Pattern inspection

Industry

CPC
H01J2237/2817

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2817Pattern inspection

Industries

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam device
- Patent number 12,142,457
- Issue date Nov 12, 2024
- HITACHI HIGH-TECH CORPORATION
- Takahiro Nishihata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection of probabilistic process windows
- Patent number 12,142,454
- Issue date Nov 12, 2024
- Fractilla, LLC
- Chris Mack
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-source charged particle illumination apparatus
- Patent number 12,125,671
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Stijn Wilem Herman Karel Steenbrink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal-aided inspection by advanced charge controller module in a...
- Patent number 12,125,669
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Ning Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,087,541
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image contrast enhancement in sample inspection
- Patent number 12,087,542
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Yixiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross-talk cancellation in multiple charged-particle beam inspection
- Patent number 12,080,513
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection method, inspection system, and semiconductor fabrication...
- Patent number 12,055,861
- Issue date Aug 6, 2024
- Samsung Electronics Co., Ltd.
- Kihyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for generating and analyzing roughness measuremen...
- Patent number 11,996,265
- Issue date May 28, 2024
- Fractilla, LLC
- Chris Mack
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement and correction of optical aberrations in charged partic...
- Patent number 11,990,315
- Issue date May 21, 2024
- FEI Company
- Erik Franken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,984,295
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring variation, inspection system, computer program,...
- Patent number 11,966,168
- Issue date Apr 23, 2024
- ASML Netherlands B.V.
- Antoine Gaston Marie Kiers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multiple electron-beam image acquisition apparatus and multiple ele...
- Patent number 11,961,703
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Chosaku Noda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replaceable module for a charged particle apparatus
- Patent number 11,961,698
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Christiaan Otten
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for image enhancement for a multi-beam charged-...
- Patent number 11,961,700
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Maikel Robert Goosen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,961,697
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device for inspection of a specimen with a pl...
- Patent number 11,961,709
- Issue date Apr 16, 2024
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed charged-particle beam system
- Patent number 11,942,302
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Arno Jan Bleeker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for charged particle flooding to enhance voltag...
- Patent number 11,929,232
- Issue date Mar 12, 2024
- ASML Netherlands B.V.
- Frank Nan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analysis method and analysis system of voltage contrast defect
- Patent number 11,927,625
- Issue date Mar 12, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Yue-Ying Yen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scanning electron microscope device and electron beam inspection ap...
- Patent number 11,908,657
- Issue date Feb 20, 2024
- Zhongke Jingyuan Electron Limited
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspection
- Patent number 11,875,966
- Issue date Jan 16, 2024
- ASML Netherlands B.V.
- Bernardo Kastrup
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,869,745
- Issue date Jan 9, 2024
- HITACHI HIGH-TECH CORPORATION
- Minami Shouji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number RE49784
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Weiming Ren
Information Patent Grant
Charged particle beam apparatus, and systems and methods for operat...
- Patent number 11,798,777
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Martinus Gerardus Maria Johannes Maassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,798,780
- Issue date Oct 24, 2023
- HITACHI HIGH-TECH CORPORATION
- Toshiyuki Yokosuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,798,783
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam observation device, electron beam observation system,...
- Patent number 11,791,130
- Issue date Oct 17, 2023
- HITACHI HIGH-TECH CORPORATION
- Koichi Hamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and method for controlling charged...
- Patent number 11,791,131
- Issue date Oct 17, 2023
- HITACHI HIGH-TECH CORPORATION
- Takashi Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal-aided inspection by advanced charge controller module in a...
- Patent number 11,728,131
- Issue date Aug 15, 2023
- ASML Netherlands B.V.
- Ning Ye
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...
- Publication number 20240379325
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Frank Nan ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED NAVIGATION FOR ELECTRON MICROSCOPY
- Publication number 20240339293
- Publication date Oct 10, 2024
- Oxford Instruments Nanotechnology Tools Limited
- Peter Statham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...
- Publication number 20240339295
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Tzu-Chao CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR GENERATING AND ANALYZING ROUGHNESS MEASUREMEN...
- Publication number 20240312757
- Publication date Sep 19, 2024
- FRACTILIA, LLC
- Chris MACK
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR STRUCTURE, INSPECTION METHOD AND INSPECTION SYSTEM
- Publication number 20240304411
- Publication date Sep 12, 2024
- WINBOND ELECTRONICS CORP.
- Yen-Chiao CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...
- Publication number 20240282547
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Dispositioning and Control of a Semiconductor Manufacturi...
- Publication number 20240258066
- Publication date Aug 1, 2024
- FRACTILIA, LLC
- Chris Mack
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20240249912
- Publication date Jul 25, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Gun and Charged Particle Beam Apparatus
- Publication number 20240212966
- Publication date Jun 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Tomoya IGARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPUTER SYSTEM, DIMENSION MEASUREMENT METHOD, AND STORAGE MEDIUM
- Publication number 20240200939
- Publication date Jun 20, 2024
- Hitachi High-Tech Corporation
- Yutaka Okuyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING...
- Publication number 20240203688
- Publication date Jun 20, 2024
- Samsung Electronics Co., Ltd.
- Kunsu KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION
- Publication number 20240186107
- Publication date Jun 6, 2024
- Bernardo KASTRUP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sample Inspection Apparatus, Inspection System, Thin Piece Sample F...
- Publication number 20240128047
- Publication date Apr 18, 2024
- Hitachi High-Tech Corporation
- Masahiro YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSC...
- Publication number 20240087838
- Publication date Mar 14, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING DEVICE AND METHOD, CHARGED PARTICLE ASSESSMENT SYST...
- Publication number 20240087842
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE (SEM) MEASUREMENT METHOD AND APPARATUS
- Publication number 20240079206
- Publication date Mar 7, 2024
- Samsung Electronics Co., Ltd.
- Kihyun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSESSMENT SYSTEM, METHOD OF ASSESSING
- Publication number 20240079205
- Publication date Mar 7, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20240062986
- Publication date Feb 22, 2024
- Hitachi High-Tech Corporation
- Naho TERAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION DEVICE AND INSPECTION METHOD
- Publication number 20240055223
- Publication date Feb 15, 2024
- KIOXIA Corporation
- Chihiro IDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL DEVICE
- Publication number 20240038485
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Stijn Wilem Herman Karel STEENBRINK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL SYSTEM AND METHOD OF OPERATING AN ELECTRON-OPTICAL...
- Publication number 20240029995
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Stijn Wilem Herman Karel STEENBRINK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE FOR INSPECTION OF A SPECIMEN WITH A PL...
- Publication number 20240006149
- Publication date Jan 4, 2024
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING CHARGED PARTICLE BEAMS
- Publication number 20230411110
- Publication date Dec 21, 2023
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DETECTING DEFECTS ON A WAFER AND RELATED NON-...
- Publication number 20230411224
- Publication date Dec 21, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- SHIH-CHANG WANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEFECT INSPECTION APPARATUS
- Publication number 20230402249
- Publication date Dec 14, 2023
- HITACHI HIGH-TECH CORPORATION
- Yasuhiro YOSHIDA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
THERMAL-AIDED INSPECTION BY ADVANCED CHARGE CONTROLLER MODULE IN A...
- Publication number 20230395352
- Publication date Dec 7, 2023
- ASML NETHERLANDS B.V.
- Ning YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR GENERATING AND ANALYZING ROUGHNESS MEASUREMENTS
- Publication number 20230326711
- Publication date Oct 12, 2023
- FRACTILIA, LLC
- Chris MACK
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METAL PATTERN INSPECTION METHOD AND FOCUSED ION BEAM APPARATUS
- Publication number 20230326714
- Publication date Oct 12, 2023
- V Technology Co., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCREENING EDGE PLACEMENT UNIFORMITY WAFER STOCHASTICS
- Publication number 20230326710
- Publication date Oct 12, 2023
- KLA Corporation
- Stefan Eyring
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing System and Charged Particle Beam Apparatus
- Publication number 20230314128
- Publication date Oct 5, 2023
- HITACHI HIGH-TECH CORPORATION
- Masaya GOTO
- H01 - BASIC ELECTRIC ELEMENTS

Pattern inspection

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam device

Detection of probabilistic process windows

Multi-source charged particle illumination apparatus

Thermal-aided inspection by advanced charge controller module in a...

Apparatus of plural charged-particle beams

Image contrast enhancement in sample inspection

Cross-talk cancellation in multiple charged-particle beam inspection

Inspection method, inspection system, and semiconductor fabrication...

System and method for generating and analyzing roughness measuremen...

Measurement and correction of optical aberrations in charged partic...

Charged particle assessment tool, inspection method

Method of measuring variation, inspection system, computer program,...

Multiple electron-beam image acquisition apparatus and multiple ele...

Replaceable module for a charged particle apparatus

Systems and methods for image enhancement for a multi-beam charged-...

Apparatus using charged particle beams

Charged particle beam device for inspection of a specimen with a pl...

Pulsed charged-particle beam system

Systems and methods for charged particle flooding to enhance voltag...

Analysis method and analysis system of voltage contrast defect

Scanning electron microscope device and electron beam inspection ap...

Method and apparatus for inspection

Charged particle beam device

Apparatus of plural charged-particle beams

Charged particle beam apparatus, and systems and methods for operat...

Charged particle beam device

Charged particle assessment tool, inspection method

Electron beam observation device, electron beam observation system,...

Charged particle beam apparatus and method for controlling charged...

Thermal-aided inspection by advanced charge controller module in a...

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...

IMPROVED NAVIGATION FOR ELECTRON MICROSCOPY

METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...

SYSTEM AND METHOD FOR GENERATING AND ANALYZING ROUGHNESS MEASUREMEN...

SEMICONDUCTOR STRUCTURE, INSPECTION METHOD AND INSPECTION SYSTEM

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...

Method of Dispositioning and Control of a Semiconductor Manufacturi...

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

Charged Particle Gun and Charged Particle Beam Apparatus

COMPUTER SYSTEM, DIMENSION MEASUREMENT METHOD, AND STORAGE MEDIUM

APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING...

METHOD AND APPARATUS FOR INSPECTION

Sample Inspection Apparatus, Inspection System, Thin Piece Sample F...

MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSC...

DATA PROCESSING DEVICE AND METHOD, CHARGED PARTICLE ASSESSMENT SYST...

SCANNING ELECTRON MICROSCOPE (SEM) MEASUREMENT METHOD AND APPARATUS

ASSESSMENT SYSTEM, METHOD OF ASSESSING

Charged Particle Beam Device

INSPECTION DEVICE AND INSPECTION METHOD

ELECTRON-OPTICAL DEVICE

ELECTRON-OPTICAL SYSTEM AND METHOD OF OPERATING AN ELECTRON-OPTICAL...

CHARGED PARTICLE BEAM DEVICE FOR INSPECTION OF A SPECIMEN WITH A PL...

APPARATUS USING CHARGED PARTICLE BEAMS

SYSTEM AND METHOD FOR DETECTING DEFECTS ON A WAFER AND RELATED NON-...

DEFECT INSPECTION APPARATUS

THERMAL-AIDED INSPECTION BY ADVANCED CHARGE CONTROLLER MODULE IN A...

SYSTEM AND METHOD FOR GENERATING AND ANALYZING ROUGHNESS MEASUREMENTS

METAL PATTERN INSPECTION METHOD AND FOCUSED ION BEAM APPARATUS

SCREENING EDGE PLACEMENT UNIFORMITY WAFER STOCHASTICS

Processing System and Charged Particle Beam Apparatus