Reactive etching

Industry

CPC
H01J2237/3341

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3341Reactive etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Exhaust device, processing apparatus, and exhausting method
- Patent number 12,322,578
- Issue date Jun 3, 2025
- Tokyo Electron Limited
- Kazuya Nagaseki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adaptive control of variability in device performance in advanced s...
- Patent number 12,322,618
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Samer Banna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ adsorbate formation for plasma etch process
- Patent number 12,308,212
- Issue date May 20, 2025
- Tokyo Electron Limited
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method for multi-zone active-matrix temperature control in...
- Patent number 12,309,891
- Issue date May 20, 2025
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 12,300,472
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Pei-Yu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck for high bias radio frequency (RF) power applic...
- Patent number 12,300,473
- Issue date May 13, 2025
- Applied Materials, Inc.
- Jaeyong Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit for a substrate support
- Patent number 12,293,902
- Issue date May 6, 2025
- Applied Materials, Inc.
- Muhannad Mustafa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-large area scanning reactive ion etching machine and etching...
- Patent number 12,272,530
- Issue date Apr 8, 2025
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning impedance measurement in a radio frequency plasma processi...
- Patent number 12,266,506
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing with selective etching
- Patent number 12,261,053
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Ivo Otto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-shape voltage pulse trains for uniformity and etch profile tu...
- Patent number 12,255,051
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,249,515
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing aspect ratio dependent etch with direct current bias pulsing
- Patent number 12,237,149
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Deyang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch feedback for control of upstream process
- Patent number 12,237,158
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 12,237,148
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,230,484
- Issue date Feb 18, 2025
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Atsushi Harikai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing system, method of manufacturing a semic...
- Patent number 12,217,962
- Issue date Feb 4, 2025
- Kioxia Corporation
- Shingo Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method using perfluoropropyl carbinol
- Patent number 12,217,970
- Issue date Feb 4, 2025
- Ajou University Industry-Academic Cooperation Foundation
- Chang-Koo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for increasing the surface roughness of a metal layer
- Patent number 12,215,430
- Issue date Feb 4, 2025
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Nicolas Posseme
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
DC bias in plasma process
- Patent number 12,217,936
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,211,674
- Issue date Jan 28, 2025
- HITACHI HIGH-TECH CORPORATION
- Shunsuke Tashiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solid-state switch based high-speed pulser with plasma IEDF modific...
- Patent number 12,205,797
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with spatially tunable RF coupling to a wafer
- Patent number 12,191,122
- Issue date Jan 7, 2025
- Lam Research Corporation
- John Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for filling a recess formed within a substrate...
- Patent number 12,176,243
- Issue date Dec 24, 2024
- ASM IP Holding B.V.
- Viljami Pore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning ion beam deposition and etch
- Patent number 12,176,178
- Issue date Dec 24, 2024
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method for manufacturing...
- Patent number 12,176,236
- Issue date Dec 24, 2024
- Kioxia Corporation
- Wu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etching a material layer for semiconductor applications
- Patent number 12,165,877
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Zhigang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and etching method
- Patent number 12,154,793
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck sidewall gas curtain
- Patent number 12,154,813
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ian Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing chambers configured for tunable substrate and edg...
- Patent number 12,142,469
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FABRICATION OF SEMICONDUCTOR STRUCTURES AND APPARATUS FO...
- Publication number 20250183045
- Publication date Jun 5, 2025
- National Yang Ming Chiao Tung University
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TREATING SUBSTRATE USING BORON COMPOUND
- Publication number 20250174454
- Publication date May 29, 2025
- TES CO., LTD
- Hyeong-Wook MOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST
- Publication number 20250166976
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE FEATURE MODIFICATION USING DIRECTIONAL DEPOSITION
- Publication number 20250157815
- Publication date May 15, 2025
- Applied Materials, Inc.
- Tassie ANDERSEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inductively Coupled Plasma Source with Radial Coil Network
- Publication number 20250157791
- Publication date May 15, 2025
- Yuhui ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH FEEDBACK FOR CONTROL OF UPSTREAM PROCESS
- Publication number 20250157802
- Publication date May 15, 2025
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20250149331
- Publication date May 8, 2025
- Kokusai Electric Corporation
- Kenshiro USUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR CONTROLLING A SLOPE AND LOCATION OF AN UPPER ELECTRODE
- Publication number 20250149304
- Publication date May 8, 2025
- VM Inc.
- Sang Woo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250149389
- Publication date May 8, 2025
- SEMES CO., LTD.
- Il Young KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149313
- Publication date May 8, 2025
- HITACHI HIGH-TECH CORPORATION
- Shunsuke TASHIRO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PROCESSING SUBSTRATE
- Publication number 20250140595
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Yeontae Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM-INDUCED AND REMOTE PLASMA-ASSISTED SIMULTANEOUS MATER...
- Publication number 20250125124
- Publication date Apr 17, 2025
- University of Maryland, College Park
- Gottlieb S. Oehrlein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR PLASMA PROCESSING
- Publication number 20250118532
- Publication date Apr 10, 2025
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIES
- Publication number 20250104976
- Publication date Mar 27, 2025
- Applied Materials, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, PLASMA PROCESSING METHOD, AND PLASMA PROCESSIN...
- Publication number 20250105044
- Publication date Mar 27, 2025
- SEMES CO., LTD.
- Yong Jun BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...
- Publication number 20250104980
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Changbae PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFAC...
- Publication number 20250098248
- Publication date Mar 20, 2025
- Kioxia Corporation
- Masaya NAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE-ASSISTED PLASMA STRIKE
- Publication number 20250087461
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Shreeram Jyoti DASH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250087454
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250087455
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250079136
- Publication date Mar 6, 2025
- Hitachi High-Tech Corporation
- Mai ISOMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRID...
- Publication number 20250066921
- Publication date Feb 27, 2025
- ASM IP HOLDING B.V.
- Ranjit Rohidas Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20250069935
- Publication date Feb 27, 2025
- KIOXIA Corporation
- Wu LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MECHANISM FOR FILTERING ETCHING BYPRODUCT DURING SEMICONDUCTOR FABR...
- Publication number 20250062105
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- MING-YING PEI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TAR...
- Publication number 20250046577
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Syam Parayil VENUGOPALAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250046620
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Kenta NAKAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION
- Publication number 20250046576
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COPPER-LAYER ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250046579
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Hirotoshi SAKAUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFAC...
- Publication number 20250038005
- Publication date Jan 30, 2025
- Hitachi High-Tech Corporation
- Yoshihide YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...
- Publication number 20250022691
- Publication date Jan 16, 2025
- LAM RESEARCH CORPORATION
- Shang-I CHOU
- H01 - BASIC ELECTRIC ELEMENTS

