lithography

Measurements of structures in presence of signal contaminations

Patents Applicationslast 30 patents

SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT

FIBER BUNDLE BASED OPTICAL SPOT SIZE SELECTOR

RESIST PATTERN PREDICTION DEVICE AND RESIST PATTERN PREDICTION DEVI...

Method for Monitoring Ghost Image of Illumination Unit of Lithograp...

LATENT SPACE SYNCHRONIZATION OF MACHINE LEARNING MODELS FOR IN-DEVI...

Pattern Measurement Device and Pattern Measurement Method

PHOTOLITHOGRAPHY METHOD USING CASTELLATION SHAPED ASSIST FEATURES T...

Flexible Measurement Models For Model Based Measurements Of Semicon...

METHOD AND SYSTEM FOR OPTIMIZING OPTICAL INSPECTION OF PATTERNED ST...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING

TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...

DETECTING OUTLIERS AND ANOMALIES FOR OCD METROLOGY MACHINE LEARNING

DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION

OBTAINING A PARAMETER CHARACTERIZING A FABRICATION PROCESS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...

HYBRID METROLOGY METHOD AND SYSTEM

ENHANCED CROSS SECTIONAL FEATURES MEASUREMENT METHODOLOGY

Determination of Imaging Transfer Function of a Charged-Particle Ex...

METHOD OF DETERMINING A PERFORMANCE PARAMETER DISTRIBUTION

ENHANCING LITHOGRAPHY OPERATION FOR MANUFACTURING SEMICONDUCTOR DEV...

METHODS FOR REAL TIME ETCH PROCESS COMPENSATION CONTROL

ETCHING SYSTEMS, MODELS, AND MANUFACTURING PROCESSES

METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC S...

OPTIMIZATION-BASED IMAGE PROCESSING FOR METROLOGY

PHOTOLITHOGRAPHY APPARATUS AND OPERATION METHOD OF THE SAME

METHOD FOR DETERMINING A STOCHASTIC METRIC RELATING TO A LITHOGRAPH...

METHODS AND COMPUTER PROGRAMS FOR DATA MAPPING FOR LOW DIMENSIONAL...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METROLOGY METHOD AND DEVICE