Processing photosensitive materials Apparatus therefor

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/26Processing photosensitive materials Apparatus therefor

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Patents Grantslast 30 patents

Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
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- Issue date Mar 4, 2025
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- Takafumi Endo
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Photoresist underlayer and method of manufacturing a semiconductor...
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- Issue date Feb 11, 2025
- TAIWAN SEMICONDUCTOR MANUFACURING COMPANY, LTD.
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Metal-compound-removing solvent and method in lithography
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Method composition and methods thereof
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- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Siao-Shan Wang
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Photoresist and method
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- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Liang-Yi Chang
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Resist composition and resist pattern forming method
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- Issue date Dec 31, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Tuning threshold voltage through meta stable plasma treatment
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- Issue date Nov 19, 2024
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Film processing method
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Extreme ultraviolet photolithography method with infiltration for e...
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- Issue date Oct 8, 2024
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Information Patent Grant
Apparatus and method for treating a relief plate precursor having a...
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- Issue date Sep 3, 2024
- XSYS PREPRESS N.V.
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
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- Issue date Aug 20, 2024
- Applied Materials, Inc.
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Onium salt, chemically amplified negative resist composition, and p...
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Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
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- Applied Materials, Inc.
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Directly photo-patternable, stretchable, electrically conductive po...
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- Issue date Jun 25, 2024
- The Board of Trustees of the Leland Stanford Junior University
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Microfluidic device and method for manufacturing the same, and meth...
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Systems and methods that utilize angled photolithography for manufa...
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Resist underlayer composition, and method of forming patterns using...
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Photosensitive element, resin composition for forming barrier layer...
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Apparatus and method for treating and transporting a relief printin...
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Measurement system, substrate processing system, and device manufac...
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Method and apparatus for post exposure processing of photoresist wa...
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- Viachslav Babayan
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Salts and photoresists comprising same
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- Issue date Jan 23, 2024
- Rohm and Haas Electronic Materials LLC
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Photoacid generator
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- International Business Machines Corporation
- Gerhard Ingmar Meijer
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Information Patent Grant
Mask and method for manufacturing the same, exposure system, method...
- Patent number 11,841,615
- Issue date Dec 12, 2023
- CHONGQING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Shouqiang Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing apparatus for forming a coating film on a substrate havi...
- Patent number 11,791,162
- Issue date Oct 17, 2023
- Tokyo Electron Limited
- Yasuaki Noda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Filtering device, purification device, and method for manufacturing...
- Patent number 11,759,749
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- FUJIFILM Corporation
- Tadashi Omatsu
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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Chemical liquid, chemical liquid storage body, pattern forming meth...
- Patent number 11,747,727
- Issue date Sep 5, 2023
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Carboxylate, carboxylic acid generator, resist composition and meth...
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- Issue date Aug 29, 2023
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography process method for defining sidewall morphology of lith...
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- Issue date Aug 15, 2023
- Shanghai Huahong Grace Semiconductor Manufacturing Corporation
- Hui Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

