Pattern inspection

Industry

CPC
H01J2237/2817

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2817Pattern inspection

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method, apparatus, and system for dynamically controlling an electr...
- Patent number 12,368,067
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Yixiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for inspecting a specimen and charged particle beam device
- Patent number 12,362,131
- Issue date Jul 15, 2025
- Applied Materials Israel Ltd.
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor inspection apparatus and semiconductor inspection met...
- Patent number 12,362,139
- Issue date Jul 15, 2025
- Samsung Electronics Co., Ltd.
- Yujin Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple landing energy scanning electron microscopy systems and me...
- Patent number 12,354,833
- Issue date Jul 8, 2025
- ASML Netherlands B.V.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay measurement system and overlay measurement device for overl...
- Patent number 12,354,829
- Issue date Jul 8, 2025
- HITACHI HIGH-TECH CORPORATION
- Masaki Sugie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computer system, dimension measurement method, and storage medium
- Patent number 12,345,522
- Issue date Jul 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Yutaka Okuyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multiple charged-particle beam apparatus and methods of operating t...
- Patent number 12,347,643
- Issue date Jul 1, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus match detection method, detection system, prewarning meth...
- Patent number 12,341,070
- Issue date Jun 24, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Weigang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electron beam inspection apparatus, multipole array control m...
- Patent number 12,308,202
- Issue date May 20, 2025
- NuFlare Technology, Inc.
- Yuichi Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FIB-SEM 3D tomography for measuring shape deviations of HAR structures
- Patent number 12,288,705
- Issue date Apr 29, 2025
- Carl Zeiss SMT GmbH
- Amir Avishai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern height metrology using an e-beam system
- Patent number 12,278,086
- Issue date Apr 15, 2025
- Imec VZW
- Gian Francesco Lorusso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lens designs
- Patent number 12,243,714
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Laura Del Tin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, apparatus, and program for determining condition related to...
- Patent number 12,243,711
- Issue date Mar 4, 2025
- HITACHI HIGH-TECH CORPORATION
- Takahiro Nishihata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for defect inspection using voltage contrast in a...
- Patent number 12,191,112
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system and overlay misalignment measurement m...
- Patent number 12,183,541
- Issue date Dec 31, 2024
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern measurement device and pattern measurement method
- Patent number 12,174,551
- Issue date Dec 24, 2024
- Hitachi High-Technologies Corporation
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern inspecting device
- Patent number 12,176,181
- Issue date Dec 24, 2024
- HITACHI HIGH-TECH CORPORATION
- Wei Sun
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for scanning a sample using multi-beam inspection...
- Patent number 12,165,837
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Martinus Gerardus Maria Johannes Maassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,142,457
- Issue date Nov 12, 2024
- HITACHI HIGH-TECH CORPORATION
- Takahiro Nishihata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection of probabilistic process windows
- Patent number 12,142,454
- Issue date Nov 12, 2024
- Fractilla, LLC
- Chris Mack
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-source charged particle illumination apparatus
- Patent number 12,125,671
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Stijn Wilem Herman Karel Steenbrink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal-aided inspection by advanced charge controller module in a...
- Patent number 12,125,669
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Ning Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,087,541
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image contrast enhancement in sample inspection
- Patent number 12,087,542
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Yixiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross-talk cancellation in multiple charged-particle beam inspection
- Patent number 12,080,513
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection method, inspection system, and semiconductor fabrication...
- Patent number 12,055,861
- Issue date Aug 6, 2024
- Samsung Electronics Co., Ltd.
- Kihyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for generating and analyzing roughness measuremen...
- Patent number 11,996,265
- Issue date May 28, 2024
- Fractilla, LLC
- Chris Mack
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement and correction of optical aberrations in charged partic...
- Patent number 11,990,315
- Issue date May 21, 2024
- FEI Company
- Erik Franken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,984,295
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring variation, inspection system, computer program,...
- Patent number 11,966,168
- Issue date Apr 23, 2024
- ASML Netherlands B.V.
- Antoine Gaston Marie Kiers
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM DEVICE, AND MEASUREMENT METHOD
- Publication number 20250232946
- Publication date Jul 17, 2025
- Hitachi High-Tech Corporation
- Minami UCHIHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-BEAM OPTIMIZATION FOR OVERLAY MEASUREMENT OF BURIED FEATURES
- Publication number 20250231129
- Publication date Jul 17, 2025
- ASML NETHERLANDS B.V.
- Benoit Herve GAURY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DEFECT INSPECTION USING VOLTAGE CONTRAST IN A...
- Publication number 20250226174
- Publication date Jul 10, 2025
- ASML NETHERLANDS B.V.
- Wei FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC DETERMINATION OF A SAMPLE INSPECTION RECIPE OF CHARGED PART...
- Publication number 20250226175
- Publication date Jul 10, 2025
- ASML NETHERLANDS B.V.
- Zhong-wei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSESSMENT APPARATUS AND METHODS
- Publication number 20250132122
- Publication date Apr 24, 2025
- ASML NETHERLANDS B.V.
- Thomas Izaak Fred HAARTSEN
- G01 - MEASURING TESTING
Information Patent Application
LENS DESIGNS
- Publication number 20250125120
- Publication date Apr 17, 2025
- ASML NETHERLANDS B.V.
- Laura DEL TIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20250112023
- Publication date Apr 3, 2025
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE IMAGING SYSTEM WITH IMPROVED IMAGING OF...
- Publication number 20250104966
- Publication date Mar 27, 2025
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING DATA DERIVED FROM A SAMPLE
- Publication number 20250095133
- Publication date Mar 20, 2025
- ASML NETHERLANDS B.V.
- Vincent Sylvester KUIPER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR CALIBRATION OF DIFFRACTION ANGLES
- Publication number 20250095955
- Publication date Mar 20, 2025
- APPLIED MATERIALS ISRAEL LTD.
- Konstantin Chirko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING DEVICE AND METHOD, CHARGED PARTICLE ASSESSMENT SYST...
- Publication number 20250087444
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR WAVEFORM DETECTION OF PERIODIC SIGNALS USING VOLTAGE...
- Publication number 20250069842
- Publication date Feb 27, 2025
- FEI Company
- Neel Leslie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Detection of Probabilistic Process Windows
- Publication number 20250069843
- Publication date Feb 27, 2025
- FRACTILIA, LLC
- Chris Mack
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20250060678
- Publication date Feb 20, 2025
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR SUBSTRATE, APPARATUS, AND METHOD
- Publication number 20250029811
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Arthur Eduard OVERLACK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGH...
- Publication number 20250022680
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Dmitry Klochkov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Correction Method and Correction Device
- Publication number 20250014858
- Publication date Jan 9, 2025
- Hitachi High-Tech Corporation
- Tomoaki YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DEFECT DETECTION AND DEFECT LOCATION IDENTI...
- Publication number 20250005739
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Shengcheng JIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION
- Publication number 20250006456
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR REDUCING MEASUREMENT ERRORS IN CRITICAL PATTERN DIMENSIO...
- Publication number 20240429107
- Publication date Dec 26, 2024
- Shanghai Huali Integrated Circuit Corporation
- Guanbo Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISCHARGING A REGION OF A SAMPLE
- Publication number 20240420917
- Publication date Dec 19, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Roey Levy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE INSPECTION METHOD
- Publication number 20240412943
- Publication date Dec 12, 2024
- Samsung Electronics Co., LTD
- Jinwoo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...
- Publication number 20240379325
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Frank Nan ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED NAVIGATION FOR ELECTRON MICROSCOPY
- Publication number 20240339293
- Publication date Oct 10, 2024
- Oxford Instruments Nanotechnology Tools Limited
- Peter Statham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...
- Publication number 20240339295
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Tzu-Chao CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR GENERATING AND ANALYZING ROUGHNESS MEASUREMEN...
- Publication number 20240312757
- Publication date Sep 19, 2024
- FRACTILIA, LLC
- Chris MACK
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR STRUCTURE, INSPECTION METHOD AND INSPECTION SYSTEM
- Publication number 20240304411
- Publication date Sep 12, 2024
- WINBOND ELECTRONICS CORP.
- Yen-Chiao CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...
- Publication number 20240282547
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Dispositioning and Control of a Semiconductor Manufacturi...
- Publication number 20240258066
- Publication date Aug 1, 2024
- FRACTILIA, LLC
- Chris Mack
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20240249912
- Publication date Jul 25, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS

Pattern inspection

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method, apparatus, and system for dynamically controlling an electr...

Method for inspecting a specimen and charged particle beam device

Semiconductor inspection apparatus and semiconductor inspection met...

Multiple landing energy scanning electron microscopy systems and me...

Overlay measurement system and overlay measurement device for overl...

Computer system, dimension measurement method, and storage medium

Multiple charged-particle beam apparatus and methods of operating t...

Apparatus match detection method, detection system, prewarning meth...

Multi-electron beam inspection apparatus, multipole array control m...

FIB-SEM 3D tomography for measuring shape deviations of HAR structures

Pattern height metrology using an e-beam system

Lens designs

Method, apparatus, and program for determining condition related to...

System and method for defect inspection using voltage contrast in a...

Charged particle beam system and overlay misalignment measurement m...

Pattern measurement device and pattern measurement method

Pattern inspecting device

System and method for scanning a sample using multi-beam inspection...

Charged particle beam device

Detection of probabilistic process windows

Multi-source charged particle illumination apparatus

Thermal-aided inspection by advanced charge controller module in a...

Apparatus of plural charged-particle beams

Image contrast enhancement in sample inspection

Cross-talk cancellation in multiple charged-particle beam inspection

Inspection method, inspection system, and semiconductor fabrication...

System and method for generating and analyzing roughness measuremen...

Measurement and correction of optical aberrations in charged partic...

Charged particle assessment tool, inspection method

Method of measuring variation, inspection system, computer program,...

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM DEVICE, AND MEASUREMENT METHOD

E-BEAM OPTIMIZATION FOR OVERLAY MEASUREMENT OF BURIED FEATURES

SYSTEM AND METHOD FOR DEFECT INSPECTION USING VOLTAGE CONTRAST IN A...

DYNAMIC DETERMINATION OF A SAMPLE INSPECTION RECIPE OF CHARGED PART...

ASSESSMENT APPARATUS AND METHODS

LENS DESIGNS

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

MULTI-BEAM CHARGED PARTICLE IMAGING SYSTEM WITH IMPROVED IMAGING OF...

METHOD OF PROCESSING DATA DERIVED FROM A SAMPLE

METHOD AND SYSTEM FOR CALIBRATION OF DIFFRACTION ANGLES

DATA PROCESSING DEVICE AND METHOD, CHARGED PARTICLE ASSESSMENT SYST...

TECHNIQUES FOR WAVEFORM DETECTION OF PERIODIC SIGNALS USING VOLTAGE...

Detection of Probabilistic Process Windows

Pattern Measurement Device and Pattern Measurement Method

SENSOR SUBSTRATE, APPARATUS, AND METHOD

3D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGH...

Correction Method and Correction Device

SYSTEMS AND METHODS FOR DEFECT DETECTION AND DEFECT LOCATION IDENTI...

CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION

METHOD FOR REDUCING MEASUREMENT ERRORS IN CRITICAL PATTERN DIMENSIO...

DISCHARGING A REGION OF A SAMPLE

SUBSTRATE INSPECTION METHOD

SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...

IMPROVED NAVIGATION FOR ELECTRON MICROSCOPY

METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...

SYSTEM AND METHOD FOR GENERATING AND ANALYZING ROUGHNESS MEASUREMEN...

SEMICONDUCTOR STRUCTURE, INSPECTION METHOD AND INSPECTION SYSTEM

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...

Method of Dispositioning and Control of a Semiconductor Manufacturi...

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD