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Photography
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PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
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Photomechanical
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Photosensitive materials
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Patents Grants
last 30 patents
Information
Patent Grant
Photoacid generator, photoresist composition including the same, an...
Patent number
11,982,940
Issue date
May 14, 2024
Samsung Electronics Co., Ltd.
Eunkyung Lee
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
EUV patterning methods, structures, and materials
Patent number
11,984,317
Issue date
May 14, 2024
Intel Corporation
Marie Krysak
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composition, film, dry film, pattern forming method, near-infrared...
Patent number
11,982,939
Issue date
May 14, 2024
FUJIFILM Corporation
Masahiro Mori
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Method of forming patterns using resist underlayer composition
Patent number
11,982,943
Issue date
May 14, 2024
Samsung SDI Co., Ltd.
Jaeyeol Baek
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive compositions, preparation methods thereof, and quant...
Patent number
11,977,329
Issue date
May 7, 2024
Samsung Electronics Co., Ltd.
Shang Hyeun Park
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Composition containing a dicyanostyryl group, for forming a resist...
Patent number
11,977,331
Issue date
May 7, 2024
NISSAN CHEMICAL CORPORATION
Takafumi Endo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chemical liquid storage body
Patent number
11,976,001
Issue date
May 7, 2024
FUJIFILM Corporation
Tetsuya Kamimura
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Cross-linked polymer for resist
Patent number
11,971,660
Issue date
Apr 30, 2024
Maruzen Petrochemical Co., LTD
Tomohiro Masukawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photoresist developer and method of developing photoresist
Patent number
11,971,657
Issue date
Apr 30, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
An-Ren Zi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
Patent number
11,966,162
Issue date
Apr 23, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Tzu-Yang Lin
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Semiconductor device production method employing silicon-containing...
Patent number
11,966,164
Issue date
Apr 23, 2024
NISSAN CHEMICAL CORPORATION
Wataru Shibayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with low...
Patent number
11,966,158
Issue date
Apr 23, 2024
Inpria Corporation
Benjamin L. Clark
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition and method for forming pattern
Patent number
11,966,160
Issue date
Apr 23, 2024
JSR Corporation
Ryuichi Nemoto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Organometallic solution based high resolution patterning compositions
Patent number
11,966,159
Issue date
Apr 23, 2024
Inpria Corporation
Stephen T. Meyers
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
Patent number
11,966,161
Issue date
Apr 23, 2024
JSR Corporation
Takuhiro Taniguchi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Solvent compatible nozzle plate
Patent number
11,958,292
Issue date
Apr 16, 2024
Funai Electric Co., Ltd.
Sean T. Weaver
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information
Patent Grant
Photoresist composition, coated substrate including the photoresist...
Patent number
11,960,206
Issue date
Apr 16, 2024
Rohm and Hass Electronic Materials LLC
Emad Aqad
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Molecular resist composition and patterning process
Patent number
11,953,827
Issue date
Apr 9, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,953,829
Issue date
Apr 9, 2024
FUJIFILM Corporation
Kazunari Yagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Two-stage bake photoresist with releasable quencher
Patent number
11,955,343
Issue date
Apr 9, 2024
Intel Corporation
Robert L. Bristol
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of making a picoscopic scale/ nanoscopic scale circuit pattern
Patent number
11,953,828
Issue date
Apr 9, 2024
LONGSERVING TECHNOLOGY CO., LTD
Ko-Cheng Fang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition and pattern forming process
Patent number
11,953,832
Issue date
Apr 9, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Salt, acid generator, resist composition and method for producing r...
Patent number
11,947,257
Issue date
Apr 2, 2024
Sumitomo Chemical Company, Limited
Tatsuro Masuyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoacid-generating monomer, polymer derived therefrom, photoresis...
Patent number
11,947,258
Issue date
Apr 2, 2024
Rohm and Hass Electronic Materials LLC
Emad Aqad
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process environment for inorganic resist patterning
Patent number
11,947,262
Issue date
Apr 2, 2024
Inpria Corporation
Alan J. Telecky
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Sample support
Patent number
11,947,260
Issue date
Apr 2, 2024
Hamamatsu Photonics K.K.
Akira Tashiro
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Molecular resist composition and patterning process
Patent number
11,940,728
Issue date
Mar 26, 2024
Shin-Etsu Chemical Co., Ltd.
Masaki Ohashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist compositions and pattern formation methods
Patent number
11,940,730
Issue date
Mar 26, 2024
Rohm and Haas Electronic Materials LLC
Mitsuru Haga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive composition, negative photosensitive composition, pi...
Patent number
11,940,729
Issue date
Mar 26, 2024
Toray Industries, Inc.
Akihiro Ishikawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Monomers, polymers and lithographic compositions comprising same
Patent number
11,932,713
Issue date
Mar 19, 2024
Rohm and Haas Electronic Materials LLC
Emad Aqad
C07 - ORGANIC CHEMISTRY
Patents Applications
last 30 patents
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20240152049
Publication date
May 9, 2024
FUJIFILM CORPORATION
Masafumi KOJIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
Publication number
20240152050
Publication date
May 9, 2024
JSR Corporation
Ken MARUYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ASYMMETRIC UV EXPOSURE METHOD
Publication number
20240152054
Publication date
May 9, 2024
FlexTouch Technologies Co., Ltd.
Jun WANG
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
Publication number
20240152048
Publication date
May 9, 2024
JSR Corporation
Ken MARUYAMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
Publication number
20240142872
Publication date
May 2, 2024
Sumitomo Chemical Company, Limited
Shohei TERAHIGASHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
Publication number
20240145272
Publication date
May 2, 2024
LAM RESEARCH CORPORATION
Jengyi Yu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
NON-CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD OF MANUFACTU...
Publication number
20240142874
Publication date
May 2, 2024
Samsung Electronics Co., Ltd.
Chawon KOH
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...
Publication number
20240134274
Publication date
Apr 25, 2024
LAM RESEARCH CORPORATION
Timothy William Weidman
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Polymer, Chemically Amplified Positive Resist Composition, Resist P...
Publication number
20240134280
Publication date
Apr 25, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ORGANOMETALLIC TIN CLUSTERS AS EUV PHOTORESIST
Publication number
20240134275
Publication date
Apr 25, 2024
Feng Lu
C07 - ORGANIC CHEMISTRY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, FLUORINE-CONTAININ...
Publication number
20240134276
Publication date
Apr 25, 2024
Central Glass Company, Limited
Yuzuru KANEKO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
Publication number
20240134273
Publication date
Apr 25, 2024
Samsung SDI Co., Ltd.
Kyungsoo MOON
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20240126167
Publication date
Apr 18, 2024
JSR Corporation
Ken MARUYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...
Publication number
20240126168
Publication date
Apr 18, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
HOLLOW STRUCTURE, ELECTRONIC COMPONENT USING SAME, AND NEGATIVE PHO...
Publication number
20240126171
Publication date
Apr 18, 2024
TORAY INDUSTRIES, INC.
Yutaro KOYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIN COMPOSITION FOR SOLDER RESIST, SOLDER RESIST FILM, AND CIRCUI...
Publication number
20240118609
Publication date
Apr 11, 2024
SEKISUI KASEI CO., LTD.
Koichiro OKAMOTO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
Publication number
20240116958
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Naoki KOBAYASHI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING RESIST P...
Publication number
20240118612
Publication date
Apr 11, 2024
JSR Corporation
Keiichi SATOU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
Publication number
20240118614
Publication date
Apr 11, 2024
INPRIA CORPORATION
Peter de Schepper
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Publication number
20240118619
Publication date
Apr 11, 2024
Tokyo Ohka Kogyo Co., Ltd.
Keiichi Ibata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240118610
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240118615
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE USING...
Publication number
20240118616
Publication date
Apr 11, 2024
DONGJIN SEMICHEM CO., LTD.
Kyoungsoon SHIN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTORESIST AND FORMATION METHOD THEREOF
Publication number
20240111210
Publication date
Apr 4, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Jui-Hsiung LIU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PHOTORESIST AND FORMATION METHOD THEREOF
Publication number
20240112912
Publication date
Apr 4, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Jui-Hsiung LIU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Composition For Forming Adhesive Film, Patterning Process, And Meth...
Publication number
20240103370
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Seiichiro TACHIBANA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POLYIMIDE PRECURSOR RESIN COMPOSITION AND METHOD FOR MANUFACTURING...
Publication number
20240101761
Publication date
Mar 28, 2024
Asahi Kasei Kabushiki Kaisha
Kohei MURAKAMI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Pattern Forming Method
Publication number
20240103365
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Seiichiro TACHIBANA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patte...
Publication number
20240103367
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUCING HOLLOW...
Publication number
20240103368
Publication date
Mar 28, 2024
Tokyo Ohka Kogyo Co., Ltd.
Kenichi Yamagata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY