Reactive etching

Industry

CPC
H01J2237/3341

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3341Reactive etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Etching method and etching apparatus
- Patent number 12,249,515
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing aspect ratio dependent etch with direct current bias pulsing
- Patent number 12,237,149
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Deyang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch feedback for control of upstream process
- Patent number 12,237,158
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 12,237,148
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,230,484
- Issue date Feb 18, 2025
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Atsushi Harikai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing system, method of manufacturing a semic...
- Patent number 12,217,962
- Issue date Feb 4, 2025
- Kioxia Corporation
- Shingo Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method using perfluoropropyl carbinol
- Patent number 12,217,970
- Issue date Feb 4, 2025
- Ajou University Industry-Academic Cooperation Foundation
- Chang-Koo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for increasing the surface roughness of a metal layer
- Patent number 12,215,430
- Issue date Feb 4, 2025
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Nicolas Posseme
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
DC bias in plasma process
- Patent number 12,217,936
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,211,674
- Issue date Jan 28, 2025
- HITACHI HIGH-TECH CORPORATION
- Shunsuke Tashiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solid-state switch based high-speed pulser with plasma IEDF modific...
- Patent number 12,205,797
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with spatially tunable RF coupling to a wafer
- Patent number 12,191,122
- Issue date Jan 7, 2025
- Lam Research Corporation
- John Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning ion beam deposition and etch
- Patent number 12,176,178
- Issue date Dec 24, 2024
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for filling a recess formed within a substrate...
- Patent number 12,176,243
- Issue date Dec 24, 2024
- ASM IP Holding B.V.
- Viljami Pore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method for manufacturing...
- Patent number 12,176,236
- Issue date Dec 24, 2024
- Kioxia Corporation
- Wu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etching a material layer for semiconductor applications
- Patent number 12,165,877
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Zhigang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and etching method
- Patent number 12,154,793
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck sidewall gas curtain
- Patent number 12,154,813
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ian Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing chambers configured for tunable substrate and edg...
- Patent number 12,142,469
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System of semiconductor process and control method thereof
- Patent number 12,125,687
- Issue date Oct 22, 2024
- Samsung Electronics Co., Ltd.
- Youngdo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching by electron wavefront
- Patent number 12,119,205
- Issue date Oct 15, 2024
- VELVETCH LLC
- Samir John Anz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite structure and semiconductor manufacturing apparatus inclu...
- Patent number 12,112,924
- Issue date Oct 8, 2024
- Toto Ltd.
- Hiroaki Ashizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,112,927
- Issue date Oct 8, 2024
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and system
- Patent number 12,087,591
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,087,556
- Issue date Sep 10, 2024
- Kioxia Corporation
- Yosuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 12,087,561
- Issue date Sep 10, 2024
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing chamber
- Patent number 12,080,524
- Issue date Sep 3, 2024
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Yan Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,071,687
- Issue date Aug 27, 2024
- Tokyo Electron Limited
- Michiko Nakaya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, and temperature control method
- Patent number 12,063,717
- Issue date Aug 13, 2024
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having a variable coupling of low frequency RF power...
- Patent number 12,062,524
- Issue date Aug 13, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250079136
- Publication date Mar 6, 2025
- Hitachi High-Tech Corporation
- Mai ISOMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRID...
- Publication number 20250066921
- Publication date Feb 27, 2025
- ASM IP HOLDING B.V.
- Ranjit Rohidas Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20250069935
- Publication date Feb 27, 2025
- KIOXIA Corporation
- Wu LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MECHANISM FOR FILTERING ETCHING BYPRODUCT DURING SEMICONDUCTOR FABR...
- Publication number 20250062105
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- MING-YING PEI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TAR...
- Publication number 20250046577
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Syam Parayil VENUGOPALAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250046620
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Kenta NAKAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION
- Publication number 20250046576
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COPPER-LAYER ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250046579
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Hirotoshi SAKAUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFAC...
- Publication number 20250038005
- Publication date Jan 30, 2025
- Hitachi High-Tech Corporation
- Yoshihide YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...
- Publication number 20250022691
- Publication date Jan 16, 2025
- LAM RESEARCH CORPORATION
- Shang-I CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING OF AN EDGE RING ASSEMBLY FOR AN ETCHING SYSTEM
- Publication number 20250022690
- Publication date Jan 16, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi Chiuan Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20240429030
- Publication date Dec 26, 2024
- KIOXIA Corporation
- Kazuya EMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...
- Publication number 20240420929
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Rajesh Dorai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER HAVING SWIRL MOTION SIDE GAS FEED
- Publication number 20240420925
- Publication date Dec 19, 2024
- NYSEPLASMA CORP.
- Nam Hun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20240404794
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Derek William Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIN COMPOSITION, CURED PRODUCT THEREOF, LAMINATE USING SAME, ELEC...
- Publication number 20240400825
- Publication date Dec 5, 2024
- TORAY INDUSTRIES, INC.
- Akira Shimada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
- Publication number 20240395502
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING
- Publication number 20240395509
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck Sidewall Gas Curtain
- Publication number 20240387228
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ian HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVE ETCHING BY LOCAL PHOTON SURFACE ACTIVATION
- Publication number 20240387186
- Publication date Nov 21, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Non-Intrusive Method for 2D/3D Mapping Plasma Parameters
- Publication number 20240377331
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW PARAMETER PLASMA ASHING TECHNIQUES
- Publication number 20240355595
- Publication date Oct 24, 2024
- Micron Technology, Inc.
- Rachmat Wibowo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REGENERATOR FOR FORELINE HEATING
- Publication number 20240337449
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Santosh S. Nesarkar
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
SUBSTRATE SUPPORT INCLUDING MULTIPLE RADIO FREQUENCY (RF) ELECTRODES
- Publication number 20240321560
- Publication date Sep 26, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Yulin PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240321562
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- Koki MUKAIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20240312801
- Publication date Sep 19, 2024
- KIOXIA Corporation
- Shohei ARAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20240304456
- Publication date Sep 12, 2024
- Hitachi High-Tech Corporation
- Koichi TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20240304453
- Publication date Sep 12, 2024
- Ulvac, Inc.
- Taichi SUZUKI
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
INTERNAL PRESSURE CONTROL APPARATUS AND SUBSTRATE PROCESSING APPARA...
- Publication number 20240304427
- Publication date Sep 12, 2024
- Samsung Electronics Co., Ltd.
- Sang Ki NAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240290587
- Publication date Aug 29, 2024
- Semes Co., Ltd.
- Dong Hun KIM
- H01 - BASIC ELECTRIC ELEMENTS

Reactive etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Etching method and etching apparatus

Reducing aspect ratio dependent etch with direct current bias pulsing

Etch feedback for control of upstream process

Plasma processing assembly using pulsed-voltage and radio-frequency...

Plasma processing apparatus and plasma processing method

Semiconductor manufacturing system, method of manufacturing a semic...

Plasma etching method using perfluoropropyl carbinol

Method for increasing the surface roughness of a metal layer

DC bias in plasma process

Plasma processing apparatus

Solid-state switch based high-speed pulser with plasma IEDF modific...

Electrostatic chuck with spatially tunable RF coupling to a wafer

Scanning ion beam deposition and etch

Method and apparatus for filling a recess formed within a substrate...

Semiconductor manufacturing apparatus and method for manufacturing...

Methods for etching a material layer for semiconductor applications

Etching apparatus and etching method

Electrostatic chuck sidewall gas curtain

Plasma processing chambers configured for tunable substrate and edg...

System of semiconductor process and control method thereof

Atomic layer etching by electron wavefront

Composite structure and semiconductor manufacturing apparatus inclu...

Substrate processing apparatus and method

Plasma processing apparatus and system

Plasma processing apparatus and plasma processing method

Vacuum pump protection against deposition byproduct buildup

Semiconductor processing chamber

Plasma processing method and plasma processing apparatus

Plasma processing apparatus, and temperature control method

Plasma reactor having a variable coupling of low frequency RF power...

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD

MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRID...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...

MECHANISM FOR FILTERING ETCHING BYPRODUCT DURING SEMICONDUCTOR FABR...

METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TAR...

PLASMA PROCESSING METHOD

PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION

COPPER-LAYER ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFAC...

WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...

RING OF AN EDGE RING ASSEMBLY FOR AN ETCHING SYSTEM

PLASMA TREATMENT APPARATUS

EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...

PLASMA CHAMBER HAVING SWIRL MOTION SIDE GAS FEED

PLASMA PROCESSING METHOD AND APPARATUS

RESIN COMPOSITION, CURED PRODUCT THEREOF, LAMINATE USING SAME, ELEC...

FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM

APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING

Electrostatic Chuck Sidewall Gas Curtain

METHOD FOR SELECTIVE ETCHING BY LOCAL PHOTON SURFACE ACTIVATION

Non-Intrusive Method for 2D/3D Mapping Plasma Parameters

LOW PARAMETER PLASMA ASHING TECHNIQUES

REGENERATOR FOR FORELINE HEATING

SUBSTRATE SUPPORT INCLUDING MULTIPLE RADIO FREQUENCY (RF) ELECTRODES

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...

PLASMA PROCESSING METHOD

ETCHING METHOD

INTERNAL PRESSURE CONTROL APPARATUS AND SUBSTRATE PROCESSING APPARA...

APPARATUS AND METHOD FOR TREATING SUBSTRATE