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Photography
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PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
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G03F7/70625
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Patents Grants
last 30 patents
Information
Patent Grant
Metrology targets
Patent number
11,982,946
Issue date
May 14, 2024
ASML Netherlands B.V.
Nikhil Mehta
G01 - MEASURING TESTING
Information
Patent Grant
Methods and apparatus for measuring a property of a substrate
Patent number
11,977,034
Issue date
May 7, 2024
ASML Netherlands B.V.
Wouter Lodewijk Elings
Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information
Patent Grant
Method for detecting stochastic weak points of layout pattern of se...
Patent number
11,977,828
Issue date
May 7, 2024
Samsung Electronics Co., Ltd.
Seungjin Lee
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Lithographic patterning method
Patent number
11,977,337
Issue date
May 7, 2024
Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
Diederik Jan Maas
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for improving a process for a patterning process
Patent number
11,977,336
Issue date
May 7, 2024
ASML Netherlands B.V.
Jen-Shiang Wang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for determining patterning device pattern based on manufactu...
Patent number
11,972,194
Issue date
Apr 30, 2024
ASML Netherlands B.V.
Roshni Biswas
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Method of measuring variation, inspection system, computer program,...
Patent number
11,966,168
Issue date
Apr 23, 2024
ASML Netherlands B.V.
Antoine Gaston Marie Kiers
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Endpoint detection system for enhanced spectral data collection
Patent number
11,965,798
Issue date
Apr 23, 2024
Applied Materials, Inc.
Pengyu Han
G01 - MEASURING TESTING
Information
Patent Grant
Computer-readable storage medium recording data structure for stori...
Patent number
11,960,214
Issue date
Apr 16, 2024
AUROS TECHNOLOGY, INC.
Sol-Lee Hwang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method and apparatus to determine a patterning process parameter
Patent number
11,947,269
Issue date
Apr 2, 2024
ASML Netherlands B.V.
Anagnostis Tsiatmas
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Optical phase measurement system and method
Patent number
11,946,875
Issue date
Apr 2, 2024
Nova Ltd.
Gilad Barak
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Metrology apparatus
Patent number
11,940,739
Issue date
Mar 26, 2024
ASML Netherlands B.V.
Nitesh Pandey
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Dark field microscope
Patent number
11,940,608
Issue date
Mar 26, 2024
ASML Netherlands B.V.
Sebastianus Adrianus Goorden
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Maskless based lithography methods
Patent number
11,934,107
Issue date
Mar 19, 2024
Applied Materials, Inc.
Shih-Hsien Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Apparatus and methods for determining the position of a target stru...
Patent number
11,927,891
Issue date
Mar 12, 2024
ASML Netherlands B.V.
Nitesh Pandey
G01 - MEASURING TESTING
Information
Patent Grant
Optical metrology in machine learning to characterize features
Patent number
11,921,433
Issue date
Mar 5, 2024
Lam Research Corporation
Ye Feng
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Optical metrology tool equipped with modulated illumination sources
Patent number
11,913,874
Issue date
Feb 27, 2024
KLA Corporation
Andrei V. Shchegrov
G01 - MEASURING TESTING
Information
Patent Grant
Method for predicting resist deformation
Patent number
11,914,942
Issue date
Feb 27, 2024
ASML Netherlands B.V.
Chrysostomos Batistakis
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Overlay measurement targets design
Patent number
11,914,290
Issue date
Feb 27, 2024
KLA Corporation
Hong Xiao
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Metrology method and associated metrology and lithographic apparatuses
Patent number
11,906,906
Issue date
Feb 20, 2024
ASML Netherlands B.V.
Sebastianus Adrianus Goorden
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for inferring a local uniformity metric
Patent number
11,886,125
Issue date
Jan 30, 2024
ASML Netherlands B.V.
Simon Gijsbert Josephus Mathijssen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
System and method for controlling measurements of sample's parameters
Patent number
11,874,606
Issue date
Jan 16, 2024
Nova Ltd.
Barak Bringoltz
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for accurately obtaining photolithography parameter
Patent number
11,868,053
Issue date
Jan 9, 2024
CHANGXIN MEMORY TECHNOLOGIES, INC.
Xun Yan
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Optical metrology system and method
Patent number
11,868,054
Issue date
Jan 9, 2024
Nova Ltd.
Gilad Barak
G01 - MEASURING TESTING
Information
Patent Grant
Multi-metal fill with self-aligned patterning and dielectric with v...
Patent number
11,860,550
Issue date
Jan 2, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Tai-I Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods and systems for integrated circuit photomask patterning
Patent number
11,853,674
Issue date
Dec 26, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Wei-Hao Huang
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Frequency-picked methodology for diffraction based overlay measurement
Patent number
11,852,981
Issue date
Dec 26, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Hung-Chih Hsieh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for diffraction pattern guided source mask opt...
Patent number
11,846,889
Issue date
Dec 19, 2023
ASML Netherlands B.V.
Duan-Fu Stephen Hsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Model for calculating a stochastic variation in an arbitrary pattern
Patent number
11,835,862
Issue date
Dec 5, 2023
ASML Netherlands B.V.
Steven George Hansen
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Enhancing lithography operation for manufacturing semiconductor dev...
Patent number
11,829,076
Issue date
Nov 28, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Yi-Chen Su
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN
Publication number
20240160112
Publication date
May 16, 2024
ASML NETHERLANDS B.V.
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD
Publication number
20240134286
Publication date
Apr 25, 2024
Canon Kabushiki Kaisha
SHOHEI IWATA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
Publication number
20240126181
Publication date
Apr 18, 2024
ASML NETHERLANDS B.V.
Abraham SLACHTER
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR RULE-BASED RETARGETING OF TARGET PATTERN
Publication number
20240126183
Publication date
Apr 18, 2024
ASML NETHERLANDS B.V.
Ayman HAMOUDA
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
METHODS OF FITTING MEASUREMENT DATA TO A MODEL AND MODELING A PERFO...
Publication number
20240118629
Publication date
Apr 11, 2024
ASML NETHERLANDS B.V.
Aliasghar KEYVANI JANBAHAN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SEMICONDUCTOR PATTERN FOR A PATTERNING PROCESS, AND METHOD AND SYST...
Publication number
20240118628
Publication date
Apr 11, 2024
Prosemi Co., Ltd.
Chen-Kun WANG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR ANALYZING DEFECTS OF A STRUCTURED COMPONENT
Publication number
20240103384
Publication date
Mar 28, 2024
Carl Zeiss SMT GMBH
Jan Tusch
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD AND DEVICE FOR QUALIFYING A MASK OF A LITHOGRAPHY SYSTEM
Publication number
20240103360
Publication date
Mar 28, 2024
Carl Zeiss SMT GMBH
Asad Rasool
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD TO PREDICT METROLOGY OFFSET OF A SEMICONDUCTOR MANUFACTURING...
Publication number
20240094640
Publication date
Mar 21, 2024
ASML NETHERLANDS B.V.
Thiago DOS SANTOS GUZELLA
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
HIGH-RESOLUTION EVALUATION OF OPTICAL METROLOGY TARGETS FOR PROCESS...
Publication number
20240094639
Publication date
Mar 21, 2024
KLA Corporation
Nadav Gutman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MULTI-METAL FILL WITH SELF-ALIGNED PATTERNING AND DIELECTRIC WITH V...
Publication number
20240085803
Publication date
Mar 14, 2024
Taiwan Semiconductor Manufacturing Co., Ltd.
Tai-I YANG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EF...
Publication number
20240085777
Publication date
Mar 14, 2024
Samsung Electronics Co., Ltd.
Dae Young PARK
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT
Publication number
20240085804
Publication date
Mar 14, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Hung-Chih HSIEH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
TIME-DOMAIN OPTICAL METROLOGY AND INSPECTION OF SEMICONDUCTOR DEVICES
Publication number
20240085805
Publication date
Mar 14, 2024
NOVA LTD
Gilad BARAK
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MASKLESS BASED LITHOGRAPHY METHODS
Publication number
20240077805
Publication date
Mar 7, 2024
Applied Materials, Inc.
Shih-Hsien LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
Publication number
20240069446
Publication date
Feb 29, 2024
Samsung Electronics Co., Ltd.
SeungKyo LEE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SELF-SUPERVISED REPRESENTATION LEARNING FOR INTERPRETATION OF OCD DATA
Publication number
20240069445
Publication date
Feb 29, 2024
NOVA LTD
RAN YACOBY
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
MODULAR AUTOENCODER MODEL FOR MANUFACTURING PROCESS PARAMETER ESTIM...
Publication number
20240060906
Publication date
Feb 22, 2024
ASML NETHERLANDS B.V.
Bart Jacobus Martinus TIEMERSMA
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
METHOD FOR DETECTING COORDINATE OF MARK, COMPUTING SYSTEM FOR PERFO...
Publication number
20240061354
Publication date
Feb 22, 2024
Samsung Electronics Co., Ltd.
Seung Hak PARK
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUF...
Publication number
20240045342
Publication date
Feb 8, 2024
Samsung Electronics Co., Ltd.
Su Bin KONG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METRO...
Publication number
20240036479
Publication date
Feb 1, 2024
ASML NETHERLANDS B.V.
Roy WERKMAN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD US...
Publication number
20240036478
Publication date
Feb 1, 2024
Samsung Electronics Co., Ltd.
Han Veen KOH
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF
Publication number
20240036485
Publication date
Feb 1, 2024
ASML Netheriands B. V.
Arjan Johannes Anton BEUKMAN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METROLOGY SYSTEM AND COHERENCE ADJUSTERS
Publication number
20240027913
Publication date
Jan 25, 2024
ASML NETHERLANDS B.V.
Sergei SOKOLOV
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
Publication number
20240019787
Publication date
Jan 18, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Ru-Gun LIU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
Publication number
20240012337
Publication date
Jan 11, 2024
ASML NETHERLANDS B.V.
Wim Tjibbo TEL
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
Publication number
20240012342
Publication date
Jan 11, 2024
ASML NETHERLANDS B.V.
Sebastianus Adrianus GOORDEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MULTIPLE OBJECTIVES METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND M...
Publication number
20240012338
Publication date
Jan 11, 2024
ASML Holding N.V.
Douglas C. CAPPELLI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
HIGH FORCE LOW VOLTAGE PIEZOELECTRIC MICROMIRROR ACTUATOR
Publication number
20240012332
Publication date
Jan 11, 2024
ASML NETHERLANDS B.V.
Luc Roger Simonne HASPESLAGH
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METROLOGY METHOD FOR MEASURING AN ETCHED TRENCH AND ASSOCIATED METR...
Publication number
20240012339
Publication date
Jan 11, 2024
ASML NETHERLANDS B.V.
Simon Gijsbert Josephus MATHIJSSEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY