Plural materials

Industry

CPC
H01J37/3429

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3429Plural materials

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Nonmagnetic material-dispersed Fe-Pt based sputtering target
- Patent number 12,198,911
- Issue date Jan 14, 2025
- JX Advanced Metals Corporation
- Atsushi Sato
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
PVD target design and semiconductor devices formed using the same
- Patent number 12,180,576
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and method for manufacturing sputtering target
- Patent number 12,106,949
- Issue date Oct 1, 2024
- JX Advanced Metals Corporation
- Yuki Furuya
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Sputtering target, manufacturing method therefor, and manufacturing...
- Patent number 12,091,743
- Issue date Sep 17, 2024
- JX Advanced Metals Corporation
- Yasuyuki Iwabuchi
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Garnet compound, sintered body and sputtering target containing same
- Patent number 11,987,504
- Issue date May 21, 2024
- Idemitsu Kosan Co., Ltd.
- Kazuyoshi Inoue
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method for manufacturing sputtering target, method for forming oxid...
- Patent number 11,967,505
- Issue date Apr 23, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Cr—Si sintered body
- Patent number 11,967,493
- Issue date Apr 23, 2024
- Tosoh Corporation
- Hiroyuki Hara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming nickel silicide materials
- Patent number 11,965,236
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Minrui Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chalcogenide sputtering target and method of making the same
- Patent number 11,946,132
- Issue date Apr 2, 2024
- Honeywell International Inc.
- Michael R. Pinter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and magnetic film
- Patent number 11,894,221
- Issue date Feb 6, 2024
- JX Metals Corporation
- Yasuyuki Iwabuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin film of metal oxide, organic electroluminescent device includi...
- Patent number 11,871,590
- Issue date Jan 9, 2024
- Japan Science and Technology Agency
- Hideo Hosono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target material for deposition of molybdenum oxide layers
- Patent number 11,862,444
- Issue date Jan 2, 2024
- Plansee SE
- Enrico Franzke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target for magnetic recording medium, and magnetic thin...
- Patent number 11,837,450
- Issue date Dec 5, 2023
- JX Metals Corporation
- Takashi Kosho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High efficiency rotatable sputter target
- Patent number 11,830,712
- Issue date Nov 28, 2023
- SCI ENGINEERED MATERIALS, INC.
- Ian Ravary
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus and film formation method
- Patent number 11,823,879
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for producing and using a W—Ni sputtering target
- Patent number 11,746,409
- Issue date Sep 5, 2023
- Plansee SE
- Christian Linke
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Sputtering target and method for manufacturing the same
- Patent number 11,735,403
- Issue date Aug 22, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PVD target design and semiconductor devices formed using the same
- Patent number 11,725,270
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Extreme ultraviolet mask blank defect reduction methods
- Patent number 11,669,008
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Wen Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fabrication of electrochromic devices
- Patent number 11,668,990
- Issue date Jun 6, 2023
- View, Inc.
- Robert T. Rozbicki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition system with a multi-cathode
- Patent number 11,668,003
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Vibhu Jindal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-forming apparatus, film-forming system, and film-forming method
- Patent number 11,664,207
- Issue date May 30, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin film comprising titanium oxide, and method of producing thin f...
- Patent number 11,651,790
- Issue date May 16, 2023
- JX Nippon Mining & Metals Corporation
- Hideo Takami
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Target structure of physical vapor deposition
- Patent number 11,649,543
- Issue date May 16, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ping-Yuan Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing sputtering target, method for forming oxid...
- Patent number 11,637,015
- Issue date Apr 25, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Fabrication of electrochromic devices
- Patent number 11,599,003
- Issue date Mar 7, 2023
- View, Inc.
- Sridhar Karthik Kailasam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrochromic devices
- Patent number 11,592,722
- Issue date Feb 28, 2023
- View, Inc.
- Zhongchun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target
- Patent number 11,569,075
- Issue date Jan 31, 2023
- Plansee SE
- Michael Eidenberger-Schober
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Fabrication of electrochromic devices
- Patent number 11,561,446
- Issue date Jan 24, 2023
- View, Inc.
- Sridhar Karthik Kailasam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Advanced sputter targets for ion generation
- Patent number 11,542,594
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Graham Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
LOW CARBON DEFECT COPPER-MANGANESE SPUTTERING TARGET AND METHOD FOR...
- Publication number 20240384394
- Publication date Nov 21, 2024
- Tosoh SMD, Inc.
- Eduardo del Rio Perez
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW CARBON DEFECT COPPER-MANGANESE SPUTTERING TARGET AND METHOD FOR...
- Publication number 20240384395
- Publication date Nov 21, 2024
- Tosoh SMD, Inc.
- Eduardo del Rio Perez
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALUMINUM ALLOYS AND PROCESSES FOR MAKING ALUMINUM -SCANDIUM SPUTTER...
- Publication number 20240194463
- Publication date Jun 13, 2024
- MATERION CORPORATION
- Vitaliy V. Myasnikov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SOFT MAGNETIC MULTILAYER DESPOSITION APPARATUS, METHODS OF MANUFACT...
- Publication number 20240186064
- Publication date Jun 6, 2024
- Evatec AG
- Claudiu Valentin FALUB
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME
- Publication number 20240183029
- Publication date Jun 6, 2024
- SAMSUNG DISPLAY CO., LTD.
- HYUNEOK SHIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Target and Method for Producing Sputtering Target
- Publication number 20240026525
- Publication date Jan 25, 2024
- JX NIPPON MINING & METALS CORPORATION
- Shuhei Murata
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
FILM FORMING APPARATUS AND METHOD OF CONTROLLING FILM FORMING APPAR...
- Publication number 20240021423
- Publication date Jan 18, 2024
- TOKYO ELECTRON LIMITED
- Yasuhiko KOJIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD OF GALLIUM NITRIDE FILM
- Publication number 20230374649
- Publication date Nov 23, 2023
- Japan Display Inc.
- Masanobu IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN SITU AND TUNABLE DEPOSITION OF A FILM
- Publication number 20230374654
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Hsi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PVD TARGET DESIGN AND SEMICONDUCTOR DEVICES FORMED USING THE SAME
- Publication number 20230366079
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FABRICATION OF ELECTROCHROMIC DEVICES
- Publication number 20230324754
- Publication date Oct 12, 2023
- VIEW, INC.
- Robert Tad Rozbicki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FABRICATION OF ELECTROCHROMIC DEVICES
- Publication number 20230314892
- Publication date Oct 5, 2023
- VIEW, INC.
- Robert Tad Rozbicki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Target, Manufacturing Method Therefor, And Manufacturing...
- Publication number 20230272521
- Publication date Aug 31, 2023
- JX Nippon Mining & Metals Corporation
- Yasuyuki Iwabuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...
- Publication number 20230260785
- Publication date Aug 17, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF DEPOSITING A MATERIAL
- Publication number 20230220539
- Publication date Jul 13, 2023
- Dyson Technology Limited
- Michael Edward RENDALL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROCHROMIC DEVICES
- Publication number 20230144179
- Publication date May 11, 2023
- VIEW, INC.
- Zhongchun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NONMAGNETIC MATERIAL-DISPERSED FE-PT BASED SPUTTERING TARGET
- Publication number 20230125486
- Publication date Apr 27, 2023
- JX NIPPON MINING & METALS CORPORATION
- Atsushi Sato
- B22 - CASTING POWDER METALLURGY
Information Patent Application
APPROACHES TO MODIFYING A COLOR OF AN ELECTROCHROMIC STACK IN A TIN...
- Publication number 20230077782
- Publication date Mar 16, 2023
- SAGE Electrochromics, Inc.
- Wen Li
- G02 - OPTICS
Information Patent Application
METHOD OF MANUFACTURING CRYSTALLINE MATERIAL FROM DIFFERENT MATERIALS
- Publication number 20220407043
- Publication date Dec 22, 2022
- Dyson Technology Limited
- Michael Edward RENDALL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPTICAL FILM, SPUTTERING TARGET, AND METHOD OF PRODUCING OPTICAL FILM
- Publication number 20220316049
- Publication date Oct 6, 2022
- Sumitomo Metal Mining Co., Ltd.
- Hideharu OKAMI
- G02 - OPTICS
Information Patent Application
SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM
- Publication number 20220262608
- Publication date Aug 18, 2022
- Tanaka Kikinzoku Kogyo K.K.
- Tomonari Kamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING TARGETS AND DEVICES INCLUDING MO, NB, AND TA, AND METHODS
- Publication number 20220220603
- Publication date Jul 14, 2022
- H.C. Starck Inc.
- Shuwei Sun
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FILM FORMATION APPARATUS AND FILM FORMATION METHOD
- Publication number 20220223390
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH EFFICIENCY ROTATABLE SPUTTER TARGET
- Publication number 20220216041
- Publication date Jul 7, 2022
- SCI ENGINEERED MATERIALS, INC.
- Ian RAVARY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET
- Publication number 20220195583
- Publication date Jun 23, 2022
- MITSUBISHI MATERIALS CORPORATION
- Yujiro Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Target And Method For Manufacturing Sputtering Target
- Publication number 20220189750
- Publication date Jun 16, 2022
- JX Nippon Mining & Metals Corporation
- Yuki Furuya
- B22 - CASTING POWDER METALLURGY
Information Patent Application
TARGET STRUCTURE OF PHYSICAL VAPOR DEPOSITION
- Publication number 20220162744
- Publication date May 26, 2022
- Taiwa Semiconductor Manufacturing Co, Ltd.
- Ping-Yuan CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION SYSTEM WITH A MULTI-CATHODE
- Publication number 20220106679
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PRODUCING THIN FILM AND MULTILAYER BODY
- Publication number 20220033955
- Publication date Feb 3, 2022
- Panasonic Intellectual Property Management Co., Ltd.
- MANABU KANOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...
- Publication number 20220020586
- Publication date Jan 20, 2022
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- B82 - NANO-TECHNOLOGY

Plural materials

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Nonmagnetic material-dispersed Fe-Pt based sputtering target

PVD target design and semiconductor devices formed using the same

Sputtering target and method for manufacturing sputtering target

Sputtering target, manufacturing method therefor, and manufacturing...

Garnet compound, sintered body and sputtering target containing same

Method for manufacturing sputtering target, method for forming oxid...

Cr—Si sintered body

Method of forming nickel silicide materials

Chalcogenide sputtering target and method of making the same

Sputtering target and magnetic film

Thin film of metal oxide, organic electroluminescent device includi...

Target material for deposition of molybdenum oxide layers

Sputtering target for magnetic recording medium, and magnetic thin...

High efficiency rotatable sputter target

Film formation apparatus and film formation method

Process for producing and using a W—Ni sputtering target

Sputtering target and method for manufacturing the same

PVD target design and semiconductor devices formed using the same

Extreme ultraviolet mask blank defect reduction methods

Fabrication of electrochromic devices

Deposition system with a multi-cathode

Film-forming apparatus, film-forming system, and film-forming method

Thin film comprising titanium oxide, and method of producing thin f...

Target structure of physical vapor deposition

Method for manufacturing sputtering target, method for forming oxid...

Fabrication of electrochromic devices

Electrochromic devices

Sputtering target

Fabrication of electrochromic devices

Advanced sputter targets for ion generation

Patents Applicationslast 30 patents

LOW CARBON DEFECT COPPER-MANGANESE SPUTTERING TARGET AND METHOD FOR...

LOW CARBON DEFECT COPPER-MANGANESE SPUTTERING TARGET AND METHOD FOR...

ALUMINUM ALLOYS AND PROCESSES FOR MAKING ALUMINUM -SCANDIUM SPUTTER...

SOFT MAGNETIC MULTILAYER DESPOSITION APPARATUS, METHODS OF MANUFACT...

DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME

Sputtering Target and Method for Producing Sputtering Target

FILM FORMING APPARATUS AND METHOD OF CONTROLLING FILM FORMING APPAR...

MANUFACTURING METHOD OF GALLIUM NITRIDE FILM

IN SITU AND TUNABLE DEPOSITION OF A FILM

PVD TARGET DESIGN AND SEMICONDUCTOR DEVICES FORMED USING THE SAME

FABRICATION OF ELECTROCHROMIC DEVICES

FABRICATION OF ELECTROCHROMIC DEVICES

Sputtering Target, Manufacturing Method Therefor, And Manufacturing...

METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...

METHOD OF DEPOSITING A MATERIAL

ELECTROCHROMIC DEVICES

NONMAGNETIC MATERIAL-DISPERSED FE-PT BASED SPUTTERING TARGET

APPROACHES TO MODIFYING A COLOR OF AN ELECTROCHROMIC STACK IN A TIN...

METHOD OF MANUFACTURING CRYSTALLINE MATERIAL FROM DIFFERENT MATERIALS

OPTICAL FILM, SPUTTERING TARGET, AND METHOD OF PRODUCING OPTICAL FILM

SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM

SPUTTERING TARGETS AND DEVICES INCLUDING MO, NB, AND TA, AND METHODS

FILM FORMATION APPARATUS AND FILM FORMATION METHOD

HIGH EFFICIENCY ROTATABLE SPUTTER TARGET

SPUTTERING TARGET

Sputtering Target And Method For Manufacturing Sputtering Target

TARGET STRUCTURE OF PHYSICAL VAPOR DEPOSITION

DEPOSITION SYSTEM WITH A MULTI-CATHODE

METHOD FOR PRODUCING THIN FILM AND MULTILAYER BODY

METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...