Photosensitive materials

Industry

CPC
G03F7/004

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/004Photosensitive materials

Industries

Patents Grantslast 30 patents

Information Patent Grant
Stabilized interfaces of inorganic radiation patterning composition...
- Patent number 12,360,454
- Issue date Jul 15, 2025
- Inpria Corporation
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,360,456
- Issue date Jul 15, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., TLD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive conductive paste, laminated electronic component, an...
- Patent number 12,362,078
- Issue date Jul 15, 2025
- TDK Corporation
- Yuya Ishima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,360,452
- Issue date Jul 15, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resin, resist composition and method for producing resist pattern,...
- Patent number 12,360,450
- Issue date Jul 15, 2025
- Sumitomo Chemical Company, Limited
- Yuji Kita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Quantum dot light-emitting structure and manufacturing method there...
- Patent number 12,344,787
- Issue date Jul 1, 2025
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Wenhai Mei
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Fluorine-containing resin composition and preparation method thereo...
- Patent number 12,346,025
- Issue date Jul 1, 2025
- XI'AN MANARECO NEW MATERIALS CO., LTD.
- Yang Zhang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method and composition
- Patent number 12,332,563
- Issue date Jun 17, 2025
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Metal oxide resists for EUV patterning and methods for developing t...
- Patent number 12,332,568
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Films with narrow band emission phosphor materials
- Patent number 12,331,208
- Issue date Jun 17, 2025
- EDISON INNOVATIONS, LLC
- Mark D. Doherty
- G02 - OPTICS
Information Patent Grant
Methods of synthesizing a polynucleotide array using photoactivated...
- Patent number 12,319,712
- Issue date Jun 3, 2025
- Vibrant Holdings, LLC
- John J. Rajasekaran
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Curable resin composition, cured film formed therefrom, and electro...
- Patent number 12,321,096
- Issue date Jun 3, 2025
- Samsung SDI Co., Ltd.
- Seungeun Lee
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographically patterned electrically conductive hydrogels, photo...
- Patent number 12,313,969
- Issue date May 27, 2025
- The Board of Trustees of the Leland Stanford Junior University
- Jia Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable relief precursor having adjustable surface prope...
- Patent number 12,313,970
- Issue date May 27, 2025
- XSYS Germany GmbH
- Matthias Beyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 12,313,974
- Issue date May 27, 2025
- Samsung SDI Co., Ltd.
- Jaeyeol Baek
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,306,534
- Issue date May 20, 2025
- Samsung SDI Co., Ltd.
- Seung Han
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoacid generator for chemically amplified photoresists for deep...
- Patent number 12,306,535
- Issue date May 20, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,300,487
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Yu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resin composition and flow cells incorporating the same
- Patent number 12,287,574
- Issue date Apr 29, 2025
- Illumina, Inc.
- Yekaterina Rokhlenko
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photosensitive resin composition
- Patent number 12,282,253
- Issue date Apr 22, 2025
- JSR Corporation
- Kimiyuki Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,283,484
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Nancy Fung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,282,254
- Issue date Apr 22, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid chemical, method for producing liquid chemical, and method f...
- Patent number 12,282,259
- Issue date Apr 22, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, cured film, inductor and antenna
- Patent number 12,278,032
- Issue date Apr 15, 2025
- FUJIFILM Corporation
- Tatsuo Ishikawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,278,125
- Issue date Apr 15, 2025
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluoropolymer adhesives and methods thereof
- Patent number 12,275,820
- Issue date Apr 15, 2025
- The Boeing Company
- Ashley M. Dustin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,275,693
- Issue date Apr 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,276,910
- Issue date Apr 15, 2025
- DuPont Electronic Materials International, LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ORGANOTIN COMPOUND PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PAT...
- Publication number 20250237946
- Publication date Jul 24, 2025
- Feng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20250237948
- Publication date Jul 24, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID CHEMICAL, METHOD FOR PRODUCING LIQUID CHEMICAL, AND METHOD F...
- Publication number 20250237957
- Publication date Jul 24, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...
- Publication number 20250237949
- Publication date Jul 24, 2025
- Merck Patent GmbH
- Tetsumasa Takaichi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20250237951
- Publication date Jul 24, 2025
- FUJIFILM CORPORATION
- Kotaro Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME
- Publication number 20250237945
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Kyuhyun IM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
- Publication number 20250237952
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD...
- Publication number 20250230283
- Publication date Jul 17, 2025
- FUJIFILM CORPORATION
- Atsuyasu NOZAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250231480
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...
- Publication number 20250231492
- Publication date Jul 17, 2025
- SUNTIFIC MATERIALS (WEIFANG), LTD.
- Sam SUN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR D...
- Publication number 20250231479
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Chawon Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250231483
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250231487
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING POLYMER SOLUTION
- Publication number 20250230287
- Publication date Jul 17, 2025
- MARUZEN PETROCHEMICAL CO., LTD.
- Masataka NOJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...
- Publication number 20250230355
- Publication date Jul 17, 2025
- Samsung SDI Co., Ltd.
- Taeho KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SELECTIVE DEPOSITION ON METAL-CONTAINING MASK USING PROMOTER
- Publication number 20250224677
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Katie Lutker-Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...
- Publication number 20250224682
- Publication date Jul 10, 2025
- Samsung SDI Co., Ltd.
- Jin-Hee BAE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226222
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS AND PHOTORESIST FILM
- Publication number 20250224669
- Publication date Jul 10, 2025
- Samsung SDI Co., Ltd.
- Changsoo WOO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20250224671
- Publication date Jul 10, 2025
- FUJIFILM CORPORATION
- Takahiro Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...
- Publication number 20250224680
- Publication date Jul 10, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND COMPOUND
- Publication number 20250224670
- Publication date Jul 10, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi TAKAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...
- Publication number 20250226221
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- NANCY FUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226223
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMATION METHOD
- Publication number 20250224679
- Publication date Jul 10, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN FILM, PRINTED WIRING BOARD, SEMICONDUCTOR PACK...
- Publication number 20250226236
- Publication date Jul 10, 2025
- Resonac Corporation
- Yuko KONNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250216779
- Publication date Jul 3, 2025
- Samsung SDI Co., Ltd.
- Sanghee JANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED PRO...
- Publication number 20250216781
- Publication date Jul 3, 2025
- TAIYO HOLDINGS CO., LTD.
- Daiki YUKIMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION
- Publication number 20250216784
- Publication date Jul 3, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250216776
- Publication date Jul 3, 2025
- Samsung SDI Co., Ltd.
- Jung Min CHOI
- H01 - BASIC ELECTRIC ELEMENTS

Photosensitive materials

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Stabilized interfaces of inorganic radiation patterning composition...

EUV metallic resist performance enhancement via additives

Photosensitive conductive paste, laminated electronic component, an...

Resist underlayer film-forming composition

Resin, resist composition and method for producing resist pattern,...

Quantum dot light-emitting structure and manufacturing method there...

Fluorine-containing resin composition and preparation method thereo...

Pattern-forming method and composition

Metal oxide resists for EUV patterning and methods for developing t...

Films with narrow band emission phosphor materials

Methods of synthesizing a polynucleotide array using photoactivated...

Curable resin composition, cured film formed therefrom, and electro...

Lithographically patterned electrically conductive hydrogels, photo...

Photopolymerizable relief precursor having adjustable surface prope...

Resist underlayer composition, and method of forming patterns using...

Semiconductor photoresist composition and method of forming pattern...

Treatment liquid and pattern forming method

Photoacid generator for chemically amplified photoresists for deep...

Photoresist composition and method of forming photoresist pattern

Resin composition and flow cells incorporating the same

Photosensitive resin composition

Selective deposition of carbon on photoresist layer for lithography...

Photoresist compositions and pattern formation methods

Liquid chemical, method for producing liquid chemical, and method f...

Photosensitive resin composition, cured film, inductor and antenna

Integrated dry processes for patterning radiation photoresist patte...

Fluoropolymer adhesives and methods thereof

Organotin oxide hydroxide patterning compositions, precursors, and...

Onium salt, chemically amplified resist composition and patterning...

Photoresist compositions and pattern formation methods

Patents Applicationslast 30 patents

ORGANOTIN COMPOUND PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PAT...

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

LIQUID CHEMICAL, METHOD FOR PRODUCING LIQUID CHEMICAL, AND METHOD F...

RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...

RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR D...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

METHOD FOR PRODUCING POLYMER SOLUTION

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...

SELECTIVE DEPOSITION ON METAL-CONTAINING MASK USING PROMOTER

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

METHOD OF FORMING PATTERNS AND PHOTORESIST FILM

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND COMPOUND

SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

RESIST PATTERN FORMATION METHOD

PHOTOSENSITIVE RESIN FILM, PRINTED WIRING BOARD, SEMICONDUCTOR PACK...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED PRO...

IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...