Processing objects by plasma generation

Industry

CPC
H01J2237/32

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/32Processing objects by plasma generation

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing system and method using radio frequency and micro...
- Patent number 12,131,887
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,131,891
- Issue date Oct 29, 2024
- NGK Insulators, Ltd.
- Seiya Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 12,119,207
- Issue date Oct 15, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving deposition process
- Patent number 12,112,930
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jung-Tang Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual reverse pulse sputtering system
- Patent number 12,112,931
- Issue date Oct 8, 2024
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chucking process
- Patent number 12,100,609
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma apparatus and methods for processing feed material utilizing...
- Patent number 12,094,688
- Issue date Sep 17, 2024
- 6K Inc.
- Michael C. Kozlowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ignition method and plasma processing apparatus
- Patent number 12,080,517
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-level parameter and frequency pulsing with a low angular spread
- Patent number 12,068,131
- Issue date Aug 20, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus
- Patent number 12,027,344
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Shinya Iwashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching of Ru metal
- Patent number 12,020,908
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Yung-chen Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply device and output control method therefor
- Patent number 12,014,899
- Issue date Jun 18, 2024
- Kyosan Electric Mfg. Co., Ltd.
- Takeshi Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method fabricating semiconductor device
- Patent number 12,014,905
- Issue date Jun 18, 2024
- Samsung Electronics Co., Ltd.
- Nam Kyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extremum seeking control apparatuses with online parameter adjustme...
- Patent number 11,996,269
- Issue date May 28, 2024
- MKS Instruments, Inc.
- Aaron Burry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,990,319
- Issue date May 21, 2024
- Applied Materials, Inc.
- Yida Lin
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High-frequency power supply system
- Patent number 11,990,317
- Issue date May 21, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed voltage source for plasma processing applications
- Patent number 11,972,924
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- A N M Wasekul Azad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma excitation with ion energy control
- Patent number 11,967,483
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device, substrate processing apparatus, and metho...
- Patent number 11,967,490
- Issue date Apr 23, 2024
- Kokusai Electric Corporation
- Akihiro Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control circuit, pulsed power supply system, and semiconductor proc...
- Patent number 11,955,313
- Issue date Apr 9, 2024
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Gang Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with multiple plasma units
- Patent number 11,955,319
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radio frequency match strap assembly
- Patent number 11,955,317
- Issue date Apr 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Sze Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of tuning to improve plasma stability
- Patent number 11,929,236
- Issue date Mar 12, 2024
- Applied Materials, Inc.
- Shouqian Shao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus including predictive control
- Patent number 11,907,235
- Issue date Feb 20, 2024
- HITACHI HIGH-TECH CORPORATION
- Yutaka Okuyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
RF generator device and substrate processing apparatus
- Patent number 11,901,159
- Issue date Feb 13, 2024
- Hitachi Kokusai Electric Inc.
- Naoto Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bias supply with a single controlled switch
- Patent number 11,887,812
- Issue date Jan 30, 2024
- Advanced Energy Industries, Inc.
- Hien Minh Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method using radio frequency (RF) and...
- Patent number 11,887,815
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitance measurement without disconnecting from high power circuit
- Patent number 11,881,381
- Issue date Jan 23, 2024
- Lam Research Corporation
- Sunil Kapoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Voltage waveform generator for plasma processing apparatuses
- Patent number 11,875,972
- Issue date Jan 16, 2024
- PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V.
- Antonius Wilhelmus Hendricus Johannes Driessen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-channel plasma reaction cell
- Patent number 11,875,974
- Issue date Jan 16, 2024
- Preservation Tech, LLC
- Phillip Gerard Langhorst
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LOW PARAMETER PLASMA ASHING TECHNIQUES
- Publication number 20240355595
- Publication date Oct 24, 2024
- Micron Technology, Inc.
- Rachmat Wibowo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20240339300
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Impedance Matching Network and Control Method
- Publication number 20240321552
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- John Carroll
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHER, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SE...
- Publication number 20240312764
- Publication date Sep 19, 2024
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20240312767
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Taro HAYAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, CONTROL METHOD, POWER SUPPLY SYSTEM, A...
- Publication number 20240304418
- Publication date Sep 12, 2024
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTOR AND PLASMA PROCESSING APPARATUS
- Publication number 20240297018
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Reducing Particle Formation in a Process Cham...
- Publication number 20240274404
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20240266144
- Publication date Aug 8, 2024
- Samsung Electronics Co., Ltd.
- JAEWON JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Antenna Plane Magnets for Improved Performance
- Publication number 20240258074
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY MATCH STRAP ASSEMBLY
- Publication number 20240258072
- Publication date Aug 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Sze Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing Chamber With Multiple Plasma Units
- Publication number 20240249918
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240249922
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Ryota SAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...
- Publication number 20240249923
- Publication date Jul 25, 2024
- Kokusai Electric Corporation
- Akihiro SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXHAUST GAS PROCESSING APPARATUS HAVING PLASMA SOURCE AND SUBSTRATE...
- Publication number 20240249925
- Publication date Jul 25, 2024
- Samsung Electronics Co., Ltd.
- JAEHYUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA EXCITATION WITH ION ENERGY CONTROL
- Publication number 20240249915
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Yang YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING EQUIPMENT AND IMPEDANCE-MATCHING METHOD
- Publication number 20240249917
- Publication date Jul 25, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Wenqing LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240242937
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20240234087
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- A N M Wasekul AZAD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-FREQUENCY POWER SUPPLY APPARATUS
- Publication number 20240222077
- Publication date Jul 4, 2024
- DAIHEN Corporation
- Yuichi HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...
- Publication number 20240222085
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Koichiro NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DEPOSITING BORON CARBON NITRIDE
- Publication number 20240222115
- Publication date Jul 4, 2024
- ASM IP HOLDING B.V.
- Antti Niskanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-FREQUENCY POWER SUPPLY DEVICE
- Publication number 20240222074
- Publication date Jul 4, 2024
- DAIHEN Corporation
- Yuya UENO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240222075
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, P...
- Publication number 20240222080
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Yuto KOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240212984
- Publication date Jun 27, 2024
- Hitachi High-Tech Corporation
- Isao MORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH FREQUENCY REACTION PROCESSING APPARATUS AND HIGH FREQUENCY REA...
- Publication number 20240212986
- Publication date Jun 27, 2024
- SST INC.
- Toshiyuki TAKAMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PROCESSING SUBSTRATES AND METHOD OF PROCESSING SUBSTR...
- Publication number 20240203691
- Publication date Jun 20, 2024
- WONIK IPS CO., LTD.
- Yea Jin SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD
- Publication number 20240203692
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Shin OOWADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND PLASMA DENSITY CONTROL METHOD
- Publication number 20240203690
- Publication date Jun 20, 2024
- SEMES CO., LTD.
- Hyoung Kyu SON
- H01 - BASIC ELECTRIC ELEMENTS

