Pattern dimensions

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CPC
G03F7/70625

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70625Pattern dimensions

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,366,811
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Hybrid metrology method and system
- Patent number 12,366,533
- Issue date Jul 22, 2025
- Gilad Barak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation source
- Patent number 12,366,810
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fiber bundle based optical spot size selector
- Patent number 12,360,463
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Ivan Maleev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical metrology system and method
- Patent number 12,360,462
- Issue date Jul 15, 2025
- Nova Ltd.
- Gilad Barak
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for qualifying a mask of a lithography system
- Patent number 12,353,126
- Issue date Jul 8, 2025
- Carl Zeiss SMT GmbH
- Asad Rasool
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 12,353,140
- Issue date Jul 8, 2025
- Canon Kabushiki Kaisha
- Takahiro Takiguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining metrics for a portion of a pattern on a substrate
- Patent number 12,339,591
- Issue date Jun 24, 2025
- ASML Netherlands B.V.
- Jiao Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
High force low voltage piezoelectric micromirror actuator
- Patent number 12,339,588
- Issue date Jun 24, 2025
- ASML Netherlands B.V.
- Luc Roger Simonne Haspeslagh
- G02 - OPTICS
Information Patent Grant
Method for determining defectiveness of pattern based on after deve...
- Patent number 12,332,573
- Issue date Jun 17, 2025
- ASML Netherlands B.V.
- Marleen Kooiman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dose mapper method
- Patent number 12,326,664
- Issue date Jun 10, 2025
- Shanghai Huali Integrated Circuit Corporation
- Shuo Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology system, and intensity imbalance m...
- Patent number 12,326,670
- Issue date Jun 10, 2025
- ASML Holding N.V.
- Earl William Ebert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of generating a set of illumination patterns for...
- Patent number 12,321,103
- Issue date Jun 3, 2025
- Canon Kabushiki Kaisha
- Nilabh K. Roy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...
- Patent number 12,313,979
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Sanguk Park
- G02 - OPTICS
Information Patent Grant
Metrology tool with position control of projection system
- Patent number 12,306,544
- Issue date May 20, 2025
- ASML Holding N.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark and method
- Patent number 12,292,694
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Chung Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 12,287,582
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology systems, and methods thereof
- Patent number 12,287,591
- Issue date Apr 29, 2025
- ASML Netherlands B.V. & ASML Holding N.V.
- Arjan Johannes Anton Beukman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dark field microscope
- Patent number 12,287,470
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G01 - MEASURING TESTING
Information Patent Grant
Full-chip cell critical dimension correction method and method of m...
- Patent number 12,282,249
- Issue date Apr 22, 2025
- Samsung Electronics Co., Ltd.
- Kisung Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern height metrology using an e-beam system
- Patent number 12,278,086
- Issue date Apr 15, 2025
- Imec VZW
- Gian Francesco Lorusso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate comprising a target arrangement, and associated at least...
- Patent number 12,276,921
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Olger Victor Zwier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Matching process controllers for improved matching of process
- Patent number 12,265,380
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,235,590
- Issue date Feb 25, 2025
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hollow-core photonic crystal fiber based broadband radiation generator
- Patent number 12,237,639
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- John Colin Travers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 12,228,862
- Issue date Feb 18, 2025
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Interferometer systems and methods for real time etch process compe...
- Patent number 12,218,015
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency-picked methodology for diffraction-based overlay measurement
- Patent number 12,216,412
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Chih Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ lithography pattern enhancement with localized stress treat...
- Patent number 12,204,253
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Andrew Weloth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 12,204,826
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
ALIGNMENT MARK AND METHOD
- Publication number 20250237966
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Chung CHIEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING DEFECTIVENESS OF PATTERN BASED ON AFTER DEVE...
- Publication number 20250237967
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- Marleen KOOIMAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR OBTAINING OPTICAL CRITICAL DIMENSION
- Publication number 20250231495
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- YUN-CHUNG TENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING METHOD AND METROLOGY DEVICE
- Publication number 20250231498
- Publication date Jul 17, 2025
- ASML NETHERLANDS B.V.
- Willem Marie Julia Marcel COENE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING A MEASUREMENT RECIPE AND ASSOCIATED APPARATUSES
- Publication number 20250224685
- Publication date Jul 10, 2025
- ASMLNETHERLANDS B.V.
- Jeroen VAN DONGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANALYTIC METHOD AND DEVICE FOR QUANTITATIVELY CALCULATING LINE EDGE...
- Publication number 20250224684
- Publication date Jul 10, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Dandan Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR MEASUREMENT METHOD
- Publication number 20250225674
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Inho SHIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A METHOD FOR DETERMINING A VERTICAL POSITION OF A STRUCTURE ON A SU...
- Publication number 20250208520
- Publication date Jun 26, 2025
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
METHOD, LITHOGRAPHY MASK, USE OF A LITHOGRAPHY MASK, AND PROCESSING...
- Publication number 20250208499
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF METROLOGY AND ASSOCIATED DEVICES
- Publication number 20250199419
- Publication date Jun 19, 2025
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATCHING PROCESS CONTROLLERS FOR IMPROVED MATCHING OF PROCESS
- Publication number 20250199521
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MEASURING CONTRAST AND CRITICAL DIMENSION USING AN ALIGNMENT SENSOR
- Publication number 20250199418
- Publication date Jun 19, 2025
- ASML NETHERLANDS B.V.
- Edouard André Marie Louis DURIAU
- G01 - MEASURING TESTING
Information Patent Application
CRITICAL DIMENSION UNIFORMITY TUNING BASED ON MASK DESIGN FEATURE D...
- Publication number 20250189901
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Daniel FULFORD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS
- Publication number 20250172881
- Publication date May 29, 2025
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CORRECTING REGISTRATION ERRORS, METHOD OF MANUFACTURING M...
- Publication number 20250164894
- Publication date May 22, 2025
- Samsung Electronics Co., Ltd.
- Sunghoon Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES
- Publication number 20250147435
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Marie-Claire VAN LARE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION
- Publication number 20250147428
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF METROLOGY
- Publication number 20250147436
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT
- Publication number 20250147430
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Chih HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF ALTERNATING LAYER PATTERNS APPROACH FOR EFFECTIVE OVERLAY ME...
- Publication number 20250123569
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Yau Loong CHONG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FULL-WAFER METROLOGY UP-SAMPLING
- Publication number 20250123571
- Publication date Apr 17, 2025
- NOVA LTD
- Eitan A. ROTHSTEIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RAMAN SPECTROSCOPY BASED MEASUREMENTS IN PATTERNED STRUCTURES
- Publication number 20250123210
- Publication date Apr 17, 2025
- NOVA LTD
- Gilad Barak
- G01 - MEASURING TESTING
Information Patent Application
SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT
- Publication number 20250110412
- Publication date Apr 3, 2025
- KLA Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIBER BUNDLE BASED OPTICAL SPOT SIZE SELECTOR
- Publication number 20250102924
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN PREDICTION DEVICE AND RESIST PATTERN PREDICTION DEVI...
- Publication number 20250076772
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- Hanveen Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Monitoring Ghost Image of Illumination Unit of Lithograp...
- Publication number 20250076195
- Publication date Mar 6, 2025
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Kaifeng Xu
- G01 - MEASURING TESTING
Information Patent Application
LATENT SPACE SYNCHRONIZATION OF MACHINE LEARNING MODELS FOR IN-DEVI...
- Publication number 20250060679
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Davide BARBIERI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20250060678
- Publication date Feb 20, 2025
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY METHOD USING CASTELLATION SHAPED ASSIST FEATURES T...
- Publication number 20250060672
- Publication date Feb 20, 2025
- WESTERN DIGITAL TECHNOLOGIES, INC.,
- Shinichi HISADOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Flexible Measurement Models For Model Based Measurements Of Semicon...
- Publication number 20250053096
- Publication date Feb 13, 2025
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Pattern dimensions

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metrology system and method for determining a characteristic of one...

Hybrid metrology method and system

Radiation source

Fiber bundle based optical spot size selector

Optical metrology system and method

Method and device for qualifying a mask of a lithography system

Information processing apparatus and information processing method

Determining metrics for a portion of a pattern on a substrate

High force low voltage piezoelectric micromirror actuator

Method for determining defectiveness of pattern based on after deve...

Dose mapper method

Lithographic apparatus, metrology system, and intensity imbalance m...

System and method of generating a set of illumination patterns for...

Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...

Metrology tool with position control of projection system

Alignment mark and method

Method for controlling a lithographic apparatus and associated appa...

Lithographic apparatus, metrology systems, and methods thereof

Dark field microscope

Full-chip cell critical dimension correction method and method of m...

Pattern height metrology using an e-beam system

Substrate comprising a target arrangement, and associated at least...

Matching process controllers for improved matching of process

Computer-readable storage medium recording data structure for stori...

Hollow-core photonic crystal fiber based broadband radiation generator

Selection of measurement locations for patterning processes

Interferometer systems and methods for real time etch process compe...

Frequency-picked methodology for diffraction-based overlay measurement

In-situ lithography pattern enhancement with localized stress treat...

Method and apparatus for inspection and metrology

Patents Applicationslast 30 patents

ALIGNMENT MARK AND METHOD

METHOD FOR DETERMINING DEFECTIVENESS OF PATTERN BASED ON AFTER DEVE...

METHOD AND SYSTEM FOR OBTAINING OPTICAL CRITICAL DIMENSION

IMAGING METHOD AND METROLOGY DEVICE

METHOD FOR DETERMINING A MEASUREMENT RECIPE AND ASSOCIATED APPARATUSES

ANALYTIC METHOD AND DEVICE FOR QUANTITATIVELY CALCULATING LINE EDGE...

SEMICONDUCTOR MEASUREMENT METHOD

A METHOD FOR DETERMINING A VERTICAL POSITION OF A STRUCTURE ON A SU...

METHOD, LITHOGRAPHY MASK, USE OF A LITHOGRAPHY MASK, AND PROCESSING...

METHODS OF METROLOGY AND ASSOCIATED DEVICES

MATCHING PROCESS CONTROLLERS FOR IMPROVED MATCHING OF PROCESS

MEASURING CONTRAST AND CRITICAL DIMENSION USING AN ALIGNMENT SENSOR

CRITICAL DIMENSION UNIFORMITY TUNING BASED ON MASK DESIGN FEATURE D...

CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS

METHOD OF CORRECTING REGISTRATION ERRORS, METHOD OF MANUFACTURING M...

METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES

APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION

METHODS OF METROLOGY

FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT

USE OF ALTERNATING LAYER PATTERNS APPROACH FOR EFFECTIVE OVERLAY ME...

FULL-WAFER METROLOGY UP-SAMPLING

RAMAN SPECTROSCOPY BASED MEASUREMENTS IN PATTERNED STRUCTURES

SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT

FIBER BUNDLE BASED OPTICAL SPOT SIZE SELECTOR

RESIST PATTERN PREDICTION DEVICE AND RESIST PATTERN PREDICTION DEVI...

Method for Monitoring Ghost Image of Illumination Unit of Lithograp...

LATENT SPACE SYNCHRONIZATION OF MACHINE LEARNING MODELS FOR IN-DEVI...

Pattern Measurement Device and Pattern Measurement Method

PHOTOLITHOGRAPHY METHOD USING CASTELLATION SHAPED ASSIST FEATURES T...

Flexible Measurement Models For Model Based Measurements Of Semicon...