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H
ELECTRICITY
H01
Electric elements
H01J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J2237/00
Discharge tubes exposing object to beam
Current Industry
H01J2237/3341
Reactive etching
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Patents Grants
last 30 patents
Information
Patent Grant
Apparatus and techniques for angled etching using multielectrode ex...
Patent number
11,967,489
Issue date
Apr 23, 2024
Applied Materials, Inc.
Peter F. Kurunczi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Vacuum processing method
Patent number
11,961,719
Issue date
Apr 16, 2024
HITACHI HIGH-TECH CORPORATION
Nozomu Yoshioka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate processing apparatus
Patent number
11,961,714
Issue date
Apr 16, 2024
Linco Technology Co., Ltd.
Yi-Yuan Huang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Automatic electrostatic chuck bias compensation during plasma proce...
Patent number
11,948,780
Issue date
Apr 2, 2024
Applied Materials, Inc.
Linying Cui
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Cooling device, substrate treatment device, cooling method, and sub...
Patent number
11,948,812
Issue date
Apr 2, 2024
Shibaura Mechatronics Corporation
Kensuke Demura
B08 - CLEANING
Information
Patent Grant
Plasma processing with radio frequency (RF) source and bias signal...
Patent number
11,942,307
Issue date
Mar 26, 2024
Tokyo Electron Limited
Zhiying Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of making a semiconductor manufacturing apparatus member
Patent number
11,939,678
Issue date
Mar 26, 2024
Toto Ltd.
Yasutaka Nitta
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Atomic layer etching by electron wavefront
Patent number
11,942,306
Issue date
Mar 26, 2024
VELVETCH LLC
Samir John Anz
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and method
Patent number
11,923,179
Issue date
Mar 5, 2024
Taiwan Semiconductor Manufacturing Company Limited
Pei-Yu Lee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for controlling a processing reactor
Patent number
11,894,220
Issue date
Feb 6, 2024
Applied Materials, Inc.
Michael Nichols
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Intraluminal ultrasound imaging device comprising a substrate separ...
Patent number
11,883,233
Issue date
Jan 30, 2024
Koninklijke Philips N.V.
Ronald Dekker
B06 - GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
Information
Patent Grant
Edge ring and etching apparatus
Patent number
11,887,822
Issue date
Jan 30, 2024
Tokyo Electron Limited
Toshifumi Ishida
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Imprinted substrates
Patent number
11,878,299
Issue date
Jan 23, 2024
Illumina, Inc.
Hui Han
B81 - MICRO-STRUCTURAL TECHNOLOGY
Information
Patent Grant
Method and system for metastasis diagnosis and prognosis
Patent number
11,874,268
Issue date
Jan 16, 2024
NANOHESGARSAZAN SALAMAT ARYA NCUBATION CENTER FOR EQUIPMENT AND DEVICES
Mohammad Abdolahad
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Atomic layer etching by electron wavefront
Patent number
11,869,747
Issue date
Jan 9, 2024
VELVETCH LLC
Samir John Anz
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Manufacturing method for semiconductor device
Patent number
11,862,471
Issue date
Jan 2, 2024
Kioxia Corporation
Atsushi Takahashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
DC bias in plasma process
Patent number
11,854,766
Issue date
Dec 26, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Sheng-Liang Pan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing using pulsed-voltage and radio-frequency power
Patent number
11,848,176
Issue date
Dec 19, 2023
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etching techniques
Patent number
11,837,467
Issue date
Dec 5, 2023
Toyko Electron Limited
Pingshan Luan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate joining method, substrate joining system and method for c...
Patent number
11,837,444
Issue date
Dec 5, 2023
BONDTECH CO., LTD.
Akira Yamauchi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Hardware switch on main feed line in a radio frequency plasma proce...
Patent number
11,823,868
Issue date
Nov 21, 2023
Applied Materials, Inc.
Yue Guo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Focus ring, chuck assembly for securing a substrate and plasma trea...
Patent number
11,817,298
Issue date
Nov 14, 2023
Samsung Electronics Co., Ltd.
Incheol Song
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Three-phase pulsing systems and methods for plasma processing
Patent number
11,817,295
Issue date
Nov 14, 2023
Tokyo Electron Limited
Peter Ventzek
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
11,817,321
Issue date
Nov 14, 2023
Tokyo Electron Limited
Yuzuru Sakai
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Atomic layer etching by electron wavefront
Patent number
11,810,757
Issue date
Nov 7, 2023
VELVETCH LLC
Samir John Anz
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Composite structure and semiconductor manufacturing apparatus inclu...
Patent number
11,802,085
Issue date
Oct 31, 2023
Toto Ltd.
Hiroaki Ashizawa
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
Patent number
11,784,047
Issue date
Oct 10, 2023
Lam Research Corporation
David Charles Smith
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
Patent number
11,776,789
Issue date
Oct 3, 2023
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Reactive cleaning of substrate support
Patent number
11,772,137
Issue date
Oct 3, 2023
Applied Materials, Inc.
Xi Chen
B08 - CLEANING
Information
Patent Grant
Devices and methods for controlling wafer uniformity in plasma-base...
Patent number
11,769,652
Issue date
Sep 26, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Jr-Sheng Chen
G06 - COMPUTING CALCULATING COUNTING
Patents Applications
last 30 patents
Information
Patent Application
MULTI-SHAPE VOLTAGE PULSE TRAINS FOR UNIFORMITY AND ETCH PROFILE TU...