Reactive etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Exhaust device, processing apparatus, and exhausting method

Adaptive control of variability in device performance in advanced s...

In-situ adsorbate formation for plasma etch process

Control method for multi-zone active-matrix temperature control in...

Plasma processing apparatus and method

Electrostatic chuck for high bias radio frequency (RF) power applic...

Process kit for a substrate support

Ultra-large area scanning reactive ion etching machine and etching...

Scanning impedance measurement in a radio frequency plasma processi...

Substrate processing with selective etching

Multi-shape voltage pulse trains for uniformity and etch profile tu...

Etching method and etching apparatus

Reducing aspect ratio dependent etch with direct current bias pulsing

Etch feedback for control of upstream process

Plasma processing assembly using pulsed-voltage and radio-frequency...

Plasma processing apparatus and plasma processing method

Semiconductor manufacturing system, method of manufacturing a semic...

Plasma etching method using perfluoropropyl carbinol

Method for increasing the surface roughness of a metal layer

DC bias in plasma process

Plasma processing apparatus

Solid-state switch based high-speed pulser with plasma IEDF modific...

Electrostatic chuck with spatially tunable RF coupling to a wafer

Method and apparatus for filling a recess formed within a substrate...

Scanning ion beam deposition and etch

Semiconductor manufacturing apparatus and method for manufacturing...

Methods for etching a material layer for semiconductor applications

Etching apparatus and etching method

Electrostatic chuck sidewall gas curtain

Plasma processing chambers configured for tunable substrate and edg...

Patents Applicationslast 30 patents

METHOD FOR FABRICATION OF SEMICONDUCTOR STRUCTURES AND APPARATUS FO...

METHOD FOR TREATING SUBSTRATE USING BORON COMPOUND

DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST

SELECTIVE FEATURE MODIFICATION USING DIRECTIONAL DEPOSITION

Inductively Coupled Plasma Source with Radial Coil Network

ETCH FEEDBACK FOR CONTROL OF UPSTREAM PROCESS

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

SYSTEM FOR CONTROLLING A SLOPE AND LOCATION OF AN UPPER ELECTRODE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

APPARATUS FOR PROCESSING SUBSTRATE

ELECTRON BEAM-INDUCED AND REMOTE PLASMA-ASSISTED SIMULTANEOUS MATER...

SYSTEM AND METHOD FOR PLASMA PROCESSING

RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIES

ELECTROSTATIC CHUCK, PLASMA PROCESSING METHOD, AND PLASMA PROCESSIN...

SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFAC...

PULSED VOLTAGE-ASSISTED PLASMA STRIKE

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRID...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...

MECHANISM FOR FILTERING ETCHING BYPRODUCT DURING SEMICONDUCTOR FABR...

METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TAR...

PLASMA PROCESSING METHOD

PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION

COPPER-LAYER ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFAC...

WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...