Problems associated with lithography

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H01J2237/31793

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31793Problems associated with lithography

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Aberration correction in charged particle system
- Patent number 11,348,756
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 11,037,759
- Issue date Jun 15, 2021
- NuFlare Technology, Inc.
- Ryoichi Kakehi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure device
- Patent number 10,824,077
- Issue date Nov 3, 2020
- Advantest Corporation
- Youichi Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle beam apparatus and method for operating a particle beam ap...
- Patent number 10,814,361
- Issue date Oct 27, 2020
- VISTEC ELECTRON BEAM GMBH
- Christian Borschel
- B08 - CLEANING
Information Patent Grant
Charged particle beam writing method and charged particle beam writ...
- Patent number 10,755,893
- Issue date Aug 25, 2020
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature measuring mask and temperature measuring method
- Patent number 10,670,472
- Issue date Jun 2, 2020
- NuFlare Technology, Inc.
- Kota Fujiwara
- G01 - MEASURING TESTING
Information Patent Grant
Cabinet for electronic equipment
- Patent number 10,631,441
- Issue date Apr 21, 2020
- ASML Netherlands B.V.
- David Johannes Van Den Bergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,622,186
- Issue date Apr 14, 2020
- NuFlare Technology, Inc.
- Takuya Uemura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and method for calculating...
- Patent number 10,381,196
- Issue date Aug 13, 2019
- NuFlare Technology, Inc.
- Hironobu Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam drawing apparatus and charged particle beam d...
- Patent number 10,153,130
- Issue date Dec 11, 2018
- NuFlare Technology, Inc.
- Sumito Nakada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,120,284
- Issue date Nov 6, 2018
- Nuflare Technology, Inc.
- Hiroshi Matsumoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask manufacturing method, mask substrate, and charged beam drawing...
- Patent number 9,581,893
- Issue date Feb 28, 2017
- NuFlare Technology, Inc.
- Hirohito Anze
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for correcting drift of charged particle beam, and charged p...
- Patent number 9,536,705
- Issue date Jan 3, 2017
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus utilizing multiple st...
- Patent number 9,299,533
- Issue date Mar 29, 2016
- Nuflare Technology, Inc.
- Hiroshi Matsumoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography apparatus, lithography method, and method of manufactur...
- Patent number 9,257,262
- Issue date Feb 9, 2016
- Canon Kabushiki Kaisha
- Koichi Sentoku
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device for spot size measurement at wafer level using a knife edge...
- Patent number 9,240,306
- Issue date Jan 19, 2016
- Mapper Lithography IP B.V.
- Jan Andries Meijer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam drift detection device and method for detecting elect...
- Patent number 9,165,746
- Issue date Oct 20, 2015
- NATIONAL TAIWAN UNIVERSITY
- Jia-Yush Yen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 9,070,607
- Issue date Jun 30, 2015
- Advantest Corp.
- Masahiro Ishida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Data path for lithography apparatus
- Patent number 8,884,255
- Issue date Nov 11, 2014
- Mapper Lithography IP B.V.
- Henk Derks
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System for magnetic shielding
- Patent number 8,884,253
- Issue date Nov 11, 2014
- Mapper Lithography IP B.V.
- Alon Rosenthal
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 8,859,997
- Issue date Oct 14, 2014
- Nuflare Technology, Inc.
- Takashi Kamikubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
8829475
- Patent number 8,829,475
- Issue date Sep 9, 2014
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing apparatus, and article manufacturing method
- Patent number 8,766,216
- Issue date Jul 1, 2014
- Canon Kabushiki Kaisha
- Takayuki Kawamoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron microscope assembly for viewing the wafer plane image of a...
- Patent number 8,642,981
- Issue date Feb 4, 2014
- KLA-Tencor Corporation
- Paul Petric
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern writing system and method and abnormality diagnosing method
- Patent number 8,427,919
- Issue date Apr 23, 2013
- Nuflare Technology, Inc.
- Yoshikuni Goshima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam drift correction method and electron beam writing method
- Patent number 8,362,450
- Issue date Jan 29, 2013
- Nuflare Technology, Inc.
- Osamu Iizuka
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor manufacture method
- Patent number 8,143,075
- Issue date Mar 27, 2012
- Fujitsu Semiconductor Limited
- Takashi Maruyama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam apparatus with aberration corrector
- Patent number 7,825,377
- Issue date Nov 2, 2010
- Hitachi High-Technologies Corporation
- Takeshi Kawasaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure apparatus and method for cleaning the same
- Patent number 7,737,421
- Issue date Jun 15, 2010
- Advantest Corp.
- Hiroshi Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle exposure apparatus
- Patent number 7,737,422
- Issue date Jun 15, 2010
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM
- Publication number 20220285124
- Publication date Sep 8, 2022
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE DEVICE
- Publication number 20200064743
- Publication date Feb 27, 2020
- Advantest Corporation
- Youichi SHIMIZU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20190333734
- Publication date Oct 31, 2019
- NuFlare Technology, Inc.
- Hideki MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20190237297
- Publication date Aug 1, 2019
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20190189389
- Publication date Jun 20, 2019
- NuFlare Technology, Inc.
- Takuya UEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20180342371
- Publication date Nov 29, 2018
- NuFlare Technology, Inc.
- Shunsuke ISAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING APPARATUS, DRAWING METHOD, AND METHOD FOR MANUFACTURING ART...
- Publication number 20150155130
- Publication date Jun 4, 2015
- Canon Kabushiki Kaisha
- Kazuya Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR SPOT SIZE MEASUREMENT AT WAFER LEVEL USING A KNIFE EDGE...
- Publication number 20150001423
- Publication date Jan 1, 2015
- MAPPER LITHOGRAPHY IP BV
- Jan Andries Meijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY APPARATUS, LITHOGRAPHY METHOD, AND METHOD OF MANUFACTUR...
- Publication number 20140322831
- Publication date Oct 30, 2014
- Canon Kabushiki Kaisha
- Koichi Sentoku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Simulation Of Shot-Noise Effects In A Particle-Beam Lithography Pro...
- Publication number 20140172386
- Publication date Jun 19, 2014
- Jerome Belledent
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHOD
- Publication number 20140168629
- Publication date Jun 19, 2014
- Canon Kabushiki Kaisha
- Toshihiko NISHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20130252145
- Publication date Sep 26, 2013
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of manufacturing semiconductor device and semiconductor manu...
- Publication number 20130115723
- Publication date May 9, 2013
- Advantest Corporation
- Masahiro Ishida
- B82 - NANO-TECHNOLOGY
Information Patent Application
DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHOD
- Publication number 20130068962
- Publication date Mar 21, 2013
- Canon Kabushiki Kaisha
- Takayuki Kawamoto
- B82 - NANO-TECHNOLOGY
Information Patent Application
SYSTEM FOR MAGNETIC SHIELDING
- Publication number 20130043414
- Publication date Feb 21, 2013
- MAPPER LITHOGRAPHY IP BV
- Alon ROSENTHAL
- B82 - NANO-TECHNOLOGY
Information Patent Application
DATA PATH FOR LITHOGRAPHY APPARATUS
- Publication number 20120286168
- Publication date Nov 15, 2012
- MAPPER LITHOGRAPHY IP BV
- Henk Derks
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON BEAM DRIFT DETECTION DEVICE AND METHOD FOR DETECTING ELECT...
- Publication number 20120256084
- Publication date Oct 11, 2012
- National Taiwan University
- Jia-Yush Yen
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20120211676
- Publication date Aug 23, 2012
- NuFlare Technology, Inc.
- Takashi KAMIKUBO
- B82 - NANO-TECHNOLOGY
Information Patent Application
SUBSTRATE FOR ELECTRON-BEAM DRAWING
- Publication number 20120153487
- Publication date Jun 21, 2012
- Kabushiki Kaisha Toshiba
- Keiichiro Yusu
- G11 - INFORMATION STORAGE
Information Patent Application
PATTERN WRITING SYSTEM AND METHOD AND ABNORMALITY DIAGNOSING METHOD
- Publication number 20110255388
- Publication date Oct 20, 2011
- NuFlare Technology, Inc.
- Yoshikuni GOSHIMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus for aligning a particle-beam-generated pattern to a patte...
- Publication number 20100044594
- Publication date Feb 25, 2010
- Applied Materials, Inc.
- Jeffrey S. Sullivan
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam apparatus with aberration corrector
- Publication number 20090008551
- Publication date Jan 8, 2009
- Hitachi High-Technologies Corporation
- Takeshi Kawasaki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-Particle Exposure Apparatus
- Publication number 20080258084
- Publication date Oct 23, 2008
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam exposure apparatus and method for cleaning the same
- Publication number 20080169433
- Publication date Jul 17, 2008
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS
- Publication number 20070194250
- Publication date Aug 23, 2007
- NuFlare Technology, Inc.
- Junichi Suzuki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam apparatus with aberration corrector
- Publication number 20070114409
- Publication date May 24, 2007
- Hitachi High-Technologies Corporation
- Takeshi Kawasaki
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED BEAM DRAWING APPARATUS AND CHARGED BEAM DRAWING METHOD
- Publication number 20070114461
- Publication date May 24, 2007
- Kiyoshi HATTORI
- B82 - NANO-TECHNOLOGY
Information Patent Application
Real-time compensation of mechanical position error in pattern gene...
- Publication number 20070085027
- Publication date Apr 19, 2007
- Bruce B. Baxter
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of aligning a particle-beam-generated pattern to a pattern o...
- Publication number 20070072099
- Publication date Mar 29, 2007
- APPLIED MATERIALS, INC.
- Jeffrey S. Sullivan
- B82 - NANO-TECHNOLOGY
Information Patent Application
Position measurement apparatus and method and pattern forming appar...
- Publication number 20070024864
- Publication date Feb 1, 2007
- NuFlare Technology, Inc.
- Yuichi Tachikawa
- B82 - NANO-TECHNOLOGY

Problems associated with lithography

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Aberration correction in charged particle system

Multi charged particle beam writing apparatus and multi charged par...

Exposure device

Particle beam apparatus and method for operating a particle beam ap...

Charged particle beam writing method and charged particle beam writ...

Temperature measuring mask and temperature measuring method

Cabinet for electronic equipment

Charged particle beam writing apparatus and charged particle beam w...

Charged particle beam writing apparatus and method for calculating...

Charged particle beam drawing apparatus and charged particle beam d...

Multi charged particle beam writing apparatus and multi charged par...

Mask manufacturing method, mask substrate, and charged beam drawing...

Method for correcting drift of charged particle beam, and charged p...

Multi charged particle beam writing apparatus utilizing multiple st...

Lithography apparatus, lithography method, and method of manufactur...

Device for spot size measurement at wafer level using a knife edge...

Electron beam drift detection device and method for detecting elect...

Method of manufacturing semiconductor device

Data path for lithography apparatus

System for magnetic shielding

Charged particle beam writing apparatus and charged particle beam w...

8829475

Drawing apparatus, and article manufacturing method

Electron microscope assembly for viewing the wafer plane image of a...

Pattern writing system and method and abnormality diagnosing method

Electron beam drift correction method and electron beam writing method

Semiconductor manufacture method

Electron beam apparatus with aberration corrector

Electron beam exposure apparatus and method for cleaning the same

Charged-particle exposure apparatus

Patents Applicationslast 30 patents

ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM

EXPOSURE DEVICE

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

DRAWING APPARATUS, DRAWING METHOD, AND METHOD FOR MANUFACTURING ART...

DEVICE FOR SPOT SIZE MEASUREMENT AT WAFER LEVEL USING A KNIFE EDGE...

LITHOGRAPHY APPARATUS, LITHOGRAPHY METHOD, AND METHOD OF MANUFACTUR...

Simulation Of Shot-Noise Effects In A Particle-Beam Lithography Pro...

DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHOD

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

Method of manufacturing semiconductor device and semiconductor manu...

DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHOD

SYSTEM FOR MAGNETIC SHIELDING

DATA PATH FOR LITHOGRAPHY APPARATUS

ELECTRON BEAM DRIFT DETECTION DEVICE AND METHOD FOR DETECTING ELECT...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

SUBSTRATE FOR ELECTRON-BEAM DRAWING

PATTERN WRITING SYSTEM AND METHOD AND ABNORMALITY DIAGNOSING METHOD

Apparatus for aligning a particle-beam-generated pattern to a patte...

Electron beam apparatus with aberration corrector

Charged-Particle Exposure Apparatus

Electron beam exposure apparatus and method for cleaning the same

CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS

Electron beam apparatus with aberration corrector

CHARGED BEAM DRAWING APPARATUS AND CHARGED BEAM DRAWING METHOD

Real-time compensation of mechanical position error in pattern gene...

Method of aligning a particle-beam-generated pattern to a pattern o...

Position measurement apparatus and method and pattern forming appar...