Publication number
20240153741
Publication date
May 9, 2024
Applied Materials, Inc.
Linying CUI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
Publication number
20240153744
Publication date
May 9, 2024
TOKYO ELECTRON LIMITED
Atsushi TAKAHASHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PULSED VOLTAGE PLASMA PROCESSING APPARATUS AND METHOD
Publication number
20240145215
Publication date
May 2, 2024
Applied Materials, Inc.
Shreeram Jyoti DASH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SYSTEMS AND METHODS FOR ETCHING A HIGH ASPECT RATIO STRUCTURE
Publication number
20240120209
Publication date
Apr 11, 2024
LAM RESEARCH CORPORATION
Nikhil Dole
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
In-Situ Adsorbate Formation for Dielectric Etch
Publication number
20240112888
Publication date
Apr 4, 2024
TOKYO ELECTRON LIMITED
Du Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
In-Situ Adsorbate Formation for Plasma Etch Process
Publication number
20240112887
Publication date
Apr 4, 2024
TOKYO ELECTRON LIMITED
Du Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND SYSTEM FOR FABRICATING TWO-DIMENSIONAL MATERIAL BY USING...
Publication number
20240092702
Publication date
Mar 21, 2024
BEIHANG UNIVERSITY
Shubin Yang
C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information
Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR DEVICE MANU...
Publication number
20240096607
Publication date
Mar 21, 2024
KIOXIA Corporation
Shohei ARAKAWA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
Publication number
20240087843
Publication date
Mar 14, 2024
PSK INC.
JONG CHAN LEE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
Publication number
20240087854
Publication date
Mar 14, 2024
PSK INC.
Kwang Sung YOO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SCANNING IMPEDANCE MEASUREMENT IN A RADIO FREQUENCY PLASMA PROCESSI...
Publication number
20240079212
Publication date
Mar 7, 2024
Applied Materials, Inc.
Yue GUO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR PROCESSING SUBSTRATE
Publication number
20240078663
Publication date
Mar 7, 2024
PSK INC.
KWANG SUNG YOO
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
DC Bias in Plasma Process
Publication number
20240071722
Publication date
Feb 29, 2024
Taiwan Semiconductor Manufacturing Co., Ltd.
Sheng-Liang Pan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS AND SYSTEMS FOR DRY ETCHING
Publication number
20240071803
Publication date
Feb 29, 2024
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
Fu-Yi Liu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
Publication number
20240071772
Publication date
Feb 29, 2024
TOKYO ELECTRON LIMITED
Shinya ISHIKAWA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PULSED VOLTAGE COMPENSATION FOR PLASMA PROCESSING APPLICATIONS
Publication number
20240055244
Publication date
Feb 15, 2024
Applied Materials, Inc.
Shreeram Jyoti DASH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING WITH SELECTIVE ETCHING
Publication number
20240055268
Publication date
Feb 15, 2024
TOKYO ELECTRON LIMITED
Ivo Otto
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FOCUS RING AND METHOD FOR MANUFACTURING THE SAME
Publication number
20240038503
Publication date
Feb 1, 2024
HANA MATERIALS INC.
Je Guen YU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
Publication number
20240030002
Publication date
Jan 25, 2024
Applied Materials, Inc.
Leonid DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ANALYSIS DEVICE, ANALYSIS METHOD, AND ANALYSIS PROGRAM
Publication number
20240030013
Publication date
Jan 25, 2024
Horiba Stec, Co., Ltd.
Miyako HADA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
Publication number
20240030031
Publication date
Jan 25, 2024
LAM RESEARCH CORPORATION
David Charles Smith
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
IMPROVED PLASMA RESISTANT COATINGS FOR ELECTROSTATIC CHUCKS
Publication number
20240006216
Publication date
Jan 4, 2024
OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
Matthew Paul KIRK
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
ETCHING METHOD AND ETCHING APPARATUS
Publication number
20240006152
Publication date
Jan 4, 2024
TOKYO ELECTRON LIMITED
Maju TOMURA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ETCHING METHOD AND PLASMA PROCESSING SYSTEM
Publication number
20230402289
Publication date
Dec 14, 2023
TOKYO ELECTRON LIMITED
Kae TAKAHASHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ETCHING APPARATUS AND ETCHING METHOD USING THE SAME
Publication number
20230386788
Publication date
Nov 30, 2023
IUCF-HYU(Industry-University Cooperation Foundation Hanyang University)
Chin-Wook CHUNG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS
Publication number
20230377852
Publication date
Nov 23, 2023
SEMES CO., LTD.
Junseok Park
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ETCHING METHOD AND PLASMA PROCESSING SYSTEM
Publication number
20230377850
Publication date
Nov 23, 2023
TOKYO ELECTRON LIMITED
Satoshi OHUCHIDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
Publication number
20230377953
Publication date
Nov 23, 2023
Tokyo Electron Limited
Hiroki MURAKAMI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIES
Publication number
20230369022
Publication date
Nov 16, 2023
Applied Materials, Inc.
Glen F. R. Gilchrist
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
DEVICE AND METHOD FOR TREATING SUBSTRATE
Publication number
20230352277
Publication date
Nov 2, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Zi-Wei ZHU
H01 - BASIC ELECTRIC ELEMENTS