Polyurethanes; Epoxy resins

Industry

CPC
G03F7/0217

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0217Polyurethanes; Epoxy resins

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Compound, composition, and method for producing same, underlayer fi...
- Patent number 11,067,889
- Issue date Jul 20, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Black photosensitive resin composition and black column spacer prep...
- Patent number 10,884,335
- Issue date Jan 5, 2021
- Rohm and Haas Electronic Materials Korea Ltd.
- Hyung Gu Jeong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive compositions having mixtures of alkoxy and non-alkox...
- Patent number 6,861,196
- Issue date Mar 1, 2005
- Kodak Polychrome Graphics LLC
- Stephan J. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition comprising a phenol resin having a urea...
- Patent number 6,824,947
- Issue date Nov 30, 2004
- Kodak Polychrome Graphics, LLC
- Yasuhiro Ishizuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive compositions having mixtures of alkoxy and non-alkox...
- Patent number 6,638,679
- Issue date Oct 28, 2003
- Kodak Polychrome Graphics, LLC
- Stephan J. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive diazo resin composition with polyurethane resin havi...
- Patent number 4,983,491
- Issue date Jan 8, 1991
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Light-sensitive composition
- Patent number 4,950,582
- Issue date Aug 21, 1990
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Light-sensitive diazo photopolymerizable composition with polyureth...
- Patent number 4,877,711
- Issue date Oct 31, 1989
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Reaction product of O-epoxyalkylated tetrakis(hydroxyphenyl)ethane...
- Patent number 4,785,062
- Issue date Nov 15, 1988
- W. R. Grace & Co.-Conn.
- Alan R. Browne
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Image-forming materials sensitive to high-energy beam
- Patent number 4,756,989
- Issue date Jul 12, 1988
- Asahi Kasei Kogyo Kabushiki Kaisha
- Hideo Ai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of forming lithographic print plate utilizing water developm...
- Patent number 4,612,276
- Issue date Sep 16, 1986
- W. R. Grace & Co.
- Alan R. Browne
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for making a negative working lithographic printing plate
- Patent number 4,483,758
- Issue date Nov 20, 1984
- Polychrome Corporation
- William Rowe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making a negative working lithographic printing plate
- Patent number 4,447,512
- Issue date May 8, 1984
- Polychrome Corporation
- William Rowe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive diazo composition and material with branched polyur...
- Patent number 4,337,307
- Issue date Jun 29, 1982
- Hoechst Aktiengesellschaft
- Rudolf Neubauer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Oleophilic, film-forming photopolymerizable diazo and epoxy resin c...
- Patent number 4,315,065
- Issue date Feb 9, 1982
- Rhone-Poulenc Systemes
- Marcel Pigeon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Water-developable film-forming diazonium compound containing photop...
- Patent number 4,299,905
- Issue date Nov 10, 1981
- Rhone-Poulenc Systems
- Marcel Pigeon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive article for making visual aids with diazonium compou...
- Patent number 4,299,893
- Issue date Nov 10, 1981
- Rhone-Poulenc Systemes
- Marcel Pigeon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-acting photoresist composition
- Patent number 4,247,616
- Issue date Jan 27, 1981
- Minnesota Mining and Manufacturing Company
- John P. Vikesland
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition comprising copolymer of glycidyl me...
- Patent number 4,210,449
- Issue date Jul 1, 1980
- American Can Company
- Sheldon I. Schlesinger
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Light-sensitive copying composition
- Patent number 4,186,017
- Issue date Jan 29, 1980
- Hoechst Aktiengesellschaft
- Roland Palmer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions with organohalogen compound and diazonium salts as pho...
- Patent number 4,113,497
- Issue date Sep 12, 1978
- American Can Company
- Sheldon I. Schlesinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Powdered tonor image containing article
- Patent number 4,100,321
- Issue date Jul 11, 1978
- American Can Company
- Sheldon Irwin Schlesinger
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dry photopolymer imaging process
- Patent number 4,091,194
- Issue date May 23, 1978
- American Can Company
- Sheldon Irwin Schlesinger
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dry photopolymer imaging article having a diazonium salt and epoxid...
- Patent number 4,076,536
- Issue date Feb 28, 1978
- American Can Company
- Sheldon Irwin Schlesinger
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer of glycidyl methacrylate and allyl glycidyl ether
- Patent number 4,071,671
- Issue date Jan 31, 1978
- American Can Company
- Sheldon I. Schlesinger
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of recording information using a copolymer of glycidyl metha...
- Patent number 4,056,393
- Issue date Nov 1, 1977
- American Can Company
- Sheldon I. Schlesinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of imaging a layer containing copolymer of glycidyl methacry...
- Patent number 4,054,452
- Issue date Oct 18, 1977
- American Can Company
- Sheldon I. Schlesinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of polymerizing a copolymer of glycidyl methacrylate and all...
- Patent number 4,054,451
- Issue date Oct 18, 1977
- American Can Company
- Sheldon I. Schlesinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymer of glycidyl methacrylate and allyl glycidyl ether
- Patent number 4,054,635
- Issue date Oct 18, 1977
- American Can Company
- Sheldon I. Schlesinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Article having a layer containing a copolymer of glycidyl methacryl...
- Patent number 4,054,455
- Issue date Oct 18, 1977
- American Can Company
- Sheldon I. Schlesinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
WELDING METHOD FOR CREATING AN UPSCALED MASTER
- Publication number 20230280649
- Publication date Sep 7, 2023
- Morphotonics Holding B.V.
- Leon Willem VELDHUIZEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD...
- Publication number 20230236505
- Publication date Jul 27, 2023
- SAN-APRO LTD.
- Takuto NAKAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230236502
- Publication date Jul 27, 2023
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME
- Publication number 20220404699
- Publication date Dec 22, 2022
- Illumina, Inc.
- Yekaterina Rokhlenko
- B82 - NANO-TECHNOLOGY
Information Patent Application
BLACK PHOTOSENSITIVE RESIN COMPOSITION AND BLACK COLUMN SPACER PREP...
- Publication number 20190018318
- Publication date Jan 17, 2019
- Rohm and Haas Electronic Materials Korea Ltd.
- Hyung Gu Jeong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, COMPOSITION, AND METHOD FOR PRODUCING SAME, UNDERLAYER FI...
- Publication number 20180246407
- Publication date Aug 30, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi ECHIGO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Optical information recording medium, optical information recording...
- Publication number 20070047420
- Publication date Mar 1, 2007
- Fuji Photo Film Co., Ltd.
- Naoto Yanagihara
- G11 - INFORMATION STORAGE
Information Patent Application
Increased sensitivity, UV imageable photographic elements
- Publication number 20050277051
- Publication date Dec 15, 2005
- Anocoil Corporation
- Stephan J.W. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Increased sensitivity, IR, and UV imageable photographic elements
- Publication number 20050277053
- Publication date Dec 15, 2005
- Anocoil Corporation
- Stephan J.W. Platzer
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Photosensitive compositions having mixtures of alkoxy and non-alkox...
- Publication number 20040063022
- Publication date Apr 1, 2004
- KODAK POLYCHROME GRAPHICS, L.L.C.
- Stephan J. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive composition comprising a phenol resin having a urea...
- Publication number 20030224281
- Publication date Dec 4, 2003
- Yasuhiro Ishizuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive compositions having mixtures of alkoxy and non-alkox...
- Publication number 20030013035
- Publication date Jan 16, 2003
- Kodak Polychrome Graphics, L.L.C
- Stephan J. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Polyurethanes; Epoxy resins

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Compound, composition, and method for producing same, underlayer fi...

Black photosensitive resin composition and black column spacer prep...

Photosensitive compositions having mixtures of alkoxy and non-alkox...

Photosensitive composition comprising a phenol resin having a urea...

Photosensitive compositions having mixtures of alkoxy and non-alkox...

Photosensitive diazo resin composition with polyurethane resin havi...

Light-sensitive composition

Light-sensitive diazo photopolymerizable composition with polyureth...

Reaction product of O-epoxyalkylated tetrakis(hydroxyphenyl)ethane...

Image-forming materials sensitive to high-energy beam

Method of forming lithographic print plate utilizing water developm...

Method for making a negative working lithographic printing plate

Method for making a negative working lithographic printing plate

Light-sensitive diazo composition and material with branched polyur...

Oleophilic, film-forming photopolymerizable diazo and epoxy resin c...

Water-developable film-forming diazonium compound containing photop...

Photosensitive article for making visual aids with diazonium compou...

Positive-acting photoresist composition

Radiation sensitive composition comprising copolymer of glycidyl me...

Light-sensitive copying composition

Compositions with organohalogen compound and diazonium salts as pho...

Powdered tonor image containing article

Dry photopolymer imaging process

Dry photopolymer imaging article having a diazonium salt and epoxid...

Copolymer of glycidyl methacrylate and allyl glycidyl ether

Method of recording information using a copolymer of glycidyl metha...

Method of imaging a layer containing copolymer of glycidyl methacry...

Method of polymerizing a copolymer of glycidyl methacrylate and all...

Copolymer of glycidyl methacrylate and allyl glycidyl ether

Article having a layer containing a copolymer of glycidyl methacryl...

Patents Applicationslast 30 patents

WELDING METHOD FOR CREATING AN UPSCALED MASTER

NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME

BLACK PHOTOSENSITIVE RESIN COMPOSITION AND BLACK COLUMN SPACER PREP...

COMPOUND, COMPOSITION, AND METHOD FOR PRODUCING SAME, UNDERLAYER FI...

Optical information recording medium, optical information recording...

Increased sensitivity, UV imageable photographic elements

Increased sensitivity, IR, and UV imageable photographic elements

Photosensitive compositions having mixtures of alkoxy and non-alkox...

Photosensitive composition comprising a phenol resin having a urea...

Photosensitive compositions having mixtures of alkoxy and non-alkox...