Processing objects by plasma generation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing system and method using radio frequency and micro...

Wafer placement table

Apparatus for plasma processing

Method for improving deposition process

Dual reverse pulse sputtering system

Electrostatic chucking process

Plasma apparatus and methods for processing feed material utilizing...

Ignition method and plasma processing apparatus

Multi-level parameter and frequency pulsing with a low angular spread

Film forming apparatus

Atomic layer etching of Ru metal

High-frequency power supply device and output control method therefor

Apparatus and method fabricating semiconductor device

Extremum seeking control apparatuses with online parameter adjustme...

Methods and apparatus for processing a substrate

High-frequency power supply system

Pulsed voltage source for plasma processing applications

Plasma excitation with ion energy control

Plasma generating device, substrate processing apparatus, and metho...

Control circuit, pulsed power supply system, and semiconductor proc...

Processing chamber with multiple plasma units

Radio frequency match strap assembly

Methods of tuning to improve plasma stability

Plasma processing apparatus including predictive control

RF generator device and substrate processing apparatus

Bias supply with a single controlled switch

Plasma processing system and method using radio frequency (RF) and...

Capacitance measurement without disconnecting from high power circuit

Voltage waveform generator for plasma processing apparatuses

Multi-channel plasma reaction cell

Patents Applicationslast 30 patents

LOW PARAMETER PLASMA ASHING TECHNIQUES

Plasma Processing Apparatus

Impedance Matching Network and Control Method

MATCHER, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SE...

Plasma Processing Apparatus

PLASMA PROCESSING APPARATUS, CONTROL METHOD, POWER SUPPLY SYSTEM, A...

DISTRIBUTOR AND PLASMA PROCESSING APPARATUS

System and Method for Reducing Particle Formation in a Process Cham...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

Antenna Plane Magnets for Improved Performance

RADIO FREQUENCY MATCH STRAP ASSEMBLY

Processing Chamber With Multiple Plasma Units

PLASMA PROCESSING APPARATUS

PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...

EXHAUST GAS PROCESSING APPARATUS HAVING PLASMA SOURCE AND SUBSTRATE...

PLASMA EXCITATION WITH ION ENERGY CONTROL

SEMICONDUCTOR PROCESSING EQUIPMENT AND IMPEDANCE-MATCHING METHOD

PLASMA PROCESSING APPARATUS

PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS

HIGH-FREQUENCY POWER SUPPLY APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...

METHOD AND SYSTEM FOR DEPOSITING BORON CARBON NITRIDE

HIGH-FREQUENCY POWER SUPPLY DEVICE

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, P...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

HIGH FREQUENCY REACTION PROCESSING APPARATUS AND HIGH FREQUENCY REA...

APPARATUS FOR PROCESSING SUBSTRATES AND METHOD OF PROCESSING SUBSTR...

PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD

SUBSTRATE TREATMENT APPARATUS AND PLASMA DENSITY CONTROL METHOD