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METHOD OF FORMING PATTERNS
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Photoresist and Method
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- Taiwan Semiconductor Manufacturing Co., Ltd.
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- H01 - BASIC ELECTRIC ELEMENTS
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RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS
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- ASML NETHERLANDS B.V.
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
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- LAM RESEARCH CORPORATION
- Jeffrey Marks
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INFORMATION COLLECTION SYSTEM, INSPECTION SUBSTRATE, AND INFORMATIO...
- Publication number 20240385538
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- TOKYO ELECTRON LIMITED
- Junnosuke Maki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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METHOD AND APPARATUS FOR REDUCING SOLVENT CONSUMPTION
- Publication number 20240382994
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Wei LIAO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
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TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT
- Publication number 20240387178
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
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VAPORIZER
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- Publication date Oct 24, 2024
- PROTERIAL, LTD.
- Akira Sasaki
- F22 - STEAM GENERATION
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
- Publication number 20240327321
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- Samsung SDI Co., Ltd.
- Seil CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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UNDERCOAT AGENT, AND METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE...
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- Junichi Tsuchiya
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CROSSTALK REDUCTION OF MICROCAPSULE IMAGING SYSTEM
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- Polaroid IP B.V.
- Rong-Chang Liang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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METHOD FOR MANUFACTURING LAMINATE
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- Namics Corporation
- Naoki OBATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME
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- Applied Materials, Inc.
- Yung-chen LIN
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POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR...
- Publication number 20240117102
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- Mitsubishi Gas Chemical Company, Inc.
- Kodai MATSUURA
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RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTER...
- Publication number 20240109997
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- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
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PHOTOACID GENERATOR
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- Publication date Feb 29, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Application
APPARATUS AND METHOD FOR TREATING AND TRANSPORTING A RELIEF PRINTIN...
- Publication number 20240036472
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- Bart WATTYN
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METHOD OF FABRICATING BIT LINE CONTACTS
- Publication number 20240008266
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- NANYA TECHNOLOGY CORPORATION
- CHIH-YING TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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METHOD OF FORMING PATTERNS
- Publication number 20230406970
- Publication date Dec 21, 2023
- Samsung SDI Co., Ltd.
- Seung-Wook SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTORESIST UNDERLAYER AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20230393474
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PROCESSING APPARATUS FOR FORMING A COATING FILM ON A SUBSTRATE HAVI...
- Publication number 20230395380
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- TOKYO ELECTRON LIMITED
- Yasuaki NODA
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PATTERN FORMING METHOD, KIT, AND RESIST COMPOSITION
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- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Metal-Compound-Removing Solvent And Method In Lithography
- Publication number 20230324806
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
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PATTERN FORMING METHOD, MANUFACTURING METHOD OF CIRCUIT BOARD, AND...
- Publication number 20230305403
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- FUJIFILM CORPORATION
- Akio KATAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS
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- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
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Tuning Threshold Voltage Through Meta Stable Plasma Treatment
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- Publication date Sep 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20230273516
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- LAM RESEARCH CORPORATION
- Jeffrey Marks
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RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
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VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
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- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Processing photosensitive materials Apparatus therefor

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist underlayer film-forming composition comprising epoxy adduct...

Photoresist underlayer and method of manufacturing a semiconductor...

Photoacid generator

Metal-compound-removing solvent and method in lithography

Method composition and methods thereof

Photoresist and method

Resist composition and resist pattern forming method

Tuning threshold voltage through meta stable plasma treatment

Film processing method

Extreme ultraviolet photolithography method with infiltration for e...

Apparatus and method for treating a relief plate precursor having a...

Vapor phase thermal etch solutions for metal oxo photoresists

Onium salt, chemically amplified negative resist composition, and p...

Vapor phase thermal etch solutions for metal oxo photoresists

Directly photo-patternable, stretchable, electrically conductive po...

Microfluidic device and method for manufacturing the same, and meth...

Systems and methods that utilize angled photolithography for manufa...

Resist underlayer composition, and method of forming patterns using...

Photosensitive element, resin composition for forming barrier layer...

Apparatus and method for treating and transporting a relief printin...

Measurement system, substrate processing system, and device manufac...

Method and apparatus for post exposure processing of photoresist wa...

Salts and photoresists comprising same

Photoacid generator

Mask and method for manufacturing the same, exposure system, method...

Processing apparatus for forming a coating film on a substrate havi...

Filtering device, purification device, and method for manufacturing...

Chemical liquid, chemical liquid storage body, pattern forming meth...

Carboxylate, carboxylic acid generator, resist composition and meth...

Lithography process method for defining sidewall morphology of lith...

Patents Applicationslast 30 patents

METHOD OF FORMING PATTERNS

Photoresist and Method

RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

INFORMATION COLLECTION SYSTEM, INSPECTION SUBSTRATE, AND INFORMATIO...

METHOD AND APPARATUS FOR REDUCING SOLVENT CONSUMPTION

TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT

VAPORIZER

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

UNDERCOAT AGENT, AND METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE...

CROSSTALK REDUCTION OF MICROCAPSULE IMAGING SYSTEM

METHOD FOR MANUFACTURING LAMINATE

ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME

POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR...

RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTER...

PHOTOACID GENERATOR

APPARATUS AND METHOD FOR TREATING AND TRANSPORTING A RELIEF PRINTIN...

METHOD OF FABRICATING BIT LINE CONTACTS

METHOD OF FORMING PATTERNS

PHOTORESIST UNDERLAYER AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

PROCESSING APPARATUS FOR FORMING A COATING FILM ON A SUBSTRATE HAVI...

PATTERN FORMING METHOD, KIT, AND RESIST COMPOSITION

Metal-Compound-Removing Solvent And Method In Lithography

PATTERN FORMING METHOD, MANUFACTURING METHOD OF CIRCUIT BOARD, AND...

VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS

Tuning Threshold Voltage Through Meta Stable Plasma Treatment

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS